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    • 61. 发明授权
    • Welding technique for forming passive chromium oxide film in weld and gas feed system for welding
    • 焊接和焊接进气系统中形成无源氧化铬膜的焊接技术
    • US06563072B1
    • 2003-05-13
    • US09509707
    • 2000-06-08
    • Tadahiro OhmiTakahisa NittaYasuyuki ShiraiOsamu Nakamura
    • Tadahiro OhmiTakahisa NittaYasuyuki ShiraiOsamu Nakamura
    • B23K3538
    • B23K35/38B23K9/0026B23K9/16B23K35/383C23C8/10
    • Welding of material such as a piping using ferrite system stainless steel, in which a back sealed gas used for conventional welding is switched from argon gas (or a hydrogen gas/argon gas mix) to an argon gas to which an oxidizing gas is doped at the time of forming a chromium oxide passivation film. Welding conditions are set at the temperature in which the inner surface of the piping does not melt at the time of forming the chromium oxide passivation film. The temperature of the welding piping is set uniformly between welding conditions in conventional welding and welding conditions at the time of forming the chromium oxide passivation film, and in order to replace gases used with conventional welding with gases used at the time of forming the chromium oxide passivation film. A cycle of one round or more is performed under the welding conditions for forming a chromium oxide passivation film, thereby, to form the chromium oxide passivation film on a weld in concurrence with welding.
    • 将用于常规焊接的背面密封气体从氩气(或氢气/氩气混合物)切换到掺杂有氧化气体的氩气的铁氧体系不锈钢的管道的材料的焊接 形成氧化铬钝化膜的时间。 焊接条件设定为在形成氧化铬钝化膜时管道的内表面不熔化的温度。 在形成氧化铬钝化膜时,焊接管道的温度在常规焊接和焊接条件的焊接条件之间均匀地设置,并且为了代替在形成氧化铬时使用的气体的常规焊接中使用的气体 钝化膜。 在形成氧化铬钝化膜的焊接条件下进行一圈以上的循环,由此在焊接上形成与焊接同时的氧化铬钝化膜。
    • 63. 发明授权
    • Excimer laser generator provided with a laser chamber with a fluoride passivated inner surface
    • 准分子激光发生器具有激光室,具有氟化物钝化的内表面
    • US06215806B1
    • 2001-04-10
    • US08812288
    • 1997-03-06
    • Tadahiro OhmiYasuyuki ShiraiNaoto Sano
    • Tadahiro OhmiYasuyuki ShiraiNaoto Sano
    • H01S322
    • H01S3/0305H01S3/036H01S3/225
    • An excimer laser generating system includes a laser chamber whose inner surface is covered with a fluorine-passivated surface. Preferably, the surfaces of a blower and heat exchanger disposed in the laser chamber are also covered with a fluorine-passivated surface. The fluorine-passivated surface may be formed of a wide variety of materials including an aluminum oxide film, a fluoride film containing aluminum fluoride and magnesium fluoride, iron fluoride, and nickel fluoride. Preferably, the excimer laser generation system includes a gas supply system having an inert gas purging system so that gas sources can be replaced without exposing the inside of gas supply pipes to atmosphere. With the above arrangement, the excimer laser generating system can generate a laser beam pulse whose energy and shape are maintained constant for a long period of operation time without encountering serious degradation. The invention also provides a high-reliability step-and-repeat exposure apparatus using the above excimer laser generating system, capable of exposing a very fine pattern.
    • 准分子激光发生系统包括其内表面被氟钝化表面覆盖的激光室。 优选地,设置在激光室中的鼓风机和热交换器的表面也被氟钝化表面覆盖。 氟钝化表面可以由各种各样的材料形成,包括氧化铝膜,含氟化铝和氟化镁的氟化物膜,氟化铁和氟化镍。 优选地,准分子​​激光发生系统包括具有惰性气体吹扫系统的气体供应系统,使得可以更换气体源而不将气体供应管的内部暴露于大气。 通过上述布置,准分子激光发生系统可以产生激光束脉冲,其能量和形状在长时间的操作时间内保持恒定,而不会严重恶化。 本发明还提供了使用上述准分子激光发生系统的能够曝光非常精细图案的高可靠性分步重复曝光装置。
    • 66. 发明授权
    • Three-phase DC motor
    • 三相直流电机
    • US08618711B2
    • 2013-12-31
    • US13352700
    • 2012-01-18
    • Yasuyuki Shirai
    • Yasuyuki Shirai
    • H02K1/00
    • H02K1/165H02K7/06H02K21/14
    • A three-phase DC motor includes a rotor 30 having poles 30a and a stator 28 having core units 32b arranged around the rotor 30. Three or more coils are wound around the core units 32b. An outer surface of the rotor 30 has alternating poles of N and S around the circumference of the rotor 30. The coils 35a, 35b, 35c, and 35d are placed only within a range defined by second virtual planes P2 specified respectively by rotating a first virtual plane P1 according to a predetermined angle in a rotor rotating direction and a direction opposite thereto. The first virtual plane P1 passes through the axial center of the rotor 30. The inner surface of the adjacent 3N (N=1, 2, 3, . . . ) number of core units 32b are delimited within a width of one pole on the outer surface of the rotor 30.
