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71. 发明申请

US20050127306A1 Particle beam irradiation system and method of adjusting irradiation field forming apparatus 有权
标题翻译：粒子束照射系统及照射场形成装置的调整方法
公开(公告)号：US20050127306A1
公开(公告)日：2005-06-16
申请号：US11006605
申请日：2004-12-08
申请人： Masaki Yanagisawa , Hiroshi Akiyama , Koji Matsuda , Hisataka Fujimaki
发明人： Masaki Yanagisawa , Hiroshi Akiyama , Koji Matsuda , Hisataka Fujimaki
IPC分类号： G21K3/00 , A23L5/30 , A61N1/44 , A61N5/00 , A61N5/10 , G21K1/10 , G21K5/04 , G21K5/10 , G21G5/00
CPC分类号： G21K1/10 , A61N1/44 , A61N2005/1087 , A61N2005/1095
摘要： A particle therapy system, as one example of a particle beam irradiation system, comprises a charged particle beam generator and an irradiation field forming apparatus. An ion beam from the charged particle beam generator is irradiated to a diseased part in the body of a patient through the irradiation field forming apparatus. A scattering compensator and a range modulation wheel (RMW) are disposed on the upstream side in a direction of beam advance and are movable along a beam axis. The movement of the scattering compensator and the RMW adjusts a size of the ion beam entering a scatterer device, whereby a change in scattering intensity of the ion beam in the scatterer device is adjusted. As a result, a penumbra in dose distribution is reduced and a more uniform dose distribution in a direction perpendicular to the direction of beam advance is obtained in the diseased part.
摘要翻译：作为粒子束照射系统的一个实例的粒子治疗系统包括带电粒子束发生器和照射场形成装置。来自带电粒子束发生器的离子束通过照射场形成装置照射到患者体内的患病部位。散射补偿器和范围调制轮（RMW）沿光束前进的方向设置在上游侧，并且可以沿着光束轴线移动。散射补偿器和RMW的移动调节进入散射体装置的离子束的尺寸，由此调节散射体装置中的离子束的散射强度的变化。结果，减少了剂量分布的半暗影，并且在病变部分中获得了在垂直于光束前进方向的方向上更均匀的剂量分布。

72. 发明申请

US20050051740A1 Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device 失效
标题翻译：带电粒子治疗系统，范围调制轮装置以及安装范围调制轮装置的方法
公开(公告)号：US20050051740A1
公开(公告)日：2005-03-10
申请号：US10917458
申请日：2004-08-13
申请人： Masaki Yanagisawa , Hiroshi Akiyama , Koji Matsuda , Hisataka Fujimaki
发明人： Masaki Yanagisawa , Hiroshi Akiyama , Koji Matsuda , Hisataka Fujimaki
IPC分类号： A61N5/10 , G21G5/00
CPC分类号： G21K1/10 , A61N2005/1087 , A61N2005/1095 , G21K1/043
摘要： The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member provided in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributes to cutting a time required for treatment per patient and increasing the number of patients treated.
摘要翻译：本发明提供一种能够增加治疗患者数量的带电粒子治疗系统。用于将从带电粒子束发生器提取的带电粒子束照射到照射目标的照射成像装置包括RMW装置。 RMW装置包括壳体和设置在壳体内的RMW。 RMW的旋转轴可旋转地安装在壳体上。 RMW装置可拆卸地安装在设置在照射区域形成装置的壳体中的RMW保持构件中。壳体可以放置成与RMW保持构件接触，因此可以在短时间内将RMW的旋转轴定位到预定位置。这有助于减少患者治疗所需的时间并增加治疗患者的数量。

