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61. 发明授权

US06939433B2 Sample processing apparatus and sample processing system 失效
标题翻译：样品处理设备和样品处理系统
公开(公告)号：US06939433B2
公开(公告)日：2005-09-06
申请号：US10228039
申请日：2002-08-27
申请人： Shoji Ikuhara , Hideyuki Yamamoto
发明人： Shoji Ikuhara , Hideyuki Yamamoto
IPC分类号： H01L21/66 , H05H1/00 , C23C16/00 , C23F1/00 , H01L21/00
CPC分类号： H01L22/20 , H01J37/32935
摘要： It is an object of the invention to provide a vacuum processing device and a vacuum processing system capable of improving the accuracy for the function of estimating the result of processing of samples based on the monitored values for the processing state of the samples, improving the forecasting accuracy and thus improving the yield of products. The system comprises a function of monitoring processing parameters for samples, a function of estimating the processing characteristics of the samples based on the monitored parameters, a function of conducting communication with a measuring device for measuring the processing state of the samples after processing and a function of updating the measuring conditions by the measuring device in accordance with the processing characteristics of the samples estimated from the information by monitoring.
摘要翻译：本发明的目的是提供一种真空处理装置和真空处理系统，其能够基于样本的处理状态的监视值来提高估计样品处理结果的功能的准确度，从而改善预测准确性，从而提高产品的产量。该系统包括监视样本的处理参数的功能，基于所监视的参数来估计样本的处理特性的功能，与测量装置进行通信的功能，用于测量处理后的样本的处理状态和功能根据通过监视从信息估计的样本的处理特性，由测量装置更新测量条件。

62. 发明授权

US06911157B2 Plasma processing method and apparatus using dynamic sensing of a plasma environment 失效
标题翻译：使用动态感应等离子体环境的等离子体处理方法和装置
公开(公告)号：US06911157B2
公开(公告)日：2005-06-28
申请号：US10347402
申请日：2003-01-21
申请人： Manabu Edamura , Hideyuki Yamamoto , Kazuyuki Ikenaga
发明人： Manabu Edamura , Hideyuki Yamamoto , Kazuyuki Ikenaga
IPC分类号： H05H1/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/66 , H05H1/46 , H01L21/00
CPC分类号： H01J37/32935 , H01J37/3299
摘要： At least one control parameter such as power supplied to a plasma, process pressure, gas flow rate, and radio frequency bias power to a wafer is changed for an extremely short time as compared with an entire plasma processing time, to the extent that such a change does not affect the result of plasma processing on the wafer, to monitor a temporal change of a plasma state which occurs at the time of changing. A signal resulting from the monitoring method is used to control or diagnose the plasma processing, thereby making it possible to accomplish miniature etching works, high quality deposition, surface processing.
摘要翻译：与整个等离子体处理时间相比，至少一个控制参数（例如提供给等离子体的功率，过程压力，气体流速和射频偏置功率）与整个等离子体处理时间相比改变极短的时间，改变不影响晶片上的等离子体处理的结果，以监视在改变时发生的等离子体状态的时间变化。由监视方法产生的信号用于控制或诊断等离子体处理，从而可以实现微型蚀刻工作，高质量沉积，表面处理。

