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61. 发明授权

US07052553B1 Wet cleaning of electrostatic chucks 有权
标题翻译：湿式清洁静电卡盘
公开(公告)号：US07052553B1
公开(公告)日：2006-05-30
申请号：US11000388
申请日：2004-12-01
申请人： Hong Shih , Tuochuan Huang , Catherine Zhou , Bruno Morel , Brian McMillin , Paul Mulgrew , Armen Avoyan
发明人： Hong Shih , Tuochuan Huang , Catherine Zhou , Bruno Morel , Brian McMillin , Paul Mulgrew , Armen Avoyan
IPC分类号： B08B6/00
CPC分类号： H01L21/6831 , B08B3/12 , H01L21/6704
摘要： A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
摘要翻译：用于清洁新的或使用过的静电卡盘的非破坏性和简单的方法包括湿式清洁工艺，其去除沉积在静电卡盘的表面上的污染物。

62. 发明申请

US20050284573A1 Bare aluminum baffles for resist stripping chambers 审中-公开
标题翻译：用于抗剥离室的裸铝挡板
公开(公告)号：US20050284573A1
公开(公告)日：2005-12-29
申请号：US10874566
申请日：2004-06-24
申请人： Fred Egley , Michael Kang , Anthony Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
发明人： Fred Egley , Michael Kang , Anthony Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
IPC分类号： B44C1/22 , C23C8/02 , C23C8/10 , C23F1/00 , G03F7/42 , H01J37/32
CPC分类号： H01J37/32633 , C23C8/02 , C23C8/10 , G03F7/427 , H01J37/32357 , H01J2237/3342
摘要： Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
摘要翻译：裸铝挡板适用于抗蚀剂剥离室，并且包括外部氧化铝层，其可以是天然氧化铝层或通过化学处理新的或使用的裸铝挡板形成薄的外部氧化铝层而形成的层。

63. 发明申请

US20050161061A1 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system 审中-公开
标题翻译：在等离子体处理系统中清洁包含氧化钇的一组结构的方法
公开(公告)号：US20050161061A1
公开(公告)日：2005-07-28
申请号：US10666331
申请日：2003-09-17
申请人： Hong Shih , Anthony Chen , Sok Tan , Stephen Hwang , John Daugherty , Bruno Morel
发明人： Hong Shih , Anthony Chen , Sok Tan , Stephen Hwang , John Daugherty , Bruno Morel
IPC分类号： B08B3/00 , B08B6/00 , B08B7/00 , B08B9/00 , B44C1/22 , C23G1/00 , C23G1/02 , H01L20060101
CPC分类号： H01J37/32431 , H01J2237/335
摘要： A method of removing a set of particles from a set of structures including yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution including an oxidizer for a first period. The method also includes removing the set of structures from the first solution, and exposing the set of structures to a second solution including a keytone reagent for a second period. The method further includes removing the set of structures from the second solution, and mechanically rubbing the set of structures with a third solution including a first set of acids for a third period.
摘要翻译：公开了从包括氧化钇的一组结构中去除一组颗粒的方法。该方法包括将该组结构暴露于包括第一期间的氧化剂的第一溶液。该方法还包括从第一解决方案中移除该组结构，以及将该组结构暴露于包括第二期间的键控试剂的第二溶液。所述方法还包括从所述第二溶液中去除所述一组结构，并且在第三周期内用包含第一组酸的第三溶液机械地摩擦所述一组结构。

64. 发明授权

US06649532B1 Methods for etching an organic anti-reflective coating 失效
标题翻译：蚀刻有机抗反射涂层的方法
公开(公告)号：US06649532B1
公开(公告)日：2003-11-18
申请号：US10143489
申请日：2002-05-09
申请人： Hui Chen , Xikun Wang , Hong Shih , Chun Yan , Wai-Fan Yau
发明人： Hui Chen , Xikun Wang , Hong Shih , Chun Yan , Wai-Fan Yau
IPC分类号： H01L21302
CPC分类号： C03C17/34 , C03C2218/33 , H01L21/0276 , H01L21/31138 , H01L21/32139
摘要： One embodiment of the present invention is a process for etching an organic anti-reflective coating on a base of a substrate, the process including steps of: (a) placing the substrate into a processing chamber; (b) introducing into the processing chamber a processing gas including one or more of carbon monoxide (CO), carbon dioxide (CO2), and sulfur oxide (SO2); and (c) forming a plasma from the processing gas to etch the organic anti-reflective coating layer.
摘要翻译：本发明的一个实施方案是用于在衬底的基底上蚀刻有机抗反射涂层的方法，该方法包括以下步骤：（a）将衬底放置在处理室中; （b）将包括一氧化碳（CO），二氧化碳（CO 2）和硫氧化物（SO 2））中的一种或多种的处理气体引入处理室; 和（c）从处理气体形成等离子体以蚀刻有机抗反射涂层。

