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    • 65. 发明公开
    • Semiconductor light emitting device
    • Licht-emittierende Halbleitervorrichtung
    • EP0690516A1
    • 1996-01-03
    • EP95110281.3
    • 1995-06-30
    • SHARP KABUSHIKI KAISHA
    • Nakatsu, HiroshiNakamura, Jun-ichi
    • H01L33/00H01S3/19
    • H01L33/06B82Y20/00H01S5/34H01S5/3422H01S5/3425H01S5/34326H01S5/34333H01S5/347
    • On a first cladding layer formed of n-type Al 0.7 Ga 0.3 P, an active region having a staggered-type (type II) heterojunction superlattice structure is disposed. The active region includes 50 light emitting layers formed of Al 0.1 Ga 0.9 P doped with nitrogen and 50 barrier layers formed of Al 0.7 Ga 0.3 P. The 50 light emitting layers and the 50 barrier layers formed of such materials are stacked alternately to form 50 pairs. On the active region, a second cladding layer formed of Al 0.1 Ga 0.9 P is disposed. In the formation of the active layer, the composition of the light emitting layer and the barrier layer and the thickness of the barrier layer are controlled so that the isoelectronic level in the light emitting layer and the quantum level in the barrier layer will fulfill the resonance conditions. The carriers injected into the conduction band are confined in the quantum level in the barrier layer and transfer to the isoelectronic level in the light emitting layer by the resonance tunneling effect.
    • 在由n型Al 0.7 Ga 0.3 P形成的第一覆层上,设置具有交错型(II型)异质结超晶格结构的有源区。 有源区包括由掺杂有氮的Al 0.1 Ga 0.9 P形成的50个发光层和由Al0.7Ga0.3P形成的50个势垒层。 由这种材料形成的50个发光层和50个阻挡层交替堆叠形成50对。 在有源区上设置由Al 0.1 Ga 0.9 P形成的第二覆层。 在有源层的形成中,控制发光层和阻挡层的组成以及阻挡层的厚度,使得发光层中的等电子水平和阻挡层中的量子水平将实现谐振 条件。 注入导带的载流子被限制在阻挡层中的量子水平中,并通过共振隧穿效应转移到发光层中的等电子层。