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81. 发明专利

JPS63239543A ADDRESS SPACE CONTROL SYSTEM 失效
公开(公告)号：JPS63239543A
公开(公告)日：1988-10-05
申请号：JP7143287
申请日：1987-03-27
申请人： HITACHI LTD
发明人： TANABE YOSHIKAZU , NAKANO TETSUO
IPC分类号： G06F9/32 , G06F12/06
摘要： PURPOSE:To facilitate the switching of a memory bank set at a real address space and a virtual address space by storing a relative branching instruction near the boundary address area of the adjoining memory bank. CONSTITUTION:Near the boundary address area of plural memory banks set to a real address space and a virtual address space controlled by a processor, a relative branching instruction is stored to execute the switching from the one side memory bank to other side memory bank, they are mutually adjoined. The expanded address for designating a memory bank is set in accordance with a carry C and a borrow B generated at a program counter PC by the execution of the relative branching instruction. Thus, the switching of the memory banks set at the real address space and the virtual address space can be facilitated.

82. 发明专利

JPS6329537A INSPECTING APPARATUS 失效
公开(公告)号：JPS6329537A
公开(公告)日：1988-02-08
申请号：JP17154586
申请日：1986-07-23
申请人： HITACHI LTD
发明人： TANABE YOSHIKAZU
IPC分类号： H01L21/66 , G01N21/88 , G01N21/94 , G01N21/956
摘要： PURPOSE:To perform visual inspection of a material to be inspected and the like efficiently, when foreign materials are hard to make clear in visual observation in light of infrared region from a semiconductor laser using first inspection light, by detecting the position of the foreign material in the visual field quickly and positively by the irradiation of second inspection light in a visible region. CONSTITUTION:A plurality of first inspection light beams, which scan the surface of a material to be inspected 2 and automatically inspect the surface, are emitted from a plurality of first light sources. A second inspection light beam 15 in a visible region is emitted from a second light source to the specified part of the material to be inspected 2. The positions of foreign materials and the like on the surface of the material to be inspected 2 are automatically inspected by the scanning of the first inspection light beams 5 and 6. Thereafter, the individual foreign material is visually observed. At this time, the second inspection light beam 15 in the visual region is emitted. Thus the position of the foreign material in the visual field in the visual observation can be quickly made clear. Therefore, the position of the defects such as the foreign material in the visual field, which is hard to specify in the projected lighting such as the first inspection light beams and white light 11, can be efficiently observed.

83. 发明专利

JPS6293636A INSPECTION APPARATUS 失效
公开(公告)号：JPS6293636A
公开(公告)日：1987-04-30
申请号：JP23329585
申请日：1985-10-21
申请人： HITACHI LTD , HITACHI ELECTR ENG
发明人： TAKEHANA YOICHI , TANABE YOSHIKAZU , KAMIYAMA KAZUMI
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To make it possible to reduce noise generated by the unevenness of an article to be inspected itself, by interposing a spectroscopic means permitting the transmission of light in a predetermined wavelength region to one of the light paths of a light source side optical system and a detection optical system. CONSTITUTION:A wafer 2 is scanned in an X-direction by inspection light 7 from a light source 5 and a galvanic mirror 4 and an XY table 1 is continuously moved to a Y-direction. The inspection light 7 is irregularly reflected by the foreign matter adhered to the surface of the wafer 2 to generate scattering light 12 which is, in turn, detected by a photomultiplier tube 11 and a control part 15 grasps the adhesion position of the foreign matter from the X-direction and the Y-direction at that time to output the same to a display part 16. At this time, a band-pass filter 8 is provided to the light path of inspection light 7 and, because the wavelength region of the inspection light 7 is set so as to coincide with the absorption wavelength region of a substance constituting the surface of the wafer 2, the quantity of scattering light 12 generated by the unevenness of the substrate part of the wafer 2 is reduced.

84. 发明专利

JPS6269528A INSPECTING APPARATUS 失效
公开(公告)号：JPS6269528A
公开(公告)日：1987-03-30
申请号：JP20865385
申请日：1985-09-24
申请人： HITACHI LTD
发明人： ISHIKAWA KATSUHIKO , TANABE YOSHIKAZU , TAKAMOTO KENJI
IPC分类号： G01B15/00 , G01B11/00 , G01N23/225 , G01R31/302 , H01L21/66
摘要： PURPOSE:To specify an intended inspecting part of a material to be inspected by optical systems quickly, by providing a plurality of optical systems, which are in parallel with the axis of an electron-optical system, have the optical axes, whose distances from the axis of the electron-optical system are the integer times of the specified value, and have the different magnifications. CONSTITUTION:The axis of an electron-optical system E is provided at the distance of the integer times of the arranging pitches of a plurality of semiconductor elements, which are regularly formed on a wafer 2, with respect to the optical axes of optical microscopes M1, M2 and M3. The axis of the system E is set for the intended part to be inspected. Observation through the optical system E is started. An image, which is equal to the magnification of the optical system E, is selected among the microscopes M1, M2 and M3 in a switching part 11 based on the data of the magnification of the optical system E in a signal processing part 8. A control part 9 alternately displays the images, which are obtained from the optical system E or the microscopes M1, M2 and M3 on a display part 10, and the specified inspection is performed.

