会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明授权
    • Imidazoisoquinoline compounds useful as anti-ulcerative agents
    • 咪唑并异喹啉化合物可用作抗溃疡剂
    • US4686227A
    • 1987-08-11
    • US745638
    • 1985-06-17
    • Ikuo UedaYouichi ShiokawaMasayuki KatoNobukiyo KonishiAtsushi Akahane
    • Ikuo UedaYouichi ShiokawaMasayuki KatoNobukiyo KonishiAtsushi Akahane
    • C07D471/04A61K31/47A61P1/04C07D487/04A61K31/395C07D405/04
    • C07D487/04
    • A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl,R.sup.3 is hydrogen, halogen or ar(lower)alkoxy, andR is lower alkanoyl, nitroso, amino, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, haloformyl, aminomethyleneamino which may be substituted with cyano or lower alkyl, iminomethylamino which may be substituted with cyano or lower alkyl, or a group of the formula: --A--R.sup.2 in whichA is lower alkylene andR.sup.2 is di(lower)alkylamino, cyano, lower alkoxy, N-containing heterocyclic group which may have suitable substituent(s), lower alkynyloxy, lower alkenyloxy, lower alkylthio, amino(lower)alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, hydroxy, lower alkanoyloxy, heterocyclicamino (lower)alkylthio having two oxo groups, hydrogen or a group of the formula: ##STR2## in which R.sup.4, R.sup.5 and R.sup.6 are each lower alkyl andX is an acid residue,and pharmaceutically acceptable salts thereof.The compounds are useful as anti ulcer agents.
    • 下式的化合物,其中R 1为低级烷基,R 3为氢,卤素或芳(低级)烷氧基,R为低级烷酰基,亚硝基,氨基,羧基,酯化羧基,氨基甲酰基,羟基氨基甲酰基,卤代甲酰基,氨基亚甲基氨基 可以被氰基或低级烷基取代,可以被氰基或低级烷基取代的亚氨基甲基氨基,或下列基团:其中A是低级亚烷基,R2是二(低级)烷基氨基,氰基,低级烷氧基 ,可具有适当取代基的含N杂环基,低级炔氧基,低级烯氧基,低级烷硫基,氨基(低级)烷硫基,低级烷基亚磺酰基,低级烷基磺酰基,羧基,酯化羧基,氨基甲酰基,羟基氨基甲酰基,羟基,低级烷酰氧基, 具有两个氧代基的杂环氨基(低级)烷硫基,氢或下式的基团:其中R 4,R 5和R 6各自为低级烷基,X为酸残基,及其药学上可接受的盐。 该化合物可用作抗溃疡剂。
    • 10. 发明授权
    • Industrial two-layer fabric
    • 工业双层面料
    • US08205644B2
    • 2012-06-26
    • US12733482
    • 2008-10-06
    • Ikuo Ueda
    • Ikuo Ueda
    • D21F1/10D21F7/08D03D25/00
    • D21F1/0036Y10T428/24612
    • An industrial two-layer fabric constituted by at least one upper surface side warp to be woven with at least one upper surface side weft, at least one lower surface side warp to be woven with at least one lower surface side weft, and at least one warp binding yarn to be woven with the at least one upper surface side weft and the at least one lower surface side weft having at least one pair of upper and lower warps in which the upper and lower surface side warps are located to be upper and lower, respectively, and at least one pair of warp binding yarns in which at least one yarn constitutes a warp binding yarn.
    • 一种工业双层织物,由至少一个上表面侧经纱与至少一个上表面侧纬纱组成,至少一个下表面侧经纱与至少一个下表面侧纬纱织造,至少一个 具有至少一个上表面侧纬纱和至少一个下表面侧纬纱的经编结合纱线具有至少一对上下翘曲,其中上表面侧经线和下表面侧经线位于其上下 以及至少一对经纱结合纱线,其中至少一根纱线构成经纱结合纱线。