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81. 发明申请

US20060112999A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060112999A1
公开(公告)日：2006-06-01
申请号：US11270595
申请日：2005-11-10
申请人： Hiroyuki Nagura , Ikuo Ueda , Masakazu Murakami
发明人： Hiroyuki Nagura , Ikuo Ueda , Masakazu Murakami
IPC分类号： D03D25/00
CPC分类号： D21F1/0036 , Y10T442/3195
摘要： An industrial two-layer fabric composed of an upper surface side fabric having an upper surface side warp and an upper surface side weft and a lower surface side fabric having a lower surface side warp and a lower surface side weft, the upper surface side warp and lower surface side warp being arranged vertically and constituting a pair, and the upper surface side fabric and lower surface side fabric being bound with a yarn in a warp direction. The lower surface side fabric is made of a repeating design unit in which one of warp binding yarns constituting a pair to be woven with an upper surface side weft and a lower surface side weft or a lower surface side warp passes under one lower surface side weft and then passes over a plurality of lower surface side wefts; a warp on one adjacent side to the above-described warp has the same design and passes over and under the same lower surface side wefts. A complete design repeating unit of the lower surface side fabric is formed by shifting the design of a set of these two warps and then arranging the shifted design one after another; and a lower surface side weft has a design in which the weft passes over two successive warps and then passes under a plurality of warps to form a long crimp on the lower surface side surface.
摘要翻译：一种由具有上表面侧经线和上表面侧纬纱的上表面侧织物和具有下表面侧经纱和下表面侧纬纱的下表面侧织物组成的工业双层织物，上表面侧经纱和下表面侧经线垂直排列并构成一对，上表面侧织物和下表面侧织物在经纱方向上与纱线结合。下表面侧织物由重复设计单元制成，其中构成一对织物的经线结合纱线与上表面侧纬纱和下表面侧纬纱或下表面侧经纱之一经过一个下表面侧纬纱然后经过多个下表面纬纱; 与上述翘曲相邻的一侧的翘曲具有相同的设计，并且在相同的下表面侧纬纱下方经过。通过移动一组这两个经纱的设计，然后一个接一个地布置移位的设计，形成下表面织物的完整设计重复单元。并且下表面侧纬纱具有这样的设计，其中纬纱经过两个连续的经纱，然后在多个经纱下通过，以在下表面侧表面上形成长卷曲。

82. 发明申请

US20060102244A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060102244A1
公开(公告)日：2006-05-18
申请号：US11270509
申请日：2005-11-10
申请人： Ikuo Ueda , Hiroyuki Nagura
发明人： Ikuo Ueda , Hiroyuki Nagura
IPC分类号： D21F1/00
CPC分类号： D21F1/0036
摘要： An industrial two-layer fabric obtained by alternately arranging, on an upper surface side thereof, (a) a warp complete design made of a design in which a warp passes over one upper surface side weft and then passes under one upper surface side weft, and any one of the following warp complete designs of: (b) a warp complete design made of a design in which a warp passes over two upper surface side wefts and then passes under two upper surface side wefts, (c) a warp complete design made of a design in which a warp passes over one upper surface side weft and then passes under three upper surface side wefts, (d) a warp complete design made of a design in which a warp passes over three upper surface side wefts and then passes under one upper surface side weft, and others.
摘要翻译：一种工业用双层织物，其在其上表面侧交替地设置（a）由经过一个上表面侧纬纱然后通过一个上表面侧纬纱的设计制成的经纱整体设计，以及以下任何一种弯曲完整的设计：（b）由经线穿过两个上表面侧纬纱然后通过两个上表面侧纬纱的设计制成的经纱完整设计，（c）经纱完整设计由经线穿过一个上表面侧纬纱然后穿过三个上表面侧纬纱的设计制成，（d）由经纱穿过三个上表面侧纬纱然后通过的设计制成的经纱整体设计在一个上表面侧纬纱等。

