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71. 发明申请

US20130197972A1 SYSTEM, METHOD AND PROGRAM RECORDING MEDIUM FOR SUPPLY CAPACITY ESTIMATION 有权
标题翻译：用于供应能力估算的系统，方法和程序记录介质
公开(公告)号：US20130197972A1
公开(公告)日：2013-08-01
申请号：US13568636
申请日：2012-08-07
申请人： Kentaro Taguchi , Takahiro Ogawa , Akihisa Tsujibe
发明人： Kentaro Taguchi , Takahiro Ogawa , Akihisa Tsujibe
IPC分类号： G06Q10/04 , G06Q50/28 , G06Q10/08
CPC分类号： G06Q10/04 , G06Q10/0631 , G06Q10/08 , G06Q10/087 , G06Q50/28
摘要： Technology for realizing reductions in time required for production plan by estimating supply capacities of suppliers is provided. A system has a function of registering and displaying transaction information including delivery requests from a buyer including number of required parts and delivery responses from a supplier including number of suppliable parts, a function of managing the series of transaction information as transaction history information on a DB, and an estimating function of estimating supply capacities of parts of the supplier with respect to the delivery responses in reply to delivery requests. The estimating function performs processes of estimating supply capacities by determining numbers of suppliable parts of past delivery responses with respect to numbers of required parts of past delivery requests by using the delivery request history information, the delivery response history information and the process LT information, and outputting a screen including the estimated result information to users.
摘要翻译：提供了通过估算供应商的供应能力来实现生产计划所需时间缩短的技术。系统具有登记和显示包括来自买方的交货信息的交易信息的功能，包括来自供应商的所需部件数量和交货响应，包括可供应部件的数量，将一系列交易信息作为事务历史信息管理在DB上的功能以及估计功能，以估计供应商的部分供应商在回复交货请求时的交货响应。估计功能通过使用传送请求历史信息，传送响应历史信息和处理LT信息来确定关于过去传送请求的所需部分的数量的过去传送响应的可供应部分的数量来估计供应能力的处理，以及向用户输出包括估计结果信息的画面。

72. 发明授权

US08225803B2 Substrate processing method and apparatus 有权
标题翻译：基板加工方法及装置
公开(公告)号：US08225803B2
公开(公告)日：2012-07-24
申请号：US13100484
申请日：2011-05-04
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
IPC分类号： B08B13/00
CPC分类号： H01L21/68721 , C23C18/163 , C23C18/1632 , C23C18/1886 , C25D7/123 , C25D17/001 , H01L21/67126 , H01L21/67766 , Y10S134/901
摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.
摘要翻译：基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

73. 发明申请

US20120141246A1 SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板保持装置，基板保持方法和基板处理装置
公开(公告)号：US20120141246A1
公开(公告)日：2012-06-07
申请号：US13398216
申请日：2012-02-16
申请人： Masahiko SEKIMOTO , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
发明人： Masahiko SEKIMOTO , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
IPC分类号： H01L21/683
CPC分类号： H01L21/67086 , H01L21/67051 , H01L21/687
摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.
摘要翻译：基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

74. 发明授权

US08185286B2 Two-wheeled motor vehicle brake control method and brake control system 有权
标题翻译：二轮机动车制动控制方式及制动控制系统
公开(公告)号：US08185286B2
公开(公告)日：2012-05-22
申请号：US12162626
申请日：2006-02-08
申请人： Shunsaku Ono , Takahiro Ogawa , Helge Westerfeld , Manabu Kanno
发明人： Shunsaku Ono , Takahiro Ogawa , Helge Westerfeld , Manabu Kanno
IPC分类号： G06F7/70
CPC分类号： B60T8/3225 , B60T8/1706 , B60T8/1766 , B60T8/261 , B60T8/5006 , B60T2240/06
摘要： To reliably prevent re-lifting of a rear wheel immediately after landing of the rear wheel.When it is determined that output of a detection signal corresponding to detection of lifting of a rear wheel has ended (S102), brake pressure—and specifically a pressure increase gradient of a wheel cylinder pressure of a front wheel—is reduced, and the pressure increase gradient that has been reduced is maintained until it is determined that vehicle body deceleration has fallen below a predetermined value K1 (S108, S110), whereby re-lifting of the rear wheel caused by an increase in brake pressure at a high pressure increase gradient after landing of the rear wheel can be reliably prevented.
摘要翻译：为了可靠地防止在后轮着陆后立即重新提升后轮。当确定与后轮的提升检测相对应的检测信号的输出结束时（S102），制动压力（具体地说是前轮的轮缸压力的增压梯度）减小，并且压力在确定车身减速度已经下降到预定值K1以下（S108，S110）之前，已经减小的增加梯度被维持，由此在高压增加梯度下由制动压力的增加引起的后轮的再提升可以可靠地防止后轮落地。

