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71. 发明授权

US08681328B2 Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus 有权
标题翻译：暗场缺陷检查方法，暗场缺陷检查装置，像差分析方法和像差分析装置
公开(公告)号：US08681328B2
公开(公告)日：2014-03-25
申请号：US13142328
申请日：2010-01-20
申请人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
发明人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/4788 , G01N21/93 , G01N21/94 , G01N21/956 , G01N2021/8822
摘要： By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.
摘要翻译：通过包括照明系统和检测系统，监视诸如温度和大气压力之类的环境的信息收集功能，以及具有比较监视结果和设计值的反馈功能的设备状态管理功能，理论计算值或者从模拟结果导出的理想值，并且对设备进行校准，使得监视结果接近理想值，提供用于保持设备状态和设备灵敏度恒定的单元。控制单元800被配置为包括记录单元801，比较单元802，灵敏度预测单元803和反馈控制单元804.在比较单元802中，从记录单元801发送的监视结果和理想值存储在数据库805中进行比较。当理想值与监视结果之间的差异超过预定阈值时，反馈控制单元804校正照明系统和检测系统。

72. 发明申请

US20130293880A1 DEFECT TESTING METHOD AND DEVICE FOR DEFECT TESTING 审中-公开
标题翻译：缺陷测试方法和缺陷测试装置
公开(公告)号：US20130293880A1
公开(公告)日：2013-11-07
申请号：US13882547
申请日：2011-11-01
申请人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata
发明人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata
IPC分类号： G01N21/95
CPC分类号： G01N21/9501
摘要： In a defect inspection method and an apparatus of the same, for enabling to conduct an inspection of fine defects without applying thermal damages on a sample, the following steps are conducted: mounting a sample on a rotatable table to rotate; irradiating a pulse laser emitting from a laser light source upon the sample rotating; detecting a reflected light from the sample, upon which the pulse laser is irradiated; detecting the reflected light from the sample detected; and detecting a defect on the sample through processing of a signal obtained through the detection, wherein irradiation of the pulse laser emitting from the laser light source upon the sample rotating is conducted by dividing the one pulse emitted from the laser light source into plural numbers of pulses, and irradiating each of the divided pulse lasers upon each of separate positions on the sample, respectively.
摘要翻译：在缺陷检查方法及其装置中，为了能够在对样品施加热损伤的情况下进行细小缺陷的检查，进行以下步骤：将样品安装在旋转台上旋转; 照射从激光光源发射的脉冲激光器对样品旋转; 检测来自所述脉冲激光器的样品的反射光; 检测检测到的样品的反射光; 并且通过处理通过检测获得的信号来检测样本上的缺陷，其中通过将从激光光源发射的一个脉冲除以多个数量来进行从样品旋转时从激光源发射的脉冲激光的照射脉冲，并且分别在样品上的每个分离位置上照射每个分割的脉冲激光器。

