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71. 发明授权

US07304718B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07304718B2
公开(公告)日：2007-12-04
申请号：US10919530
申请日：2004-08-17
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70383 , G03F7/70291
摘要： An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.
摘要翻译：一组可独立控制的元件，包括由多排反射器组成的多个控制区域。交替的反射体行以常见的方式启动，使得控制区域用作光栅，以提供可用作衍射光学元件的控制元件。

72. 发明授权

US06809797B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06809797B2
公开(公告)日：2004-10-26
申请号：US10109038
申请日：2002-03-29
申请人： Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Hugo Augustinus Joseph Cramer , Jozef Maria Finders , Carsten Kohler
发明人： Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Hugo Augustinus Joseph Cramer , Jozef Maria Finders , Carsten Kohler
IPC分类号： G02B2768
CPC分类号： G03F7/705 , G03F7/706
摘要： A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved.
摘要翻译：公开了一种装置制造方法，其中光泽投影装置的投影系统的像差取得Zernike扩展。基于Zernike像差和灵敏度系数计算投影图像的位移误差和焦平面失真的场分布，Zernike像差和灵敏度系数量化了Zernike像差分量与图像中的误差之间的关系。然后执行计算以确定应用于装置的补偿，以使图像中的误差最小化。然后将补偿应用于该装置。补偿可以包括增加装置的像差的一个分量，以便减小另一个像差的影响，从而平衡地改善了整体上的图像质量。

73. 发明申请

US20120257182A1 LITHOGRAPHIC METHOD AND ASSEMBLY 有权
标题翻译：光刻方法和装配
公开(公告)号：US20120257182A1
公开(公告)日：2012-10-11
申请号：US13438526
申请日：2012-04-03
申请人： Shaoxian Zhang , Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
发明人： Shaoxian Zhang , Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
IPC分类号： G03B27/68
CPC分类号： G03F7/706 , G03F7/70616 , G03F7/70625
摘要： A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
摘要翻译：确定图案特征的属性的灵敏度以改变用于提供该图案特征的光刻设备的光学像差的光刻方法。该方法包括控制光刻设备的配置以建立第一像差状态，当光刻设备处于第一像差状态时，利用该光刻设备形成图案特征的第一图像，测量图像的属性，控制配置的光刻设备，以建立第二，不同的像差状态，当光刻设备处于第二像差状态时，与该光刻设备形成相同图案特征的图像，测量图像的相同特性，并使用测量值确定图案特征的属性对像差状态变化的敏感度。

74. 发明授权

US08189172B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08189172B2
公开(公告)日：2012-05-29
申请号：US11763275
申请日：2007-06-14
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G01B9/02 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/706
摘要： Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the array of individually controllable elements to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor detects the projected radiation and measures interference in the radiation projected by the projection system. Aberration in the detected radiation beam is then measured.
摘要翻译：提供了用于测量光刻设备中的像差的系统和方法。使用单独可控元件的阵列来调制辐射束，并且使用投影系统投影调制束。在单独可控元件的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填充了辐射束的瞳孔投影系统传感器检测投射的辐射并测量由投影系统投射的辐射的干扰。然后测量检测到的辐射束中的畸变。

75. 发明授权

US07948606B2 Moving beam with respect to diffractive optics in order to reduce interference patterns 有权
$Moving beam with respect to diffractive optics in order to reduce interference patterns$
标题翻译：相对于衍射光学器件移动光束，以减少干涉图案
公开(公告)号：US07948606B2
公开(公告)日：2011-05-24
申请号：US11403194
申请日：2006-04-13
申请人： Huibert Visser , Johannes Jacobus Matheus Baselmans , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
发明人： Huibert Visser , Johannes Jacobus Matheus Baselmans , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
IPC分类号： G03B27/42
CPC分类号： G03F7/70058
摘要： A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at varying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.
摘要翻译：系统和方法用于从至少部分相干光束形成非相干光束，从而基本上消除了干涉或散斑图案。旋转光学元件引导部分相干光束从角分布变化元件反射以形成非相干光束。部分相干光束可以通过旋转光学元件的旋转以变化的角度或位置被引导到角度分布变化元件上。角度可以随着时间的变化而变化。

