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    • 1. 发明授权
    • Method of polishing the inner peripheral end surfaces of substrates for a recording medium using a brush
    • 使用刷子对记录介质的基板的内周端面进行研磨的方法
    • US08323071B2
    • 2012-12-04
    • US11660106
    • 2005-08-24
    • Katsuaki AidaHiroyuki Machida
    • Katsuaki AidaHiroyuki Machida
    • B24B1/00
    • B24B9/00B24B9/065B24B29/005B24B29/04B24B37/02G11B5/8404
    • There is provided a method of polishing the inner peripheral end surfaces of disk-like substrates for a recording medium using a brush comprising, providing a plurality of pieces of disk-like substrates having circular holes at the central portion thereof; bringing a polishing material slurry containing a polishing material into contact with the object to be polished; inserting a polishing brush into the circular hole of the object from a first side of the object to be polished, and rotating the polishing brush with the shaft as a center to polish the inner peripheral end surfaces of the substrates; and inserting the polishing brush into the circular hole of the object to be polished from a second side opposite to the first side and rotating the polishing brush with the shaft as a center axis to polish the inner peripheral end surfaces of the substrates.
    • 提供了一种使用刷子研磨用于记录介质的盘状基板的内周端面的方法,所述刷子包括:在其中心部分设置有多个具有圆形孔的盘状基板; 使含有抛光材料的抛光材料浆料与被抛光物体接触; 将抛光刷从被研磨对象物的第一面插入到物体的圆形孔中,以抛光刷为轴心旋转,研磨基板的内周端面; 以及从与第一侧相反的第二侧将抛光刷插入待抛光对象物的圆形孔中,并以作为中心轴的方式旋转抛光刷,以抛光基板的内周端面。
    • 4. 发明申请
    • Method of Polishing the Inner Peripheral end Surfaces of Substrates for a Recording Medium Using a Brush
    • 使用刷子抛光记录介质的基板的内周边表面的方法
    • US20070249267A1
    • 2007-10-25
    • US11660106
    • 2005-08-24
    • Katsuaki AidaHiroyuki Machida
    • Katsuaki AidaHiroyuki Machida
    • B24B29/00
    • B24B9/00B24B9/065B24B29/005B24B29/04B24B37/02G11B5/8404
    • A polishing method without dispersion in the amount of working at the time of polishing the inner peripheral end surfaces of a plurality of disk-like substrates for a recording medium is provided. There is provided a method of polishing the inner peripheral end surfaces of disk-like substrates for a recording medium using a brush comprising, providing a plurality of pieces of disk-like substrates for a recording medium having a circular hole at the central portion thereof thereby forming an inner peripheral end surface, and stacking them while aligning the circular holes to form an object to be polished having the circular hole at the central portion thereof; bringing a polishing material slurry containing a polishing material into contact with the object to be polished; inserting a polishing brush having brush hairs studded on the periphery of a rod-like shaft into the circular hole of the object from a first side of the object to be polished in a state where the slurry is brought into contact with the object to be polished, and rotating the polishing brush with the shaft as a center to polish the inner peripheral end surfaces of the substrates; and inserting the polishing brush into the circular hole of the object to be polished from a second side opposite to the first side in a state where the slurry is brought into contact with the object to be polished, and rotating the polishing brush with the shaft as a center axis to polish the inner peripheral end surfaces of the substrates.