85. 发明专利

JPS6219706A DIMENSION MEASURING INSTRUMENT 失效
公开(公告)号：JPS6219706A
公开(公告)日：1987-01-28
申请号：JP15815285
申请日：1985-07-19
申请人： HITACHI LTD
发明人： TANABE YOSHIKAZU , ISHIKAWA KATSUHIKO , TAKAMOTO KENJI
IPC分类号： G01B15/00 , G01B15/02 , H01L21/66
摘要： PURPOSE:To measure dimensions accurately by changing over a scanning direction of an electron beam according to a direction of a pattern to be measured. CONSTITUTION:An electron generated with an electron generating part 1 is irradiated in the direction of a semiconductor wafer 5 on a sample stand 6 from an electron gun 3 and on that occasion, the electron is brought out and accelerated with an electrode 4 and deflected with deflecting coils X and Y, and the like. The electron beam irradiated on a circuit pattern of the wafer 5 is detected 7. The detected signal is converted into a digital signal with a control part 8 and converted into an analog signal after the necessary signal processing is performed and sent to an image memory 9 and displayed on a CRT 10 as an image. Here, the displayed circuit pattern 5 is observed and the symmetry of the pattern in a prescribed measured part is discovered and it is detected whether or not a pattern edge is measured clearly. At this time, since the pattern edge is symmetrized, the scanning direction of the electron beam is decided and the optimum scanning direction of the electron beam is detected by changing over a changeover switch mechanism automatically and the accurate dimensions are measured.

86. 发明专利

JPS60218546A CLEAN ROOM 失效
公开(公告)号：JPS60218546A
公开(公告)日：1985-11-01
申请号：JP7285084
申请日：1984-04-13
申请人： HITACHI LTD , HITACHI KENSETSU SEKKEI KK
发明人： TANABE YOSHIKAZU , ISHIKAWA KATSUHIKO , SAITOU ARATA
IPC分类号： F24F7/06 , F24F3/16 , H01L21/02
摘要： PURPOSE:To make changing of working clothes unnecessary in case of movement between clean rooms of respective floors and reduce the space of clean rooms by a constitution wherein stairs, connecting respective clean rooms of a plurality of floors, are made by the structure of air shower. CONSTITUTION:Clean air flows through respective supplying paths 19 by connecting them to a clean air unit 23 provided at the upper part of a building 2 and is blown off downward from air nozzles 22 to flow it through the staires, thereafter, is sucked into return paths 18 to flow it through a return collective path 21. According to this constitution, the space of the stairs 4 is constituted so as to be the air shower as a whole. In case workers move between individual clean rooms of respective floors, they can move through the stairs 4 under wearing dust-proofing clothes without changing their clothes and working efficiency may be improved. Further, it is not necessary to provide air showers individually in the individual clean rooms 3 of respective floors, therefore, it may become favorable with regard to space.

87. 发明专利

JPS60120230A FINE-GRAIN MEASURING APPARATUS 失效
公开(公告)号：JPS60120230A
公开(公告)日：1985-06-27
申请号：JP22841183
申请日：1983-12-05
申请人： HITACHI LTD
发明人： TANABE YOSHIKAZU , TAKEHANA YOUICHI
IPC分类号： G01N1/00 , G01N1/26 , G01N15/14
摘要： PURPOSE:To prevent yield of dust when points are switched, by constituting switches of a sample-fluid-selecting-point switching part, which is provided between each sample point and a sensor part. CONSTITUTION:Air introducing pipes 2A, 2B, 2C and 2D are connected to a plurality of, e.g., 4 sampling points A, B, C and D, which are provided in a clean room 1. A measuring pipe 4 is connected to the pipes 2A-2D through a point switching part 3. A sensor part 5 is connected to the measuring pipe 4. The switching part 3 is composed of 6 AND elements 8-13, 3 OR elements 14-16, 3 NOT elements 17-19, and the like. The elements 8-13 are communicated to a port O when both ports C1 and C2 are activated. The elements 14-16 are communicated to the port O when either of the port C1 and C2 is activated. When a fluid is supplied to a port C, the element 17-19 are not communicated to the port O. Therefore, the sampling fluid does not flow to a mechanical operating part.

