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71. 发明授权

US06210855B1 Positive resist composition suitable for lift-off technique and pattern forming method 有权
公开(公告)号：US06210855B1
公开(公告)日：2001-04-03
申请号：US09459876
申请日：1999-12-14
申请人： Takafumi Ueda , Hideto Kato , Toshihiko Fujii , Miki Kobayashi
发明人： Takafumi Ueda , Hideto Kato , Toshihiko Fujii , Miki Kobayashi
IPC分类号： G03F7023
CPC分类号： G03F7/0226 , G03F7/0233
摘要： A positive resist composition contains (A) a novolak resin having a weight average molecular weight calculated as polystyrene of 2,000-20,000 wherein 2.5-27 mol % of the hydrogen atom of a hydroxyl group is replaced by a 1,2-naphthoquinonediazidosulfonyl group and (B) a low molecular aromatic compound having phenolic hydroxyl groups and 2-20 benzene rings wherein the ratio of the number of phenolic hydroxyl groups to the number of benzene rings is between 0.5 and 2.5. By forming a resist layer on a substrate from the positive resist composition and baking the resist layer at 90-130° C., followed by exposure and development, there is formed a resist pattern having an undercut of desired configuration. Owing to high resolution and improved dimensional control, heat resistance and film retention, the resist pattern lends itself to a lift-off technique.

72. 发明授权

US5616448A Photosensitive resin composition and a process for forming a patterned polyimide film using the same 失效
标题翻译：感光树脂组合物和使用其形成图案化聚酰亚胺膜的方法
公开(公告)号：US5616448A
公开(公告)日：1997-04-01
申请号：US592536
申请日：1996-01-26
申请人： Hideto Kato
发明人： Hideto Kato
IPC分类号： G03F7/038 , G03F7/38
CPC分类号： G03F7/0387
摘要： The composition comprises (A) a specified polyimide precursor and (B) at least one member selected from the group consisting of a sensitizer, a photopolymerization initiator and a combination thereof. The above process comprises applying a solution of the above photosensitive resin composition on a substrate, followed by drying to form a film; exposing the film to light, followed by developing with an aqueous alkaline solution to form a patterned film; and curing the patterned film. The composition has little ionic impurities mixed therein during the preparation of the composition; is excellent in storage stability in the state of a solution; can be developed with an aqueous alkaline solution, which does not cause the problems such as a problem to health and a problem to the treatment of waste liquids, within a short time; and exhibits a good sensitivity even when formed a thick film, thereby readily providing a patterned resinous film. Further, the cured product obtained by curing the patterned film has a superior heat resistance and excellent electrical and mechanical properties, which can be suitably used as a protective film for use in electronic parts.
摘要翻译：组合物包含（A）特定的聚酰亚胺前体和（B）选自敏化剂，光聚合引发剂及其组合中的至少一种。上述方法包括将上述感光性树脂组合物的溶液涂布在基材上，然后干燥以形成膜; 将膜曝光，随后用碱性水溶液显影以形成图案化膜; 并固化图案化膜。在组合物的制备期间，组合物中少量的离子杂质混入其中; 在溶液状态下的储存稳定性优异; 可以在短时间内用碱性水溶液显影，其不会引起诸如健康问题和废液处理问题; 并且即使形成厚膜也显示出良好的灵敏度，从而容易提供图案化的树脂膜。此外，通过固化图案化膜获得的固化产物具有优异的耐热性和优异的电气和机械性能，其可以适合用作用于电子部件的保护膜。

