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61. 发明授权

US07642034B2 Polymer, resist protective coating material, and patterning process 有权
标题翻译：聚合物，抗蚀剂保护涂层材料和图案化工艺
公开(公告)号：US07642034B2
公开(公告)日：2010-01-05
申请号：US11699485
申请日：2007-01-30
申请人： Jun Hatakeyama , Koji Hasegawa , Yuji Harada
发明人： Jun Hatakeyama , Koji Hasegawa , Yuji Harada
IPC分类号： G03F7/00 , G03F7/004 , C08F218/00
CPC分类号： G03F7/11 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041
摘要： A polymer comprising repeat units having formula (1) wherein R1 and R2 are hydrogen or C1-C12 alkyl, or R1 and R2 may bond together to form a ring, and R30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
摘要翻译：包含具有式（1）的重复单元的聚合物，其中R 1和R 2是氢或C 1 -C 12烷基，或者R 1和R 2可以键合在一起形成环，并且R 30是氢或甲基来配制抗蚀剂保护涂层材料。在抗蚀剂膜上形成的保护涂层是水不溶性的，可溶于碱性水溶液或碱性显影剂中，与抗蚀剂膜不混溶，使浸渍光刻可以以令人满意的方式进行。在碱显影过程中，可以同时实现抗蚀剂膜的开发和保护涂层的去除。

62. 发明申请

US20090280434A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20090280434A1
公开(公告)日：2009-11-12
申请号：US12463751
申请日：2009-05-11
申请人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

63. 发明申请

US20090197200A1 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US20090197200A1
公开(公告)日：2009-08-06
申请号：US12320183
申请日：2009-01-21
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/11 , G03F7/2041
摘要： The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid:
摘要翻译：本发明涉及一种抗蚀剂面漆组合物和采用这种材料的图案化方法，其抗蚀面漆组合物用于在光致抗蚀剂膜上形成顶涂层以保护光致抗蚀剂膜，在液体浸渍光刻中。本发明提供了一种用于在光致抗蚀剂膜上形成顶涂层的抗蚀剂面漆组合物，其中抗蚀剂面漆组合物至少包含：包含由以下通式（1）表示的重复单元的聚合物I; 和包含具有磺酸或磺酸胺盐的重复单元的聚合物II：

64. 发明授权

US07537880B2 Polymer, resist composition, and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07537880B2
公开(公告)日：2009-05-26
申请号：US11905763
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/30 , C08F24/00
CPC分类号： G03F7/0397 , C08F24/00 , C08F220/32 , G03F7/0046 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
摘要翻译：作为添加剂，作为抗蚀剂组合物，含有含有含氟酯的内酯单元的碱溶性聚合物。抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。抗蚀剂膜防止浸渍光刻时的水渗透。

65. 发明申请

US20090011365A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20090011365A1
公开(公告)日：2009-01-08
申请号：US12167151
申请日：2008-07-02
申请人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/20 , G03C1/00
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/11 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing α-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.
摘要翻译：对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，加入含有氨基的重复单元和含有α-三氟甲基羟基作为添加剂的重复单元的共聚物。该组合物适用于浸没光刻。

66. 发明申请

US20070298355A1 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US20070298355A1
公开(公告)日：2007-12-27
申请号：US11808543
申请日：2007-06-11
申请人： Yuji Harada , Jun Hatakeyama
发明人： Yuji Harada , Jun Hatakeyama
IPC分类号： G03C5/00 , C08F12/30 , C08G63/685 , C08G63/688 , C08G75/26
CPC分类号： G03F7/11 , C08F2/38 , C08F20/18 , C08F220/18 , C08F220/22 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108
摘要： There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film on a substrate; a step of forming a resist top coat on the photoresist film by using the resist top coat composition; a step of exposing the substrate; and a step of developing the substrate with a developer. There can be provided a resist top coat composition that makes it possible to provide more certainly rectangular and excellent resist patterns when a top coat is formed on a photoresist film; and a patterning process using such a composition.
摘要翻译：公开了一种抗蚀剂面漆组合物，其至少包含在聚合物末端具有氨基或磺酰胺基团并由以下通式（1）表示的聚合物; 以及图案化工艺，包括：至少在衬底上形成光致抗蚀剂膜的步骤; 通过使用抗蚀剂面漆组合物在光致抗蚀剂膜上形成抗蚀剂面涂层的步骤; 使基板曝光的工序; 以及用显影剂显影衬底的步骤。可以提供抗蚀剂面漆组合物，当在光致抗蚀剂膜上形成顶涂层时，可以提供更确定的矩形和优异的抗蚀剂图案; 以及使用这种组合物的图案化工艺。

67. 发明授权

US06579658B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06579658B2
公开(公告)日：2003-06-17
申请号：US09783446
申请日：2001-02-15
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： G03C1492
CPC分类号： C08F222/04 , G03F7/0045 , G03F7/0046 , G03F7/039 , Y10S430/108
摘要： Polymers comprising recurring units of fluorinated maleic anhydride and/or fluorinated maleimide are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
摘要翻译：包含氟化马来酸酐和/或氟化马来酰亚胺的重复单元的聚合物是新颖的。使用聚合物，获得了具有低的F2准分子激光吸收的抗蚀剂组合物。

68. 发明授权

US08361703B2 Resist protective coating composition and patterning process 有权
标题翻译：抗蚀保护涂料组合物和图案化工艺
公开(公告)号：US08361703B2
公开(公告)日：2013-01-29
申请号：US12628705
申请日：2009-12-01
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/11 , G03F7/20 , G03F7/30
CPC分类号： C09D127/12 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/30 , C08L33/16 , C09D125/18 , C09D133/16 , G03F7/0046 , G03F7/11 , G03F7/2041 , C08L2666/04 , C08F212/14 , C08F232/08 , C08F212/32
摘要： A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
摘要翻译：包含酰基保护的六氟醇结构的聚合物作为基础聚合物的保护性涂料组合物，任选地与含有重复单元的磺酸胺盐的第二聚合物的混合物施加到抗蚀剂膜上。保护涂层对波长高达200nm的辐射是透明的。

69. 发明授权

US08101335B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US08101335B2
公开(公告)日：2012-01-24
申请号：US12463751
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

70. 发明授权

US08088537B2 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US08088537B2
公开(公告)日：2012-01-03
申请号：US12320183
申请日：2009-01-21
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/26 , G03F7/11 , C08L33/02
CPC分类号： G03F7/11 , G03F7/2041
摘要： The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid:
摘要翻译：本发明涉及一种抗蚀剂面漆组合物和采用这种材料的图案化方法，其抗蚀面漆组合物用于在光致抗蚀剂膜上形成顶涂层以保护光致抗蚀剂膜，在液体浸渍光刻中。本发明提供了一种用于在光致抗蚀剂膜上形成顶涂层的抗蚀剂面漆组合物，其中抗蚀剂面漆组合物至少包含：包含由以下通式（1）表示的重复单元的聚合物I; 和包含具有磺酸或磺酸胺盐的重复单元的聚合物II：

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