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    • 1. 发明授权
    • Optical devices and related systems and methods
    • 光器件及相关系统及方法
    • US07629572B2
    • 2009-12-08
    • US11418872
    • 2006-05-05
    • Vitaliy ShkloverHolger KiereyHolger MuenzMichel Le MaireBernhard Weigl
    • Vitaliy ShkloverHolger KiereyHolger MuenzMichel Le MaireBernhard Weigl
    • G01J1/32G02B13/08
    • G02B27/0988G02B1/115G02B5/22G02B13/08G02B27/0966G03F7/70591G03F7/70958G03F7/70975
    • The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
    • 本发明涉及一种光束强度不均匀性校正装置,其包括具有防反射性的光入射面的光学元件。 根据本发明,为了增强光束强度的均匀性,局部地修改了防反射特性。 本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法,其中所述方法包括:a)将光学系统与布置在预定位置的一个或多个光学元件组合,b )测量强度分布,c)计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布,d)从光学系统中去除光学元件,e)局部地 根据计算修正光学元件之一的吸收和/或反射,f)将光学元件安装在光学系统中的预定位置。
    • 6. 发明申请
    • Optical devices and related systems and methods
    • 光器件及相关系统及方法
    • US20080272275A1
    • 2008-11-06
    • US11418872
    • 2006-05-05
    • Vitaliy ShkloverHolger KiereyHolger MuenzMichel Le MaireBernhard Weigl
    • Vitaliy ShkloverHolger KiereyHolger MuenzMichel Le MaireBernhard Weigl
    • G01J1/32
    • G02B27/0988G02B1/115G02B5/22G02B13/08G02B27/0966G03F7/70591G03F7/70958G03F7/70975
    • The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.
    • 本发明涉及一种光束强度不均匀性校正装置,其包括具有防反射性的光入射面的光学元件。 根据本发明,为了增强光束强度的均匀性,局部地修改了防反射特性。 本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法,其中所述方法包括:a)将光学系统与布置在预定位置的一个或多个光学元件组合,b )测量强度分布,c)计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布,d)从光学系统中去除光学元件,e)局部地 根据计算修正光学元件之一的吸收和/或反射,f)将光学元件安装在光学系统中的预定位置。