88. 发明专利

JPS6061011A DEAERATION-DEFOAMING APPARATUS 失效
公开(公告)号：JPS6061011A
公开(公告)日：1985-04-08
申请号：JP16818983
申请日：1983-09-14
申请人： HITACHI LTD , HITACHI ELECTR ENG
发明人： TANABE YOSHIKAZU , KOYAMA YOSHIHIRO , SHINPO SENJI , YAMADA KUNIO , TAKEHANA YOUICHI
IPC分类号： B01D19/00 , H01L21/304
摘要： PURPOSE:To deaerate or to defoam sample liquid and to enable to determine fine particles contained in the liquid alone with high precision by providing a pressure vessel to a part of the passage of the sample liquid and evacuating or pressurizing the inside of the vessel. CONSTITUTION:The inside of a pressure vessel 6 is evacuated by driving a vacuum compressor 19 and pure water in a sucked water vessel 2 is sucked up in the pressure vessel 6. A valve 9 is closed and an ultrasonic cleaner 14 is driven to remove bubbles from the pure water. By reversing changeover valves 20, 21 after deaeration, the delivery side of the compressor 19 is communicated with a passage 17 to pressurize the inside of the pressure vessel 6, and ultrafine bubble particles are dissolved in the pure water. At the midway of transportation of the pure water to an exhaust water vessel 5 by passing the pure water through a passage 11 by opening a valve 12, the number of fine particles is counted by a fine particle counter 4. There is no fear for causing miscounting because bubbles have been completely removed.

89. 发明专利

JPS6019616A CONVEYANCE DEVICE 失效
公开(公告)号：JPS6019616A
公开(公告)日：1985-01-31
申请号：JP12917383
申请日：1983-07-14
申请人： HITACHI LTD , HITACHI KIDEN KOGYO KK
发明人： TANABE YOSHIKAZU , TAKEO KAZUHIRO , FUKUWATARI ICHIROU , WATANABE SEIJIYU
IPC分类号： B65G51/03 , B65G47/49 , B65G54/00 , B65G54/02
摘要： PURPOSE:To prevent magnetic memory from being erazed by providing a conveying pallet with a magnetic shield for shielding from the alternating field of a linear motor type conveying device in an electronic precision circuit part in a clean room and the like. CONSTITUTION:A magnetic shield/conveyed material tray 6c is arranged at the center of a conveying pallet 6 by stays 6b with a proper distance to a reaction plate 6a for keeping a fixed distance constantly between a conveyed object 8 with magnetic record medium and a linear motor as well as for shielding from magnetism by the iron plate. This construction permits to shield from an alternating field given by the linear motor for preventing magnetic memory from being erazed.

90. 发明专利

JPS59192904A Device for measuring film thickness 失效
标题翻译：用于测量薄膜厚度的装置
公开(公告)号：JPS59192904A
公开(公告)日：1984-11-01
申请号：JP6544683
申请日：1983-04-15
申请人： Hitachi Ltd
发明人： SASABE SHIYUNJI , TANABE YOSHIKAZU
IPC分类号： G01B11/06 , H01L21/205 , H01L21/66
CPC分类号： G01B11/0616
摘要： PURPOSE:To improve an SN ratio and the measurement precision of film thickness by projecting light from a polarized laser light source upon a film to be measured through a beam splitter and an lambda/4 plate, and detecting interference reflected light by a sensor through a linear polarizing plate. CONSTITUTION:P Polarized light projected by the polarized laser oscillator 14 illuminates an SiO2 film 8 on the surface of a semiconductor wafer 5 through the polarized beam splitter (PBS)15, reflecting mirror 13, view spot glass 12, and lambda/4 plate 11. The interference reflected light travels backward and is reflected by the PBS15 and then detected by the photosensor 18 through the linear polarizing plate 16 and an interference filter 17. Its detection output is processed by a microcomputer 21 through an amplifier 19 and an AD converter 20 to calculate the film thickness. Noise light reflected by the PBS15 and view spot glass 12 is cut off by the linear polarizing plate 16 and the spectrum width is restricted by the interference filter 17, so the SN ratio is improved and the measurement precision of the film thickness is also improved.
摘要翻译：目的：通过将来自偏振激光光源的光投射到通过分束器和λ/ 4板测量的膜上，通过传感器检测干涉反射光，来提高SN比和测量精度线偏振片。构成：P由偏振激光振荡器14投影的偏振光通过偏振分束器（PBS）15，反射镜13，视点玻璃12和λ/ 4板11照射半导体晶片5的表面上的SiO 2膜8 干涉反射光向后行进并被PBS15反射，然后由光电传感器18通过线性偏振板16和干涉滤光器17检测。其检测输出由微型计算机21通过放大器19和AD转换器20 以计算膜厚度。由PBS15和观察点玻璃12反射的噪声光被线偏振片16切断，光谱宽度受到干涉滤光器17的限制，因此提高了SN比，并提高了膜厚的测量精度。

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