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61. 发明授权

US06261741B1 Photosensitive heat-resistant resin composition, method of patterning insulating film made of the same, and patterned insulating film obtained thereby 有权
标题翻译：感光耐热树脂组合物，由其制造绝缘膜的方法，以及由此获得的图案化绝缘膜
公开(公告)号：US06261741B1
公开(公告)日：2001-07-17
申请号：US09199329
申请日：1998-11-25
申请人： Motoaki Tani , Nobuyuki Hayashi , Hiroyuki Machida
发明人： Motoaki Tani , Nobuyuki Hayashi , Hiroyuki Machida
IPC分类号： G03F7027
CPC分类号： G03F7/037 , H05K3/0023 , H05K3/287 , H05K3/4602 , Y10S430/107
摘要： A photosensitive heat-resistant resin composition contains a polyamideimide resin, an organic solvent for dissolving the polyamideimide, an acrylic monomer or oligomer having at least two polymerizable double bonds, and a photoreaction initiator for initiating polymerization of the acrylic monomer or oligomer by photochemical reaction. The resin composition may be used to make a heat-resistant insulating film which may be patterned by selective irradiation of ultraviolet rays. The insulating film may be interposed between different conductor layers in a build-up multilayer circuit board.
摘要翻译：感光耐热性树脂组合物含有聚酰胺酰亚胺树脂，用于溶解聚酰胺酰亚胺的有机溶剂，具有至少两个可聚合双键的丙烯酸单体或低聚物，以及通过光化学反应引发丙烯酸单体或低聚物的聚合的光反应引发剂。树脂组合物可以用于制造可以通过选择性照射紫外线来图案化的耐热绝缘膜。绝缘膜可以插入在积层多层电路板中的不同导体层之间。

62. 发明授权

US06236356B1 Position measuring system, position measuring unit, and position measuring method 失效
标题翻译：位置测量系统，位置测量单元和位置测量方法
公开(公告)号：US06236356B1
公开(公告)日：2001-05-22
申请号：US09283085
申请日：1999-03-31
申请人： Nobuyuki Hayashi
发明人： Nobuyuki Hayashi
IPC分类号： G01S502
CPC分类号： G01S19/51 , G01C21/20 , G01S5/0072 , G01S19/14
摘要： In a first position measuring unit, a selecting portion selects radio waves containing available position measured information from a plurality of satellites through an antenna. A communicating portion communicates with a second position measuring unit. The first and second position measuring units select radio waves that can be shared therewith. The first and second position measuring units measure their positions using the same set of the selected radio waves. Measured results of the second position measuring unit are transmitted to the first position measuring unit. A calculating portion of the first position measuring unit calculates a relative distance between the first and second position measuring units corresponding to the difference between the measured results of the first and second position measuring units.
摘要翻译：在第一位置测量单元中，选择部分通过天线从多个卫星中选择包含可用位置测量信息的无线电波。连通部与第二位置测量单元连通。第一和第二位置测量单元选择可与其共享的无线电波。第一和第二位置测量单元使用相同的一组所选择的无线电波来测量它们的位置。第二位置测量单元的测量结果被传送到第一位置测量单元。第一位置测量单元的计算部分计算与第一和第二位置测量单元的测量结果之间的差值相对应的第一和第二位置测量单元之间的相对距离。