83. 发明申请

US20060040578A1 Industrial two-layer fabric 有权
标题翻译：工业双层面料
公开(公告)号：US20060040578A1
公开(公告)日：2006-02-23
申请号：US11207942
申请日：2005-08-22
申请人： Hiroyuki Nagura , Ikuo Ueda , Keiichi Takimoto
发明人： Hiroyuki Nagura , Ikuo Ueda , Keiichi Takimoto
IPC分类号： D03D15/00 , B32B5/26
CPC分类号： D21F1/0036 , Y10S162/90 , Y10S162/902 , Y10S162/903 , Y10T442/30 , Y10T442/3472
摘要： An industrial two-layer fabric which comprises eight pairs of warps obtained by arranging eight upper surface side warps and eight lower surface side warps, and a plurality of upper surface side wefts and lower surface side wefts, and has an upper surface side layer and a lower surface side layer bound with warp-direction yarns. In the lower surface side layer, warps are formed by successively arranging a design in which one warp passes over four successive lower surface side wefts, passes under one lower surface side weft, passes over two lower surface side wefts, and passes under one lower surface side weft while shifting the design by three lower surface side wefts, and two adjacent lower surface side warps simultaneously weave therein, from the lower surface side, one lower surface side weft.
摘要翻译：一种工业双层织物，其包括通过布置八个上表面侧经纱和八个下表面侧经纱而获得的八对经纱，以及多个上表面侧纬纱和下表面侧纬纱，并且具有上表面侧层和与经向纱线结合的下表面侧层。在下表面侧层中，通过连续地设置一个经纱经过四个连续的下表面侧纬线，经过一个下表面侧纬线，经过两个下表面侧纬纱并在一个下表面下方通过的设计形成经纱侧面纬纱同时由三个下表面纬纱移动设计，并且从下表面侧同时编织两个相邻的下表面侧经纱，一个下表面侧纬纱。

84. 发明授权

US5457099A Carbostyril derivatives and antiallergic agent 失效
标题翻译：卡波他汀衍生物和抗过敏剂
公开(公告)号：US5457099A
公开(公告)日：1995-10-10
申请号：US81021
申请日：1993-06-22
申请人： Takeshi Shogaki , Hiromu Toyoda , Takao Kakita , Masumi Furukawa , Seiichi Nakatsugi , Emi Masai , Tsuyako Yashima , Ikuo Ueda
发明人： Takeshi Shogaki , Hiromu Toyoda , Takao Kakita , Masumi Furukawa , Seiichi Nakatsugi , Emi Masai , Tsuyako Yashima , Ikuo Ueda
IPC分类号： A61K31/47 , C07D215/22 , C07D215/227 , C07D401/06 , C07D401/14 , C07D407/12 , C07D409/14
CPC分类号： C07D215/227 , A61K31/47 , C07D401/06 , C07D401/14 , C07D407/12 , C07D409/14
摘要： 1. A compound of the formula: ##STR1## wherein the symbol of a solid line with a broken line means a single bond or a double bond,R and R' are independently selected from the group consisting of hydrogen atom, halogen atom, lower alkyl, nitro, unsubstituted amino and substituted amino,A and B are independently selected from the group consisting of hydrogen atom, lower alkyl optionally substituted with a lower cycloalkyl, aryl optionally substituted with one or more halogen atoms and the group: -Y-R.sup.2wherein Y is lower alkylene and R.sup.2 is the group: ##STR2## wherein m is integer of 1 to 3, n is 0 or 1, Z is >N-, >CH-- or >C=, R.sup.3 is diaryl (lower) alkyl optionally substituted with one or more halogen atoms or is condensed heterocyclic group optionally substituted with oxo, with the proviso that(a) at least one of A and B is the group -Y-R.sup.2 and(b) when A is hydrogen atom and B is the group -Y-R.sup.2, then Z is >CH-- or >C= if R.sup.3 is condensed heterocyclic group optionally substituted with oxo and n is Oor a pharmaceutically acceptable salt thereof. The compounds of the above formula have antiallergic activity.
摘要翻译： 1.下式的化合物：其中虚线的实线的符号表示单键或双键，R和R'独立地选自氢原子，卤原子，低级烷基，硝基，未取代的氨基和取代的氨基，A和B独立地选自氢原子，任选被低级环烷基取代的低级烷基，任选被一个或多个卤素原子取代的基团和-Y-R 2 其中Y为低级亚烷基且R2为基团：其中m为1至3的整数，n为0或1，Z为> N-，> CH-或> C =，R3为二芳基（低级）烷基任选地被一个或多个卤素原子取代或是被氧代取代的稠合杂环基，条件是（a）A和B中的至少一个是基团-Y-R 2和（b）当A是氢原子和B 是基团-Y-R 2，则Z是> CH-或> C =，如果R 3是任选被氧代a取代的稠合杂环基 nd n是O或其药学上可接受的盐。上述化合物具有抗过敏活性。

