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    • 62. 发明授权
    • Electron beam exposure system having an electromagnetic deflector
configured for efficient cooling
    • 具有电磁偏转器的电子束曝光系统被配置为有效地冷却
    • US5264706A
    • 1993-11-23
    • US874138
    • 1992-04-27
    • Yoshihisa OaeAkio YamadaHiroshi Yasuda
    • Yoshihisa OaeAkio YamadaHiroshi Yasuda
    • H01J37/147H01J3/32
    • H01J37/1471H01J2237/002H01J2237/152H01J2237/3175
    • An electron beam exposure system comprises a beam source for producing and directing an electron beam along an optical axis, an evacuated column for accommodating the beam source and extending along the optical axis, an electron lens for focusing the electron beam on a substrate; and an electromagnetic deflector supplied with a control signal for deflecting the electron beam in response to the control signal. The electromagnetic deflector comprises an inner sleeve surrounding the evacuated column, first and second mutually separate windings provided on an outer surface of the inner sleeve in opposed relationship with respect to each other across the optical axis, an outer sleeve surrounding the inner sleeve with a separation therebetween defining a passageway for the flow of a coolant therethrough; third and fourth, mutually separate windings provided on an inner surface of the outer sleeve in opposed relationship with respect to each other across the optical axis, an inlet for introducing the coolant into the passageway, and an outlet for exiting the coolant from the passageway.
    • 电子束曝光系统包括用于沿光轴产生和引导电子束的光束源,用于容纳光束源并沿光轴延伸的抽真空柱,用于将电子束聚焦在衬底上的电子透镜; 以及电磁偏转器,其被提供有用于响应于控制信号偏转电子束的控制信号。 电磁偏转器包括围绕真空柱的内套筒,第一和第二相互独立的绕组,其设置在内套筒的外表面上,相对于彼此跨越光轴的对置关系,包围内套筒的外套筒具有分离 其间限定用于冷却剂流过其的通道; 第三和第四,互相分离的绕组设置在外套筒的内表面上,相对于彼此跨越光轴的相对关系,用于将冷却剂引入通道的入口和用于从冷却剂离开通道的出口。
    • 63. 发明授权
    • Bipolar transistor in bipolar-CMOS technology
    • 双极晶体管在双极CMOS技术
    • US08536002B2
    • 2013-09-17
    • US13567552
    • 2012-08-06
    • Hiroshi YasudaBerthold Staufer
    • Hiroshi YasudaBerthold Staufer
    • H01L21/8238
    • H01L27/0623H01L21/8249H01L29/1004H01L29/66287H01L29/732H01L29/7833
    • A process of forming an integrated circuit containing a bipolar transistor and an MOS transistor, by forming a base layer of the bipolar transistor using a non-selective epitaxial process so that the base layer has a single crystalline region on a collector active area and a polycrystalline region on adjacent field oxide, and concurrently implanting the MOS gate layer and the polycrystalline region of the base layer, so that the base-collector junction extends into the substrate less than one-third of the depth of the field oxide, and vertically cumulative doping density of the polycrystalline region of the base layer is between 80 percent and 125 percent of a vertically cumulative doping density of the MOS gate. An integrated circuit containing a bipolar transistor and an MOS transistor formed by the described process.
    • 通过使用非选择性外延工艺形成双极型晶体管的基极层,使得基极层在集电极有源区域上具有单一结晶区域和多晶硅层,形成包含双极晶体管和MOS晶体管的集成电路的工艺 区域,并且同时注入基极层的MOS栅极层和多晶区域,使得基极 - 集电极结延伸到小于场氧化物深度的三分之一的衬底中,并且垂直累积掺杂 基极层的多晶区域的密度在MOS栅极的垂直累积掺杂密度的80%至125%之间。 包含双极晶体管和通过所描述的工艺形成的MOS晶体管的集成电路。
    • 64. 发明授权
    • Semiconductor device having a first bipolar device and a second bipolar device and method for fabrication
    • 具有第一双极器件和第二双极器件的半导体器件及其制造方法
    • US08450179B2
    • 2013-05-28
    • US11670729
    • 2007-02-02
    • Badih El-KarehHiroshi YasudaScott Balster
    • Badih El-KarehHiroshi YasudaScott Balster
    • H01L21/331
    • H01L29/7378H01L21/8222H01L21/8249H01L27/0825H01L29/66242
    • A method for fabricating a semiconductor device having a first and second bipolar devices of the same dopant type includes: depositing a dielectric layer over a semiconductor layer, depositing a gate conductor layer over the dielectric layer, defining base regions of both bipolar devices, removing the gate conductor layer and dielectric layer in the base regions, depositing a base layer on the gate conductor layer and on the exposed semiconductor layer in the base regions, depositing an insulating layer over the base layer, forming a photoresist layer and defining emitter regions of both bipolar devices, removing the photoresist layer in the emitter regions thereby forming two emitter windows, masking the emitter window of the first bipolar device and exposing the base layer in the base region of the second bipolar device to an additional emitter implant through the associated emitter window.
    • 一种用于制造具有相同掺杂剂类型的第一和第二双极器件的半导体器件的方法包括:在半导体层上沉积介电层,在电介质层上沉积栅极导体层,限定两个双极器件的基极区域, 栅极导体层和电介质层,在栅极导体层和基极区域的暴露的半导体层上沉积基底层,在基底层上沉积绝缘层,形成光致抗蚀剂层并限定两者的发射极区域 去除发射极区域中的光致抗蚀剂层,从而形成两个发射器窗口,掩蔽第一双极器件的发射极窗口,并将第二双极器件的基极区域中的基极层通过相关的发射极窗口暴露于另外的发射体注入 。