73. 发明授权

US5143948A Semiconductor element protecting compositions 失效
标题翻译：半导体元件保护组合物
公开(公告)号：US5143948A
公开(公告)日：1992-09-01
申请号：US561865
申请日：1990-08-02
申请人： Hiroshige Okinoshima , Hideto Kato
发明人： Hiroshige Okinoshima , Hideto Kato
IPC分类号： C08G73/10 , C08G77/455 , C08K3/36 , C08K5/544 , C08K9/06 , C08L79/08 , C09D179/08 , H01B3/30 , H01L23/29 , H01L23/31
CPC分类号： H01L23/293 , C08G73/1042 , C08G73/105 , C08G73/106 , C08G77/455 , C08K3/36 , C08L79/08 , H01B3/306 , H01L2924/0002
摘要： A polyimide resin is prepared by polymerizing (A) a tetracarboxylic acid dianhydride component consisting essentially of 10 to 50 mol % of 2,2-bis(3,4-benzene-dicarboxylic anhydride)perfluoropropane and 90 to 50 mol % of pyromellitic dianhydride or similar acid dianhydride and (B) a diamine component consisting essentially of 10 to 80 mol % of a silicon diamine and 90 to 20 mol % of an ether diamine. The polyimide resin is dissolved in an organic solvent and blended with finely divided silica to form a composition which is useful for protecting semiconductor elements.
摘要翻译：通过聚合（A）基本上由10〜50摩尔％的2,2-双（3,4-苯二羧酸酐）全氟丙烷和90〜50摩尔％的1,2,4,5-苯四酸二酐组成的四羧酸二酐组分，类似的酸二酐和（B）基本上由10至80mol％的硅二胺和90至20mol％的醚二胺组成的二胺组分。将聚酰亚胺树脂溶解在有机溶剂中并与细碎的二氧化硅混合以形成可用于保护半导体元件的组合物。

74. 发明授权

US4742177A Methacrylic acid ester 失效
标题翻译：甲基丙烯酸酯
公开(公告)号：US4742177A
公开(公告)日：1988-05-03
申请号：US8538
申请日：1987-01-29
申请人： Yasushi Yamamoto , Hironao Fujiki , Hideto Kato , Akira Yoshida
发明人： Yasushi Yamamoto , Hironao Fujiki , Hideto Kato , Akira Yoshida
IPC分类号： C07F7/10 , B01D53/22 , C07F7/08 , C07F7/18 , C08F30/08 , C08G77/385
CPC分类号： C07F7/0854 , C08G77/385
摘要： A novel methacrylic acid ester represented by General Formula (I): ##STR1## wherein l is an integer of 1 to 3; m is an integer of 1 to 10; and n is an integer of 1 to 3,and a process for producing the same. This novel methacrylic acid ester is useful for the synthesis of polymers having useful functions such as an oxygen enrichment performance.
摘要翻译：由通式（I）表示的新型甲基丙烯酸酯：其中l为1〜3的整数; m为1〜10的整数。 n为1〜3的整数，及其制造方法。该新型甲基丙烯酸酯可用于合成具有富氧性能等有用功能的聚合物。

75. 发明申请

US20110076465A1 EPOXY-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTIVE FILM 有权
标题翻译：含环氧聚合物，光固化树脂组合物，图案处理和电子/电子部件保护膜
公开(公告)号：US20110076465A1
公开(公告)日：2011-03-31
申请号：US12889730
申请日：2010-09-24
申请人： Takanobu Takeda , Hideto Kato
发明人： Takanobu Takeda , Hideto Kato
IPC分类号： C08G77/14 , G03F7/004 , G03F7/20 , B32B3/10
CPC分类号： C08L83/06 , C08G77/14 , C08G77/80 , C08L83/14 , C09D183/06 , C09D183/14 , G03F7/0045 , G03F7/0757 , H01L21/02118 , H01L21/312 , Y10T428/24802 , C08L2666/14
摘要： A photo-curable resin composition comprising an epoxy-containing silphenylene or silicone polymer with a Mw of 3,000-500,000 forms a coating which is useful as a protective film for electric/electronic parts.
摘要翻译：包含Mw为3,000〜500,000的含环氧基的硅亚烷基或有机硅聚合物的光固化树脂组合物形成可用作电气/电子部件的保护膜的涂层。

