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61. 发明授权

US08431186B2 Method for the coating of a diesel particle filter and diesel particle filter produced thereby 有权
标题翻译：由此生产的柴油颗粒过滤器和柴油颗粒过滤器的涂覆方法
公开(公告)号：US08431186B2
公开(公告)日：2013-04-30
申请号：US12866982
申请日：2009-02-17
申请人： Gerald Jeske , Marcus Pfeifer , Wolfgang Schneider , Franz Dornhaus , Ralf Mueller , Michael Schiffer
发明人： Gerald Jeske , Marcus Pfeifer , Wolfgang Schneider , Franz Dornhaus , Ralf Mueller , Michael Schiffer
IPC分类号： B05D7/22 , B01J29/04 , B01J29/06
CPC分类号： B01J35/04 , B01J23/40 , B01J23/58 , B01J23/63 , B01J35/0006 , B01J37/0244 , B01J37/0246 , F01N3/035
摘要： To equip a diesel particle filter with a zeolite-containing coating uniformly over the entire length of the particle filter and with a further zeolite-free coating which is applied, from the entry side of the filter, solely up to a specific length of the filter, it is proposed, first, to apply the zeolite-free coating from the entry side of the filter and only thereafter to apply the zeolite-containing coating over the entire length of the filter from the exit side of the filter. As a result of this sequence of coatings, a better adhesive strength of the coatings than when both coatings are applied from the entry side is ensured.
摘要翻译：为了在颗粒过滤器的整个长度上均匀地装载含有沸石的涂层的柴油颗粒过滤器，并且从过滤器的进入侧施加另外的无沸石涂层，直到过滤器的特定长度首先，提出从过滤器的入口侧施加无沸石涂层，然后仅从过滤器的出口侧在过滤器的整个长度上施加含沸石的涂层。作为这种涂层顺序的结果，确保了从入口侧施加两个涂层的涂层的更好的粘合强度。

62. 发明申请

US20130079698A1 METHOD OF INITIALISING AN APPARATUS FOR BLOOD TREATMENT IN THE SINGLE-NEEDLE MODE AND APPARATUS FOR BLOOD TREATMENT IN THE SINGLE-NEEDLE MODE 有权
标题翻译：单针模式血液处理装置及单针模式血液处理装置的方法
公开(公告)号：US20130079698A1
公开(公告)日：2013-03-28
申请号：US13700586
申请日：2011-06-03
申请人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
发明人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
IPC分类号： A61M5/00
CPC分类号： A61M5/00 , A61M1/30 , A61M1/303 , A61M1/306 , A61M1/308 , A61M2205/07
摘要： An apparatus and method for blood treatment for the single-needle mode, the apparatus having an extra-corporeal blood circuit with a blood infeed line running to the inlet and a blood return line leading away from the outlet, of a blood treating unit, includes in the blood return line a device, e.g., container, for amassing blood, which is in flow-permitting connection for gas transfer with a device, e.g., container, for storing gas. A pressure is calculated and set in the device for storing gas before the arterial and venous phases are started, with two constraints. First, the pressure should be sufficiently low to ensure both no infusion of air into the patient and also regulated flow of blood into the patient even at opposing pressures lower than ambient pressure. Second, the pressure should be sufficiently high to expel blood from the device for amassing blood into the device for storing gas.
摘要翻译：一种用于单针模式的血液处理的装置和方法，所述装置具有血液处理单元的离开出口处的入口线和从血液出口导出的血液回流管线的具有血液输入管线的体外血液回路，在血液返回管路中，用于积聚血液的装置，例如容器，其用于与用于储存气体的装置（例如容器）进行气体转移的流动允许连接。计算并设置在用于在动脉和静脉期开始之前储存气体的装置中具有两个限制。首先，压力应该足够低，以确保不向患者输入空气，并且即使在低于环境压力的相对压力下，也将血液调节到患者体内。第二，压力应该足够高，以将血液从装置中排出以将血液聚集到用于储存气体的装置中。