    • 提供了一种抛光方法,其不会在用于记录介质的多个盘状基底的内周端面抛光时的加工量中产生分散。 提供了一种使用刷子研磨用于记录介质的盘状基板的内周端面的方法,所述刷子包括:在其中心部分设置用于具有圆形孔的记录介质的多个盘形基板, 形成内周端面,并且在对准圆形孔的同时堆叠它们以形成其中心部分具有圆形孔的被抛光物体; 使含有抛光材料的抛光材料浆料与被抛光物体接触; 将具有刷头的刷头的抛光刷在待抛光对象的状态下从待研磨物体的第一面插入到杆状轴的周边的圆形孔中, 并以所述轴为中心旋转所述研磨刷,以研磨所述基板的内周端面; 以及在所述浆料与被抛光物体接触的状态下,将所述抛光刷从与所述第一侧相反的第二侧将所述研磨刷插入所述被研磨物的圆形孔,并且将所述研磨刷与所述轴一起旋转, 中心轴,以抛光衬底的内周端表面。
    • 5. 发明申请
    • SILICON SUBSTRATE FOR MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM
    • 用于磁记录介质和磁记录介质的硅基板
    • US20090136786A1
    • 2009-05-28
    • US12067912
    • 2006-09-12
    • Katsuaki AidaHiroyuki Machida
    • Katsuaki AidaHiroyuki Machida
    • G11B5/73G11B5/82
    • G11B5/7315G11B5/82
    • A silicon substrate for a magnetic recording medium in which the substrate has a chamfered surface between its data-carrying surface (surface) having layers including a magnetic layer and its outer peripheral end surface (straight surface) is provided. The silicon substrate is characterized in that a dub-off value at an outer peripheral side of the data-carrying surface is not more than 120 Å wherein when a first position (A) is a point on the data-carrying surface radially and inwardly positioned at 1 mm from the outer peripheral end surface of the substrate, a second position (B) is a point on the data-carrying surface radially and inwardly positioned further at 1.6 mm from the first position (A), and further, provided that a perpendicular line is dropped to a straight line (A-B) connecting the first position (A) with the second position (B), a third position (C) is a point crossing the perpendicular line with the data-carrying surface and a fourth position (H) is a point crossing the perpendicular line with the straight line (A-B), the dub-off value is defined as the maximum value of the distance (C-H) between the third position (C) and the fourth position (H). Using this silicon substrate, a small avalanche point, for a higher recording density, can be obtained for the magnet recording medium. A magnetic recording medium using this silicon substrate is also provided.
    • 提供一种用于磁记录介质的硅衬底,其中衬底在其包括磁性层的层的数据承载表面(表面)和其外周端表面(直表面)之间具有倒角表面。 硅基板的特征在于,数据承载表面的外周侧的配重值不大于120,其中当第一位置(A)是数据承载表面上的点径向和向内定位时 在距离基板的外周端面1mm的位置处,第二位置(B)是数据承载表面上的距离第一位置(A)进一步距离1.6mm处的点,并且如果a 垂直线下降到连接第一位置(A)和第二位置(B)的直线(AB),第三位置(C)是与数据承载表面和第四位置( H)是与直线(AB)交叉的垂直线的点,该脱模值被定义为第三位置(C)与第四位置(H)之间的距离(CH)的最大值。 对于磁记录介质,可以获得用于更高记录密度的小的雪崩点。 还提供了使用该硅衬底的磁记录介质。
    • 7. 发明申请
    • Silicon Substrate for Magnetic Recording Medium and Magnetic Recording Medium
    • 用于磁记录介质和磁记录介质的硅基板
    • US20080088973A1
    • 2008-04-17
    • US11662493
    • 2005-09-16
    • Katsuaki AidaHiroyuki MachidaKazuyuki Haneda
    • Katsuaki AidaHiroyuki MachidaKazuyuki Haneda
    • G11B5/82
    • G11B5/7315
    • To provide a substrate which is not substantially chipped or cracked on the substrate end faces even when the substrate is a silicon substrate made of a brittle material, and provide a substrate which prevents dust raising from the substrate end faces and prevents dust raising due to rubbing with a processing cassette. A silicon substrate for a magnetic recording medium is formed by setting the lengths L of chamfered portions between the main surfaces of the substrate and the outer circumferential side end face to 0.1±0.03 mm and setting the angles α between the main surfaces and the chamfered portions between the main surfaces and the outer circumferential side end face to 45 degrees ±5 degrees. It is also possible for a curved portion with a radius of 0.01 mm or more and less than 0.3 mm is interposed between the main surfaces and the outer circumferential side chamfered portions of the substrate.
    • 为了提供在基板端面上基本上没有切屑或破裂的基板,即使基板是由脆性材料制成的硅基板,并且提供了防止从基板端面引起的灰尘的基板,并且防止由于摩擦引起的灰尘增加 配有处理盒。 通过将基板的主表面和外周侧端面之间的倒角部分的长度L设定为0.1±0.03mm,并且将主表面和倒角部分之间的角度α设定,形成用于磁记录介质的硅基板 主表面和外周侧端面之间的距离为45度±5度。 也可以在基板的主表面和外周侧倒角部分之间插入半径为0.01mm以上且小于0.3mm的弯曲部。