    • 三相直流电动机包括具有极数30a的转子30和具有围绕转子30配置的铁心单元32b的定子28.三个或更多个线圈缠绕在铁心单元32b周围。 转子30的外表面在转子30的周围具有N和S的交变极。线圈35a,35b,35c和35d仅在由第二虚拟平面P2限定的范围内,第二虚拟平面P2分别通过旋转第一 虚拟平面P1根据转子旋转方向上的预定角度和与其相反的方向。 第一虚拟平面P1穿过转子30的轴向中心。相邻的3N(N = 1,2,3,...)数量的芯单元32b的内表面在一个极的宽度上限定在 转子30的外表面。
    • 69. 发明授权
    • Mechanism and method for mechanically removing a substrate
    • 用于机械去除基材的机理和方法
    • US5569350A
    • 1996-10-29
    • US389789
    • 1995-02-16
    • Tomoaki OsadaYasuyuki Shirai
    • Tomoaki OsadaYasuyuki Shirai
    • C23C16/458H01L21/683C23F1/02C23C16/00
    • H01L21/6831C23C16/4586
    • A mechanism for completely separating a substrate, such as a semiconductor substrate, from at base in such a way that the substrate is in a horizontal position and can be easily removed from an electrostatic chuck. The substrate is mounted on a pedestal which is placed on a base such as an electrode. Pins are mounted within the base beneath a central portion of the substrate. The pins can be moved vertically through the circular pedestal to lift the substrate from the pedestal. A ring is mounted around the pedestal and underneath the outer edge of the substrate. When the pins are protrude beyond the top surface of the circular pedestal the substrate is lifted and caused to tilt. The ring then is lifted to act on the outer edge of the rear surface of the substrate, thus separating the substrate from the circular pedestal and returning the substrate to a horizontal position.
    • 用于将基板(例如半导体基板)从底部完全分离以使得基板处于水平位置并且可以容易地从静电卡盘移除的方式的机构。 基板安装在放置在诸如电极的基座上的基座上。 引脚安装在底座下方的基板的中心部分之下。 销可以垂直移动通过​​圆形底座从基座提起基板。 一个环安装在基座周围并在基底的外边缘下方。 当销突出超过圆形基座的顶面时,基板被提起并使其倾斜。 然后,环被提升以作用在基板的后表面的外边缘上,从而将基板与圆形基座分离并将基板返回到水平位置。
    • 70. 发明授权
    • Automatic loader
    • 自动装载机
    • US4643629A
    • 1987-02-17
    • US790288
    • 1985-10-22
    • Nobuyuki TakahashiRyuji SugimotoYasuyuki Shirai
    • Nobuyuki TakahashiRyuji SugimotoYasuyuki Shirai
    • B65G1/00B65G1/04B65G1/07B65G47/52C23C14/56H01L21/67H01L21/677B65G1/06
    • H01L21/67781C23C14/56Y10S414/136Y10S414/137Y10S414/139
    • In an automatic loader for automatically loading a flat unprocessed substrate to a substrate processing apparatus for processing the flat substrate and automatically unloading a processed substrate, the automatic loader has: a plurality of cassette stages for vertically moving cassettes having a plurality of substrates held horizontally and parallel to each other; a first substrate convey mechanism contacting a single door of the substrate processing apparatus and forming a common conveyance path of all substrates; a single substrate posture control stage arranged in contact with the first convey mechanism to correct a posture of the substrate to be fed in the substrate processing apparatus; second substrate convey mechanisms for forming at least one conveyance path between the plurality of cassette stages and the substrate posture control stage and exchanging and conveying the substrate; and substrate counters arranged in the respective conveyance paths of the second substrate convey mechanisms. The processed substrates are returned to the original cassette.
    • 在自动装载机中,将平坦的未处理的基板自动装载到用于处理平坦基板并自动卸载处理的基板的基板处理装置,自动装载机具有:多个用于垂直移动的带盒,具有水平保持的多个基板, 相互平行; 与基板处理装置的单个门接触并形成所有基板的公共输送路径的第一基板输送机构; 单个基板姿势控制台,其布置成与所述第一输送机构接触以校正要供给到所述基板处理装置中的所述基板的姿势; 第二基板输送机构,用于形成多个盒带台与基板姿势控制台之间的至少一个输送路径,并交换和输送基板; 以及布置在第二基板输送机构的各个输送路径中的基板计数器。 经处理的基板返回原始盒。