63. 发明申请

US20130028788A1 Method as well as apparatuses for testing at least one function of a medical functional device 有权
标题翻译：方法以及用于测试医疗功能装置的至少一个功能的装置
公开(公告)号：US20130028788A1
公开(公告)日：2013-01-31
申请号：US13559873
申请日：2012-07-27
申请人： Soeren Gronau , Joachim Manke , Ralf Mueller , Ingo SCHAEFER
发明人： Soeren Gronau , Joachim Manke , Ralf Mueller , Ingo SCHAEFER
IPC分类号： G01L27/00 , A61M1/34 , A61M1/14
CPC分类号： A61M1/1621 , A61M1/14 , A61M1/1605 , A61M1/34 , A61M1/3413 , A61M1/3434 , A61M1/3607 , A61M39/24 , A61M2205/12 , A61M2205/15 , A61M2205/18 , A61M2205/27 , A61M2205/3306 , A61M2205/3331 , A61M2205/3368 , A61M2205/50 , A61M2205/70
摘要： The invention relates to a method for testing at least one function of a medical functional device which is inserted in and connected and compressed with a medical treatment apparatus, and/or a function of this treatment apparatus, wherein between a hydraulic device or a pneumatic unit of the treatment apparatus and the functional device at least one fluid communication is established. It further relates to a detection device which is programmed and/or configured for executing the method according to the invention as well as a medical treatment apparatus which comprises at least one detection device and/or is in signal transmission or is connected for signal transmission with it, a digital storage medium, a computer program product as well as a computer program.
摘要翻译：本发明涉及一种用于测试插入并与医疗处理设备连接并压缩的医疗功能设备的至少一个功能的方法和/或该处理设备的功能，其中在液压设备或气动单元的治疗装置和功能装置建立至少一个流体连通。本发明还涉及一种被编程和/或配置用于执行根据本发明的方法的检测装置，以及包括至少一个检测装置和/或处于信号传输中或被连接用于信号传输的医疗处理装置，它，数字存储介质，计算机程序产品以及计算机程序。

64. 发明申请

US20110304926A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR 有权
标题翻译：投影曝光装置，投影曝光方法和镜像的目标投影目标
公开(公告)号：US20110304926A1
公开(公告)日：2011-12-15
申请号：US13217793
申请日：2011-08-25
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
摘要翻译：投影物镜具有物体表面和图像表面。投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。光学元件包括凹面镜，第一偏转镜和第二偏转镜。第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

65. 发明授权

US08027088B2 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
标题翻译：反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜
公开(公告)号：US08027088B2
公开(公告)日：2011-09-27
申请号：US11964527
申请日：2007-12-26
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B27/28 , G02B5/30
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror, a first deflecting mirror tilted relative to the optical axis and a second deflecting mirror. The catadioptric projection objective can image patterns including sub-patterns oriented in various directions such that line width variations due to differences of orientation of sub-patterns are largely avoided.
摘要翻译：通常，一方面，本发明的特征在于一种反射折射投影物镜，其具有沿着光轴布置的多个光学元件，以将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上。光学元件包括凹面镜，相对于光轴倾斜的第一偏转镜和第二偏转镜。反射折射投影物镜可以对包括在各个方向上取向的子图案的图案图案进行图像化，从而大大避免了由于子图案的取向差异引起的线宽变化。

66. 发明申请

US20100277708A1 ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20100277708A1
公开(公告)日：2010-11-04
申请号：US12836436
申请日：2010-07-14
申请人： Damian Fiolka , Ralf Mueller , Andras G. Major
发明人： Damian Fiolka , Ralf Mueller , Andras G. Major
IPC分类号： G03B27/72
CPC分类号： G03F7/70208 , G03F7/70116
摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