76. 发明授权

US07060761B2 Epoxy resin compositions 有权
标题翻译：环氧树脂组合物
公开(公告)号：US07060761B2
公开(公告)日：2006-06-13
申请号：US10639623
申请日：2003-08-13
申请人： Kazuhiro Arai , Satoshi Asai , Hideto Kato
发明人： Kazuhiro Arai , Satoshi Asai , Hideto Kato
IPC分类号： C08L83/06
CPC分类号： C08L63/00 , C08L83/14 , C08L83/00 , C08L2666/14
摘要： An epoxy resin composition comprising (i) a compound having at least two epoxy groups in a molecule as a main component, (ii) a fluorene skeleton-bearing, silicone-modified phenolic resin as a curing agent, and (iii) an organophosphorus compound, amine compound or imidazole compound as a cure accelerator cures into an elastomeric product having a low elasticity, toughness and low dielectric properties.
摘要翻译：一种环氧树脂组合物，其包含（i）分子中具有至少两个环氧基的化合物作为主要成分，（ii）含芴骨架的硅氧烷改性酚醛树脂作为固化剂，和（iii）有机磷化合物，作为固化促进剂的胺化合物或咪唑化合物固化成具有低弹性，韧性和低介电特性的弹性体产品。

77. 发明授权

US06899991B2 Photo-curable resin composition, patterning process, and substrate protecting film 有权
标题翻译：光固化树脂组合物，图案化工艺和基材保护膜
公开(公告)号：US06899991B2
公开(公告)日：2005-05-31
申请号：US10266566
申请日：2002-10-09
申请人： Hideto Kato , Kazumi Noda , Toshihiko Fujii , Kazuhiro Arai , Satoshi Asai
发明人： Hideto Kato , Kazumi Noda , Toshihiko Fujii , Kazuhiro Arai , Satoshi Asai
IPC分类号： B05D7/24 , C08F2/46 , C08G59/62 , C08J5/18 , C08K5/13 , C08K5/5415 , C08L83/04 , C08L83/14 , C09D183/14 , G03F7/004 , G03F7/038 , G03F7/075 , G03F7/40 , H01L21/027
CPC分类号： G03F7/0757 , C09D183/14 , G03F7/0382 , Y10S430/128 , C08L2666/14
摘要： A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): wherein R1 to R4 are monovalent C1-C8 hydrocarbon, n is an integer of 1-1,000, and X is and having a Mw of 500-200,000, (B) a formalin-modified or formalin-alcohol-modified amino condensate, a phenol compound having on the average at least two methylol or alkoxymethylol radicals, or an epoxy compound having on the average at least two epoxy radicals, (C) a photoacid generator, and (D) a silicon compound of the formula: (R11)mSi(OR12)4−m wherein R11 is monovalent C1-C9 hydrocarbon, R12 is C1-C4 alkyl, m is 0-2, forms cured pattern films having dry etch resistance and improved adhesion to substrates.
摘要翻译：一种光固化树脂组合物，其包含（A）含有机硅氧烷的聚合物，其包含式（1）的重复单元：其中R 1至R 4为单价C 1〜8个碳原子，n为1-1000的整数，X为Mw为500-200,000，（B）福尔马林改性或福尔马林醇 - 改性氨基缩合物，平均具有至少两个羟甲基或烷氧基羟甲基的苯酚化合物或平均具有至少两个环氧基的环氧化合物，（C）光酸产生剂，和（D）式（R 11）其中R 11是（OR 12）其中R 11是（OR 12） SUP>是一价C 1 -C 9烃，R 12是C 1 -C 4烃基烷基，m为0-2，形成具有耐干蚀刻性和改善对基材的粘合性的固化图案膜。