75. 发明申请

US20110313536A1 FUNCTIONALIZED TITANIUM IMPLANTS AND RELATED REGENERATIVE MATERIALS 审中-公开
标题翻译：功能性钛金属植入物和相关再生材料
公开(公告)号：US20110313536A1
公开(公告)日：2011-12-22
申请号：US13131013
申请日：2009-11-24
申请人： Takahiro Ogawa
发明人： Takahiro Ogawa
IPC分类号： A61F2/28 , B01J19/12
CPC分类号： A61F2/30767 , A61F2/3094 , A61F2002/0086 , A61F2002/30906 , A61F2002/30925 , A61F2002/3093 , A61F2310/00017 , A61F2310/00023 , A61F2310/00029 , A61F2310/00047 , A61F2310/00071 , A61F2310/00089 , A61F2310/00095 , A61F2310/00107 , A61F2310/00131 , A61F2310/00149 , A61F2310/00155 , A61F2310/00616 , A61F2310/00976 , A61L27/06 , A61L27/50 , A61L2400/18 , C23F1/26
摘要： It is provided a method for functionalizing an implant comprising treating the implant surface thereby causing the surface to be electro-positively charged. The implant has enhanced tissue-implant integration and/or bone-implant integration.
摘要翻译：提供了一种用于使植入物官能化的方法，包括处理植入物表面，从而使表面被带电电荷。植入物具有增强的组织植入物整合和/或骨 - 植入物整合。

76. 发明授权

US08038136B2 Hand having rocking mechanism and substrate delivering device having the same 有权
标题翻译：具有摇摆机构的手和具有该摆动机构的基板输送装置
公开(公告)号：US08038136B2
公开(公告)日：2011-10-18
申请号：US12407826
申请日：2009-03-20
申请人： Hiroki Sanemasa , Hideo Yamamoto , Naoomi Torii , Takahiro Ogawa , Seiji Katsuoka , Hidetaka Nakao , Natsuki Makino
发明人： Hiroki Sanemasa , Hideo Yamamoto , Naoomi Torii , Takahiro Ogawa , Seiji Katsuoka , Hidetaka Nakao , Natsuki Makino
IPC分类号： H01L21/683 , B65G49/07 , B23Q3/18
CPC分类号： H01L21/68707 , Y10S414/141
摘要： A hand 1 is constituted by a hand base 4 serving as a base portion, a rocking hand 3 disposed to be superposed on the hand base 4 and serving to support a substrate 2, and a rocking mechanism 5 provided between the hand base 4 and the rocking hand 3 and serving to support the rocking hand 3 to be tiltable and movable in parallel with respect to the hand base 4.
摘要翻译：手1由用作基部的手持基座4，摆放在手基座4上并用于支撑基板2的摆动手3构成，摆动机构5设置在手持基座4和手柄基座4之间。摆动手3并且用于支撑摇摆手3以相对于手基座4平行地倾斜和移动。

77. 发明授权

US07938130B2 Substrate holding rotating mechanism, and substrate processing apparatus 有权
标题翻译：基板保持旋转机构，以及基板处理装置
公开(公告)号：US07938130B2
公开(公告)日：2011-05-10
申请号：US11730309
申请日：2007-03-30
申请人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
发明人： Hiroyuki Kaneko , Takahiro Ogawa , Kenichi Sugita
IPC分类号： B08B3/02
CPC分类号： H01L21/68728 , B24B37/345 , B24B41/06 , H01L21/67219 , H01L21/68707 , Y10S134/902 , Y10T29/53091 , Y10T29/5313 , Y10T29/53174 , Y10T29/53196
摘要： A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
摘要翻译：使用基板保持旋转机构来保持和旋转待处理的基板。根据本发明的基板保持旋转机构包括至少三个主轴，分别安装在主轴上的用于保持基板周边的夹紧辊，用于使至少一个夹紧辊旋转的旋转装置，至少一个基座部件所述主轴中的至少一个被安装，以及适于允许所述基座构件旋转的旋转机构。