67. 发明申请

US20100231888A1 OPTICAL SYSTEM 有权
标题翻译：光学系统
公开(公告)号：US20100231888A1
公开(公告)日：2010-09-16
申请号：US12782831
申请日：2010-05-19
申请人： Ralf Mueller , Toralf Gruner
发明人： Ralf Mueller , Toralf Gruner
IPC分类号： G03B27/72 , G02B27/28 , G03F7/20
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The disclosure provides an optical system having an optical axis, where the optical system includes a polarization manipulator which includes first and second subelements. The first subelement has a non-planar, optically effective surface. For light passing through the first subelement, the first subelement causes a change in the polarization state. A maximum effective retardation introduced by the first subelement along the optical axis is less than a quarter of the working wavelength of the optical system. The first subelement and the second subelement have mutually facing surfaces which are mutually complementary. The optical system also includes a position manipulator to manipulate the relative position of the first and second subelements.
摘要翻译：本公开提供了一种具有光轴的光学系统，其中光学系统包括包括第一和第二子元件的偏振操纵器。第一个子元件具有非平面的光学有效表面。对于通过第一子元件的光，第一子元件导致极化状态的变化。由第一子元件沿着光轴引入的最大有效延迟小于光学系统的工作波长的四分之一。第一子元件和第二子元件具有相互互补的相互面对的表面。光学系统还包括位置操纵器来操纵第一和第二子元件的相对位置。

68. 发明申请

US20100097592A1 HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS 有权
标题翻译：高传输，高光电子投影预测目标和投影曝光装置
公开(公告)号：US20100097592A1
公开(公告)日：2010-04-22
申请号：US12580369
申请日：2009-10-16
申请人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
发明人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
IPC分类号： G03B27/54 , G02B27/18 , G02B17/08
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译：本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在投影物镜的物体表面。本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。

69. 发明申请

US20100022980A1 WRAPPER SEALING PROCESS AND ARTICLE 有权
标题翻译：包装密封工艺和文章
公开(公告)号：US20100022980A1
公开(公告)日：2010-01-28
申请号：US12444656
申请日：2007-10-12
申请人： Joseph Junio , David L. Kimball , Ralf Mueller , Tony Ng
发明人： Joseph Junio , David L. Kimball , Ralf Mueller , Tony Ng
IPC分类号： A61F13/20 , B65B11/56
CPC分类号： A61F13/2085 , A61F13/55175 , A61F15/003 , Y10S604/904
摘要： A process for overwrapping a catamenial device such as a tampon includes the steps of providing a substantially cylindrical overwrapper material, inserting a catamenial device into the overwrap material, and closing the open end of the overwrapper material. The overwrapper material has an open end, a closed end, and a first length. The catamenial device has a tapered insertion end, a longitudinal axis, and a length less than the first length, such that the open end of the overwrapper material extends beyond the insertion end of the inserted catamenial device. Concave clamping jaws are applied to the open end of the overwrapper material to urge it toward the longitudinal axis of the catamenial device; to conform portions of the overwrapper material to the insertion end of the catamenial device; and to fold overwrapper material between adjacent clamping jaws to form fins extending outwardly from the conformed portions.
摘要翻译：用于包装月经装置（例如卫生棉条）的方法包括以下步骤：提供基本上圆柱形的外包装材料，将月经装置插入外包装材料中，以及封闭外包装材料的开口端。外包装材料具有开口端，封闭端和第一长度。月经装置具有锥形插入端，纵向轴线和小于第一长度的长度，使得外包裹材料的开口端延伸超过插入的月经装置的插入端。凹面夹钳被施加到外包装材料的开口端以将其推向月经装置的纵向轴线; 将外包装材料的一部分配合到月经装置的插入端; 并且在相邻夹爪之间折叠外包装材料以形成从配合部分向外延伸的翅片。

70. 发明申请

US20090306921A1 SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS 有权
标题翻译：通过使用定向ZERNIKE POLYNOMIALS的光学系统的规格，优化和匹配
公开(公告)号：US20090306921A1
公开(公告)日：2009-12-10
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01M11/02 , G06F19/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

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