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71. 发明申请

US20050083507A1 Projection exposure system for microlithography and method for generating microlithographic images 失效
公开(公告)号：US20050083507A1
公开(公告)日：2005-04-21
申请号：US10984256
申请日：2004-11-09
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

72. 发明申请

US20050032059A1 Novel amylases and uses thereof 审中-公开
标题翻译：新型淀粉酶及其用途
公开(公告)号：US20050032059A1
公开(公告)日：2005-02-10
申请号：US10486868
申请日：2002-08-02
申请人： Dieter Maier , Alexander Stock , Christian Wagner , Ulrike Folkers , Kaj Albermann
发明人： Dieter Maier , Alexander Stock , Christian Wagner , Ulrike Folkers , Kaj Albermann
IPC分类号： C12N15/09 , A21D8/04 , C07K14/38 , C07K16/14 , C07K16/40 , C07K19/00 , C12N1/15 , C12N1/19 , C12N1/21 , C12N5/10 , C12N9/30 , C12N15/56 , C12Q1/68 , C07H21/04 , C12N1/16 , C12N15/74
CPC分类号： C12N9/242 , C07K2319/00
摘要： The invention relates to newly identified polynucleotide sequences comprising genes that encode novel amylases isolated from Aspergillus niger. The invention features the full length nucleotide sequences of the novel genes, the cDNA sequences comprising the full length coding sequence of the novel amylases as well as the amino acid sequence of the full-length functional proteins and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein an amylase according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的多核苷酸序列，其包含编码从黑曲霉分离的新型淀粉酶的基因。本发明的特征在于新基因的全长核苷酸序列，cDNA序列包含新型淀粉酶的全长编码序列以及全长功能蛋白质的氨基酸序列及其功能等同物。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的多核苷酸转化的细胞和其中根据本发明的淀粉酶被遗传修饰以增强或降低其活性和/或表达水平的细胞。

73. 发明授权

US06788471B2 Projection exposure apparatus for microlithography 失效
标题翻译：用于微光刻的投影曝光装置
公开(公告)号：US06788471B2
公开(公告)日：2004-09-07
申请号：US10271775
申请日：2002-10-17
申请人： Christian Wagner , Wilhelm Ulrich
发明人： Christian Wagner , Wilhelm Ulrich
IPC分类号： G02B900
CPC分类号： G03F7/70058 , G03F7/70241
摘要： The invention relates to a projection exposure apparatus for microlithography at &lgr;
摘要翻译：本发明涉及一种用于在λ<200nm下进行微光刻的投影曝光装置。用于微光刻的投影曝光装置具有波长小于200nm的光源和小于0.3μm，优选小于0.25μm且大于0.1μm的带宽。投影曝光装置包括由单个透镜材料制成的唯一折射投影物镜。投影物镜提供了在12mm至25mm的范围内的最大图像高度，在0.75至0.95的范围内的图像侧数值孔径以及波长的波长的均方根<150/00的波前的单色校正光源。

74. 发明授权

US06583850B2 Optical system 有权
标题翻译：光学系统
公开(公告)号：US06583850B2
公开(公告)日：2003-06-24
申请号：US09755401
申请日：2001-01-05
申请人： Wolfgang Hummel , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter
发明人： Wolfgang Hummel , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical element (1) of an optical system has at least one chamber (5) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber (5) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber (5) results in a change in non-rotational-symmetric imaging properties of the optical element (1) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line (17). Furthermore, a control device is provided for the pressure in the fluid filling.
摘要翻译：光学系统的光学元件（1）具有至少一个室（5），其被密封以抵抗大气压并被边界表面包围并具有流体填充。室（5）的至少一个边界表面至少部分地暴露于照明光。其构造使得室（5）内的流体压力的变化导致具有n倍对称性的光学元件（1）的非旋转对称成像特性的变化。为此，流体源经由流体供应管线（17）与腔室流体连接。此外，为流体填充中的压力提供控制装置。

75. 发明授权

US06522392B1 Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system 失效
标题翻译：在光学系统中补偿旋转非对称图像缺陷的光学系统和方法
公开(公告)号：US06522392B1
公开(公告)日：2003-02-18
申请号：US09721452
申请日：2000-11-22
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2768
CPC分类号： G03F7/70241 , G03F7/70258 , G03F7/70825
摘要： An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.
摘要翻译：光学系统，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。该系统包括光源（30）以及至少一个光学元件，特别是透镜或反射镜。在由光源（30）的辐射（1）作用的至少一个表面的区域中，光学元件相对于旋转对称轴线（5）基本上是对称的。光学元件或其壳体（6）通过至少一个轴承（8,9,10）可旋转地连接到框架（7）。致动器（18）将光学元件（25）或其壳体（6）围绕旋转对称轴线（5）旋转。致动与控制装置（23）配合。当光学元件暴露于照明时，后者激活用于光学元件的致动器（18），以在光学元件暴露于照明期间的至少暂时的旋转。以这种方式，可以补偿旋转非对称的图像缺陷。