63. 发明授权

US6154807A Memory system performing fast access to a memory location by omitting the transfer of a redundant address 有权
标题翻译：存储器系统通过省略冗余地址的传输来执行对存储器位置的快速访问
公开(公告)号：US6154807A
公开(公告)日：2000-11-28
申请号：US188902
申请日：1998-11-10
申请人： Osamu Nishii , Nobuyuki Hayashi , Noriharu Hiratsuka , Tetsuhiko Okada , Hiroshi Takeda
发明人： Osamu Nishii , Nobuyuki Hayashi , Noriharu Hiratsuka , Tetsuhiko Okada , Hiroshi Takeda
IPC分类号： G06F12/00 , G06F12/02
CPC分类号： G06F12/0215 , G06F13/1631
摘要： A data processing system including a processor LSI and a DRAM divided into banks, for increasing a ratio of using a fast operation mode for omitting transfer of a row address to the DRAM and for minimizing the amount of logics external to the processor LSI. The processor LSI includes row address registers for holding recent row addresses corresponding to the banks. The contents of the row address registers are compared with an accessed address by a comparator to check for each bank whether the fast operation mode is possible. As long as the row address does not change in each bank, the fast operation mode can be used, thus making it possible to speed up operations, for example in block copy processing.
摘要翻译：一种数据处理系统，包括处理器LSI和划分为存储体的DRAM，用于增加使用快速操作模式以省略将行地址传送到DRAM的比例，以及最小化处理器LSI外部的逻辑量。处理器LSI包括行地址寄存器，用于保存对应于存储体的最近行地址。通过比较器将行地址寄存器的内容与访问地址进行比较，以检查每个存储区是否可以进行快速操作模式。只要每个行中的行地址不变化，可以使用快速操作模式，从而可以加快操作，例如在块复制处理中。

64. 发明授权

US5484685A Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof 失效
标题翻译：萘酞菁衍生物，其制备，使用其的光记录介质及其制造
公开(公告)号：US5484685A
公开(公告)日：1996-01-16
申请号：US708839
申请日：1991-05-30
申请人： Seiji Tai , Nobuyuki Hayashi , Koichi Kamijima , Mitsuo Katayose , Takayuki Akimoto , Shigeru Hayashida , Hideo Hagiwara , Susumu Era , Setsuo Kobayashi , Akio Mukoh
发明人： Seiji Tai , Nobuyuki Hayashi , Koichi Kamijima , Mitsuo Katayose , Takayuki Akimoto , Shigeru Hayashida , Hideo Hagiwara , Susumu Era , Setsuo Kobayashi , Akio Mukoh
IPC分类号： B41M5/26 , C07D487/22 , C09B47/04 , G11B7/24 , G11B7/244 , G11B7/248 , G03C1/72 , C09B47/00
CPC分类号： C09B47/04 , C09B47/045 , G11B7/248 , Y10S430/146
摘要： A naphthalocyanine derivative of the formula: ##STR1## wherein M, Y, R.sup.1, k, l, m, n are as defined in the specification, is an effective substance for forming a recording layer on a substrate of an optical recording medium having high sensitivity with good properties.
摘要翻译：具有下式的萘菁菁衍生物：其中M，Y，R 1，k，l，m，n如说明书中所定义的是用于在光学记录基材上形成记录层的有效物质介质具有高灵敏度和良好的性能。

65. 发明授权

US5378589A Derivative of naphthalocyanine containing perfluoroalkyl group, process for preparing the same and optical recording medium 失效
标题翻译：含有全氟烷基的萘酞菁的衍生物，其制备方法和光学记录介质
公开(公告)号：US5378589A
公开(公告)日：1995-01-03
申请号：US87517
申请日：1993-07-02
申请人： Hideo Sawada , Motohiro Mitani , Masaharu Nakayama , Yoshii Morishita , Mitsuo Katayose , Tadashi Okamoto , Nobuyuki Hayashi
发明人： Hideo Sawada , Motohiro Mitani , Masaharu Nakayama , Yoshii Morishita , Mitsuo Katayose , Tadashi Okamoto , Nobuyuki Hayashi
IPC分类号： C07D487/22 , C07F7/08 , C09B47/08 , C09B47/14 , G11B7/248 , G11B7/24 , C09B47/00
CPC分类号： C07D487/22 , C07F7/0858 , C09B47/085 , C09B47/14 , G11B7/248 , Y10S430/146
摘要： A derivative of naphthalocyanine containing a perfluoroalkyl group and having a particular structure for ensuring excellent weather-proof properties, extremely high solubility in various solvents and capability of forming a film, and an optical recording medium prepared by using the derivative and capable of recording while using a focused beam of a semiconductor laser or the like. The derivative of naphthalocyanine containing a perfluoroalkyl group may be prepared by reacting a perfluoroalkanoyl peroxide having a particular structure with a naphthalocyanine.
摘要翻译：含有全氟烷基的萘酞菁衍生物，具有特殊的结构，用于确保优异的耐候性，在各种溶剂中的溶解度极高，形成膜的能力以及使用该衍生物并能够在使用时记录的光记录介质半导体激光器等的聚焦光束。含有全氟烷基的萘酞菁的衍生物可以通过使具有特定结构的全氟烷酰基过氧化物与萘酞菁反应来制备。

