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81. 发明授权

US07092161B2 Optical arrangement, optical grating and method for the manufacture of such an optical grating 有权
标题翻译：光学布置，光栅和制造这种光栅的方法
公开(公告)号：US07092161B2
公开(公告)日：2006-08-15
申请号：US10885411
申请日：2004-07-07
申请人： Bernd Kleemann , Stefan Weissenrieder , Jeffrey Erxmeyer , Ralf Kuschnereit
发明人： Bernd Kleemann , Stefan Weissenrieder , Jeffrey Erxmeyer , Ralf Kuschnereit
IPC分类号： G02B5/18
CPC分类号： G02B5/1861 , G02B5/1857
摘要： An optical grating has a multiplicity of parallel diffraction structures, which are arranged on a support defining a base face. Each structure has a blaze flank that is inclined substantially at the Littrow angle with respect to the base face, and a back flank. Both flanks together form a reflection layer which comprises a reflective base layer and a transparent protective layer that is connected to the base layer and covers it. The protective layer on the blaze flank and the protective layer on the back flank are made of the same material. The thicknesses of the protective layers on the blaze flank and on the back flank, however, are different.
摘要翻译：光栅具有多个平行衍射结构，其布置在限定基面的支撑上。每个结构具有相对于基面大致以Littrow角倾斜的火焰侧面和后侧面。两个侧面一起形成反射层，该反射层包括反射基底层和连接到基底层并覆盖它的透明保护层。火焰侧面上的保护层和后侧面上的保护层由相同的材料制成。然而，火焰侧翼和后侧面上的保护层的厚度是不同的。

82. 发明申请

US20130176614A1 EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY 审中-公开
标题翻译： EUV收集器的EUV收集器镜子
公开(公告)号：US20130176614A1
公开(公告)日：2013-07-11
申请号：US13753127
申请日：2013-01-29
申请人： Carl Zeiss Laser Optics GmbH
发明人： Willi Anderl , Holger Kierey , Markus Bauer , Jens Kugler
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B5/0808 , G02B5/1861 , G02B7/1815 , G03F7/70891 , G21K1/067 , G21K2201/065 , G21K2201/067
摘要： An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts.
摘要翻译：用于EUV光刻的EUV收集器的EUV收集器镜壳包括具有光入射侧前部具有反射光学有效区域，后部以及前部和后部之间的空腔的主体。空腔基本上沿着整个光学有效区域延伸，并且空腔用于接收冷却介质。主体还具有用于冷却介质的至少一个入口和至少一个出口。多个流量影响元件位于空腔中，从前部延伸到后部，并且将前部连接到后部并且与前部和后部整体地形成。

83. 发明授权

US08289520B2 Method for measuring a spectrum of a narrowband light source, and spectrometer arrangement 有权
标题翻译：用于测量窄带光源的光谱的方法和光谱仪布置
公开(公告)号：US08289520B2
公开(公告)日：2012-10-16
申请号：US12558874
申请日：2009-09-14
申请人： Johannes Kraus , Alois Herkommer , Bernhard Weigl , Michel Le Maire , Holger Muenz
发明人： Johannes Kraus , Alois Herkommer , Bernhard Weigl , Michel Le Maire , Holger Muenz
IPC分类号： G01J3/45
CPC分类号： G01J3/26 , G01J3/36
摘要： A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.
摘要翻译：用于测量由窄带光源（例如带宽变窄的激光器）发射的光束的光谱的光谱仪装置包括至少一个标准具，用于将光束分成第一部分光束的分束器和第二部分光束一个或多个用于通过至少一个标准具指导第一部分光束n次和第二部分光束（n + k）的光学引导元件，其中n和k是整数≥1。光谱仪布置还具有至少一个光敏检测器和评估装置，用于评估已经通过至少一个标准具的第一部分光束的至少一个检测器记录的光谱n次和第二部分光束已经通过至少一个标准具（n + k）次的光束，以便确定校正了至少一个标准具的装置功能的光谱。

84. 发明授权

US07629572B2 Optical devices and related systems and methods 有权
标题翻译：光器件及相关系统及方法
公开(公告)号：US07629572B2
公开(公告)日：2009-12-08
申请号：US11418872
申请日：2006-05-05
申请人： Vitaliy Shklover , Holger Kierey , Holger Muenz , Michel Le Maire , Bernhard Weigl
发明人： Vitaliy Shklover , Holger Kierey , Holger Muenz , Michel Le Maire , Bernhard Weigl
IPC分类号： G01J1/32 , G02B13/08
CPC分类号： G02B27/0988 , G02B1/115 , G02B5/22 , G02B13/08 , G02B27/0966 , G03F7/70591 , G03F7/70958 , G03F7/70975
摘要： The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
摘要翻译：本发明涉及一种光束强度不均匀性校正装置，其包括具有防反射性的光入射面的光学元件。根据本发明，为了增强光束强度的均匀性，局部地修改了防反射特性。本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法，其中所述方法包括：a）将光学系统与布置在预定位置的一个或多个光学元件组合，b ）测量强度分布，c）计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布，d）从光学系统中去除光学元件，e）局部地根据计算修正光学元件之一的吸收和/或反射，f）将光学元件安装在光学系统中的预定位置。

