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61. 发明申请

US20100110458A1 DEVICE FOR SETTING COLOR PRINT LIMIT MODE ACCORDING TO PREFERENCE SET ON PER-PAGE BASIS 有权
标题翻译：用于根据每页基础设置偏好设置的颜色打印限制模式的设备
公开(公告)号：US20100110458A1
公开(公告)日：2010-05-06
申请号：US12604938
申请日：2009-10-23
申请人： Takashi Sugiyama
发明人： Takashi Sugiyama
IPC分类号： H04N1/60
CPC分类号： H04N1/40012
摘要： An image processing system includes a preference designating unit and a printer. The preference designating unit is configured to designate one or more preferential print pages from pages included in a print job so as to be color printed preferentially to non-designated pages included in the print job. The printer performs color printing of the one or more preferential print pages.
摘要翻译：图像处理系统包括偏好指定单元和打印机。偏好设计单元被配置为从包括在打印作业中的页面指定一个或多个优先打印页面，以便优先地打印到包括在打印作业中的非指定页面。打印机执行一个或多个优先打印页面的彩色打印。

62. 发明授权

US07667814B2 Monochromatic liquid crystal display with high contrast 有权
标题翻译：单色液晶显示屏具有高对比度
公开(公告)号：US07667814B2
公开(公告)日：2010-02-23
申请号：US12127202
申请日：2008-05-27
申请人： Takashi Sugiyama
发明人： Takashi Sugiyama
IPC分类号： C09K19/02
CPC分类号： G02F1/1397 , G02F1/133784 , G02F1/134327 , G02F1/134336 , G02F2203/01 , G02F2203/64
摘要： An STN liquid crystal display cell includes a liquid crystal layer sandwiched between a first and second transparent substrate, is outwardly provided with a first and second polarizers, and a monochromatic back light. Twist angle of the liquid crystal layer is 95° to 170° or 200° to 280°; a first angle between alignment direction of liquid crystal molecules contacting the first transparent substrate and polarization direction of the first polarizer and a second angle between an alignment direction of liquid crystal molecules contacting the second transparent substrate and polarization direction of the second polarizer are each larger than 0° and smaller than 90°; and sum of the first and second angles is 90°±7°.
摘要翻译： STN液晶显示单元包括夹在第一和第二透明基板之间的液晶层，向外设置有第一和第二偏振器以及单色背光。液晶层的扭转角为95°〜170°或200°〜280°; 与第一透明基板接触的液晶分子的取向方向与第一偏振片的偏振方向之间的第一角度与与第二透明基板接触的液晶分子的取向方向与第二偏光片的偏振方向之间的第二角度分别大于 0°且小于90°; 第一和第二角度之和为90°±7°。

63. 发明申请

US20090225257A1 LIQUID CRYSTAL DISPLAY APPARATUS 有权
标题翻译：液晶显示装置
公开(公告)号：US20090225257A1
公开(公告)日：2009-09-10
申请号：US12398032
申请日：2009-03-04
申请人： Takashi Sugiyama , Masatoshi Horii
发明人： Takashi Sugiyama , Masatoshi Horii
IPC分类号： G02F1/1335
CPC分类号： G02F1/133707 , G02F1/13439 , G02F1/1393 , G02F2001/133742
摘要： A liquid crystal display apparatus includes: a vertical alignment type liquid crystal cell including a first substrate formed with a first electrode, a second substrate formed with a second electrode, and a liquid crystal layer containing liquid crystal molecules given a pretilt angle; a pair of polarizer plates sandwiching the cell; and a driver device for applying a voltage of a multiplex driving waveform across the first and second electrodes, wherein in a display in-plane parallel to a surface of the first or second substrate, at least one of the first and second electrodes has a zigzag border alternately coupling a first border perpendicular to display in-plane components of directors of liquid crystal molecules in a middle area along a thickness direction of the liquid crystal layer in the absence of applied voltage and a second border extending along a direction crossing the first boarder.
摘要翻译：液晶显示装置包括：垂直取向型液晶单元，包括形成有第一电极的第一基板，形成有第二电极的第二基板和包含预倾角的液晶分子的液晶层; 一对夹着电池的偏光板; 以及驱动器装置，用于跨越第一和第二电极施加多路复用驱动波形的电压，其中在平面于第一或第二基板的表面的平面内的显示器中，第一和第二电极中的至少一个具有之字形在不存在施加电压的情况下沿着液晶层的厚度方向交替地耦合垂直于第一边界的液晶分子的导向器的平面内部分的中间区域，以及沿着与第一边界线交叉的方向延伸的第二边界。

