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71. 发明申请

US20110076617A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110076617A1
公开(公告)日：2011-03-31
申请号：US12888243
申请日：2010-09-22
申请人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
发明人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
IPC分类号： G03F7/20 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
摘要翻译：本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团。

72. 发明授权

US07915819B2 Magnesium oxide-containing barrier layer for thick dielectric electroluminescent displays 有权
标题翻译：用于厚电介质电致发光显示器的含氧化镁的阻挡层
公开(公告)号：US07915819B2
公开(公告)日：2011-03-29
申请号：US11403708
申请日：2006-04-13
申请人： Isao Yoshida , Hiroki Hamada , Joe Acchione , Yongbao Xin , San Yu
发明人： Isao Yoshida , Hiroki Hamada , Joe Acchione , Yongbao Xin , San Yu
IPC分类号： H05B33/14
CPC分类号： H05B33/14 , C09K11/7734 , H05B33/22
摘要： A novel laminate is provided to improve the operating stability of thioaluminate based phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises a rare earth activated alkaline earth thioaluminate phosphor thin film layer and a magnesium oxide or magnesium oxide containing layer provided directly adjacent and in contact with the bottom of the phosphor thin film layer. The invention is particularly applicable to phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.
摘要翻译：提供了一种新颖的层压材料，以改善在ac厚膜电介质电致发光显示器中使用的硫铝酸盐基磷光体的操作稳定性。该新型结构包括稀土活化的碱土金属硫铝酸盐荧光体薄膜层和直接邻近并与荧光体薄膜层的底部接触的氧化镁或氧化镁含有层。本发明特别适用于采用在高处理温度下形成和激活荧光膜的厚电介质层的电致发光显示器中使用的荧光体。

73. 发明申请

US20100233628A1 COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学和化学放大的积极抵抗组合物
公开(公告)号：US20100233628A1
公开(公告)日：2010-09-16
申请号：US12719505
申请日：2010-03-08
申请人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/004 , C07C69/76 , C08F232/08
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

74. 发明授权

US07667050B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07667050B2
公开(公告)日：2010-02-23
申请号：US11889596
申请日：2007-08-15
申请人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
发明人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
IPC分类号： C07C309/19 , C07D333/46
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中X表示含有至少一个二价脂环族烃基的C 3 -C 30二价基团，并且C 3 -C 30二价基团中的至少一个-CH 2可以被 -O-或-CO-，Y表示可以被至少一个选自C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 6羟基烷基，C 1 -C 6烷氧基，羟基和氰基，C3-C30环状烃基中的至少一个-CH2-可以被-O-或-CO-取代，Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，A +表示有机抗衡离子。

75. 发明申请

US20090004600A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20090004600A1
公开(公告)日：2009-01-01
申请号：US12143268
申请日：2008-06-20
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03C1/053
CPC分类号： G03F7/0397 , C07C69/00 , C07C2603/24 , C08F212/14 , C08F212/34 , C08F220/18 , G03F7/0045 , G03F7/0046 , Y10S430/106
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

76. 发明申请

US20080315762A1 LAMINATED THICK FILM DIELECTRIC STRUCTURE FOR THICK FILM DIELECTRIC ELECTROLUMINESCENT DISPLAYS 有权
标题翻译：厚膜电介质电镀显微镜的层压薄膜电介质结构
公开(公告)号：US20080315762A1
公开(公告)日：2008-12-25
申请号：US12109564
申请日：2008-04-25
申请人： Hiroki Hamada , Isao Yoshida , Vincent Joseph Alfred Pugliese , Manuela Peter , James Alexander Robert Stiles
发明人： Hiroki Hamada , Isao Yoshida , Vincent Joseph Alfred Pugliese , Manuela Peter , James Alexander Robert Stiles
IPC分类号： H01J1/62
CPC分类号： H01B3/10 , C09K11/7734 , H01B3/004 , H05B33/22 , Y10T428/265
摘要： A novel and improved composite thick film dielectric structure is provided to improve the operating stability of phosphors used in thick dielectric ac electroluminescent displays. The novel structure comprises one or more aluminum oxide layers disposed between the composite thick dielectric layer and the bottom of the phosphor layer of these displays.
摘要翻译：提供了一种新型改进的复合厚膜电介质结构，以改善在厚介电ac电致发光显示器中使用的荧光体的操作稳定性。该新型结构包括一个或多个设置在复合厚介电层和这些显示器的荧光体层底部之间的氧化铝层。