85. 发明授权

US4764514A Oxothiazolidine compound and composition containing same 失效
标题翻译：氧化噻唑烷类化合物及其组合物
公开(公告)号：US4764514A
公开(公告)日：1988-08-16
申请号：US855904
申请日：1986-04-24
申请人： Ikuo Ueda , Yousuke Katsura
发明人： Ikuo Ueda , Yousuke Katsura
IPC分类号： A61K31/425 , A61K31/426 , A61K31/435 , A61K31/44 , A61K31/445 , A61K31/495 , A61K31/496 , A61K31/535 , A61K31/55 , A61P25/00 , A61P25/28 , C07D243/00 , C07D277/14 , C07D333/00 , C07D417/06 , C07D417/12 , C07D417/14 , C07D521/00
CPC分类号： C07D417/06 , C07D277/14 , C07D417/12 , C07D417/14
摘要： This invention provides a oxothiazolidine compound of the formula: ##STR1## wherein R.sup.1 is acyl;di(lower)alkylamino(lower)alkylcarbamoyl(lower)alkyl; arylcarbamoyl(lower)alkyl;ar(lower)alkylcarbamoyl(lower)alkyl;heterocyclic carbamoyl(lower)alkyl;heterocyclic(lower)alkylcarbamoyl(lower)alkyl;thiazolidinylcarbonyl(lower)alkyl;morpholinylcarbonyl(lower)alkyl or a group of the formula: ##STR2## in which A is lower alkylene;n is an integer of 0 or 1;m is an integer of 2 or 3;X is --N--, ##STR3## or --CH-- and R.sup.2 is hydroxy;lower alkyl which may have hydroxy;ar(lower)alkyl which may have halogen;arylthio which may have halogen;acyl or heterocyclic group andY is --S--, ##STR4## or pharmaceutically acceptable salt thereof. This compound is useful as cognition activator. This invention further provides processes for the preparation of this compound and pharmaceutical composition comprising compound of the above formula.
摘要翻译：本发明提供下式的氧代噻唑烷化合物：其中R 1是酰基; 二（低级）烷基氨基（低级）烷基氨基甲酰基（低级）烷基; 芳基氨基甲酰基（低级）烷基; 芳（低级）烷基氨基甲酰基（低级）烷基; 杂环氨基甲酰基（低级）烷基; （低级）烷基氨基甲酰基（低级）烷基; 噻唑烷基羰基（低级）烷基; 吗啉基羰基（低级）烷基或下式的基团：其中A是低级亚烷基; n为0或1的整数; m为2或3的整数; X是-N-，或-CH-，R 2是羟基; 可具有羟基的低级烷基; 可以具有卤素的芳基（低级）烷基; 可以具有卤素的芳硫基; 酰基或杂环基，Y是-S-，其中或其药学上可接受的盐。该化合物可用作认知激活剂。本发明还提供了制备该化合物的方法和包含上式化合物的药物组合物。

86. 发明授权

US4738967A Imidazoisoquinoline compounds useful as anti-ulcerative agents 失效
标题翻译：咪唑并异喹啉化合物可用作抗溃疡剂
公开(公告)号：US4738967A
公开(公告)日：1988-04-19
申请号：US945788
申请日：1986-12-23
申请人： Ikuo Ueda , Youichi Shiokawa , Masayuki Kato , Nobukiyo Konishi , Atsushi Akahane
发明人： Ikuo Ueda , Youichi Shiokawa , Masayuki Kato , Nobukiyo Konishi , Atsushi Akahane
IPC分类号： C07D471/04 , A61K31/47 , A61P1/04 , C07D487/04 , A61K31/40
CPC分类号： C07D487/04
摘要： A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl,R.sup.3 is hydrogen, halogen or ar(lower)alkoxy, andR is lower alkanoyl, nitroso, amino, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, haloformyl, aminomethyleneamino which may be substituted with cyano or lower alkyl, iminomethylamino which may be substituted with cyano or lower alkyl, or a group of the formula: --A--R.sup.2 in which A is lower alkylene andR.sup.2 is di(lower) alkylamino, cyano, lower alkoxy, N-containing heterocyclic group which may have suitable substituent(s), lower alkynyloxy, lower alkenyloxy, lower alkylthio, amino(lower)alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, hydroxy, lower alkanoyloxy, heterocyclicamino(lower)alkylthio having two oxo groups, hydrogen or a group of the formula: ##STR2## in which R.sup.4, R.sup.5 and R.sup.6 are each lower alkyl andX is an acid residue,and pharmaceutically acceptable salts thereof. pa The compounds are useful as anti ulcer agents.

87. 发明授权

US4705787A Quinazolinone derivatives, processes for the preparation thereof and pharmaceutical composition comprising the same 失效
标题翻译：喹唑啉酮衍生物，其制备方法和包含其的药物组合物
公开(公告)号：US4705787A
公开(公告)日：1987-11-10
申请号：US869340
申请日：1986-06-02
申请人： Ikuo Ueda , Masayuki Kato
发明人： Ikuo Ueda , Masayuki Kato
IPC分类号： A61K31/505 , A61K31/517 , A61P37/08 , C07D239/95 , C07D239/96 , C07D243/00 , C07D243/08 , C07D403/06 , C07D403/12 , A61K31/445 , C07D455/06
CPC分类号： C07D403/06 , C07D239/95 , C07D239/96 , C07D243/08 , C07D403/12 , Y10S514/826
摘要： Anti-allergic quinazolinone derivatives are disclosed which have the formula ##STR1## wherein R.sup.3 is hydrogen or lower alkyl and A is lower alkylene.