66. 发明授权

US5028513A Process for producing printed circuit board 失效
标题翻译：印刷电路板生产工艺
公开(公告)号：US5028513A
公开(公告)日：1991-07-02
申请号：US336771
申请日：1989-04-13
申请人： Kanji Murakami , Mineo Kawamoto , Akio Tadokoro , Haruo Akahoshi , Toshikazu Narahara , Ritsuji Toba , Toshiaki Ishimaru , Nobuyuki Hayashi , Motoyo Wajima
发明人： Kanji Murakami , Mineo Kawamoto , Akio Tadokoro , Haruo Akahoshi , Toshikazu Narahara , Ritsuji Toba , Toshiaki Ishimaru , Nobuyuki Hayashi , Motoyo Wajima
IPC分类号： C23C18/40 , H05K3/00 , H05K3/06 , H05K3/10 , H05K3/18 , H05K3/24 , H05K3/28 , H05K3/38
CPC分类号： H05K3/282 , H05K3/108 , H05K2201/0355 , H05K2203/0591 , H05K2203/072 , H05K2203/1105 , H05K2203/124 , H05K3/0076 , H05K3/062 , H05K3/383
摘要： The present invention provide a process for producing printed circuit boards which comprises the steps of(a) roughening a surface of a copper layer formed on an insulating board.(b) coating the roughened surface of copper layer with a photo-resist layer containing a sublimable copper-corrosion inhibitor, exposing the resist layer selectively to actinic rays according to a circuit pattern to form, and developing the resulting resist layer, thereby forming plating-resist coats on circuit-negative pattern portions of the copper layer,(c) heat-treating the plating-resist coats,(d) plating chemically the circuit-corresponding portion with copper,(e) removing the plating-resist coats, and(f) removing the copper layer except the circuit-corresponding portion thereof.

67. 发明授权

US4987057A Photoinitiator and photopolymerizable composition using the same 失效
标题翻译：光引发剂和使用其的可光聚合组合物
公开(公告)号：US4987057A
公开(公告)日：1991-01-22
申请号：US355123
申请日：1989-05-22
申请人： Makoto Kaji , Nobuyuki Hayashi
发明人： Makoto Kaji , Nobuyuki Hayashi
IPC分类号： C08F2/50 , G03F7/028 , G03F7/031
CPC分类号： G03F7/031 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/125
摘要： A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.

68. 发明授权

US4842970A Electrophotographic plate containing a naphthalocyanine compound 失效
标题翻译：含有萘酞菁化合物的电子照相板
公开(公告)号：US4842970A
公开(公告)日：1989-06-27
申请号：US184027
申请日：1988-04-20
申请人： Seiji Tai , Shigeru Hayashida , Nobuyuki Hayashi
发明人： Seiji Tai , Shigeru Hayashida , Nobuyuki Hayashi
IPC分类号： C07D487/22 , C09B47/00 , G03G5/06
CPC分类号： G03G5/0696
摘要： There is disclosed an electrophotographic plate comprising an electroconductive supporting substrate and a photoconductive layer formed thereon, wherein the photoconductive layer contains an organic photoconductive material as a charge generation material, said organic photoconductive material being a naphthalocyanine compound represented by the formula ##STR1## or the general formula ##STR2## wherein M denotes one member selected from the group consisting of Cu, Zn, Mg, OTi, OV, ClAl ClGa, ClIn, Cl.sub.2 Si, Cl.sub.2 Ge, and Cl.sub.2 Sn.

