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1. 发明申请

US20100233628A1 COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学和化学放大的积极抵抗组合物
公开(公告)号：US20100233628A1
公开(公告)日：2010-09-16
申请号：US12719505
申请日：2010-03-08
申请人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/004 , C07C69/76 , C08F232/08
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

2. 发明申请

US20090004600A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20090004600A1
公开(公告)日：2009-01-01
申请号：US12143268
申请日：2008-06-20
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03C1/053
CPC分类号： G03F7/0397 , C07C69/00 , C07C2603/24 , C08F212/14 , C08F212/34 , C08F220/18 , G03F7/0045 , G03F7/0046 , Y10S430/106
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

3. 发明授权

US08808960B2 Compound and chemically amplified positive resist composition 有权
标题翻译：化合物和化学放大阳性抗蚀剂组合物
公开(公告)号：US08808960B2
公开(公告)日：2014-08-19
申请号：US12719505
申请日：2010-03-08
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/039 , C08F32/08 , C08F20/30
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

4. 发明授权

US07893293B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07893293B2
公开(公告)日：2011-02-22
申请号：US12143268
申请日：2008-06-20
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： C07C69/753 , C07C43/21 , C07C43/215 , C08F12/32 , G03F7/039
CPC分类号： G03F7/0397 , C07C69/00 , C07C2603/24 , C08F212/14 , C08F212/34 , C08F220/18 , G03F7/0045 , G03F7/0046 , Y10S430/106
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

5. 发明授权

US07759045B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07759045B2
公开(公告)日：2010-07-20
申请号：US12213800
申请日：2008-06-24
申请人： Makoto Akita , Isao Yoshida , Yukako Harada
发明人： Makoto Akita , Isao Yoshida , Yukako Harada
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+−O3S—R (I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）由式（I）表示的盐：A + -O3S-R（I）其中R表示9,10-蒽醌基，其可以被至少一个选自可以被取代为C1-C4烷基，C1-C4烷氧基和羟基，C1-C4烷基和C1-C4烷氧基组成的组，A +表示有机抗衡阳离子，（B ）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

6. 发明申请

US20090004601A1 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US20090004601A1
公开(公告)日：2009-01-01
申请号：US12213800
申请日：2008-06-24
申请人： Makoto Akita , Isao Yoshida , Yukako Harada
发明人： Makoto Akita , Isao Yoshida , Yukako Harada
IPC分类号： G03C1/73 , G03C1/56
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+−O3S—R (I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：一种化学放大阳性抗蚀剂组合物，其包含（A）由式（I）表示的盐：<？in-line-formula description =“In-line Formulas”end =“lead”？> A + -O3S-R（I） <？in-line-formula description =“In-line Formulas”end =“tail”？>其中R表示9,10-蒽醌基，其可被至少一个选自以下的基团取代：C1- C4烷基，C1-C4烷氧基和羟基，C1-C4烷基和C1-C4烷氧基可以被取代，A +表示有机抗衡阳离子，（B）含有结构单元，其具有酸不稳定基团，其本身在碱性水溶液中不溶或难溶，但通过酸的作用变得可溶于碱水溶液。

7. 发明授权

US07001706B2 Sulfonate and a resist composition 有权
标题翻译：磺酸盐和抗蚀剂组合物
公开(公告)号：US07001706B2
公开(公告)日：2006-02-21
申请号：US10892291
申请日：2004-07-16
申请人： Satoshi Yamaguchi , Makoto Akita , Isao Yoshida
发明人： Satoshi Yamaguchi , Makoto Akita , Isao Yoshida
IPC分类号： G03C1/73 , G03C7/039 , C07C309/73
CPC分类号： G03F7/0395 , C07C309/58 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/115 , Y10S430/12 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A sulfonate of the formula (I): wherein Q1, Q2, Q3, Q4 and Q5 each independently represents a certain substituent, and A+ represents a counter ion, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 is a group of the formula (II) wherein R1 and R2 each independently an alkyl having 1 to 12 carbon atoms or the like; and a chemical amplification type positive resist composition comprising the sulfate of the formula (I) and a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：式（I）的磺酸酯：<化学式id =“CHEM-US-00001”num =“000

