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61. 发明授权

US07663860B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US07663860B2
公开(公告)日：2010-02-16
申请号：US11001298
申请日：2004-12-02
申请人： Shinya Nishimoto , Hiroyuki Nakayama , Hidetoshi Kimura
发明人： Shinya Nishimoto , Hiroyuki Nakayama , Hidetoshi Kimura
IPC分类号： H01T23/00
CPC分类号： H01L21/67109 , H01L21/6831
摘要： An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.
摘要翻译：用于通过使用静电力吸引和保持基板的静电卡盘包括与基板接触的多个突出部分。突出部由陶瓷电介质形成，该陶瓷电介质包括各自具有特定粒径的晶粒，并且突出部与基板的接触表面形成为具有取决于粒径的表面粗糙度。

62. 发明授权

US07604426B2 Paper cutting device and a printer with a paper cutting device 有权
标题翻译：切纸装置和带切纸装置的打印机
公开(公告)号：US07604426B2
公开(公告)日：2009-10-20
申请号：US11595323
申请日：2006-11-08
申请人： Yukihiro Hanaoka , Hiroyuki Nakayama
发明人： Yukihiro Hanaoka , Hiroyuki Nakayama
IPC分类号： B41J11/00
CPC分类号： B41J11/663 , B26D1/305 , B26D5/14 , B26D11/00 , B41J3/44 , Y10T83/8799 , Y10T83/8828
摘要： A paper cutting device for cutting sheet material from the lengthwise edges of the material toward the middle comprising a stationary blade and first and second movable blades with the sheet material placed between the stationary blade and the first and second movable blades. The paper cutting device enables the spacing between the stationary blade and the first and second movable blades to be opened by moving the stationary blade frame and the movable blade frame relative to each other. The first movable blade and second movable blade are supported on a first stud and second stud, respectively, near the distal ends of the edge of the blade part of the stationary blade so that the paths of the blade tips overlap when cutting the sheet material. The movable blade drive mechanism drives the first movable blade and second movable blade with the first movable blade leading and the second movable blade following.
摘要翻译：一种用于从材料的纵向边缘向中间切割片材的切纸装置，包括固定刀片和第一和第二可动刀片，其中片材被放置在固定刀片与第一和第二可动刀片之间。切纸装置通过相对于彼此移动固定刀片框架和可动刀片框架，能够使固定刀片与第一和第二可动刀片之间的间隔打开。第一可动刀片和第二可动刀片分别支撑在固定刀片的刀片部分的边缘的远端附近的第一螺柱和第二螺柱上，使得当切割片材时刀片尖端的路径重叠。可移动刀片驱动机构利用第一可动刀片引导件和第二可动刀片跟随来驱动第一可动刀片和第二可动刀片。

63. 发明申请

US20090242515A1 PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD 有权
标题翻译：等离子体处理装置和等离子体蚀刻方法
公开(公告)号：US20090242515A1
公开(公告)日：2009-10-01
申请号：US12411953
申请日：2009-03-26
申请人： Masanobu Honda , Kenji Masuzawa , Hiroyuki Nakayama , Manabu Iwata , Manabu Sato , Kazuki Narishige
发明人： Masanobu Honda , Kenji Masuzawa , Hiroyuki Nakayama , Manabu Iwata , Manabu Sato , Kazuki Narishige
IPC分类号： B44C1/22 , C23F1/02
CPC分类号： H01J37/32027 , H01J37/32091
摘要： A plasma processing apparatus includes an inner upper electrode provided to face a lower electrode mounting thereon a substrate, an outer upper electrode provided in a ring shape at a radially outside of the inner upper electrode and electrically isolated from the inner upper electrode in a vacuum evacuable processing chamber and a processing gas supply unit for supplying a processing gas into a processing space between the inner and the outer upper electrode and the lower electrode. A radio frequency (RF) power supply unit is also provide to apply a RF power to the lower electrode or the inner and the outer upper electrode to generate a plasma of the processing gas by RF discharge. A first and a second DC power supply unit are provided to apply a first and a second variable DC voltage to the inner upper electrode, respectively.
摘要翻译：一种等离子体处理装置，包括：内部上部电极，其设置在其上安装有基板的下部电极;外部上部电极，其在所述内部上部电极的径向外侧设置成环状，并且在真空抽真空中与所述内部上部电极电隔离处理室和处理气体供应单元，用于将处理气体供应到内外部上电极和下电极之间的处理空间中。射频（RF）电源单元还提供向下电极或内外电极施加RF功率以通过RF放电产生处理气体的等离子体。提供第一和第二直流电源单元，以分别向内部上部电极施加第一和第二可变直流电压。

