会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 64. 发明授权
    • Chromatic aberration corrector and electron microscope
    • 色差校正器和电子显微镜
    • US08785880B2
    • 2014-07-22
    • US14102838
    • 2013-12-11
    • JEOL Ltd.
    • Hidetaka SawadaFumio Hosokawa
    • G21K1/08H01J3/14H01J3/26H01J49/42
    • H01J37/153H01J37/26H01J2237/12H01J2237/1405H01J2237/1534
    • The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic field. The first multipole element (110) first, second, and third portions (110a, 110b, 110c) arranged along an optical axis (OA) having a thickness and producing a quadrupole field in which an electric quadrupole field and a magnetic quadrupole field are superimposed. In the first and third portions (110a, 110c), the electric quadrupole field is set stronger than the magnetic quadrupole field. In the second portion (110b), the magnetic quadrupole field is set stronger than the electric quadrupole field. The second portion (110b) produces a two-fold astigmatism component that is opposite in sign to two-fold astigmatism components produced by the first portion (110a) and third portion (110c).
    • 色差校正器(100)具有用于产生第一电磁场的第一多极元件(110)和用于产生第二电磁场的第二多极元件(120)。 第一多极元件(110)沿着具有厚度并且产生四极场的光轴(OA)布置的第一,第二和第三部分(110a,110b,110c),其中电四极场和四极磁场被叠加 。 在第一和第三部分(110a,110c)中,电四极场被设置为比四极四极场强。 在第二部分(110b)中,将四极四极场设置得比电四极场强。 第二部分(110b)产生与由第一部分(110a)和第三部分(110c)产生的两折像散分量相反的双折射散光成分。
    • 65. 发明授权
    • Electron gun with magnetic immersion double condenser lenses
    • 电子枪与磁浸双重聚光镜
    • US08314401B2
    • 2012-11-20
    • US12896110
    • 2010-10-01
    • Xu ZhangZhong-Wei Chen
    • Xu ZhangZhong-Wei Chen
    • H01J1/50
    • H01J37/141H01J37/063H01J2237/065H01J2237/083H01J2237/1035H01J2237/1405
    • An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.
    • 电子枪包括电子发射器,围绕电子发射体的电极,引出电极和双重聚光透镜组件,双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合,如在电子束应用中所希望的那样,电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时,由于几何放大和其透镜作用的像差,预聚焦透镜有效地准直光束以增加其角度强度,同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的,则其峰值磁场足够远,因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。