69. 发明授权

US4833264A 5- or 6-alkoxycarbonyl-2,3-dicyanonaphthalenes 失效
标题翻译： 5-或6-烷氧基羰基-2,3-二氰基萘
公开(公告)号：US4833264A
公开(公告)日：1989-05-23
申请号：US172290
申请日：1988-03-23
申请人： Seiji Tai , Shigeru Hayashida , Nobuyuki Hayashi
发明人： Seiji Tai , Shigeru Hayashida , Nobuyuki Hayashi
IPC分类号： G03G5/06 , C07C67/00 , C07C69/80 , C07C253/00 , C07C253/30 , C07C255/52 , C07C255/57 , C09B47/00 , C09B47/24
CPC分类号： C07C255/00
摘要： A 5- or 6-alkoxycarbonyl-2,3-dicyanonaphthalene is a useful intermediate for synthesizing a tetrakis(alkoxycarbonyl) metal naphthalocyanine.

70. 发明授权

US4499163A Soldering mask formed from a photosensitive resin composition and a photosensitive element 失效
标题翻译：由感光性树脂组合物和光敏元件形成的焊接掩模
公开(公告)号：US4499163A
公开(公告)日：1985-02-12
申请号：US512660
申请日：1983-07-11
申请人： Toshiaki Ishimaru , Katsushige Tsukada , Nobuyuki Hayashi , Shigeru Koibuchi , Asao Isobe
发明人： Toshiaki Ishimaru , Katsushige Tsukada , Nobuyuki Hayashi , Shigeru Koibuchi , Asao Isobe
IPC分类号： G03F7/004 , C08F2/50 , C08F299/06 , C08G18/67 , G03F7/027 , G03C5/00 , G03C1/78
CPC分类号： G03F7/027 , C08F2/50 , C08F299/065 , C08G18/672
摘要： A photosensitive resin composition comprising (a) 20 to 75 parts by weight of a urethane diacrylate or dimethacrylate compound obtained by reacting trimethylhexamethylene diisocyanate and/or isophorone diisocynate dihydric alcohol and an acrylic or methacrylic monoester of a dihydric alcohol, (b) 20 to 75 parts by weight of a linear polymeric compound having a glass transition temperature of about 40.degree. to 150.degree. C., and (c) a sensitizer and/or a sensitizer system which generate free radicals owing to actinic light, is excellent in heat resistance, resistance to thermal shock and solvent resistance, and is suitable for forming a soldering mask. Further, a photosensitive element produced by forming a layer of the above-mentioned composition on a support gives a protective coating film excellent in heat resistance, resistance to thermal shock and solvent resistance, and is particularly suitable for a soldering mask.
摘要翻译：一种感光性树脂组合物，其含有（a）20〜75重量份通过使三甲基六亚甲基二异氰酸酯和/或异佛尔酮二异氰酸酯二元醇与二元醇的丙烯酸或甲基丙烯酸单酯反应得到的氨基甲酸酯二丙烯酸酯或二甲基丙烯酸酯化合物，（b）20〜75 重量的玻璃化转变温度为约40〜150℃的线性高分子化合物，和（c）由于光化性光而产生自由基的敏化剂和/或敏化剂体系，耐热性优异，耐热冲击和耐溶剂性，并且适于形成焊接掩模。此外，通过在支撑体上形成上述组合物层而制造的感光元件形成耐热性，耐热冲击性和耐溶剂性优异的保护涂膜，特别适用于焊接掩模。

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