85. 发明授权

US07477438B2 Optical imaging system for imaging at least two planes of a light beam spaced apart in the beam direction 有权
标题翻译：光学成像系统，用于对沿光束方向间隔开的光束的至少两个平面进行成像
公开(公告)号：US07477438B2
公开(公告)日：2009-01-13
申请号：US10441990
申请日：2003-05-20
申请人： Alois Herkommer
发明人： Alois Herkommer
IPC分类号： G02B26/08
CPC分类号： G01J1/4257
摘要： An optical imaging system for imaging at least two planes of a light beam spaced apart in the beam direction, in particular of a laser light beam, onto a common target site, for example a detector, has at least one optically imaging element arranged in the beam path of the light beam. The at least one optically imaging element is a collecting primary mirror, and arranged downstream of the primary mirror are at least two secondary mirrors that can be brought alternately into the beam path, the secondary mirrors being designed such that one secondary mirror permits imaging of one plane, and the other secondary mirror permits imaging of the other plane of the light beam onto the target site in each case.
摘要翻译：一种光学成像系统，用于将沿光束方向（特别是激光束）间隔开的光束的至少两个平面成像到公共目标位置（例如检测器）上，具有至少一个光学成像元件光束的光束路径。所述至少一个光学成像元件是收集主反射镜，并且布置在主反射镜的下游是至少两个可以交替地被带入光束路径的次级反射镜，次级反射镜被设计成使得一个副反射镜允许成像一个平面，另一个副镜允许在每种情况下将光束的另一平面成像到目标位置上。

86. 发明授权

US09297936B2 Mirror with dielectric coating 有权
标题翻译：镜面与介质涂层
公开(公告)号：US09297936B2
公开(公告)日：2016-03-29
申请号：US13686101
申请日：2012-11-27
申请人： Carl Zeiss Laser Optics GmbH
发明人： Jeffrey Erxmeyer , Alexandra Pazidis , Horst Feldermann
IPC分类号： G02B5/08 , G02B5/26 , G02B5/28
CPC分类号： G02B5/08 , G02B5/0833 , G02B5/0891 , G02B5/284
摘要： A mirror with a dielectric coating (2) on a substrate (3), wherein the dielectric coating (2) has exactly two layer stacks (4, 5), a first layer stack (4), on the substrate, of layers (41, 42) of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (5), arranged thereon, of layers of fluorides (52) and oxides (51) in alternating arrangement, and wherein the number of fluoride layers (52) as a proportion of the total number of layers of the dielectric coating (2) is less than 0.45.
摘要翻译：一种在基板（3）上具有介电涂层（2）的反射镜，其中所述电介质涂层（2）具有恰好两层叠层（4,5），在所述基底上的第一层叠层（4），层（41），42）交替布置的高折射率和低折射率氧化物和布置在其上的第二层堆叠（5），氟化物层（52）和氧化物（51）交替布置，并且其中氟化物层的数量（52）作为电介质涂层（2）的总层数的比例小于0.45。

87. 发明授权

US08456771B2 Holding arrangement for an optical element 失效
标题翻译：保持光学元件的布置
公开(公告)号：US08456771B2
公开(公告)日：2013-06-04
申请号：US13359368
申请日：2012-01-26
申请人： Ulrich Weber , Hubert Holderer
发明人： Ulrich Weber , Hubert Holderer
IPC分类号： G02B7/02 , E04G3/00
CPC分类号： G03F7/70825 , B23K26/02 , B23K26/035 , G02B7/003 , G02B7/028
摘要： A holding arrangement for an optical element includes a basic structure surrounding an optical element and a mounting device by which the optical element can be supported on the basic structure with two degrees of freedom for a rotational movement about an optical axis and a translational movement along a first axis which extends perpendicularly to the optical axis and intersects the optical axis in a center. The mounting device includes four joint locations arranged point-symmetrically with respect to the center and at least one parallel rocker which is displaceable parallel to the first axis. A manipulator unit includes a holding arrangement.
摘要翻译：用于光学元件的保持装置包括围绕光学元件的基本结构和安装装置，通过该安装装置，光学元件可以以两个自由度支撑在基本结构上，用于围绕光轴的旋转运动和沿着光轴的平移运动第一轴线垂直于光轴延伸并与中心的光轴相交。安装装置包括相对于中心点对称布置的四个关节位置和平行于第一轴线移动的至少一个平行摇杆。操纵器单元包括保持装置。