65. 发明授权

US5194138A Method for creating a corrosion-resistant aluminum surface 失效
标题翻译：制造耐腐蚀铝表面的方法
公开(公告)号：US5194138A
公开(公告)日：1993-03-16
申请号：US556109
申请日：1990-07-20
申请人： Florian B. Mansfeld , Hong Shih , You Wang
发明人： Florian B. Mansfeld , Hong Shih , You Wang
IPC分类号： C23C22/56
CPC分类号： C23C22/56
摘要： A method for treating the surface of an aluminum-based material so as to make the surface resistant to corrosion includes the steps of contacting the surface with an aqueous cerium non-halide solution and then contacting the surface with an aqueous cerium halide solution. These steps may optionally be followed by a step of positively charging the metal surface while in contact with an aqueous molybdenum solution.
摘要翻译：用于处理铝基材料的表面以使表面耐腐蚀的方法包括使表面与无水卤化铈水溶液接触，然后使表面与卤化铈水溶液接触的步骤。这些步骤可以任选地在与钼水溶液接触的同时对金属表面进行正电充电的步骤。

66. 发明授权

US09293305B2 Mixed acid cleaning assemblies 有权
标题翻译：混合酸洗组件
公开(公告)号：US09293305B2
公开(公告)日：2016-03-22
申请号：US13483566
申请日：2012-05-30
申请人： Armen Avoyan , Cliff La Croix , Hong Shih , John Daugherty
发明人： Armen Avoyan , Cliff La Croix , Hong Shih , John Daugherty
IPC分类号： B08B3/08 , H01J37/32 , B08B9/032 , B08B3/04 , C23C16/44
CPC分类号： H01J37/3288 , B08B3/04 , B08B3/08 , B08B9/0323 , B08B9/0328 , C23C16/4407 , H01J37/3244 , H01J37/32889
摘要： In one embodiment, a cleaning assembly may include a modular electrode sealing housing, an acid injection inlet, and a fluid injection inlet. The modular electrode sealing housing may include a high pressure closure member that contains a first cleaning volume and a low pressure closure member that contains a second cleaning volume. The acid injection inlet can be in fluid communication with the first cleaning volume of the high pressure closure member. The fluid injection inlet can be in fluid communication with the second cleaning volume of the low pressure closure member. During normal operation, a showerhead electrode can be sealed within the modular electrode sealing housing such that the first cleaning volume is located on a first side and the second cleaning volume is located on a second side of the showerhead electrode.
摘要翻译：在一个实施例中，清洁组件可以包括模块化电极密封壳体，酸注射入口和流体注射入口。模块化电极密封壳体可以包括包含第一清洁体积的高压关闭构件和包含第二清洁体积的低压关闭构件。酸注入口可以与高压关闭构件的第一清洁体积流体连通。流体注射入口可以与低压关闭构件的第二清洁体积流体连通。在正常操作期间，喷头电极可以密封在模块化电极密封壳体内，使得第一清洁体积位于第一侧上，第二清洁体积位于喷头电极的第二侧。