73. 发明申请

US20050024630A1 Device for examining end part 审中-公开
标题翻译：检查端部的装置
公开(公告)号：US20050024630A1
公开(公告)日：2005-02-03
申请号：US10833038
申请日：2004-04-28
申请人： Toshiki Ohno , Hirotoshi Ise , Masato Toyota , Toshio Komemura , Hidefumi Sakita , Suekazu Nakashima , Koji Matsuda
发明人： Toshiki Ohno , Hirotoshi Ise , Masato Toyota , Toshio Komemura , Hidefumi Sakita , Suekazu Nakashima , Koji Matsuda
IPC分类号： G01B11/00 , G01N21/89 , G01N21/95 , H01L21/66 , G01N21/88
CPC分类号： G01N21/9503
摘要： A device for examining an end part according to the present invention includes a light projecting portion, a light receiving portion, a displacement sensor amplifier, and a data processing apparatus. The light projecting portion projects light on the end part of a semiconductor wafer. The light receiving portion receives specular reflected light reflected from the end part of the semiconductor wafer. The displacement sensor amplifier and the data processing apparatus calculate the displacement amount of the end part of the semiconductor wafer by a change in the distribution of the quantity of the specular reflected light received by the light receiving portion. Thus, the device for examining an end part can be reduced in size and simplified. Additionally, the device for examining an end part can be obtained, with which a change of the material of the end part of a measurement target is hardly detected as defects falsely.
摘要翻译：根据本发明的用于检查端部的装置包括光投射部分，光接收部分，位移传感器放大器和数据处理装置。光投射部分在半导体晶片的端部上投射光。光接收部分接收从半导体晶片的端部反射的镜面反射光。位移传感器放大器和数据处理装置通过光接收部分接收的镜面反射光量的分布变化来计算半导体晶片的端部的位移量。因此，用于检查端部的装置可以减小尺寸并简化。此外，可以获得用于检查端部的装置，由此几乎不能将测量对象的端部的材料的变化几乎不被错误地检测为缺陷。

74. 发明授权

US06498276B2 Process for producing acetophenone compound 失效
标题翻译：生产苯乙酮化合物的方法
公开(公告)号：US06498276B2
公开(公告)日：2002-12-24
申请号：US10066727
申请日：2002-02-06
申请人： Koji Matsuda , Katsuyoshi Hara , Minoru Akamatsu
发明人： Koji Matsuda , Katsuyoshi Hara , Minoru Akamatsu
IPC分类号： C07D26332
CPC分类号： C07D263/32
摘要： The present invention relates to a method for producing a compound of the formula [71] wherein R1 is an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted heterocyclic group, R2 is a lower alkyl or a halogenated lower alkyl and R3 is a halogen atom or a hydrogen atom. The method of the present invention includes reacting compound [1] with thionyl chloride to give compound [2] and obtaining the objective compound [7] at a high yield via intermediate [5], and is utilizable for industrial production.
摘要翻译：本发明涉及制备式[71]化合物的方法，其中R 1为任选取代的环烷基，任选取代的芳基或任选取代的杂环基，R 2为低级烷基或卤代低级烷基，R 3 是卤素原子或氢原子。本发明的方法包括使化合物[1]与亚硫酰氯反应，得到化合物[2]，通过中间体[5]以高收率得到目标化合物[7]，可用于工业生产。

75. 发明授权

US06265837B1 Charged-particle beam irradiation method and system 失效
标题翻译：带电粒子束照射方法及系统
公开(公告)号：US06265837B1
公开(公告)日：2001-07-24
申请号：US09265557
申请日：1999-03-09
申请人： Hiroshi Akiyama , Kazuo Hiramoto , Koji Matsuda
发明人： Hiroshi Akiyama , Kazuo Hiramoto , Koji Matsuda
IPC分类号： H05H1304
CPC分类号： A61N5/1043 , A61N5/1045 , A61N2005/1087 , A61N2005/1095 , G21K5/04
摘要： A charged-particle beam irradiation method and system are disclosed in which while a charged-particle beam ejected from an accelerator is scanned by an electromagnet, each layer resulting from the division of an affected part into a plurality of layers in the direction of progression of the charged-particle beam is irradiated with the charged-particle beam. The intensity of a charged-particle beam for irradiation of a first layer is made lower than the intensity of a charged-particle beam for irradiation of a second layer existing at a position deeper than the first layer in the beam progressing direction. A scanning speed in the first layer is changed between a portion of the first layer subjected to irradiation at the time of irradiation of the second layer and a portion of the first layer subjected to no irradiation at the time of irradiation of the second layer.
摘要翻译：公开了一种带电粒子束照射方法和系统，其中当从加速器喷射的带电粒子束被电磁体扫描时，由将受影响部分分解为沿着用带电粒子束照射带电粒子束。使用于照射第一层的带电粒子束的强度低于存在于比第一层在光束前进方向更深的位置处的第二层的照射的带电粒子束的强度。第一层的扫描速度在照射第二层时照射的第一层的一部分与在第二层的照射时不进行照射的第一层的一部分之间变化。

