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    • 63. 发明授权
    • Variable resistance element, its manufacturing method and semiconductor memory device comprising the same
    • 可变电阻元件,其制造方法和包括该可变电阻元件的半导体存储器件
    • US07796416B2
    • 2010-09-14
    • US12092766
    • 2006-12-13
    • Kazuya IshiharaYasunari HosoiShinji Kobayashi
    • Kazuya IshiharaYasunari HosoiShinji Kobayashi
    • G11C11/00
    • H01L27/101H01L27/2436H01L45/08H01L45/1233H01L45/145H01L45/146H01L45/1625H01L45/1633Y10T29/49082
    • Provided is a variable resistance element capable of performing a stable resistance switching operation and having a favorable resistance value retention characteristics, comprising a variable resistor 2 sandwiched between a upper electrode 1 and lower electrode 3 and formed of titanium oxide or titanium oxynitride having a crystal grain diameter of 30 nm or less. When the variable resistance 2 is formed under the substrate temperature of 150° C. to 500° C., an anatase-type crystal having a crystal grain diameter of 30 nm or less is formed. Since the crystalline state of the variable resistor changes by applying a voltage pulse and the resistance value changes, no forming process is required. Moreover, it is possible to perform a stable resistance switching operation and obtain an excellent effect that the resistance fluctuation is small even if the switching is repeated, or the variable resistance element is stored for a long time under a high temperature.
    • 提供一种能够进行稳定的电阻切换操作并具有良好的电阻值保持特性的可变电阻元件,包括夹在上电极1和下电极3之间并由具有晶粒的氧化钛或氮氧化钛形成的可变电阻器2 直径30nm以下。 当在150℃至500℃的衬底温度下形成可变电阻2时,形成晶粒直径为30nm以下的锐钛矿型晶体。 由于可变电阻器的结晶状态通过施加电压脉冲而变化,并且电阻值改变,因此不需要形成工艺。 此外,即使重复切换,或者可变电阻元件在高温下长时间存储,也可以进行稳定的电阻切换操作,并获得优异的电阻波动小的效果。
    • 64. 发明授权
    • Stamp
    • 邮票
    • US07757605B2
    • 2010-07-20
    • US10589392
    • 2005-03-16
    • Shinji KobayashiHiromi KitamuraKazuyuki Kanbe
    • Shinji KobayashiHiromi KitamuraKazuyuki Kanbe
    • B41J1/60B41F31/00B41K1/38B41K1/10B41K1/50
    • B41K1/10B41K1/50
    • In a fixed print portion 100, a cylindrical holding member 125 holds a fixed print member 112 and an ink storage body 113 from the side of the ink storage body 113 and a frame member 120 having an L-shaped section is set from the side of the fixed print member 112 so that it is fitted to the outer periphery of the holding member 125, thereby a print face 111 is held and exposed outside. A portion of the fixed print member 112 near the outer periphery is nipped between the frame member 120 and the holding member 125 in a compressed state because the frame member 120 is fitted to the holding member 125 and an exposed portion of the fixed print member 112 has a difference of height H between the end face of the frame member 120 and the print face 111. A damper member 300 is disposed between the frame member 120 and a flange 203 provided on a supporting case 201 of the movable print portion 200.
    • 在固定打印部分100中,圆柱形保持构件125从墨水容纳体113的侧面保持固定的打印构件112和墨水存储体113,并且从侧面设置具有L形截面的框架构件120 固定打印构件112,使得其被固定到保持构件125的外周,从而将打印面111保持并暴露在外部。 靠近外周的固定打印构件112的一部分在压缩状态下夹在框架构件120和保持构件125之间,因为框架构件120装配到保持构件125和固定打印构件112的暴露部分 具有框架构件120的端面与打印面111之间的高度差。阻尼构件300设置在框架构件120和设置在可动打印部200的支撑壳体201之间的凸缘203之间。
    • 68. 发明授权
    • Liquid processing apparatus and liquid processing method
    • 液体处理装置和液体处理方法
    • US07566365B2
    • 2009-07-28
    • US10796179
    • 2004-03-10
    • Shinji KobayashiTetsushi MiyamotoMasahito Hamada
    • Shinji KobayashiTetsushi MiyamotoMasahito Hamada
    • B05C5/02
    • H01L21/68721B05C11/08B05D1/005H01L21/6715H01L21/68735H01L21/6875
    • In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
    • 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中,旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上,使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置,其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环,该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口,其中空气入口与排气单元连通。