63. 发明授权

US06844275B2 Heat-resistant fabric and method for production thereof 失效
标题翻译：耐热织物及其制造方法
公开(公告)号：US06844275B2
公开(公告)日：2005-01-18
申请号：US10111204
申请日：2001-09-03
申请人： Hideyuki Yamamoto , Makoto Nakahara
发明人： Hideyuki Yamamoto , Makoto Nakahara
IPC分类号： B01D39/16 , B01D39/20 , D04H1/42 , D04H1/64 , B32B27/12 , B32B27/04
CPC分类号： D04H1/64 , B01D39/163 , B01D39/202 , D04H1/4218 , D04H1/4318 , D04H1/4342 , D04H1/587 , Y10S428/92 , Y10S428/921 , Y10T428/13 , Y10T442/2631 , Y10T442/2861 , Y10T442/60 , Y10T442/696
摘要： The object of this invention is to provide a heat resistant fabric having high stiffness at high temperature and also high chemicals resistance.The heat resistant fabric of this invention is a fabric consisting of heat resistant fibers, characterized in that the contacts between the fibers constituting the fabric are bound by means of an inorganic binder. Furthermore, a preferable process for preparing the heat resistant fabric of this invention comprises the steps of impregnating a fabric consisting of heat resistant fibers with a sodium silicate aqueous solution, and drying in an atmosphere containing carbon dioxide, to bind the contacts between the fibers constituting the fabric by means of silicon oxide.
摘要翻译：本发明的目的是提供一种在高温下具有高刚度并且具有高耐化学性的耐热织物。本发明的耐热织物是由耐热纤维组成的织物，其特征在于，构成纤维的纤维之间的接触织物通过无机粘合剂结合。此外，制备本发明的耐热织物的优选方法包括以下步骤：将由耐热纤维组成的织物用硅酸钠水溶液浸渍，并在含有二氧化碳的气氛中干燥，使构成的纤维之间的接触织物通过氧化硅。

64. 发明授权

US06755932B2 Plasma processing system and apparatus and a sample processing method 有权
标题翻译：等离子体处理系统和设备及样品处理方法
公开(公告)号：US06755932B2
公开(公告)日：2004-06-29
申请号：US09788463
申请日：2001-02-21
申请人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
发明人： Toshio Masuda , Tatehito Usui , Mitsuru Suehiro , Hiroshi Kanekiyo , Hideyuki Yamamoto , Kazue Takahashi , Hiromichi Enami
IPC分类号： H05H100
CPC分类号： H01L21/67069 , G01N21/68 , H01J37/32082 , H01J37/32935 , H01J37/32972
摘要： The object of the present invention is to provide a plasma processing apparatus wherein plasma is generated in process chamber to treat a sample. Said plasma processing apparatus is further characterized in that multiple closely packed through-holes are formed on the plate installed on the UHF antenna arranged opposite to the sample, an optical transmitter is installed almost in contact with the back of the through-holes, and an optical transmission means is arranged on the other end of said optical transmitter, thereby measuring optical information coming from the sample and plasma through optical transmitter and optical transmission means by means of a measuring instrument. No abnormal discharge or particle contamination occur to through-holes even in long-term discharge process, and no deterioration occurs to the optical performance at the end face of the optical transmitter. Said plasma processing apparatus ensures stable and high precision measurement of the state of the surface of sample and plasma for a long time.
摘要翻译：本发明的目的是提供一种等离子体处理装置，其中在处理室中产生等离子体以处理样品。所述等离子体处理装置的特征还在于，在安装在与样品相对布置的UHF天线上的板上形成多个紧密堆积的通孔，光发射器几乎与通孔背面几乎接触，并且光传输装置设置在所述光发射机的另一端，借助于测量仪器通过光发射机和光传输装置测量来自样本和等离子体的光信息。即使在长期放电过程中也不会对通孔发生异常放电或颗粒污染，并且在光发射机的端面处的光学性能不会劣化。所述等离子体处理装置长时间保证对样品和等离子体表面的状态的稳定和高精度的测量。

65. 发明授权

US06653594B2 Consumable electrode gas shielded arc welding method and apparatus 有权
标题翻译：消耗电极气体保护电弧焊接方法及装置
公开(公告)号：US06653594B2
公开(公告)日：2003-11-25
申请号：US09793991
申请日：2001-02-28
申请人： Terumi Nakamura , Kazuo Hiraoka , Chiaki Shiga , Hideyuki Yamamoto , Koji Nakamura
发明人： Terumi Nakamura , Kazuo Hiraoka , Chiaki Shiga , Hideyuki Yamamoto , Koji Nakamura
IPC分类号： B23K9173
CPC分类号： B23K9/295
摘要： A gas having an arc current-voltage property that is different from a shielding gas is intermittently added to the shielding gas, an arc current is intermittently changed in proportion to an intermittent chemical composition change of the shielding gas at an arc generation region, and an arc generation point situated at a tip of a welding wire is displaced upwardly or downwardly along a groove of a base metal.
摘要翻译：与保护气体不同的具有电弧电流特性的气体被间歇地添加到保护气体中，电弧电流与电弧产生区域的保护气体的间歇化学组成变化成比例地间歇地变化，位于焊丝前端的电弧产生点沿着母材的沟槽向上或向下移位。