88. 发明授权

US4673676A Pyrimidoisoquinoline derivatives useful for treating allergies 失效
标题翻译：用于治疗过敏的嘧啶并喹啉衍生物
公开(公告)号：US4673676A
公开(公告)日：1987-06-16
申请号：US669865
申请日：1984-11-09
申请人： Ikuo Ueda , Youichi Shiokawa , Takashi Manabe
发明人： Ikuo Ueda , Youichi Shiokawa , Takashi Manabe
IPC分类号： C07D487/04 , A61K31/4745 , A61K31/505 , A61P11/06 , C07D217/02 , C07D217/08 , C07D217/22 , C07D471/04
CPC分类号： C07D217/02 , C07D217/08 , C07D217/22 , C07D471/04
摘要： Pyrimidoisoquinoline/compounds of the formula: ##STR1## where R.sup.1 is H, halogen or lower alkyl, R.sup.2 is NH.sub.2, NO.sub.2 or acylamino and R.sup.3 is carboxy or protected carboxy, pharmaceutically acceptable salts thereof, and pharmaceutical compositions thereof are disclosed in this application. Also disclosed is a method of treating allergies by administering the compounds of this invention.
摘要翻译：嘧啶并喹啉/下式的化合物：其中R 1为H，卤素或低级烷基，R 2为NH 2，NO 2或酰基氨基，R 3为羧基或被保护的羧基，其药学上可接受的盐及其药物组合物在本申请中公开。还公开了通过施用本发明化合物治疗过敏症的方法。

89. 发明授权

US4563524A Cephem compounds and processes for preparation thereof 失效
标题翻译：头孢烯化合物及其制备方法
公开(公告)号：US4563524A
公开(公告)日：1986-01-07
申请号：US570297
申请日：1984-01-13
申请人： Ikuo Ueda , Masaaki Matsuo , Kiyoshi Tsuji , Masayuki Kato
发明人： Ikuo Ueda , Masaaki Matsuo , Kiyoshi Tsuji , Masayuki Kato
IPC分类号： C07D209/48 , C07D257/04 , C07D277/20 , C07D295/13 , C07D295/205 , C07D501/36 , C07D403/06
CPC分类号： C07D209/48 , C07D257/04 , C07D277/587 , C07D295/13 , C07D295/205 , Y02P20/55
摘要： The invention relates to novel intermediates for preparing novel cephem compounds of high antimicrobial activity, the intermediates being of the formula: ##STR1## wherein A is lower alkylene which may have an oxo group;R.sup.3 is carboxy, protected carboxy, lower alkyl, lower alkenyl, hydroxy(lower)alkyl, phenyl(lower)alkyl or aryl; andR.sup.7a is hydrogen or a mercapto-protective group, or a salt thereof.
摘要翻译：本发明涉及用于制备高抗微生物活性的新型头孢烯化合物的新型中间体，其中间体具有下式：其中A是可具有氧代基团的低级亚烷基; R3是羧基，被保护的羧基，低级烷基，低级烯基，羟基（低级）烷基，苯基（低级）烷基或芳基; 和R7a是氢或巯基保护基，或其盐。

90. 发明授权

US4562190A Benzothiazolone derivatives, processes for preparation thereof and pharmaceutical compositions comprising the same 失效
标题翻译：苯并噻唑酮衍生物，其制备方法和包含其的药物组合物
公开(公告)号：US4562190A
公开(公告)日：1985-12-31
申请号：US627612
申请日：1984-07-03
申请人： Ikuo Ueda , Kiyoshi Taniguchi , Yousuke Katsura
发明人： Ikuo Ueda , Kiyoshi Taniguchi , Yousuke Katsura
IPC分类号： A61K31/50 , A61P7/02 , A61P9/04 , A61P9/12 , C07D237/00 , C07D277/68 , C07D417/04 , C07D417/02 , C07D417/06 , C07D417/10 , C07D417/14
CPC分类号： C07D277/68 , C07D417/04
摘要： A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl, andR.sup.2 is hydrogen lower alkyl, carboxy(lower)alkyl, lower alkoxy(lower)alkyl, aliphatic acyl (lower)alkyl, aromatic acyl(lower)alkyl or heterocyclic acyl(lower)alkyl,and pharmaceutically acceptable salts thereof are useful for treatment of hypertension, heart disease and thrombosis.
摘要翻译：下式的化合物，其中R 1是低级烷基，R 2是氢低级烷基，羧基（低级）烷基，低级烷氧基（低级）烷基，脂族酰基（低级）烷基，芳族酰基（低级）烷基或杂环酰基（低级）烷基及其可药用盐可用于治疗高血压，心脏病和血栓形成。

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