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    • 81. 发明申请
    • SUBSTRATE PROCESSING APPARATUS AND ANALYSIS METHOD THEREFOR
    • 基板加工设备及其分析方法
    • US20080110233A1
    • 2008-05-15
    • US11931145
    • 2007-10-31
    • Hideki TanakaSusumu Saito
    • Hideki TanakaSusumu Saito
    • G12B13/00G01P21/00
    • H01L22/26
    • An analysis method for a substrate processing apparatus capable of accurately detecting a state in a housing chamber. Emission intensities of processing gas before being introduced into the chamber and processing gas having passed therethrough are measured before an inter-chamber part is replaced. If an emission intensity measured after the replacement coincides with that measured before the replacement, an emission intensity of the processing gas having passed through the chamber is measured, and a variation between the emission intensities of the processing gas having passed through the chamber measured before and after the replacement is calculated. After start of plasma processing on wafers, an emission intensity of the processing gas having passed through the chamber is measured and the variation is removed therefrom to calculate an emission intensity really representing a state in the chamber, thus detecting an end point of plasma processing therefrom.
    • 一种能够精确地检测收纳室内的状态的基板处理装置的分析方法。 在更换腔室间部分之前,测量在引入室内的处理气体的排放强度和处理通过其中的气体之前。 如果在更换之后测量的发射强度与更换之前测量的发射强度一致,则测量已经通过室的处理气体的发射强度,并且测量了之前经过腔室的处理气体的发射强度之间的变化, 更换后计算。 在开始对晶片进行等离子体处理之后,测量已经通过室的处理气体的发射强度,并从其中去除变化,从而计算出真实表示室内状态的发射强度,从而检测等离子体处理的终点 。
    • 85. 发明申请
    • NMR solenoidal coil for RF field homogeneity
    • 用于RF场均匀性的NMR螺线管线圈
    • US20070188174A1
    • 2007-08-16
    • US11655208
    • 2007-01-19
    • Hideki TanakaTsuyoshi Wakuda
    • Hideki TanakaTsuyoshi Wakuda
    • G01V3/00
    • G01R33/34046G01R33/34053G01R33/5659
    • An NMR signal acquisition device that can increase the magnetic field homogeneity in a high frequency magnetic field by one of the following. (a) Current paths each having a different inductance are provided to adjust the diversion ratio of the current, (b) A current path branch point is provided in an intermediate part of the winding of a solenoidal coil so that there are more current paths in the intermediate part of the winding than in the current paths connected to the feeding points at both ends, (c) The radiuses of current paths are adjusted, (d) Winding pitches in the axis direction are adjusted, (e) Current path widths are adjusted, and (f) The solenoidal coil has both positive direction current paths and negative direction current paths.
    • NMR信号采集装置,其可以通过以下之一增加高频磁场中的磁场均匀性。 (a)提供各自具有不同电感的电流路径以调节电流的转向比,(b)电流路径分支点设置在螺线管线圈的绕组的中间部分中,使得存在更多的电流路径 (c)调整电流路径的半径,(d)调整轴向的绕组间距,(e)电流路径宽度为 (f)螺线管线圈具有正向电流路径和负向电流路径。
    • 87. 发明授权
    • Coating film tape end structure
    • 涂膜胶带端面结构
    • US07201961B2
    • 2007-04-10
    • US11181127
    • 2005-07-14
    • Kenichi NarimatsuHideki Tanaka
    • Kenichi NarimatsuHideki Tanaka
    • B32B7/12B32B15/04B65H37/00B44C7/00
    • B65H37/007B65H2511/114Y10T156/1705Y10T156/1795Y10T428/28Y10T428/2848
    • In a the structure of end tape for revealing impending exhausting of a coating film tape supply, the end tape is connected to the core by a first single-sided adhesive tape, and to the coating film tape by a second single-sided adhesive tape, both adhesive tapes having a thickness of not more than 25μ. The thickness of the second single-sided adhesive tape is 20% to 70% of the total thickness of the adhered section where the second single-sided adhesive tape, the end tape and the coating film tape overlap, and at least 30% of the thickness of the adhered section where the second adhesive tape is adhered directly to the coating film tape. The thickness of the first adhesive tape is 30% to 70% of the total thickness of the adhered section, where the first adhesive tape and the end tape overlap.
    • 在用于揭示涂膜带供应的即将消耗的端带的结构中,端带通过第一单面胶带与芯连接,并通过第二单面胶带与涂膜带连接, 两个胶带的厚度不超过25mu。 第二单面胶带的厚度是第二单面胶带,端胶带和涂膜胶带重叠的粘合部分的总厚度的20%至70%,并且至少30% 第二胶带直接粘附在涂膜带上的粘接部分的厚度。 第一粘合带的厚度为第一胶带和端带重叠的粘合部的总厚度的30%至70%。