76. 发明授权

US09134629B2 Illumination system, lithographic apparatus and method of forming an illumination mode 有权
标题翻译：照明系统，光刻设备和形成照明模式的方法
公开(公告)号：US09134629B2
公开(公告)日：2015-09-15
申请号：US13203773
申请日：2010-02-25
申请人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
发明人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G03F7/70075 , G03F7/70116
摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.
摘要翻译：光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。反射元件的第一方向和第二方向由端点限定。

77. 发明授权

US08953141B2 Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid 有权
标题翻译：浸没光刻设备和衬底台不对称加速度分布的装置制造方法，以保持浸液的弯液面
公开(公告)号：US08953141B2
公开(公告)日：2015-02-10
申请号：US12329145
申请日：2008-12-05
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Christian Wagner , Rogier Hendrikus Magdalena Cortie
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Christian Wagner , Rogier Hendrikus Magdalena Cortie
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341
摘要： A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid.
摘要翻译：光刻设备包括：液体供应系统，被配置为在光刻设备的投影系统的下游光学元件与基板之间提供浸没液体;以及控制系统，该控制系统布置成驱动基板台以便执行加速曲线以从第一方向的第一速度向第二方向的第二速度加速衬底台。加速度曲线在时间上是不对称的，并且尺寸使得当根据加速度分布加速衬底台时，破坏浸没液体的弯液面的力保持低于保持浸液的弯液面的力。

78. 发明授权

US08783183B2 Active body 有权
标题翻译：活体
公开(公告)号：US08783183B2
公开(公告)日：2014-07-22
申请号：US11727869
申请日：2007-03-28
申请人： Rainer Gaisbauer , Heinz Bannach , Vikron Kadavanich , Martin Fegg , Christian Wagner
发明人： Rainer Gaisbauer , Heinz Bannach , Vikron Kadavanich , Martin Fegg , Christian Wagner
IPC分类号： F42B4/26 , C06D3/00 , F42B12/48 , C06B45/12
CPC分类号： F42B5/16 , C06B45/00 , C06C15/00 , F42B4/26
摘要： An active body is provided that includes at least one active mass block made of monobasic or polybasic high-energy materials such as a nitrocellulose mixture, for example, comprising approximately 60 percent nitroglycerin and 40 percent diethylene glycol dinitrate, which is provided with structures both on a surface and on an interior. In addition, the inner structures can be filled with an active mass substance. The ignition is triggered by a pyrotechnical primer composition, which initiates the active body, preferably from the inside.
摘要翻译：提供了一种活性物质，其包含至少一种由一元或多碱性高能材料如硝酸纤维素混合物制成的至少一种活性质量块，例如包含约60％硝酸甘油和40％二甘醇二硝酸酯，其具有两者结构表面和内部。此外，内部结构可以填充有活性物质。点火是由烟火底漆组合物触发的，其引发活性体，优选从内部引发。

79. 发明申请

US20130287886A1 Injection-Moulding Machine 有权
标题翻译：注塑机
公开(公告)号：US20130287886A1
公开(公告)日：2013-10-31
申请号：US13978783
申请日：2012-01-02
申请人： Stefan Schweininger , Christian Wagner
发明人： Stefan Schweininger , Christian Wagner
IPC分类号： B29C45/17 , B29C45/03
CPC分类号： B29C45/17 , B29C45/03 , B29C45/281
摘要： An injection-moulding machine comprising a hot runner, arranged in a manifold, for feeding a melt into a mould, a shut-off needle for optionally closing or opening the hot runner, a piston connected to the needle, is arranged in a housing with an opening and to which a fluid can be applied from both sides, and a covering plate having two fluid feeds, into the opening wherein the covering plate, the hot runner manifold and the housing are arranged in such a way that, at a first temperature of the manifold, a distance remains between the housing and the covering plate and, at a second higher temperature the thermal expansion of the manifold and/or housing causes the housing to come into contact with the covering plate, closing the opening. In a further embodiment, a flexible seal is provided between the housing and the covering plate.
摘要翻译：一种注射成型机，包括设置在歧管中的热流道，用于将熔体输送到模具中，用于可选地关闭或打开热流道的关闭针，连接到针的活塞，布置在具有开口，并且可以从两侧施加流体，以及具有两个流体进料的盖板进入开口，其中所述盖板，所述热流道歧管和所述壳体以这样的方式布置，使得在第一温度在第二较高温度下，歧管和/或壳体的热膨胀导致壳体与盖板接触，从而封闭开口。在另一个实施例中，在壳体和覆盖板之间提供柔性密封。

80. 发明申请

US20120013882A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 有权
标题翻译：照明系统，光刻设备和形成照明模式的方法
公开(公告)号：US20120013882A1
公开(公告)日：2012-01-19
申请号：US13203773
申请日：2010-02-25
申请人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
发明人： Erik Roelof Loopstra , Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Christian Wagner , Gosse Charles De Vries
IPC分类号： G03B27/54 , F21V17/02
CPC分类号： G03F7/70825 , G03F7/70075 , G03F7/70116
摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.
摘要翻译：光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。反射元件的第一方向和第二方向由端点限定。

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