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61. 发明授权

US06407298B1 Process for the preparation of (p-chlorophenyl)propanol derivatives 失效
标题翻译：（对氯苯基）丙醇衍生物的制备方法
公开(公告)号：US06407298B1
公开(公告)日：2002-06-18
申请号：US09830555
申请日：2001-05-04
申请人： Hiroo Matsumoto , Minako Kamikawaji , Takashi Horiuchi
发明人： Hiroo Matsumoto , Minako Kamikawaji , Takashi Horiuchi
IPC分类号： C07C1716
CPC分类号： C07C17/16 , C07C29/14 , C07C45/512 , C07C25/02 , C07C47/24 , C07C33/46
摘要： A process for the preparation of an alcohol compound (1), characterized by subjecting p-iodochlorobenzene to Pd coupling with allyl alcohol in the presence of tetramethylammonium chloride, followed by reduction, and a process for the preparation of a compound (2), characterized by brominating the alcohol compound (1) obtainable by said process:
摘要翻译：一种制备醇化合物（1）的方法，其特征在于在氯化四甲基铵存在下使对氯代苯与烯丙醇进行Pd偶联，然后还原，以及制备化合物（2）的方法，其特征在于通过溴化由所述方法获得的醇化合物（1）：

62. 发明授权

US08072708B2 Head suspension, load beam, and method of manufacturing load beam 有权
标题翻译：头悬挂，负载梁和负载梁制造方法
公开(公告)号：US08072708B2
公开(公告)日：2011-12-06
申请号：US12284400
申请日：2008-09-22
申请人： Takashi Horiuchi
发明人： Takashi Horiuchi
IPC分类号： G11B21/21
CPC分类号： G11B5/4826 , G11B5/4833
摘要： A load beam is capable of securing a required level of positioning accuracy for a slider, a load beam has a body and a dimple, the body is made of a plate having a first surface and a second surface, the dimple has a convex curved surface protruding from the first surface of the body and supports a slider so that the slider is movable in predetermined directions to write and read information to and from a disk in a disk drive, and the load beam includes a mark formed on the second surface of the body, configured to provide positional information about a vertex of the dimple.
摘要翻译：负载梁能够确保滑块的所需水平的定位精度，负载梁具有主体和凹坑，主体由具有第一表面和第二表面的板制成，凹部具有凸曲面从主体的第一表面突出并且支撑滑块，使得滑块可在预定方向上移动以向盘驱动器中的盘写入和读取信息，并且负载光束包括形成在盘的第二表面上的标记身体，被配置为提供关于凹坑的顶点的位置信息。

63. 发明申请

US20110261345A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110261345A1
公开(公告)日：2011-10-27
申请号：US13067842
申请日：2011-06-29
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。

64. 发明授权

US07995186B2 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权
标题翻译：基板输送装置及基板输送方法，曝光装置及曝光方法，装置的制造方法
公开(公告)号：US07995186B2
公开(公告)日：2011-08-09
申请号：US11652015
申请日：2007-01-11
申请人： Atsushi Ohta , Takashi Horiuchi
发明人： Atsushi Ohta , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。一种器件制造方法包括使用光刻设备的投影系统将图案化的辐射束通过液体投影到衬底上，衬底由衬底台保持，并且在突出完成之后，检测残留液体衬底和/或衬底台。