78. 发明授权

US06867325B2 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat 失效
标题翻译：有机硅氧烷聚合物，光固化树脂组合物，图案化工艺和底物保护涂层
公开(公告)号：US06867325B2
公开(公告)日：2005-03-15
申请号：US10212253
申请日：2002-08-06
申请人： Hideto Kato , Satoshi Asai , Toshihiko Fujii
发明人： Hideto Kato , Satoshi Asai , Toshihiko Fujii
IPC分类号： G03F7/075 , B05D3/06 , C07F7/02 , C07F7/08 , C07F7/10 , C08F230/08 , C08G77/04 , C08G77/14 , C08G77/52 , H01L21/027 , H01L21/312
CPC分类号： C09D183/04
摘要： An organosiloxane polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-500,000 is novel. R1 to R4 are monovalent hydrocarbon groups, n is an integer of 1-2,000, X has a structure of the formula: and R5 is an acrylic functional organic group of the formula: wherein R′ is H or methyl and R″ is a divalent hydrocarbon group. A photo-curable resin composition comprising the organosiloxane polymer and a sensitizer can be cured with a wide wavelength range of light.
摘要翻译：包含通式（1）的重复单元并且具有1,000-500,000重均分子量的有机硅氧烷聚合物是新颖的.R 1至R 4是一价烃基，n是1-2,000的整数， X具有下式的结构：R 5是具有下式的丙烯酸官能的有机基团：其中R'是H或甲基，R“是二价烃基。包含有机硅氧烷聚合物和敏化剂的光固化树脂组合物可以在宽的波长范围的光下固化。

79. 发明授权

US06590010B2 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating 有权
公开(公告)号：US06590010B2
公开(公告)日：2003-07-08
申请号：US09949848
申请日：2001-09-12
申请人： Hideto Kato , Takafumi Ueda , Tomoyoshi Furihata
发明人： Hideto Kato , Takafumi Ueda , Tomoyoshi Furihata
IPC分类号： C08G7700
CPC分类号： H01L21/02126 , C08G77/42 , C08G77/52 , C08L83/10 , G03F7/0757 , H01L21/02216 , H01L21/02282 , H01L21/02345 , H01L21/02348 , H01L21/3122 , Y10T428/31663
摘要： By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.

80. 发明授权

US06456198B1 Fence sensor 失效
标题翻译：围栏传感器
公开(公告)号：US06456198B1
公开(公告)日：2002-09-24
申请号：US09720681
申请日：2001-03-27
申请人： Ryochi Kato , Hideto Kato , Kunihide Kamiyama , Kiichi Seino
发明人： Ryochi Kato , Hideto Kato , Kunihide Kamiyama , Kiichi Seino
IPC分类号： G08B1326
CPC分类号： G08B13/26
摘要： It is an object of this invention to provide a fence sensor which can achieve an excellent detection stability without using a current for generating an electric field nor infrared rays. The fence sensor comprises a detection electrode (8); a reference electrode (9) insulated from the detection electrode (8); a chargeable member (4) insulated from both of the detection electrode (8) and the reference electrode (9); and a detection circuit (20) for detecting a change in the electrostatic capacitance between the detection electrode and the reference electrode that is generated by the presence of an object to be detected within a detection region of the detection electrode. In this fence sensor, the chargeable member is arranged such that at least a part of the chargeable member is situated within the detection region of the detection electrode. Further, the chargeable member is formed from a conductor.
摘要翻译：本发明的目的是提供一种能够在不使用用于产生电场和红外线的电流的情况下实现优异的检测稳定性的栅栏传感器。栅栏传感器包括检测电极（8）; 与所述检测电极（8）绝缘的参考电极（9）; 与所述检测电极（8）和所述参考电极（9）绝缘的可充电部件（4）; 以及检测电路（20），用于检测在检测电极的检测区域内由待检测物体的存在产生的检测电极和参考电极之间的静电电容的变化。在该栅栏传感器中，可充电构件被布置成使得可充电构件的至少一部分位于检测电极的检测区域内。此外，可充电部件由导体形成。

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