78. 发明申请

US20090324669A1 OSTEOGENIC ENHANCER COMPOSITION 有权
标题翻译：骨质增强剂组合物
公开(公告)号：US20090324669A1
公开(公告)日：2009-12-31
申请号：US12374475
申请日：2007-07-25
申请人： Takahiro Ogawa , Anahid Jewett
发明人： Takahiro Ogawa , Anahid Jewett
IPC分类号： A61F13/00 , A61K31/195 , A61K31/59 , A61K38/39 , A61K33/42 , A61K31/56
CPC分类号： A61K31/197 , A61K31/573 , A61K35/32 , A61K38/00 , A61K45/06 , A61L24/0015 , A61L27/54 , A61L2300/112 , A61L2300/41 , A61L2300/414 , A61L2300/428 , A61L2300/43 , A61L2300/64 , A61L2430/02 , A61K2300/00
摘要： An osteogenic enhancer composition for bone and cartilage repair and methods of using the same are described.
摘要翻译：描述了用于骨和软骨修复的成骨增强剂组合物及其使用方法。

79. 发明申请

US20090283701A1 Medical Implants 有权
标题翻译：医疗植入物
公开(公告)号：US20090283701A1
公开(公告)日：2009-11-19
申请号：US11885474
申请日：2006-03-03
申请人： Takahiro Ogawa
发明人： Takahiro Ogawa
IPC分类号： G21K5/00
CPC分类号： A61F2/30767 , A61B17/68 , A61B17/80 , A61B17/866 , A61C8/0006 , A61F2/0077 , A61F2/186 , A61F2/2803 , A61F2/3094 , A61F2/32 , A61F2/36 , A61F2/38 , A61F2/4261 , A61F2/44 , A61F2002/183 , A61F2002/30031 , A61F2002/30062 , A61F2002/3084 , A61F2002/30906 , A61F2002/30925 , A61F2002/3097 , A61F2002/3625 , A61F2210/0004 , A61F2250/0056 , A61F2310/00011 , A61F2310/00017 , A61F2310/00023 , A61F2310/00029 , A61F2310/00041 , A61F2310/00047 , A61F2310/00059 , A61F2310/00071 , A61F2310/00089 , A61F2310/00095 , A61F2310/00107 , A61F2310/00131 , A61F2310/00149 , A61F2310/00155 , A61F2310/00179 , A61F2310/00293 , A61F2310/00329 , A61F2310/00353 , A61L24/02 , A61L24/046 , A61L24/06 , A61L27/50 , A61L31/14 , A61L2400/12 , A61L2400/18 , B23K26/355 , B82Y40/00 , Y10S977/901 , Y10S977/904 , C08L67/04 , C08L33/12
摘要： Provided herein is methods of treating a medical implant and methods of using the same.
摘要翻译：本文提供了治疗医疗植入物的方法及其使用方法。

80. 发明授权

US07575636B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US07575636B2
公开(公告)日：2009-08-18
申请号：US11455777
申请日：2006-06-20
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
IPC分类号： B05C3/02
CPC分类号： H01L21/67161 , C23C18/1628 , C23C18/1893 , C25D7/123 , C25D17/001 , C25D17/08 , H01L21/67051 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/6723 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67781 , H01L21/68707 , H01L21/68721 , Y10S134/902 , Y10T279/11
摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.
摘要翻译：本发明涉及通过将基板浸渍在处理液中而用于电镀基板或加工基板的基板处理装置。本发明的基板处理装置包括：用于搬入和取出基板的装载/卸载区域; 用于清洁衬底的清洁区域; 以及用于电镀基板的电镀区域。装载/卸载区域设置有具有多个干用设计的手的基板传送机器人，安装有用于容纳基板的盒的装载端口和用于将基板从面朝上翻转的干式设计的反转机面对下来

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