会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 75. 发明授权
    • Pattern inspection equipment, pattern inspection method, and storage medium storing pattern inspection program
    • 图案检验设备,图案检验方法和存储介质存储图案检验程序
    • US06400838B2
    • 2002-06-04
    • US09122779
    • 1998-07-27
    • Toshiyuki Watanabe
    • Toshiyuki Watanabe
    • G06K942
    • G06T7/0006G06T2207/30121G06T2207/30148
    • Pattern inspection equipment has at least a measured data generation unit for generating measured data from patterns that have been delineated on a sample according to design data, a reference data generation unit for generating reference data used to inspect the patterns from gradational data expressed in multiple gradation levels, and a fault decision circuit for comparing the measured data with the reference data. The reference data generation unit has a multi-valued pattern development circuit for developing the design data into the gradational data and a fine adjustment circuit for finely shifting the positions or adjusting the curvatures of pattern edges in the pattern constructed with the gradational data. The fine adjustment of the pattern edges is necessary to cope with slightly displaced edges and rounded corners of the actual patterns on the sample. These slightly displaced edges and rounded corners are caused through mask manufacturing processes and are frequently smaller than the size of a sensor pixel. To adjust the reference data to the displaced edges, a size modification circuit detects a maximum value in a specified area in the gradational data and modifies the size of the pattern constructed with the gradational data. To adjust the reference data to match with the actual rounded corners, a corner rounding circuit rounds corners in the pattern constructed with the gradational data. Also provided is a pattern inspection method for developing the design data into the gradational data, adjusting the gradational data to displaced edges and rounded corners of the actual patterns and preparing the reference data, and testing the patterns for faults. Further provided is a storage medium for storing a pattern inspection program for realizing the pattern inspection method.
    • 模式检查设备至少具有测量数据生成单元,用于根据设计数据从已经在样本上划定的模式生成测量数据;参考数据生成单元,用于生成用于根据以多个等级表示的分级数据检查模式的参考数据 电平,以及用于将测量数据与参考数据进行比较的故障判定电路。 参考数据生成单元具有用于将设计数据发展成渐变数据的多值图案开发电路和用于精细移位位置或调整由渐变数据构成的图案中的图案边缘的曲率的微调电路。 图案边缘的精细调整是必要的,以应对样品上实际图案的稍微偏移的边缘和圆角。 这些略微偏移的边缘和圆角是通过掩模制造工艺引起的,并且通常小于传感器像素的尺寸。 为了将参考数据调整到移位边缘,尺寸修改电路检测渐变数据中指定区域中的最大值,并修改由渐变数据构成的图案的大小。 为了调整参考数据以与实际的圆角匹配,一个圆角圆形回转线使用渐变数据构造的图案中的角落圆。 还提供了一种用于将设计数据开发到等级数据的模式检查方法,将等级数据调整到实际模式的偏移边缘和圆角,并准备参考数据,并测试故障模式。 还提供了一种用于存储用于实现图案检查方法的图案检查程序的存储介质。