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81. 发明申请

US20130004057A1 METHOD AND APPARATUS FOR INSPECTING PATTERN DEFECTS 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20130004057A1
公开(公告)日：2013-01-03
申请号：US13611664
申请日：2012-09-12
申请人： Kaoru SAKAI , Shunji Maeda , Takafumi Okabe
发明人： Kaoru SAKAI , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/46 , G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： A method of detecting a defect, including the steps of: illuminating step for illuminating a sample with a light; detecting step for detecting light from the specimen which is illuminated by the light and forming an image by processing the detected light; processing step for extracting a defect candidate by processing the image of the sample formed in the detecting step and determining an inspection condition by using images including the image of the sample acquired in the detecting step, a partial image including the extracted defect candidate and a reference image which corresponds to the partial image including the defect candidate.
摘要翻译：一种检测缺陷的方法，包括以下步骤：用光照射样品的照明步骤; 检测步骤，用于检测由光照射的样本的光并通过处理检测到的光来形成图像; 处理步骤，用于通过处理在检测步骤中形成的样本的图像来提取缺陷候选，并且通过使用包括在检测步骤中获取的样本的图像的图像来确定检查条件，包括提取的缺陷候选的部分图像和参考对应于包括缺陷候选的部分图像的图像。

82. 发明授权

US08310665B2 Inspecting method and inspecting apparatus for substrate surface 有权
标题翻译：基板表面检查方法及检查装置
公开(公告)号：US08310665B2
公开(公告)日：2012-11-13
申请号：US13404749
申请日：2012-02-24
申请人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
发明人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC分类号： G01N21/00
CPC分类号： G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.
摘要翻译：用于检查基板表面的检查方法和装置包括：由于在多个位置处施加的光，向基板表面施加光，检测散射光或来自基板表面的反射光，以获得多个电信号，提取在与所述多个电信号中的每一个相互不同的频带中的信号的信号，以及通过所述频带中的多个提取的信号的算术运算处理来计算关于所述衬底的膜的状态的值。

83. 发明授权

US08275190B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US08275190B2
公开(公告)日：2012-09-25
申请号：US13214420
申请日：2011-08-22
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the defect detection process performed by the defect detection unit is performed asynchronously with an image acquisition process that is performed by the image acquisition unit.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理，其中由缺陷检测单元执行的缺陷检测处理与图像获取处理异步地执行，由图像获取单元执行。

84. 发明申请

US20120041575A1 Anomaly Detection Method and Anomaly Detection System 审中-公开
标题翻译：异常检测方法和异常检测系统
公开(公告)号：US20120041575A1
公开(公告)日：2012-02-16
申请号：US13144343
申请日：2009-10-29
申请人： Shunji Maeda , Hisae Shibuya
发明人： Shunji Maeda , Hisae Shibuya
IPC分类号： G05B9/02 , G06F15/18
CPC分类号： G05B23/024 , G05B23/0254
摘要： (1) A compact set of learning data about normal cases is created using the similarities among data as key factors, (2) new data is added to the learning data according to the similarities and occurrence/nonoccurrence of an anomaly, (3) the alarm occurrence section of a facility is deleted from the learning data, (4) a model of the learning data updated at appropriate times made by the subspace method, and an anomaly candidate is detected on the basis of the distance between each piece of the observation data and a subspace, (5) analyses of event information are combined and an anomaly is detected from the anomaly candidates, and (6) the deviance of the observation data is determined on the basis of the distribution of histograms of use of the learning data, and the abnormal element (sensor signal) indicated by the observation data is identified.
摘要翻译：（1）使用数据之间的相似性作为关键因素，创建了一组关于正常情况的学习数据，（2）根据异常的相似性和发生/不发生将新数据添加到学习数据中，（3）从学习数据中删除设施的报警发生部分，（4）以子空间方式适当地更新的学习数据的模型，并且基于每个观察之间的距离来检测异常候选数据和子空间，（5）组合事件信息的分析，并从异常候选中检测到异常，以及（6）基于学习数据的使用直方图的分布来确定观测数据的偏差，并且识别由观察数据指示的异常元素（传感器信号）。

85. 发明申请

US20110292390A1 Apparatus For Inspecting Defects 有权
标题翻译：检查缺陷的仪器
公开(公告)号：US20110292390A1
公开(公告)日：2011-12-01
申请号：US13198170
申请日：2011-08-04
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： A defect inspection apparatus includes an illumination optical system, a detection optical system which includes a reflecting objective lens, and wavelength separation optics for conducting wavelength separation, and after the wavelength separation, branching the scattered light into at least a first detection optical path and a second detection optical path. The detection optical system further includes, on the first detection optical path, a first sensor, and on the second detection optical path, a second sensor. A signal processor is provided which, in accordance with at least one of a first signal obtained from the first sensor and a second signal obtained from the second sensor, discriminates defects or defect candidates present on a surface of a sample.
摘要翻译：缺陷检查装置包括照明光学系统，包括反射物镜的检测光学系统和用于进行波长分离的波长分离光学器件，并且在波长分离之后，将散射光分支成至少第一检测光路和第二检测光路。检测光学系统还在第一检测光路上包括第一传感器，并且在第二检测光路上还包括第二传感器。提供一种信号处理器，其根据从第一传感器获得的第一信号和从第二传感器获得的第二信号中的至少一个识别存在于样品表面上的缺陷或缺陷候选物。