73. 发明授权

US08236161B2 Apparatus for electrolyzing sulfuric acid, method of performing electrolysis, and apparatus for processing a substrate 有权
标题翻译：硫酸电解装置，电解方法以及基板处理装置
公开(公告)号：US08236161B2
公开(公告)日：2012-08-07
申请号：US12274681
申请日：2008-11-20
申请人： Nobuo Kobayashi , Yukihiro Shibata , Naoya Hayamizu , Masaaki Kato
发明人： Nobuo Kobayashi , Yukihiro Shibata , Naoya Hayamizu , Masaaki Kato
IPC分类号： C25B1/28 , C23G1/00
CPC分类号： C25B1/285 , H01L21/67051
摘要： An apparatus for electrolyzing sulfuric acid, the apparatus comprising an electrolytic cell comprising a cathode chamber having a cathode and an anode chamber having an anode, the cathode chamber and the anode chamber being separated by a diaphragm, a sulfuric acid tank configured to store the sulfuric acid, a supply pipe connecting the sulfuric acid tank to an inlet port of the anode chamber, a connection pipe connecting an outlet port of the cathode chamber to the inlet port of the anode chamber, a first supply pump provided on the supply pipe and configured to supply the sulfuric acid from the sulfuric acid tank to the cathode chamber through the supply pipe, and a drain pipe connected to an outlet port of the anode chamber and configured to supply to a solution tank a solution containing an oxidizing agent generated by electrolysis in the anode chamber.
摘要翻译：一种用于电解硫酸的设备，该设备包括电解池，该电解池包括具有阴极的阴极室和具有阳极的阳极室，阴极室和阳极室由隔膜隔开;硫酸罐，其构造成储存硫酸酸，将硫酸罐连接到阳极室的入口的供给管，将阴极室的出口与阳极室的入口连接的连接管，设置在供给管上的第一供给泵，通过供给管将硫酸从硫酸罐供给到阴极室，以及排水管，其连接到阳极室的出口，并配置成向溶液罐供给含有通过电解产生的氧化剂的溶液阳极室。

74. 发明申请

US20100208249A1 Apparatus For Inspecting Defects 有权
标题翻译：检查缺陷的仪器
公开(公告)号：US20100208249A1
公开(公告)日：2010-08-19
申请号：US12771216
申请日：2010-04-30
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/62
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： A defect inspection apparatus and method includes a darkfield illumination optical system which conducts darkfield illumination upon the surface of a sample with irradiation light having at least one of wavelength band, a darkfield detection optical system which includes a reflecting objective lens for converging the light scattered from the surface of the sample that has been darkfield-illuminated with the irradiation light having the at least one wavelength band, and imaging optics for imaging onto a light-receiving surface of an image sensor the scattered light that the reflecting objective lens has converged, and an image processor which, in accordance with an image signal obtained from the image sensor of the darkfield detection optical system, discriminates defects or defect candidates present on the surface of the sample.
摘要翻译：缺陷检查装置和方法包括：暗场照明光学系统，其使用具有波长带中的至少一个的照射光对样品的表面进行暗场照明，暗视场检测光学系统包括用于会聚来自已经用具有至少一个波长带的照射光进行暗场照射的样品的表面，以及用于在图像传感器的光接收表面上成像以用于反射物镜会聚的散射光的成像光学器件;以及根据从暗场检测光学系统的图像传感器获得的图像信号，鉴别存在于样品表面上的缺陷或缺陷候选物的图像处理器。

75. 发明授权

US07440092B2 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07440092B2
公开(公告)日：2008-10-21
申请号：US11602247
申请日：2006-11-21
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/21
摘要： A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.
摘要翻译：一种检测缺陷的方法和装置，其中通过在不同光学条件下对样本进行成像而获得样品的相同区域的图像信号，并且分析所获得的图像信号，并且选择修改图像信号中的对比度的光学条件。通过用检查系统对样品进行成像获得样品的图像信号，并且在所选择的光学条件下评估图像以调整检查的光学条件，包括大于最大对比差的检查阈值在获取步骤中检测到的虚假缺陷中，可以检测到最大数量的实际缺陷。通过在调整光学条件下处理通过检查系统获得的样品的图像信号来检测样品的缺陷。

76. 发明授权

US07400393B2 Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen 有权
标题翻译：用于利用关于样本的信息来检测样本中的缺陷的方法和装置
公开(公告)号：US07400393B2
公开(公告)日：2008-07-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