66. 发明授权

US06558100B1 Vacuum processing apparatus and a vacuum processing system 失效
公开(公告)号：US06558100B1
公开(公告)日：2003-05-06
申请号：US09697324
申请日：2000-10-27
申请人： Hironobu Kawahara , Mitsuru Suehiro , Kazue Takahashi , Hideyuki Yamamoto , Katsuya Watanabe
发明人： Hironobu Kawahara , Mitsuru Suehiro , Kazue Takahashi , Hideyuki Yamamoto , Katsuya Watanabe
IPC分类号： H01L213065
CPC分类号： H01L21/6719 , H01L21/67161 , H01L21/67196 , H01L21/67201 , H01L21/67207 , Y10S414/135 , Y10S414/139
摘要： The vacuum processing apparatus has an atmospheric loader having a plurality of cassette tables and a transport unit for carrying wafers, a vacuum loader equipped with vacuum wafer-processing chambers and a vacuum transport chamber communicating with the processing chambers via gate valves, and a locking unit provided with a loading lock chamber and unloading lock chambers that have gate valves for connecting the atmospheric transport unit and vacuum transport chamber; wherein two etching chambers, formed by UHF-ECR reactors, are arranged symmetrically with respect to an axial line passing through the middle of the vacuum transport chamber and locking unit, only at the opposite side of the locking unit across the vacuum transport chamber, and at an acute angle with respect to the vacuum transport chamber, and UHF-ECR antennas, almost parallel to the foregoing axial line, are opened at the opposite side to that of the vacuum transport chamber.

67. 外观设计

USD394404S Wrist watch 失效
公开(公告)号：USD394404S
公开(公告)日：1998-05-19
申请号：US73111
申请日：1997-06-30
申请人： Shingo Ishizaka , Hideyuki Yamamoto
设计人： Shingo Ishizaka , Hideyuki Yamamoto

68. 外观设计

USD387678S Watch case with a protection device 失效
公开(公告)号：USD387678S
公开(公告)日：1997-12-16
申请号：US61149
申请日：1996-10-16
申请人： Hideyuki Yamamoto
设计人： Hideyuki Yamamoto

69. 发明授权

US5404819A Apparatus for cleaning printing press blanket cylinder and method for manufacturing the same 失效
标题翻译：印刷机用橡皮滚筒清洗装置及其制造方法
公开(公告)号：US5404819A
公开(公告)日：1995-04-11
申请号：US283168
申请日：1994-08-03
申请人： Toru Hishinuma , Hideyuki Yamamoto
发明人： Toru Hishinuma , Hideyuki Yamamoto
IPC分类号： B41F35/06 , B41L41/06
CPC分类号： B41F35/06 , B41P2235/246
摘要： A blanket cylinder cleaning apparatus includes a pressure pad for pressing a cleaning fabric against a rotating blanket cylinder in a printing press to wipe away unwanted matter such as residual ink on the peripheral surface of the blanket cylinder. The pressure pad is hollow and filled with gelatinous viscoelastic material to stably bring the cleaning fabric into adequate contact with the blanket cylinder to efficiently clean the blanket cylinder. The viscoelastic material is solated with heat and readily injected into the inside space of the pressure pad.
摘要翻译：橡皮布滚筒清洁装置包括用于将清洁织物压靠在印刷机中的旋转橡皮布滚筒上的压垫，以擦除不需要的物质，例如橡皮布滚筒的外周表面上的残留墨。压力垫是中空的并且填充有凝胶状粘弹性材料，以稳定地使清洁织物与橡皮滚筒充分接触以有效地清洁橡皮布滚筒。粘弹性材料被热固化并容易地注入到压力垫的内部空间中。

70. 外观设计

USD339302S Wrist watch 失效
公开(公告)号：USD339302S
公开(公告)日：1993-09-14
申请号：US812228
申请日：1991-12-23
申请人： Hideyuki Yamamoto
设计人： Hideyuki Yamamoto

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