65. 发明授权

US07791840B2 Head suspension, load beam, and method of manufacturing load beam 有权
标题翻译：头悬挂，负载梁和负载梁制造方法
公开(公告)号：US07791840B2
公开(公告)日：2010-09-07
申请号：US11709021
申请日：2007-02-21
申请人： Takashi Horiuchi , Takumi Karasawa
发明人： Takashi Horiuchi , Takumi Karasawa
IPC分类号： G11B5/127
CPC分类号： G11B5/4833 , Y10T29/49032
摘要： In the manufacture of a load beam for reading and writing a hard disk in a hard disk drive which load beam has a body having a slope extending from a front end thereof and bent along a bend line in a direction opposite to the hard disk, a tab protruding from the slope and to be guided on a guide of the hard disk drive, and a box-bent portion extending along each side edge of the body and slope and passing through an end of the bend line. A first stage is preparing a load beam material that is flat and has a deformation control zone on a section to be processed into the box-bent portion of the load beam material corresponding to the section to be processed into the bend line so as to prevent the box-bent portion from deforming and protruding when the box-bent portion is formed.
摘要翻译：在用于读取和写入硬盘驱动器中的硬盘的负载光束的制造中，该负载光束具有从其前端延伸并且沿与硬盘相反的方向沿着弯曲线弯曲的主体，从该斜面突出并且在该硬盘驱动器的引导件上引导的突片，以及沿着主体的每个侧边缘延伸并且穿过弯曲线的端部的箱形弯曲部分。第一阶段是准备一个平坦的负载梁材料，并且在要处理的部分上具有对应于待加工部分的弯曲部分的弯曲部分中的变形控制区域，以防止所述盒弯曲部在形成所述箱形弯曲部时变形并突出。

66. 发明授权

US07749398B2 Selective-redeposition sources for calibrating a plasma process 失效
标题翻译：用于校准等离子体工艺的选择性再沉积源
公开(公告)号：US07749398B2
公开(公告)日：2010-07-06
申请号：US11536758
申请日：2006-09-29
申请人： Jozef Brcka , Rodney L. Robison , Takashi Horiuchi
发明人： Jozef Brcka , Rodney L. Robison , Takashi Horiuchi
IPC分类号： H01L21/302
CPC分类号： H01J37/3299 , H01J37/32935
摘要： Calibration wafers and methods for calibrating a plasma process performed in a plasma processing apparatus, such as an ionized physical vapor deposition apparatus. The calibration wafer includes one or more selective-redeposition sources that may be used for calibrating a plasma process. The selective-redeposition sources are constructed to promote the redeposition of a controllable and/or measurable amount of material during the plasma process.
摘要翻译：用于校准在诸如电离物理气相沉积装置的等离子体处理装置中进行的等离子体处理的校准晶片和方法。校准晶片包括可用于校准等离子体工艺的一个或多个选择性再沉积源。构建选择性再沉积源以在等离子体工艺期间促进可控和/或可测量的材料的再沉积。

67. 发明授权

US07657721B2 Method of maintaining a plurality of snapshots, server apparatus and storage apparatus 失效
标题翻译：维护多个快照的方法，服务器装置和存储装置
公开(公告)号：US07657721B2
公开(公告)日：2010-02-02
申请号：US11809113
申请日：2007-05-30
申请人： Takahiro Nakano , Koji Sonoda , Yoshiaki Eguchi , Takashi Horiuchi , Katsumi Hirezaki
发明人： Takahiro Nakano , Koji Sonoda , Yoshiaki Eguchi , Takashi Horiuchi , Katsumi Hirezaki
IPC分类号： G06F12/00
CPC分类号： G06F17/30067 , G06F11/1448 , G06F11/1464 , G06F2201/84 , Y10S707/99953 , Y10S707/99954
摘要： Snapshots are implemented by combining original data in a place where an operational volume has been updated with data in a place where the operational volume has not been updated. A snapshot management table maintains a value indicating that update has not been conducted, or a storage place of original data, for each of combinations of blocks in the operational volume and the snapshots. If there is a snapshot in which update has not been conducted in a update place at the time of update, then original data is copied and the snapshot management table is updated. The copied original data is managed by a difference block management table, which has a value indicating whether respective snapshots are referencing the data. If a snapshot is deleted, then the value indicating that the snapshot is referencing is altered in all entries in the difference block management table.
摘要翻译：快照是通过将操作卷更新的地方的原始数据与操作卷未更新的地方的数据相结合来实现的。对于操作卷和快照中的每个块的组合，快照管理表维护指示尚未进行更新的值或原始数据的存储位置。如果在更新时没有在更新位置进行更新的快照，则会复制原始数据，并更新快照管理表。复制的原始数据由差分块管理表管理，差分块管理表具有指示各个快照是否参考数据的值。如果快照被删除，则表示快照正在引用的值在差异块管理表的所有条目中被更改。