76. 发明授权

US6018049A Process for the preparation of carbamoylated imidazole derivatives 失效
标题翻译：氨基甲酰化咪唑衍生物的制备方法
公开(公告)号：US6018049A
公开(公告)日：2000-01-25
申请号：US319704
申请日：1999-06-10
申请人： Makoto Hajima , Yoshiyuki Takeuchi , Koji Matsuda
发明人： Makoto Hajima , Yoshiyuki Takeuchi , Koji Matsuda
IPC分类号： C07D233/84 , C07D401/06
CPC分类号： C07D233/84
摘要： The present invention provides a process for the preparation of a compound of the formula (III): ##STR1## wherein R.sup.1 is an optionally substituted alkyl or an optionally substituted aryl; R.sup.2 is an optionally substituted alkyl: R.sup.3 is an optionally substituted alkyl, an optionally substituted alkenyl, an optionally substituted aralkyl, or an optionally substituted heteroarylalkyl; and n is an integer of 1-3,which comprises reacting a compound of the formula (I): ##STR2## wherein R.sup.1, R.sup.2, and n are as defined above, with a compound of the formula (II):R.sup.3 OH (II)wherein R.sup.3 is as defined above, in the presence of phosphine and either of dialkyl azodicarboxylate and tetraalkyl azodicarboxamide.
摘要翻译： PCT No.PCT / JP97 / 04706 Sec。 371日期1999年6月10日第 102（e）1999年6月10日PCT 1997年12月19日PCT公布。公开号WO98 / 29394 日期：1998年7月9日本发明提供制备式（III）化合物的方法：其中R 1为任选取代的烷基或任选取代的芳基; R2是任选取代的烷基：R 3是任选取代的烷基，任选取代的烯基，任选取代的芳烷基或任选取代的杂芳基烷基; 并且n是1-3的整数，其包括使式（I）化合物：其中R 1，R 2和n如上所定义，与式（II）化合物反应：其中R 3 在磷化氢和偶氮二羧酸二烷基酯和四烷基偶氮二甲酰胺的存在下，如上所定义。

77. 外观设计

USD720043S1 Electromagnetic valve 有权
公开(公告)号：USD720043S1
公开(公告)日：2014-12-23
申请号：US29476585
申请日：2013-12-16
申请人： Tatsuya Nishiyama , Koji Matsuda , Shinji Miyazoe
设计人： Tatsuya Nishiyama , Koji Matsuda , Shinji Miyazoe

78. 发明授权

US08588456B2 Acoustic conversion device 有权
标题翻译：声转换装置
公开(公告)号：US08588456B2
公开(公告)日：2013-11-19
申请号：US13108489
申请日：2011-05-16
申请人： Tsutomu Nagumo , Koji Matsuda , Kenji Hiraiwa , Takayuki Ishii , Koji Nageno , Takeshi Hara , Takahiro Suzuki
发明人： Tsutomu Nagumo , Koji Matsuda , Kenji Hiraiwa , Takayuki Ishii , Koji Nageno , Takeshi Hara , Takahiro Suzuki
IPC分类号： H04R1/00 , H04R9/06 , H04R11/02
CPC分类号： H04R11/02
摘要： An acoustic conversion device includes: a driving unit including a pair of magnets disposed so as to face each other, a yoke to which the pair of magnets are attached, a coil to which driving current is supplied, a vibrating portion which vibrates when driving current is supplied to the coil, and an armature disposed between the pair of magnets with the vibrating portion passed through the coil; and a diaphragm unit including a holding frame having an opening, a resin film adhered to the holding frame in a state covering the opening of the holding frame, a diaphragm held on the inner side of the holding frame in a state adhered to the resin film, and a beam portion of which the tip portion formed integrally with the diaphragm is combined with the vibrating portion of the armature, for propagating the vibration of the vibrating portion to the diaphragm.
摘要翻译：一种声转换装置，包括：驱动单元，包括一对彼此相对配置的磁体;一对磁体附接的磁轭;供给驱动电流的线圈;驱动电流时振动的振动部; 设置在所述一对磁体之间的电枢，所述振动部通过所述线圈; 以及膜片单元，其包括具有开口的保持框架，在覆盖所述保持框架的开口的状态下粘附到所述保持框架的树脂膜，以与所述树脂膜粘附的状态保持在所述保持框架的内侧的隔膜并且将与隔膜一体形成的前端部的梁部与电枢的振动部结合，将振动部的振动传播到振动膜。