64. 发明申请

US20090086132A1 LIQUID CRYSTAL DISPLAY UNIT 有权
标题翻译：液晶显示单元
公开(公告)号：US20090086132A1
公开(公告)日：2009-04-02
申请号：US12237997
申请日：2008-09-25
申请人： Masatoshi Horii , Takashi Sugiyama , Yoshihisa Iwamoto , Keiichi Hirata
发明人： Masatoshi Horii , Takashi Sugiyama , Yoshihisa Iwamoto , Keiichi Hirata
IPC分类号： G02F1/1343 , G02F1/1335
CPC分类号： G02F1/1393 , G02F1/133707 , G02F1/134336
摘要： A liquid crystal display unit has: a pair of opposing substrates; an electrode pattern formed on each of the substrates on an opposing surface side; a vertical alignment film formed on each of the substrates and covering the electrode pattern; a liquid crystal layer squeezed between the substrates; and a pair of polarizer plates formed on the substrates on an opposite side to the side of said liquid crystal layer, wherein an edge of the electrode pattern includes a zigzag pattern parallel to one of axis directions of the polarizer plates and a direction perpendicular the axis direction. Optical through can be reduced along an edge portion of a pixel of a vertical alignment LCD.
摘要翻译：液晶显示单元具有：一对相对的基板; 形成在相对表面侧上的每个基板上的电极图案; 形成在每个基板上并覆盖电极图案的垂直取向膜; 在基板之间挤压的液晶层; 以及一对偏振片，其形成在与所述液晶层相反的一侧上的基板上，其中所述电极图案的边缘包括平行于所述偏振片的轴向之一的锯齿形图案和垂直于所述轴线的方向方向。可以沿着垂直对准LCD的像素的边缘部分减小光通量。

65. 发明申请

US20090011341A1 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
标题翻译：反射掩蔽空白用于EUV LITHOGRAPHY
公开(公告)号：US20090011341A1
公开(公告)日：2009-01-08
申请号：US12205967
申请日：2008-09-08
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/22
摘要： To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness.A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the absorber layer, the B content is at least 1 at % and less than 5 at %, the Si content is from 1 to 25 at %, and the compositional ratio of Ta to N (Ta:N) is from 8:1 to 1:1.
摘要翻译：为了提供具有吸收层的EUV光刻用的反射掩模板，其对EUV光和图案检查光的波长范围内的光呈现低反射率，并且易于控制以具有所需的膜组成和膜厚度。一种用于EUV光刻的反射掩模板，包括基板和用于反射EUV光的反射层和用于吸收在基板上依次形成的EUV光的吸收层，其中吸收层包含钽（Ta），硼（B），硅（Si）和氮（N），并且在吸收层中，B含量为至少1原子％且小于5原子％，Si含量为1至25原子％，Ta的组成比至N（Ta：N）为8:1至1:1。

66. 发明申请

US20080182183A1 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
标题翻译：反射掩蔽空白用于EUV LITHOGRAPHY
公开(公告)号：US20080182183A1
公开(公告)日：2008-07-31
申请号：US12028250
申请日：2008-02-08
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
IPC分类号： G03F1/00 , G03F7/26
CPC分类号： G03F1/24 , G03F1/46 , G03F1/58
摘要： To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness.A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %, and wherein the absorber layer has a content of N being 0 to at most 35 at. %.
摘要翻译：为了提供EUV光刻用的反射掩模板，其具有在EUV光或光的波长区域具有低反射率的吸收层，用于检查图案，并且易于控制以具有期望的层组成和厚度。用于EUV光刻的反射掩模板，其包括基板，以及反射层，用于反射EUV光和吸收层，以吸收在基板上依次形成的EUV光，其中吸收层包含钽（Ta）和铪（ Hf），并且在吸收层中，Hf的含量为20〜60at。％，Ta的含量为40〜80。％，并且其中所述吸收层的N含量为0至至多35at。％。

67. 发明申请

US20070293758A1 Ultrasonograph 有权
公开(公告)号：US20070293758A1
公开(公告)日：2007-12-20
申请号：US11882895
申请日：2007-08-07
申请人： Shin-ichiro Umemura , Yuichi Miwa , Takashi Azuma , Takashi Sugiyama , Hiroshi Kuribara
发明人： Shin-ichiro Umemura , Yuichi Miwa , Takashi Azuma , Takashi Sugiyama , Hiroshi Kuribara
IPC分类号： A61B8/00
CPC分类号： G01S7/52047 , A61B8/481 , G01S7/5202 , G01S7/52026 , G01S7/52038 , G01S15/8963 , G10K11/346
摘要： To provide an ultrasonograph capable of generating a transmission beam comprising a main beam having a uniform width over a wide range in an ultrasonic wave propagation direction by one-time transmission of an ultrasonic pulse. A weighted mean value of a plurality of transmission delay time values corresponding to focal lengths of transmission pulse waves having a plurality of focal points which are set in the ultrasonic wave propagation direction is calculated for each of elements constituting a transmission aperture and used as the delay time. Waves are actually transmitted with the weighted mean value as delay time. As the weight used for obtaining the delay time mean value, first, a transmission effective aperture width according to each transmission focal length is selected, and a weight in the direction of the transmit aperture realizing the width is calculated and is used in a focal length direction. As a result, the curvature of a wave front of a wave transmitted is close to that of the wave front of a short focal length in the center portion of the transmit aperture, and is close to that of the wave front of a long focal length in the peripheral portion. Consequently, a non-cylindrical wave front is formed. Thus, a transmission beam including a relatively narrow main beam with a uniform width over a wide range in the ultrasonic wave propagation direction can be generated by one-time transmission of an ultrasonic pulse.