68. 发明申请

US20090274664A1 Method of culturing vascular smooth muscle cells, culture device and medical material obtained by the culture 审中-公开
标题翻译：培养血管平滑肌细胞，培养装置和通过培养获得的医疗材料的方法
公开(公告)号：US20090274664A1
公开(公告)日：2009-11-05
申请号：US12227688
申请日：2007-05-24
申请人： Keiichi Miyamoto , Takashi Horiuchi
发明人： Keiichi Miyamoto , Takashi Horiuchi
IPC分类号： A61K35/34 , C12N5/02
CPC分类号： C12N5/0691 , A61K35/12 , A61L27/227 , A61L27/3826 , A61L27/383 , A61L27/3895 , A61L27/507 , C12M25/02 , C12N2533/50
摘要： There is provided a method for culturing vascular smooth muscle cells while maintaining their normal function, and a culture device and regenerative medical material for the same. The method takes advantage of vascular smooth muscle cell recognition of elastin as an extracellular matrix. The invention provides a method for culturing vascular smooth muscle cells on elastin, a culture device having elastin anchored on the cell-growing surface, a culture device wherein the cell-growing surface is composed of an elastin molded article, and medical materials obtained by culturing vascular smooth muscle cells using such culture devices.
摘要翻译：提供培养血管平滑肌细胞同时保持其正常功能的方法，以及用于其的培养装置和再生医疗材料。该方法利用弹性蛋白作为细胞外基质的血管平滑肌细胞识别。本发明提供了一种在弹性蛋白上培养血管平滑肌细胞的方法，具有固定在细胞生长表面上的弹性蛋白的培养装置，其中细胞生长表面由弹性蛋白模制品组成的培养装置以及通过培养获得的医疗材料使用这种培养装置的血管平滑肌细胞。

69. 发明授权

US07515249B2 Substrate carrying apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：基板搬送装置，曝光装置及装置的制造方法
公开(公告)号：US07515249B2
公开(公告)日：2009-04-07
申请号：US11398598
申请日：2006-04-06
申请人： Kei Sato , Takashi Horiuchi
发明人： Kei Sato , Takashi Horiuchi
IPC分类号： G03B27/32 , G03B27/58
CPC分类号： H01L21/6715 , G03F7/70341 , G03F7/7075
摘要： A substrate carrying apparatus, comprises: a first carrying mechanism that carries a substrate into an exposure processing unit that performs exposure processing via a projection optical system and a liquid; a second carrying mechanism that carries a substrate from the exposure processing unit; and an anti-scattering mechanism that controls scattering of the liquid from at least one of the second carrying mechanism and the substrate carried by the second carrying mechanism to at least one of the first carrying mechanism and the substrate carried by the first carrying mechanism.
摘要翻译：一种基板承载装置，包括：第一承载机构，其将基板运送到通过投影光学系统和液体进行曝光处理的曝光处理单元; 第二承载机构，其从所述曝光处理单元承载基板; 以及防散射机构，其将来自第二承载机构和由第二承载机构承载的基板中的至少一个的液体的散射控制到由第一搬运机构承载的第一搬运机构和基板中的至少一个。

70. 外观设计

USD571854S1 Paper cartridge for printer 有权
公开(公告)号：USD571854S1
公开(公告)日：2008-06-24
申请号：US29274955
申请日：2007-06-12
申请人： Takashi Horiuchi , Yasunori Nakamura , Yoshikatsu Suito
设计人： Takashi Horiuchi , Yasunori Nakamura , Yoshikatsu Suito

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