79. 发明授权

US08383819B2 Method for producing 4-oxoquinoline compound 有权
标题翻译： 4-氧代喹啉化合物的制备方法
公开(公告)号：US08383819B2
公开(公告)日：2013-02-26
申请号：US12281889
申请日：2007-03-06
申请人： Koji Matsuda , Koji Ando , Shigeji Ohki , Jun-ichi Hoshi , Takahiro Yamasaki
发明人： Koji Matsuda , Koji Ando , Shigeji Ohki , Jun-ichi Hoshi , Takahiro Yamasaki
IPC分类号： C07D215/00
CPC分类号： C07C229/30 , C07C43/215 , C07C57/72 , C07C57/76 , C07C61/40 , C07C67/333 , C07C67/343 , C07C69/708 , C07C69/716 , C07C69/738 , C07C69/92 , C07C69/94 , C07C229/34 , C07D215/56
摘要： The present invention provides a compound useful as a synthetic intermediate for an anti-HIV agent having an integrase inhibitory activity, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate. Specifically, for example, a compound represented by the formula (2′): wherein R is a fluorine atom or a methoxy group, and R400 is a hydrogen atom or a C1-C4 alkyl group, or a salt thereof, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate.
摘要翻译：本发明提供了可用作具有整合酶抑制活性的抗HIV剂的合成中间体的化合物及其制备方法，以及使用该合成中间体的抗HIV剂的制备方法。具体而言，例如，式（2'）表示的化合物或其盐，其中R为氟原子或甲氧基，R400为氢原子或C1-C4烷基，以及使用该合成中间体的抗HIV剂的制造方法。

80. 发明申请

US20110244067A1 Sizing Device 有权
标题翻译：尺寸设备
公开(公告)号：US20110244067A1
公开(公告)日：2011-10-06
申请号：US13075365
申请日：2011-03-30
申请人： Koji Matsuda
发明人： Koji Matsuda
IPC分类号： B29C47/90
CPC分类号： B29C47/903 , B29C47/0023 , B29C47/0028 , B29C47/0818 , B29C47/0864 , B29C47/0867 , B29C47/34 , B29C47/8835 , B29C47/884 , B29C47/8895 , B29C47/90 , B29C47/907
摘要： A sizing device is installed on a downstream side in an extrusion direction of a die. A table having two sizing unit attachment portions which are adjacent to each other in a lateral direction orthogonal to the extrusion direction. The table is provided at a device body so as to be laterally movable between a first position where one of the two sizing unit attachment portions is at a production position and the other of the two sizing unit attachment portions is at a standby position, and a second position where the other of the two sizing unit attachment portions is at the production position and the one of the two sizing unit attachment portions is at the standby position. A sizing unit for production configured to perform cooling and sizing in practice is detachably attached to one of the two sizing unit attachment portions at the production position to coincide with an extrusion line. A sizing unit for replacement is detachably attachable to the other of the two sizing unit attachment portions at the standby position.
摘要翻译：定型装置安装在模具挤出方向的下游侧。具有在与挤压方向正交的横向方向上彼此相邻的两个施胶单元附接部的台。桌子设置在装置主体处，以便在两个施胶单元附接部分中的一个处于生产位置并且两个施胶单元附接部分中的另一个处于待机位置的第一位置之间可横向移动;以及第二位置，其中两个施胶单元附接部分中的另一个处于生产位置，并且两个施胶单元安装部分中的一个处于待机位置。在实际中，构造成进行冷却和施胶的生产用尺寸单元可以在生产位置上与两个施胶单元安装部分中的一个可拆卸地连接，以与挤出生产线重合。用于更换的尺寸单元可拆卸地附接到待机位置处的两个施胶单元附接部分中的另一个。

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