77. 发明申请

US20080053478A1 SUBSTRATE-PROCESSING METHOD AND METHOD OF MANUFACTURING ELECTRONIC DEVICE 审中-公开
标题翻译：基板处理方法及制造电子器件的方法
公开(公告)号：US20080053478A1
公开(公告)日：2008-03-06
申请号：US11681368
申请日：2007-03-02
申请人： Yukihiro Shibata , Naoya Hayamizu
发明人： Yukihiro Shibata , Naoya Hayamizu
IPC分类号： C23G1/02
CPC分类号： H01L21/67086 , G03F7/423
摘要： A method of manufacturing an electronic device includes dipping a substrate in a solution containing sulfuric acid, which is accommodated in a processing vessel. An aqueous solution of hydrogen peroxide supplies the sulfuric acid accommodated in the processing vessel for generating peroxomonosulfuric acid (Caro's acid). Therefore, an organic material present on the surface of the substrate is removed by the action of Caro's acid within the processing vessel. The time for supplying the aqueous solution of hydrogen peroxide into the processing vessel is set on the basis of the change with time in the concentration of Caro's acid measured in advance so as to permit the peak in the concentration of Caro's acid to appear while the substrate is kept dipped in the processing solution.
摘要翻译：制造电子器件的方法包括将基底浸入容纳在处理容器中的含有硫酸的溶液中。过氧化氢水溶液为容纳在处理容器中的硫酸提供产生过氧硫酸（卡罗酸）。因此，通过Caro酸在处理容器内的作用去除存在于基板表面上的有机材料。将过氧化氢水溶液供给到处理容器中的时间是基于事先测定的Caro酸浓度随时间的变化而设定的，以使Caro酸的浓度峰值出现，同时衬底保持浸在处理液中。

78. 发明申请

US20070064225A1 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20070064225A1
公开(公告)日：2007-03-22
申请号：US11602247
申请日：2006-11-21
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/21
摘要： A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.
摘要翻译：一种检测缺陷的方法和装置，其中通过在不同光学条件下对样本进行成像而获得样品的相同区域的图像信号，并且分析所获得的图像信号，并且选择修改图像信号中的对比度的光学条件。通过用检查系统对样品进行成像获得样品的图像信号，并且在所选择的光学条件下评估图像以调整检查的光学条件，包括大于最大对比差的检查阈值在获取步骤中检测到的虚假缺陷中，可以检测到最大数量的实际缺陷。通过在调整光学条件下处理通过检查系统获得的样品的图像信号来检测样品的缺陷。

79. 发明申请

US20070058164A1 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20070058164A1
公开(公告)日：2007-03-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

80. 发明申请

US20060290930A1 Method and apparatus for inspecting pattern defects 审中-公开
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20060290930A1
公开(公告)日：2006-12-28
申请号：US11434070
申请日：2006-05-16
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Sachio Uto
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/95623
摘要： The present invention relates to a pattern defect inspection apparatus, wherein light emitted from an illumination source capable of outputting a plurality of wavelengths is linearly illuminated by an illuminating optical system. Diffracted or scattered light due to a circuit pattern or defect on a wafer is collected by an imaging optical system onto a line sensor and converted into a digital signal, and the defect is detected by a signal processing section. Then, the defect can be detected with high sensitivity since a surface to be formed by an optical axis of the illuminating optical system and an optical axis of the imaging optical system is almost collimated to a direction of a wiring pattern and further since an angle to be formed by the optical axis of the imaging optical system and the wafer is set to an angle with less diffracted light from the pattern. Thereby, the pattern defect inspection detecting various defects on the wafer with high sensitivity at high speed can be achieved.
摘要翻译：本发明涉及一种图案缺陷检查装置，其中从能够输出多个波长的照明源发射的光线由照明光学系统线性地照亮。由于晶片上的电路图案或缺陷导致的衍射或散射光被成像光学系统收集到线传感器上并转换成数字信号，并且由信号处理部分检测缺陷。然后，由于要由照明光学系统的光轴和成像光学系统的光轴形成的表面几乎准直到布线图案的方向，因此可以以高灵敏度检测缺陷，并且进一步由于与由成像光学系统的光轴形成，并且将晶片设置成与来自图案的较少衍射光的角度。由此，可以实现以高速度高灵敏度地检测晶片上的各种缺陷的图案缺陷检查。

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