76. 发明授权

US07864295B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US07864295B2
公开(公告)日：2011-01-04
申请号：US12166837
申请日：2008-07-02
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
摘要翻译：使用装置和方法在基板上形成图案。该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为子光束阵列。图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，也可以使用过滤器。

77. 发明申请

US20100171939A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100171939A1
公开(公告)日：2010-07-08
申请号：US12639321
申请日：2009-12-16
申请人： Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
发明人： Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/705 , G03F7/70591 , G03F7/706 , G03F7/70891
摘要： In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.
摘要翻译：在光刻方法中，在加热（曝光）和冷却之前和之后测量投影系统的特性，以提供用于校准透镜加热模型的数据。该模型具有对冷却效果进行建模的部分，以及对加热对特性影响的部分建模。

78. 发明授权

US07330239B2 Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device 有权
标题翻译：使用造影装置的燃烧部分的平版印刷设备和装置制造方法
公开(公告)号：US07330239B2
公开(公告)日：2008-02-12
申请号：US11101627
申请日：2005-04-08
申请人： Johannes Jacobus Matheus Baselmans , Huibert Visser , Henri Johannes Petrus Vink
发明人： Johannes Jacobus Matheus Baselmans , Huibert Visser , Henri Johannes Petrus Vink
IPC分类号： G03B27/32 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/70308
摘要： A system and method utilize a lithographic apparatus comprising an illumination system, an array of individually controllable elements, and a projection system. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the beam. At least one group of elements in the array of individually controllable elements being tilted to at least a same tilt direction with a same tilt sign. For example, the tilting can form one or more blazing portions (e.g., blazing super-pixel portions) in the array of individually controllable elements. The projection system projects the modulated beam onto a target portion of a substrate. The projection system includes an aperture that filters out undesired diffraction orders of the modulated beam.
摘要翻译：一种系统和方法利用包括照明系统，独立可控元件阵列和投影系统的光刻设备。照明系统调节辐射束。独立可控元件的阵列调制光束。独立可控元件阵列中的至少一组元件以相同的倾斜标志倾斜至至少相同的倾斜方向。例如，倾斜可以在独立可控元件的阵列中形成一个或多个燃烧部分（例如，燃烧的超像素部分）。投影系统将调制束投影到基板的目标部分上。投影系统包括滤光器，其滤除调制光束的不期望的衍射级。

79. 发明申请

US20070291372A1 System and method to form unpolarized light 有权
标题翻译：系统和方法形成非偏振光
公开(公告)号：US20070291372A1
公开(公告)日：2007-12-20
申请号：US11452435
申请日：2006-06-14
申请人： Johannes Jacobus Matheus Baselmans , Huibert Visser
发明人： Johannes Jacobus Matheus Baselmans , Huibert Visser
IPC分类号： G02B27/14
CPC分类号： G02B27/123 , G03F7/70566
摘要： A system and method are used to form an unpolarized light beam from a polarized light beam. A system comprises a source of radiation and a unpolarizing system. The source of radiation produces a linear polarized beam. The unpolarizing system has first and second optical paths and splits the linear polarized beam. A first portion of the split beam travels along the first optical path having a first path length. A second portion of the split beam travels along the second optical path having a second, different path length. The first and second portions of the split beam are combined to form the unpolarized beam.
摘要翻译：使用系统和方法来形成来自偏振光束的非偏振光束。系统包括辐射源和非偏振系统。辐射源产生线偏振光束。非偏振系统具有第一和第二光路，并分裂线偏振光束。分割光束的第一部分沿着具有第一路径长度的第一光路行进。分束的第二部分沿着具有第二不同路径长度的第二光路传播。分束的第一和第二部分被组合以形成非偏振光束。

80. 发明授权

US07262831B2 Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus 有权
标题翻译：平版印刷设备和使用这种光刻投影设备的设备制造方法
公开(公告)号：US07262831B2
公开(公告)日：2007-08-28
申请号：US11000507
申请日：2004-12-01
申请人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
发明人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
IPC分类号： G03B27/52 , G03B27/42 , G03B27/68
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/706
摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
摘要翻译：光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和由测量系统提供的测量的投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。

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