64. 发明申请

US20090098268A1 LIQUID SEASONING 有权
标题翻译：液体季节
公开(公告)号：US20090098268A1
公开(公告)日：2009-04-16
申请号：US12093676
申请日：2006-11-14
申请人： Shin Koike , Koichi Okisaka , Jun Kohori , Yoko Seo , Noboru Shirahata , Hiroyuki Nakayama , Atsushi Suzuki , Ryuji Ochiai
发明人： Shin Koike , Koichi Okisaka , Jun Kohori , Yoko Seo , Noboru Shirahata , Hiroyuki Nakayama , Atsushi Suzuki , Ryuji Ochiai
IPC分类号： A23L1/22
CPC分类号： A23L17/00 , A23L27/40 , A23L27/50 , A23L27/60 , A23L33/105
摘要： The present invention is a liquid seasoning containing the following (A), (B), and (C): (A) 0.4 to 8% by mass of sodium (B) 0.01 to 4% by mass of flavonoid (C) 1 to 10% by mass of ethanol wherein, the flavonoid (B) satisfies the formula (1) and/or has one or more OH groups on the A-ring or B-ring in a molecule and no OH group at the position adjacent to the OH group (ortho position). Y/(X+Y)=0.05 to 1 formula (1) wherein, X and Y represent the following numbers, respectively: X; the number of OH group bonded to benzene rings in a molecule of the flavonoid, Y; the number of OCH3 group bonded to benzene rings in a molecule of the flavonoid.
摘要翻译：本发明是含有以下（A），（B）和（C）的液体调味料：（A）0.4〜8质量％的钠（B）0.01〜4质量％的类黄酮（C） 10质量％的乙醇，其中类黄酮（B）满足式（1）和/或在分子中在A环或B环上具有一个或多个OH基，并且在与 OH基（邻位）。 <？in-line-formula description =“In-line Formulas”end =“lead”？> Y /（X + Y）= 0.05〜1式（1）<？in-line-formula description =“In-line 公式“end =”tail“？>其中，X和Y分别表示以下数字：X; 在一类黄酮分子中与苯环键合的OH基数Y; 在类黄酮分子中与苯环键合的OCH 3基团的数目。

65. 发明授权

US07410315B2 Paper discharge mechanism for a printer, and a printer 失效
标题翻译：打印机和打印机的排纸机构
公开(公告)号：US07410315B2
公开(公告)日：2008-08-12
申请号：US11080686
申请日：2005-03-14
申请人： Hiroyuki Nakayama
发明人： Hiroyuki Nakayama
IPC分类号： B41J11/66 , B41J13/02 , B41J13/076 , B41J13/28 , B41J2/01
CPC分类号： B41J11/70 , B41J2/325 , B41J13/106 , B65H29/125 , B65H2404/722
摘要： A printer having a paper discharge mechanism which reliably prevents recording paper after completion of the printing operation from being pulled back inside the printer. The printer includes a paper feed roller 62 located on the upstream side of the printing position 83 along the horizontal paper transportation path of the printer. A paper cutting mechanism 67 is located downstream from the printing position. A pressure roller 66 presses the recording paper against a discharge roller 65 from the top side of the paper transportation path. A reversing-prevention lever 80 is disposed coaxially and freely rotatably to the pressure roller 66. The center of gravity of the reversing-prevention lever 80 is downstream from the axis of rotation 66e of the pressure roller 66, and the weight of the reversing-prevention lever 80 causes the reversing-prevention lever 80 to contact the top of the discharged paper 10. If the trailing end of the cut and discharged paper 100, which rests on top of the leading end of the roll paper 10, moves with the leading end of the roll paper 10 when the roll paper 10 is pulled back inside the printer after cutting, the trailing end of the discharged paper 100 contacts the reversing-prevention lever 80 and is thus prevented from being pulled back inside the printer.
摘要翻译：具有排纸机构的打印机，其可靠地防止在完成打印操作之后的记录纸被拉回打印机内部。打印机包括位于打印位置83的沿着打印机的水平纸输送路径的上游侧的供纸辊62。切纸机构67位于打印位置的下游。压力辊66从纸张输送路径的上侧将记录纸压靠在排出辊65上。反转防止杆80同轴且可自由转动地设置在加压辊66上。反转防止杆80的重心位于加压辊66的旋转轴线66e的下游，防倒转杆80的重量使反转防止杆80接触排出的顶部纸10。如果在切割后将卷纸10在打印机内拉回卷筒纸10的前端时，搁置在卷纸10的前端顶部的切出排出纸100的后端移动，排出纸100的尾端与防倒转杆80接触，从而防止在打印机内被拉回。

