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1. 发明授权

US06692883B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06692883B2
公开(公告)日：2004-02-17
申请号：US09838257
申请日：2001-04-20
申请人： Fumiyuki Nishiyama , Toru Fujimori , Shiro Tan
发明人： Fumiyuki Nishiyama , Toru Fujimori , Shiro Tan
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含具有包含特定基团的结构单元并且能够在酸的作用下分解以增加在碱性显影剂中的溶解度的树脂，具有包含特定基团的结构单元的树脂，并且能够在酸的作用下分解以增加在碱性显影剂中的溶解度，以及能够在用光化射线或辐射照射时能够产生酸的化合物。

2. 发明授权

US06207343B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06207343B1
公开(公告)日：2001-03-27
申请号：US09292052
申请日：1999-04-14
申请人： Toru Fujimori , Shiro Tan
发明人： Toru Fujimori , Shiro Tan
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a positive photosensitive composition comprising a compound having a group represented by the following general formula (Ia) or (Ib) which decomposes by the action of an acid to enhance its solubility in an alkaline developing solution and a compound which generates an acid upon irradiation with actinic rays or radiation: wherein R1a and R2a each represent a hydrogen atom or a C1-4 alkyl group; Wa represents a single bond or a divalent organic group; R3a represents a group which decomposes the action of an acid; R1b and R2b each represent a hydrogen atom or a C1-4 alkyl group; Wb represents a divalent organic group; and R3b represents a C11-20 chain alkyl group which may have substituents, a C11-20 cyclic alkyl group which may have substituents, a C11-30 aryl group which may have substituents or a C12-30 aralkyl group which may have substituents.
摘要翻译：本发明提供一种正型光敏组合物，其包含具有由以下通式（Ia）或（Ib）表示的基团的化合物，其通过酸的作用而分解，以增强其在碱性显影液中的溶解度和产生用光化射线或辐射照射时酸;其中R1a和R2a各自表示氢原子或C1-4烷基; Wa表示单键或二价有机基团; R3a表示分解酸的作用的基团; R1b和R2b各自表示氢原子或C1-4烷基; Wb表示二价有机基团; R3b表示可具有取代基的C11-20链烷基，可具有取代基的C11-20环状烷基，可具有取代基的C11-30芳基或可具有取代基的C12-30芳烷基。

3. 发明授权

US6136504A Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US6136504A
公开(公告)日：2000-10-24
申请号：US280679
申请日：1999-03-29
申请人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
发明人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides an excellent chemically-sensitized positive-working photoresist composition which exhibits a high resolution and a good dimensional stability with time, generates no development residue (scum) and standing waves and is less liable to loss of lone pattern. A novel positive-working photoresist composition is provided comprising at least (a) a copolymer A having at least structural units representedby the following general formulae (I), (II) and (III), (b) a compound which generates an acid when irradiated with actinic rays or radiation and (c) a solvent: ##STR1## wherein R.sub.1 and R.sub.2 each independently represent a hydrogen atom or methyl group; R.sub.3 represents a tertiary alkyl or cycloalkyl group which may be substituted; and X represents a divalent organic residue.
摘要翻译：本发明提供了一种优异的化学敏化正性光致抗蚀剂组合物，其显示出高分辨率和随时间稳定的尺寸稳定性，不产生显影残渣（浮渣）和驻波，并且不易损失孤单图案。提供了一种新型的正性光致抗蚀剂组合物，其包含至少（a）至少具有由以下通式（I），（II）和（III）表示的结构单元的共聚物A，（b）用光化射线或辐射照射，和（c）溶剂：其中R1和R2各自独立地表示氢原子或甲基; R3表示可以被取代的叔烷基或环烷基; X表示二价有机残基。

4. 发明授权

US06489080B2 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06489080B2
公开(公告)日：2002-12-03
申请号：US09449899
申请日：1999-12-02
申请人： Kazuya Uenishi , Toru Fujimori , Kunihiko Kodama , Koji Shirakawa , Shiro Tan
发明人： Kazuya Uenishi , Toru Fujimori , Kunihiko Kodama , Koji Shirakawa , Shiro Tan
IPC分类号： G03F7027
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.
摘要翻译：本发明提供一种正电子束或X射线抗蚀剂组合物，其含有（a）通过辐射照射产生酸的化合物和（b）具有阳离子可聚合官能团的化合物。正电子束或X射线抗蚀剂组成灵敏度高，分辨率高，可提供优异的矩形图案，PCD稳定性和PED稳定性优异。