8. 发明申请

US20050014095A1 Sulfonate and a resist composition 有权
标题翻译：磺酸盐和抗蚀剂组合物
公开(公告)号：US20050014095A1
公开(公告)日：2005-01-20
申请号：US10892291
申请日：2004-07-16
申请人： Satoshi Yamaguchi , Makoto Akita , Isao Yoshida
发明人： Satoshi Yamaguchi , Makoto Akita , Isao Yoshida
IPC分类号： C07C309/29 , C07C309/58 , C07C323/31 , C07C381/12 , G03C1/76 , G03F7/004 , G03F7/039
CPC分类号： G03F7/0395 , C07C309/58 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/115 , Y10S430/12 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A sulfonate of the formula (I): wherein Q1, Q2, Q3, Q4 and Q5 each independently represents a certain substituent, and A+ represents a counter ion, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 is a group of the formula (II) wherein R1 and R2 each independently an alkyl having 1 to 12 carbon atoms or the like; and a chemical amplification type positive resist composition comprising the sulfate of the formula (I) and a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：式（I）的磺酸酯：其中Q 1，Q 2，Q 3，Q 4和Q 5各自独立地表示某一取代基，A +表示抗衡离子，条件是Q 1，Q 2，Q 3，Q 4和Q 5中的至少一个是式（II）的基团，其中R 1和R 3， 2>各自独立地为具有1至12个碳原子的烷基等; 以及包含式（I）的硫酸盐和含有具有酸不稳定基团的结构单元并且本身在碱性水溶液中不溶或难溶于但在碱性水溶液中易溶的树脂的化学放大型正性抗蚀剂组合物溶液通过酸的作用。

9. 发明授权

US08616062B2 Ultrasonic inspection system and ultrasonic inspection method 有权
标题翻译：超声波检测系统和超声波检测方法
公开(公告)号：US08616062B2
公开(公告)日：2013-12-31
申请号：US13028268
申请日：2011-02-16
申请人： Naoyuki Kono , Isao Yoshida , Masahiro Koike , Yoshio Nonaka , Hiroyuki Nakano , Kenichi Otani , Chihiro Matsuoka , Masafumi Imai
发明人： Naoyuki Kono , Isao Yoshida , Masahiro Koike , Yoshio Nonaka , Hiroyuki Nakano , Kenichi Otani , Chihiro Matsuoka , Masafumi Imai
IPC分类号： G01N29/06
CPC分类号： G01N29/28 , G01N29/265 , G01N2291/101 , G01N2291/2675
摘要： In an ultrasonic inspection method or ultrasonic inspection system in which an ultrasonic wave is propagated to an test object via a medium such as a liquid or a gas, an incident position of the ultrasonic wave is accurately and reliably identified. In an ultrasonic inspection method based on an immersion technique, an optical irradiator is mounted on an ultrasonic wave transmitting/receiving unit, an optical marker is irradiated from the optical irradiator to the test object, and an irradiated position of the optical marker is imaged using imaging equipment in order to perform inspection.
摘要翻译：在超声波检查方法或超声波检查系统中，通过诸如液体或气体的介质将超声波传播到测试对象，可以精确可靠地识别超声波的入射位置。在基于浸没技术的超声波检查方法中，将光学照相机安装在超声波发送/接收单元上，将光学标记从光学照射器照射到被检体，并且使用成像设备进行检查。

10. 发明授权

US08530138B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08530138B2
公开(公告)日：2013-09-10
申请号：US13216776
申请日：2011-08-24
申请人： Isao Yoshida , Koji Ichikawa
发明人： Isao Yoshida , Koji Ichikawa
IPC分类号： G03F7/00 , G03F7/028 , C07D343/00 , C07D411/00 , C07C309/00
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74 , C07D233/60 , C07D327/08 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1和L2各自表示C1-C17二价饱和烃基，其中一个或更多的-CH 2 - 可被-O-或-CO-取代，环W1和环W2各自独立地表示C 3 -C 36脂族环，R 2在每次出现时独立地为C1-C6烷基，R4各自独立地为 C1-C6烷基，R3表示C1-C12烃基，t表示0〜2的整数，u表示0〜2的整数，Z +表示有机抗衡离子。

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