86. 发明申请

US20110286001A1 DARK-FIELD DEFECT INSPECTING METHOD, DARK-FIELD DEFECT INSPECTING APPARATUS, ABERRATION ANALYZING METHOD, AND ABERRATION ANALYZING APPARATUS 有权
标题翻译：暗场缺陷检查方法，暗场缺陷检查装置，分析方法和分析方法
公开(公告)号：US20110286001A1
公开(公告)日：2011-11-24
申请号：US13142328
申请日：2010-01-20
申请人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
发明人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
IPC分类号： G01N21/55
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/4788 , G01N21/93 , G01N21/94 , G01N21/956 , G01N2021/8822
摘要： By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.
摘要翻译：通过包括照明系统和检测系统，监视诸如温度和大气压力之类的环境的信息收集功能，以及具有比较监视结果和设计值的反馈功能的设备状态管理功能，理论计算值或者从模拟结果导出的理想值，并且对设备进行校准，使得监视结果接近理想值，提供用于保持设备状态和设备灵敏度恒定的单元。控制单元800被配置为包括记录单元801，比较单元802，灵敏度预测单元803和反馈控制单元804.在比较单元802中，从记录单元801发送的监视结果和理想值存储在数据库805中进行比较。当理想值与监视结果之间的差异超过预定阈值时，反馈控制单元804校正照明系统和检测系统。

87. 发明授权

US08045149B2 Apparatus for detecting defects using multiple coordinate systems 失效
标题翻译：使用多坐标系检测缺陷的装置
公开(公告)号：US08045149B2
公开(公告)日：2011-10-25
申请号：US12946555
申请日：2010-11-15
申请人： Minoru Yoshida , Shunji Maeda
发明人： Minoru Yoshida , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/4738
摘要： An apparatus is disclosed for detecting defects on a sample inspected by different inspection apparatuses. A data processing unit receives position information of a first defects group in a first coordinate system, based on inspection of the sample under a first condition using a first defect inspection apparatus. The data processing unit receives position information of a second defects group in a second coordinate system, after least one processing step has been performed on the sample. Position information of the second defects group is obtained by inspecting the sample under a second condition using a second defect inspection apparatus which is different from the first defect inspection apparatus. A position correction unit corrects error of relative position information on the first defects group and the second defects group, and the first and second defects groups are checked.
摘要翻译：公开了一种用于检测由不同检查装置检查的样品上的缺陷的装置。数据处理单元使用第一缺陷检查装置，基于第一条件下的样本检查，接收第一坐标系中的第一缺陷组的位置信息。在对样本进行了至少一个处理步骤之后，数据处理单元接收第二坐标系中的第二缺陷组的位置信息。使用与第一缺陷检查装置不同的第二缺陷检查装置，在第二条件下检查样品，获得第二缺陷组的位置信息。位置校正单元校正第一缺陷组和第二缺陷组的相对位置信息的误差，并且检查第一和第二缺陷组。

88. 发明申请

US20110205534A1 Defect Inspection Apparatus and Its Method 有权
标题翻译：缺陷检查装置及其方法
公开(公告)号：US20110205534A1
公开(公告)日：2011-08-25
申请号：US13099530
申请日：2011-05-03
申请人： Akira Hamamatsu , Hisae Shibuya , Shunji Maeda
发明人： Akira Hamamatsu , Hisae Shibuya , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N2021/8822
摘要： A defect inspection apparatus for inspecting defects on an inspecting object includes an illuminator which irradiates a beam of light on the inspecting object, a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator, a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector, a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect, and a defect size calculator which uses a relation between size and characteristic quantity which is calculated by an optical simulation and calculates a size of the detected defect.
摘要翻译：用于检查检查对象的缺陷的缺陷检查装置包括：在检查对象物上照射光束的照明器，由于照射器照射光束而检测来自被检查物体的光的光检测器，缺陷检测器，其通过处理通过光检测器的检测获得的信号来检测缺陷;计算与缺陷的尺寸相关的特征量的特征量计算器;以及使用尺寸和特性之间的关系的缺陷尺寸计算器通过光学模拟计算的量，并计算检测到的缺陷的尺寸。

89. 发明授权

US08005292B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US08005292B2
公开(公告)日：2011-08-23
申请号：US12876699
申请日：2010-09-07
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理和缺陷分类处理，其中由缺陷检测单元执行的处理异步执行具有由图像获取单元执行的图像获取处理。

90. 发明授权

US08004666B2 Apparatus for inspecting defects 有权
标题翻译：检查缺陷的装置
公开(公告)号：US08004666B2
公开(公告)日：2011-08-23
申请号：US12771216
申请日：2010-04-30
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： A defect inspection apparatus and method includes a darkfield illumination optical system which conducts darkfield illumination upon the surface of a sample with irradiation light having at least one of wavelength band, a darkfield detection optical system which includes a reflecting objective lens for converging the light scattered from the surface of the sample that has been darkfield-illuminated with the irradiation light having the at least one wavelength band, and imaging optics for imaging onto a light-receiving surface of an image sensor the scattered light that the reflecting objective lens has converged, and an image processor which, in accordance with an image signal obtained from the image sensor of the darkfield detection optical system, discriminates defects or defect candidates present on the surface of the sample.
摘要翻译：缺陷检查装置和方法包括：暗场照明光学系统，其使用具有波长带中的至少一个的照射光对样品的表面进行暗场照明，暗视场检测光学系统包括用于会聚来自已经用具有至少一个波长带的照射光进行暗场照射的样品的表面，以及用于在图像传感器的光接收表面上成像以用于反射物镜已经会聚的散射光的成像光学器件;以及根据从暗场检测光学系统的图像传感器获得的图像信号，鉴别存在于样品表面上的缺陷或缺陷候选物的图像处理器。

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