5. 发明授权

US06638683B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06638683B1
公开(公告)日：2003-10-28
申请号：US09103544
申请日：1998-06-24
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.
摘要翻译：正型光致抗蚀剂组合物包含（a）由含有酚羟基的碱溶性树脂得到的树脂A的组合，通过用式（I）和（b）表示的基团代替10至80％的酚羟基，通过用式（II）或（III）表示的基团代替10〜80％的酚羟基或由至少一种以上的非聚合物溶解抑制化合物代替的酚醛羟基的碱溶性树脂得到的树脂B 选自叔烷基酯基和叔烷基碳酸酯基的一类基团;其中R 1，W，n和R 4如说明书中所定义。

6. 发明授权

US06630280B1 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06630280B1
公开(公告)日：2003-10-07
申请号：US09512664
申请日：2000-02-24
申请人： Toru Fujimori , Shiro Tan
发明人： Toru Fujimori , Shiro Tan
IPC分类号： G03F700
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprising: (a) a resin having structural units represented by the following formulae (X) and being capable of decomposing by, the action of an acid to increase the solubility in an alkali developer, and (b) a compound capable of generating an acid with irradiation of actinic ray or radiation: wherein R1 and R2, which may be the same or different, each represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, R3 and R4, which may be the same or different, each represents a hydrogen atom or a linear, branched or cyclic alkyl group which may have a substituent, R5 represents a linear, branched or cyclic alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent, m represents an integer of from 1 to 20, and n represents an integer of from 0 to 5.
摘要翻译：一种正型光致抗蚀剂组合物，其包含：（a）具有由下式（X）表示的结构单元的树脂，并且能够通过酸的作用分解以提高在碱性显影剂中的溶解度，和（b）能够通过光化射线或辐射的照射产生酸：其中可以相同或不同的R 1和R 2各自表示氢原子或具有1至4个碳原子的烷基，R 3和R 4可以是相同或不同，各自表示氢原子或可具有取代基的直链，支链或环状烷基，R5表示可具有取代基的直链，支链或环状烷基，可具有取代基的芳基或可以具有取代基的芳烷基，m表示1〜20的整数，n表示0〜5的整数。

7. 发明授权

US06379860B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06379860B1
公开(公告)日：2002-04-30
申请号：US09220682
申请日：1998-12-23
申请人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
发明人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.
摘要翻译：公开了一种正型感光性组合物，其包含在用光化射线照射时产生酸的化合物或辐射，以及具有通过酸作用分解的基团的树脂，以增强在碱性显影液中的溶解度，所述树脂是通过使具有酚羟基的碱溶性树脂与至少一种特定的烯醇醚化合物在酸性条件下在特定的有机溶剂中。正型感光性组合物显示出非图像区域和图像区域之间的区分改善，具有高灵敏度，高分辨率和高耐热性，随着从曝光到热处理（PED）的时间的流逝，性能几乎没有变化，并且是没有缺陷，例如发展缺陷。

8. 发明授权

US6004721A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6004721A
公开(公告)日：1999-12-21
申请号：US18883
申请日：1998-02-05
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含（a）通过用具有特定结构的基团代替10至80％的酚羟基，由（b）化合物其在用光化射线或辐射照射时产生酸，和（c）溶剂。该组合物是优异的化学放大型光致抗蚀剂组合物，其具有高分辨率并且在其上部具有不具有凹陷的抗蚀剂图案，并且对基材具有令人满意的粘合性。

9. 发明授权

US08877423B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
标题翻译：光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US08877423B2
公开(公告)日：2014-11-04
申请号：US13378387
申请日：2010-06-30
申请人： Kana Fujii , Toru Fujimori
发明人： Kana Fujii , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/028
CPC分类号： G03F7/0048 , C08F8/02 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C09D125/14 , C09D125/18 , G03F7/0397 , C08F220/10 , C08F2220/1841
摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.
摘要翻译：一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。

10. 发明授权

US08741542B2 Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same 有权
标题翻译：光化射线敏感或辐射敏感性树脂组合物，使用其组合物和图案形成方法形成的膜
公开(公告)号：US08741542B2
公开(公告)日：2014-06-03
申请号：US13512633
申请日：2010-11-30
申请人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
发明人： Tomotaka Tsuchimura , Takayuki Ito , Toru Fujimori , Kana Fujii
IPC分类号： G03F7/027 , G03F7/039 , G03F7/30
CPC分类号： G03F7/0045 , C09B69/101 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/091
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.
摘要翻译：本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。

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