77. 发明申请

US20070122750A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20070122750A1
公开(公告)日：2007-05-31
申请号：US11600884
申请日：2006-11-17
申请人： Satoshi Yamaguchi , Yukako Harada , Isao Yoshida
发明人： Satoshi Yamaguchi , Yukako Harada , Isao Yoshida
IPC分类号： G03C5/00 , C07C309/12
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , G03F7/0397
摘要： The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
摘要翻译：本发明提供式（I）的盐：其中环X表示碳原子数为3〜30的单环或多环烃基，单环或多环烃基中的一个或多个氢原子任选被具有1个 10个碳原子，碳原子数1〜10的烷氧基，碳原子数1〜4的全氟烷基，碳原子数1〜10的羟基烷基或氰基。 Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。本发明还提供了包含式（I）的盐的化学放大抗蚀剂组合物。

78. 发明授权

US07220532B2 Chemical amplification type resist composition 有权
标题翻译：化学放大型抗蚀剂组合物
公开(公告)号：US07220532B2
公开(公告)日：2007-05-22
申请号：US10657149
申请日：2003-09-09
申请人： Yoshiyuki Takata , Isao Yoshida , Hirotoshi Nakanishi
发明人： Yoshiyuki Takata , Isao Yoshida , Hirotoshi Nakanishi
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0392 , Y10S430/111 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： The present invention provides a chemical amplification type positive resist composition comprising a nitrogen containing compound of the formula (VIa) or (VIb); resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and an acid generator of the formula (I)
摘要翻译：本发明提供了包含式（VIa）或（VIb）的含氮化合物的化学扩增型正性抗蚀剂组合物; 树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中; 和式（I）的酸产生剂，

79. 发明申请

US20070100096A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20070100096A1
公开(公告)日：2007-05-03
申请号：US11516644
申请日：2006-09-07
申请人： Yukako Harada , Isao Yoshida , Yoshiyuki Takata
发明人： Yukako Harada , Isao Yoshida , Yoshiyuki Takata
IPC分类号： C08F4/06 , C07C309/12
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14
摘要： The present invention provides a salt of the formula (I): wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
摘要翻译：本发明提供式（I）的盐：其中X表示碳原子数1〜30的无环烃的二价或三价残基或含有单环或双环的碳原子数3〜30的二价或三价残基，其中，在烃中的-CH 2 - 2可以被-O-取代，X中的一个或多个氢原子任选被具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基取代，具有1-6个碳原子的羟基烷基，羟基或氰基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A ^{+ 代表有机抗衡离子; Y表示羟基，氰基或甲氧基; 并且n表示1或2.本发明还提供包含式（I）的盐的化学放大抗蚀剂组合物。}

80. 发明申请

US20070027336A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20070027336A1
公开(公告)日：2007-02-01
申请号：US11390319
申请日：2006-03-28
申请人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi , Nobuo Ando
发明人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi , Nobuo Ando
IPC分类号： C07C309/51
CPC分类号： C07C309/17 , C07C2603/74
摘要： The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
摘要翻译：本发明提供式（L）的盐式（L）的盐：其中Q表示-CO-基或-C（OH） - 基; 环X表示当Q为-C（OH） - 基团或其中两个氢原子被≡O基团取代时，其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基在Q为-CO-基的Q位置，单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基，具有1至6个碳原子的烷氧基，具有1至6个碳原子的烷氧基， 1至4个碳原子，具有1至6个碳原子的羟基烷基，羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。本发明还提供了包含式（L）的盐的化学放大抗蚀剂组合物。

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