88. 发明申请

US20130083411A1 MIRROR WITH DIELECTRIC COATING 有权
标题翻译：具有电介质涂层的镜子
公开(公告)号：US20130083411A1
公开(公告)日：2013-04-04
申请号：US13686101
申请日：2012-11-27
申请人： Carl Zeiss Laser Optics GmbH
发明人： Jeffrey ERXMEYER , Alexandra PAZIDIS , Horst FELDERMANN
IPC分类号： G02B5/08
CPC分类号： G02B5/08 , G02B5/0833 , G02B5/0891 , G02B5/284
摘要： A mirror with a dielectric coating (2) on a substrate (3), wherein the dielectric coating (2) has exactly two layer stacks (4, 5), a first layer stack (4), on the substrate, of layers (41, 42) of high refractive index and low refractive index oxides in alternating arrangement and a second layer stack (5), arranged thereon, of layers of fluorides (52) and oxides (51) in alternating arrangement, and wherein the number of fluoride layers (52) as a proportion of the total number of layers of the dielectric coating (2) is less than 0.45.
摘要翻译：一种在基板（3）上具有介电涂层（2）的反射镜，其中所述电介质涂层（2）具有恰好两层叠层（4,5），在所述基底上的第一层叠层（4），层（41），42）交替布置的高折射率和低折射率氧化物和布置在其上的第二层堆叠（5），氟化物层（52）和氧化物（51）交替布置，并且其中氟化物层的数量（52）作为电介质涂层（2）的总层数的比例小于0.45。

89. 发明申请

US20120154935A1 HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT 失效
标题翻译：光学元件的安装
公开(公告)号：US20120154935A1
公开(公告)日：2012-06-21
申请号：US13359341
申请日：2012-01-26
申请人： Ulrich Weber , Armin Schoeppach , Hubert Holderer
发明人： Ulrich Weber , Armin Schoeppach , Hubert Holderer
IPC分类号： G02B7/02
CPC分类号： G02B7/004 , G02B7/023
摘要： A holding arrangement for an optical element, in particular for a cylindrical lens, includes a basic structure surrounding an optical element and a mounting device by which the optical element is supported on the basic structure. The mounting device has two degrees of freedom so that the optical element can be supported by the mounting device in a manner that allows the optical element to rotate about both about an optical axis and an axis perpendicular to the optical axis. If the optical element is a cylindrical lens, the axis perpendicular to the optical axis can be an axis perpendicular to an axial direction of the cylindrical lens. The disclosure further relates to a manipulator unit for an optical system which includes a holding arrangement.
摘要翻译：用于光学元件的保持装置，特别是用于圆柱形透镜的保持装置包括围绕光学元件的基本结构和安装装置，光学元件通过该安装装置支撑在基本结构上。安装装置具有两个自由度，使得光学元件可以以允许光学元件围绕光轴和垂直于光轴的轴线旋转的方式由安装装置支撑。如果光学元件是圆柱形透镜，则垂直于光轴的轴线可以是垂直于柱面透镜轴向的轴线。本发明还涉及一种用于光学系统的操纵器单元，其包括保持装置。

90. 发明申请

US20120099612A1 BANDWIDTH NARROWING MODULE FOR SETTING A SPECTRAL BANDWIDTH OF A LASER BEAM 审中-公开
标题翻译：用于设置激光束的光谱带的带宽窄带模块
公开(公告)号：US20120099612A1
公开(公告)日：2012-04-26
申请号：US13238470
申请日：2011-09-21
申请人： Markus Deubel , Anton Lengel
发明人： Markus Deubel , Anton Lengel
IPC分类号： H01S3/10
CPC分类号： H01S3/005 , G02B5/1861 , G02B19/0014 , G02B19/0052 , G02B26/0883 , G02B26/0891 , G02B27/0972 , G02B27/4244 , G03F7/70575 , H01S3/0057
摘要： The disclosure provides a bandwidth narrowing module for setting a spectral bandwidth of a laser beam of a laser light source. The bandwidth narrowing module includes a beam expanding module for expanding a laser beam transversely with respect to a propagation direction of the laser beam and comprising a reflection grating. A first optical component of the bandwidth narrowing module is configured so that a disturbance with a cylindrical portion about a first axis transversely with respect to an optical axis of the bandwidth narrowing module can be impressed on a wavefront of a laser beam. The first optical component is embodied such that it is pivotable about a pivoting axis parallel to the first axis.
摘要翻译：本公开提供了一种用于设置激光光源的激光束的光谱带宽的带宽窄化模块。带宽变窄模块包括一个扩束模块，用于相对于激光束的传播方向横向地扩展激光束并且包括反射光栅。带宽窄化模块的第一光学部件被配置为使得相对于带宽窄化模块的光轴横向的第一轴的圆柱形部分的扰动可以施加在激光束的波前。第一光学部件被实施为使得其可围绕平行于第一轴线的枢转轴线枢转。

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