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    • 71. 发明授权
    • Thin film forming apparatus, film thickness measuring method and film thickness sensor
    • 薄膜成膜装置,薄膜​​厚度测定方法及薄膜厚度传感器
    • US08226802B2
    • 2012-07-24
    • US12725658
    • 2010-03-17
    • Masato FukaoToru Kimura
    • Masato FukaoToru Kimura
    • C23C14/00C23C14/32
    • C23C14/545C23C14/546G01B17/02
    • A technology which is capable of an accurate measurement of the film thickness even if an exfoliation occurs is provided. A difference frequency Δf0 is calculated from a resonance frequency f0 of a film thickness sensor at a current time a0 and a resonance frequency f1 at an immediate past time a1, and whether the exfoliation has occurred or not is detected from its sign and a comparison result relative to a reference value. When the exfoliation has occurred, a corrected film thickness value T′ is obtained by adding the thickness Δt0 of the exfoliation film to an increased film thickness value T which is determined from a resonance frequency fx measured at a future time ax to be converted to the thickness of a film on a film forming object, and whether the formation of the film should be terminated is judged in comparison to an aimed value. Thus, even if the exfoliation occurs in the film thickness sensor, the film thickness value of the thin film on the surface of the film forming object can be accurately obtained.
    • 提供即使发生剥离也能够精确测量膜厚度的技术。 从当前时间a0的膜厚度传感器的谐振频率f0和紧接着的时刻a1的谐振频率f1计算差频率Dgr; f0,从其符号检测出剥离是否发生, 比较结果相对于参考值。 当发生剥离时,通过将剥离膜的厚度> t0添加到从将来的时间ax测量的共振频率fx确定的增加的膜厚度值T来获得校正的膜厚度值T'以进行转换 相对于成膜物体上的膜的厚度,以及膜的形成是否应该终止,与目标值相比较。 因此,即使在膜厚传感器中发生剥离,也能够精确地得到成膜体表面的薄膜的膜厚值。
    • 74. 发明申请
    • DIFFRACTIVE OPTICAL ELEMENT AND OPTICAL PICKUP APPARATUS
    • 衍射光学元件和光学拾取器
    • US20080310284A1
    • 2008-12-18
    • US12179751
    • 2008-07-25
    • Kyu TAKADAJunji HashimuraYuichiro OriToru Kimura
    • Kyu TAKADAJunji HashimuraYuichiro OriToru Kimura
    • G11B7/00
    • G11B7/1353G02B3/08G02B13/003G02B13/0045G02B13/0055G02B13/0065G11B7/1367G11B7/13922G11B7/13925G11B2007/0006
    • An optical pickup apparatus includes a diffractive optical element, and an objective lens that focuses a light beam of a first wavelength λ1, a light beam of a second wavelength λ2 and a light beam of a third wavelength λ3 on a first recording medium, a second recording medium, and a third recording medium, respectively, the wavelengths λ1, λ2, and λ3 being different from each other. The diffractive optical element includes a first diffractive surface that neither diffracts the light beam of the first wavelength λ1 nor the light beam of the third wavelength λ3 but diffracts the light beam of the second wavelength λ2, and a second diffractive surface that neither diffracts the light beam of the first wavelength λ1 nor the light beam of the second wavelength λ2 but diffracts the light beam of the third wavelength λ3, and each of the first and second diffractive surfaces satisfies the following condition inequality: Λ/λ≧8 wherein Λ represents the minimum pitch in the case that the width which generates a phase difference of one wavelength when the closest wavefronts resulting from adjacent steps in each of the diffractive surfaces are linked with each other is defined as one pitch, and λ represents the wavelength of the diffracted light.
    • 光拾取装置包括衍射光学元件和将第一波长λ1的光束,第二波长λ2的光束和第三波长λ3的光束的光束聚焦在第一记录介质上的物镜,第二 记录介质和第三记录介质,波长λ1,λ2和λ3彼此不同。 衍射光学元件包括:第一衍射面,其既不衍射第一波长λ1的光束也不衍射第三波长λ3的光束,但衍射第二波长λ2的光束;以及第二衍射面,其不衍射光 第一波长λ1的光束和第二波长λ2的光束,但是衍射第三波长λ3的光束,并且第一和第二衍射面中的每一个满足以下条件不等式:<βin-line-formula description = “In-line Formulas”end =“lead”?>λ/λ> = 8 <?in-line-formula description =“In-line Formulas”end =“tail”?>其中Lambda表示该情况下的最小间距 当由每个衍射表面中的相邻步骤产生的最接近的波前相互连接时产生一个波长的相位差的宽度被定义为一个间距,并且λ表示 衍射光的波长。
    • 77. 发明申请
    • Copolymer and Top Coating Composition
    • 共聚物和顶部涂料组合物
    • US20080038661A1
    • 2008-02-14
    • US11664296
    • 2005-09-28
    • Takashi ChibaToru KimuraTomohiro UtakaHiroki NakagawaHirokazu SakakibaraHiroshi Dougauchi
    • Takashi ChibaToru KimuraTomohiro UtakaHiroki NakagawaHirokazu SakakibaraHiroshi Dougauchi
    • C08F12/30G03C1/73
    • G03F7/11C08F220/18C08F220/26C08F220/38C08F228/00G03F7/2041
    • A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.
    • 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合,可以保持在浸没光刻期间不溶于介质的稳定的膜涂层,在干燥曝光期间不损害图案轮廓( 这不是浸没式光刻法),并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式(1)表示的基团的重复单元,由下式(2)表示的基团的重复单元)的重复单元(I)的共聚物, 和具有羧基的重复单元和具有磺基的重复单元(II),所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000,其中R 1〜 R 2是具有1〜4个碳原子的氟代烷基,式(2)中的R 3表示碳原子数1〜20的氟代烷基 。