67. 发明申请

US20130019907A1 Dual Phase Cleaning Chambers and Assemblies Comprising The Same 有权
标题翻译：双相清洗室和组件包括它
公开(公告)号：US20130019907A1
公开(公告)日：2013-01-24
申请号：US13186827
申请日：2011-07-20
申请人： Armen Avoyan , Cliff La Croix , Hong Shih
发明人： Armen Avoyan , Cliff La Croix , Hong Shih
IPC分类号： B08B3/00
CPC分类号： H01J37/32862 , B08B3/00 , B08B3/02 , H01J21/00 , H01J37/32532 , H01L21/00
摘要： In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.
摘要翻译：在一个实施例中，双相清洗室可以包括湍流混合室，流体扩散器，等静压压力室和破裂缓冲喷嘴。湍流混合室可以与第一流体入口和第二流体入口流体连通。流体扩散器可以与湍流混合室流体连通。破裂缓冲喷嘴可以包括第一流体收集偏移，第二流体收集偏移和位移阻尼突起。位移阻尼突起可以设置在第一和第二流体收集偏移之间，并且可以偏离第一流体收集偏移和第二流体收集偏移中的每一个并且朝向流体扩散器偏移。从第一流体入口，第二流体入口或二者引入的加压清洁流体流过第一和第二流体收集偏移的出口通道。

68. 发明授权

US08292698B1 On-line chamber cleaning using dry ice blasting 有权
标题翻译：使用干冰喷砂在线室清洁
公开(公告)号：US08292698B1
公开(公告)日：2012-10-23
申请号：US11730299
申请日：2007-03-30
申请人： Hong Shih , Oana M. Leonte , John E. Daugherty , Tuochuan Huang , Gregory J. Goldspring , Michael C. May
发明人： Hong Shih , Oana M. Leonte , John E. Daugherty , Tuochuan Huang , Gregory J. Goldspring , Michael C. May
IPC分类号： B24B1/00 , B24C1/00
CPC分类号： B24C1/003 , B08B7/0021 , B08B7/0092 , H01J37/32853 , H01J37/32862 , H01J37/3288 , H01J2237/022 , H01L21/67028
摘要： An on-line method of cleaning contaminants from at least one interior surface in plasma chambers comprises blasting one or more interior surfaces of a plasma chamber with dry ice to remove contaminants from the one or more surfaces.
摘要翻译：在等离子体室中从至少一个内表面清洁污染物的在线方法包括用干冰喷射等离子体室的一个或多个内表面以从一个或多个表面去除污染物。

69. 发明授权

US08221552B2 Cleaning of bonded silicon electrodes 有权
标题翻译：粘结硅电极的清洁
公开(公告)号：US08221552B2
公开(公告)日：2012-07-17
申请号：US11730296
申请日：2007-03-30
申请人： Duane Outka , Jason Augustino , Armen Avoyan , Stephen Whitten , Hong Shih , Yan Fang
发明人： Duane Outka , Jason Augustino , Armen Avoyan , Stephen Whitten , Hong Shih , Yan Fang
IPC分类号： B08B17/02 , B08B3/04 , B08B5/02 , B08B1/04
CPC分类号： B08B3/04 , H01J37/32862
摘要： Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member.
摘要翻译：清洁等离子体处理室部件的方法包括将部件的表面与清洁溶液接触，同时避免清洁溶液损坏其它表面或部件区域。要清洁的示例性等离子体处理室部件是具有硅构件的弹性体接合电极组件，其具有等离子体暴露的硅表面，背衬构件和在硅表面和背衬构件之间的弹性体接合材料。

70. 发明申请

US20120013242A9 BACKSIDE MOUNTED ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME 有权
标题翻译：背面安装的电极载体和装配的装置
公开(公告)号：US20120013242A9
公开(公告)日：2012-01-19
申请号：US12164285
申请日：2008-06-30
申请人： Jason Augustino , Armen Avoyan , Yan Fang , Duane Outka , Hong Shih , Stephen Whitten
发明人： Jason Augustino , Armen Avoyan , Yan Fang , Duane Outka , Hong Shih , Stephen Whitten
IPC分类号： H01J19/42
CPC分类号： H01J37/32568 , H01J37/32091 , H01J37/32605
摘要： A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.
摘要翻译：提供的载体组件包括背面安装的电极载体和电极安装硬件。背面安装的电极载体包括电极容纳孔，电极容纳孔又包括被配置为限制定位在孔中的电极的横向移动的侧壁结构。电极容纳孔还包括支撑位于孔中的电极的重量的一个或多个侧壁突起。电极安装硬件被配置成从位于载体的背面的电极容纳孔中的电极接合，并且将电极推靠在侧壁突起上，以限制电极在电极容纳孔中的轴向移动。考虑到更广泛和更窄范围的另外的实施例。

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