68. 发明申请

US20070160874A1 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH A CONDUCTIVE FILM FOR THE MASK BLANK 有权
标题翻译：用于EUV光刻的反射掩模层和带有导电膜的掩模
公开(公告)号：US20070160874A1
公开(公告)日：2007-07-12
申请号：US11566883
申请日：2006-12-05
申请人： Kazuyuki Hayashi , Takashi Sugiyama , Masaki Mikami
发明人： Kazuyuki Hayashi , Takashi Sugiyama , Masaki Mikami
IPC分类号： B32B9/04
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/38 , G21K2201/067 , Y10T428/31616
摘要： To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film. A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.
摘要翻译：为了提供具有增加表面硬度的EUV掩模坯料用导电膜的基板，以及使用这种具有导电膜的基板的具有反射多层膜的基板和EUV掩模坯料。一种具有用于生产用于EUV光刻的反射掩模板的导电膜的基板，其特征在于，导电膜的主要材料是选自Cr，Ti，Zr，Nb，Ni中的至少一种和V，导电膜含有平均浓度为1-70原子％的B（硼）。

69. 发明申请

US20050217410A1 Gas pedal 有权
标题翻译：油门踏板
公开(公告)号：US20050217410A1
公开(公告)日：2005-10-06
申请号：US10509325
申请日：2003-08-27
申请人： Tomohiro Sakuraba , Hideto Nebuya , Takashi Sugiyama , Shigeki Nomura , Koji Terasaki , Teruo Kato , Toshimi Kitamura , Tomoaki Abe
发明人： Tomohiro Sakuraba , Hideto Nebuya , Takashi Sugiyama , Shigeki Nomura , Koji Terasaki , Teruo Kato , Toshimi Kitamura , Tomoaki Abe
IPC分类号： B60K26/02 , F02D11/02 , G05G1/00 , G05G1/30 , G05G1/50 , G05G1/14
CPC分类号： G05G1/506 , B60K26/02 , G05G1/30 , G05G1/44 , Y10T74/20534
摘要： An accelerator pedal (100) includes a stopper member (30) fixed to the floor of the driver's seat, a pad member (20) fastened to the stopper member (30) and operated by the driver's depression force, an arm (4) engaged with the pad member (20) to transmit the depression force, and a bracket (5) engaged with the arm (4) to support the arm (4), wherein the stopper member (30) is provided with a pad fitting section (17) for fastening the pad member (20), and the pad member (20) is integrally molded by a single resin material.
摘要翻译：一个加速踏板（100）包括一个固定在驾驶员座椅地板上的止动件（30），一个紧固在止动件（30）上并由驾驶员的踏力操作的垫片（20）与所述垫构件（20）传递所述按压力，以及与所述臂（4）接合以支撑所述臂（4）的支架（5），其中所述止动构件（30）设置有垫配合部（17）），并且衬垫构件（20）由单个树脂材料一体地模制。

70. 发明授权

US06568295B2 Transmission control apparatus for an automobile 失效
标题翻译：用于汽车的变速器控制装置
公开(公告)号：US06568295B2
公开(公告)日：2003-05-27
申请号：US09908281
申请日：2001-07-18
申请人： Takanori Matsuno , Shigeaki Oda , Shigeki Nomura , Takashi Sugiyama , Yoshinori Furusawa , Hiroshi Hanjono
发明人： Takanori Matsuno , Shigeaki Oda , Shigeki Nomura , Takashi Sugiyama , Yoshinori Furusawa , Hiroshi Hanjono
IPC分类号： B60K2000
CPC分类号： F16H59/0208 , B60K20/08 , F16H59/10 , F16H2059/0291 , Y10T74/2014 , Y10T74/20177
摘要： A transmission control apparatus for an automobile to be arranged on or near an instrument panel of a vehicle comprising: a bracket for supporting a control lever unit for speed-change operation; a plate secured to the bracket; a shaft passed through both the bracket and the plate for rotatably supporting the control lever unit therearound; a first shock absorbing portion adapted to be broken when a shock load exceeding a predetermined value is applied to the control lever unit in order to absorb the shock load and to release the support of the shaft from the bracket or the plate; and a second shock absorbing portion adapted to be deformed by the shaft released from the bracket and displaced together with the control lever unit over a predetermined stroke in order to continuously absorb the shock load.
摘要翻译：一种用于汽车的变速器控制装置，其布置在车辆的仪表板上或附近，包括：支架，用于支撑用于变速操作的控制杆单元; 固定在支架上的板; 轴穿过支架和板，用于围绕其可旋转地支撑控制杆单元; 当超过预定值的冲击载荷被施加到控制杆单元以便吸收冲击载荷并从支架或板释放轴的支撑件时，适于被破坏的第一减震部分; 以及第二减震部，其适于由从所述支架释放的所述轴变形，并与所述控制杆单元一起在预定行程上移动，以便连续地吸收所述冲击载荷。

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