66. 发明授权

US07282112B2 Method and apparatus for an improved baffle plate in a plasma processing system 有权
标题翻译：等离子体处理系统中改进挡板的方法和装置
公开(公告)号：US07282112B2
公开(公告)日：2007-10-16
申请号：US11010373
申请日：2004-12-14
申请人： Shinya Nishimoto , Kouji Mitsuhashi , Hiroyuki Nakayama
发明人： Shinya Nishimoto , Kouji Mitsuhashi , Hiroyuki Nakayama
IPC分类号： C23C16/455 , C23C16/00 , H01L21/306 , C23F1/00
CPC分类号： H01J37/32633 , H01J37/32623 , H01J37/32834
摘要： The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
摘要翻译：本发明提出了一种用于等离子体处理系统的改进的挡板，其中挡板的设计和制造有利地在过程空间中提供均匀的处理等离子体，同时对挡板具有基本上最小的侵蚀。

67. 发明授权

US07166200B2 Method and apparatus for an improved upper electrode plate in a plasma processing system 有权
标题翻译：等离子体处理系统中改进的上电极板的方法和装置
公开(公告)号：US07166200B2
公开(公告)日：2007-01-23
申请号：US10259757
申请日：2002-09-30
申请人： Hidehito Saigusa , Taira Takase , Kouji Mitsuhashi , Hiroyuki Nakayama
发明人： Hidehito Saigusa , Taira Takase , Kouji Mitsuhashi , Hiroyuki Nakayama
IPC分类号： C23C14/00
CPC分类号： H01J37/32009 , H01J37/3244 , H01J37/3255
摘要： The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
摘要翻译：本发明提出了一种用于等离子体处理系统的改进的上电极，其中耦合到上部组件的电极板的设计和制造有利地提供了对电极板的基本上最小的侵蚀的工艺气体的气体注入。

68. 发明授权

US07147749B2 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 有权
公开(公告)号：US07147749B2
公开(公告)日：2006-12-12
申请号：US10259858
申请日：2002-09-30
申请人： Shinya Nishimoto , Kouji Mitsuhashi , Hiroyuki Nakayama
发明人： Shinya Nishimoto , Kouji Mitsuhashi , Hiroyuki Nakayama
IPC分类号： C23C16/00 , H01L21/00
CPC分类号： H01J37/32009 , C23C16/4404 , H01J37/3244 , H01J37/32532 , Y10S156/916
摘要： The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

69. 发明授权

US07137353B2 Method and apparatus for an improved deposition shield in a plasma processing system 有权
标题翻译：用于等离子体处理系统中改进的沉积屏蔽的方法和装置
公开(公告)号：US07137353B2
公开(公告)日：2006-11-21
申请号：US10259353
申请日：2002-09-30
申请人： Hidehito Saigusa , Taira Takase , Kouji Mitsuhashi , Hiroyuki Nakayama
发明人： Hidehito Saigusa , Taira Takase , Kouji Mitsuhashi , Hiroyuki Nakayama
IPC分类号： C23C16/00
CPC分类号： H01J37/32477 , Y10S156/916
摘要： The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
摘要翻译：本发明提出了一种用于围绕等离子体处理系统中的处理空间的改进的沉积屏蔽，其中沉积屏蔽的设计和制造有利地在处理空间中提供清洁的处理等离子体，同时具有基本上最小的沉积屏蔽侵蚀。

70. 发明申请

US20060239886A1 Silica aerogel coating and its production method 有权
标题翻译：二氧化硅气凝胶涂料及其制备方法
公开(公告)号：US20060239886A1
公开(公告)日：2006-10-26
申请号：US11407907
申请日：2006-04-21
申请人： Hiroyuki Nakayama , Kazuhiro Yamada , Yasuhiro Sakai , Maki Yamada
发明人： Hiroyuki Nakayama , Kazuhiro Yamada , Yasuhiro Sakai , Maki Yamada
IPC分类号： C01B33/12
CPC分类号： B01J19/123 , C01B33/1585
摘要： A method for producing a silica aerogel coating comprising the steps of organically modifying a wet gel formed by the hydrolysis and polymerization of an alkoxysilane having an ultraviolet-polymerizable unsaturated group, and subjecting a layer of the resultant organically modified silica to ultraviolet irradiation and baking.
摘要翻译：一种二氧化硅气凝胶涂层的制造方法，其特征在于，对通过具有紫外线聚合性不饱和基团的烷氧基硅烷的水解和聚合形成的湿凝胶进行有机改性，并对所得有机改性二氧化硅层进行紫外线照射和烘烤。

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