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    • 61. 发明申请
    • Semiconductor memory device
    • 半导体存储器件
    • US20080279017A1
    • 2008-11-13
    • US12149549
    • 2008-05-05
    • Hiroki ShimanoKazutami Arimoto
    • Hiroki ShimanoKazutami Arimoto
    • G11C7/00G11C5/14G11C8/00
    • G11C5/14G11C5/063G11C5/148G11C11/406G11C11/4074G11C2211/4067
    • During a stand-by state in which power supply is cut off, a high-voltage power supply control circuit isolates a global negative voltage line transmitting a negative voltage and a local negative voltage line provided corresponding to each respective sub array block from each other and isolates a global ground line and a local ground line transmitting a ground voltage from each other. These local ground line and local negative voltage line are charged to a high voltage level through a high voltage line before cut-off from the corresponding power supply. A leakage current path from a word line to the negative voltage line or the ground line is cut off, so that the word line in a non-selected state can reliably be maintained at a non-selection voltage. Thus, in a low power consumption stand-by mode, data stored in a memory cell can be held in a stable manner.
    • 在电源被切断的待机状态下,高电压电源控制电路将发送负电压的全局负电压线与对应于每个各个子阵列块的局部负电压线相互隔离, 隔离全球接地线和传输地电压的局部接地线。 这些本地接地线和局部负电压线在从相应电源切断之前通过高压线充电到高电压电平。 从字线到负电压线或接地线的漏电流路径被切断,使得未选择状态的字线可以可靠地保持在非选择电压。 因此,在低功耗待机模式中,可以以稳定的方式保存存储在存储单元中的数据。
    • 70. 发明授权
    • X-ray exposure system with curved reflecting mirrors
    • 具有弯曲反射镜的X射线曝光系统
    • US5249215A
    • 1993-09-28
    • US848312
    • 1992-03-09
    • Hiroki Shimano
    • Hiroki Shimano
    • G03F7/20G21K1/06H01L21/027H01L21/30H05H13/04
    • G03F7/702
    • X-ray exposure equipment which can effectively converge a synchrotron radiation, which tends to diverge to a great extent in a horizontal direction, to assure a sufficiently high intensity on a lithographic plane and can irradiate X-rays perpendicularly to a full lateral extent of the lithographic plane over an entire exposure area. The X-ray exposure equipment comprises a point X-ray source and a first reflecting mirror having first and second point focuses and disposed such that the first focal point coincides with the location of the X-ray source so as to focus X-rays to the second focal point. A second reflecting mirror is disposed such that the focus thereof substantially coincides with the second focal point of the first reflecting mirror so as to collimate X-rays received from the first reflecting mirror by way of the focusing property thereof in parallel to a principal optical axis of an optical system for X-rays which includes the first and second reflecting mirrors. The parallel X-rays from the second reflecting mirror are irradiated perpendicularly to a lithographic plane.
    • 可以有效地收敛在水平方向上大幅度分散的同步加速器辐射的X射线曝光设备,以确保在平版印刷平面上具有足够高的强度,并能够垂直于X射线的全部横向辐射X射线 在整个曝光区域的平版印刷平面。 X射线曝光设备包括点X射线源和具有第一和第二点聚焦的第一反射镜,并且被布置成使得第一焦点与X射线源的位置一致,以将X射线聚焦到 第二个焦点。 第二反射镜被设置为使得其焦点基本上与第一反射镜的第二焦点重合,以便通过其聚焦特性将从第一反射镜接收到的X射线平行于主光轴 包括第一和第二反射镜的用于X射线的光学系统。 来自第二反射镜的平行X射线垂直于光刻平面照射。