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61. 发明申请

US20080264905A1 METHODS AND SYSTEMS FOR MEASURING A CHARACTERISTIC OF A SUBSTRATE OR PREPARING A SUBSTRATE FOR ANALYSIS 失效
标题翻译：用于测量基板特性或制备用于分析的基板的方法和系统
公开(公告)号：US20080264905A1
公开(公告)日：2008-10-30
申请号：US12110759
申请日：2008-04-28
申请人： Mehran Nasser-Ghodsi , Mark Borowicz , Dave Bakker , Mehdi Vaez-Iravani , Prashant Aji , Rudy F. Garcia , Tzu Chin Chuang
发明人： Mehran Nasser-Ghodsi , Mark Borowicz , Dave Bakker , Mehdi Vaez-Iravani , Prashant Aji , Rudy F. Garcia , Tzu Chin Chuang
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01J37/317 , G01N1/32 , H01J37/244 , H01J37/3005 , H01J2237/2814 , H01J2237/3174 , H01J2237/31745
摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.
摘要翻译：提供了用于测量基板的特性或准备用于分析的基板的方法和系统。用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。该特征可以是光致抗蚀剂特征。该方法还包括测量横截面轮廓的特性。制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。缺陷可能是地下缺陷或部分地下缺陷。制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

62. 发明授权

US07365834B2 Optical system for detecting anomalies and/or features of surfaces 有权
标题翻译：用于检测表面异常和/或特征的光学系统
公开(公告)号：US07365834B2
公开(公告)日：2008-04-29
申请号：US10874861
申请日：2004-06-22
申请人： Isabella Lewis , Mehdi Vaez-Iravani
发明人： Isabella Lewis , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501
摘要： A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corresponding detector arrays, although a different number of channels and detector arrays may be used. One or both illumination beams are focused to a line on the surface to be inspected and each line is imaged onto one or more detector arrays in the up to three or more detection and collection channels. Relative motion is caused between the lines and the surface inspected in a direction perpendicular to the lines, thereby increasing throughput while retaining high resolution and sensitivity. The same detection channels may be employed by detecting scattered or reflected radiation from both illumination beams. Fourier filters may be employed to filter out diffraction at one or more different spatial frequencies.
摘要翻译：系统的表面检查应用第一倾斜照明光束并且还可以施加第二照明光束以顺序地或同时地照射表面。尽管可以使用不同数量的通道和检测器阵列，但优选地通过三个收集通道收集反射或散射的辐射并且由三个对应的检测器阵列检测。一个或两个照明光束被聚焦到要检查的表面上的线，并且每条线被成像到多达三个或更多个检测和收集通道中的一个或多个检测器阵列上。在垂直于线路的方向上在线和表面之间产生相对运动，从而在保持高分辨率和灵敏度的同时增加产量。可以通过检测来自两个照明光束的散射或反射辐射来采用相同的检测通道。可以使用傅立叶滤波器来滤出在一个或多个不同空间频率处的衍射。

63. 发明申请

US20060007435A1 Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination 有权
标题翻译：使用多角度和多波长照明的晶圆检查系统的系统和方法
公开(公告)号：US20060007435A1
公开(公告)日：2006-01-12
申请号：US11227555
申请日：2005-09-14
申请人： Steve Biellak , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Steve Biellak , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/88
CPC分类号： G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/9501 , G01N2021/8825 , H01L22/12
摘要： A method for detecting an anomaly on a top surface of a substrate comprises directing a first radiation beam having a first wavelength at the top surface of the substrate at a first angle measured from normal, and directing a second radiation beam having a second wavelength at the top surface of the substrate at a second angle measured from normal, wherein the second wavelength is not equal to the first wavelength. The method then comprises detecting scattered radiation from the first radiation beam and the second radiation beam to detect the presence of particles or COPs, and to differentiate between the two. Differences in the scattered radiation detected from the first radiation beam and from the second radiation beam provide the data needed to differentiate between particles and COPs.
摘要翻译：用于检测衬底的顶表面上的异常的方法包括以从正常测量的第一角度引导具有第一波长的第一辐射束在衬底的顶表面处，并且将具有第二波长的第二辐射束引导到从正常测量的第二角度的衬底的顶表面，其中第二波长不等于第一波长。该方法然后包括检测来自第一辐射束和第二辐射束的散射辐射，以检测颗粒或COP的存在，并区分两者。从第一辐射束和第二辐射束检测的散射辐射的差异提供了区分颗粒和COP之间所需的数据。

64. 发明授权

US06922236B2 Systems and methods for simultaneous or sequential multi-perspective specimen defect inspection 有权
标题翻译：用于同时或顺序多视角样本缺陷检查的系统和方法
公开(公告)号：US06922236B2
公开(公告)日：2005-07-26
申请号：US10192813
申请日：2002-07-10
申请人： Mehdi Vaez-Iravani , Stan Stokowski , Steven Biellak , Jamie Sullivan , Keith Wells , Mehrdad Nikoonahad
发明人： Mehdi Vaez-Iravani , Stan Stokowski , Steven Biellak , Jamie Sullivan , Keith Wells , Mehrdad Nikoonahad
IPC分类号： G01N21/84 , G01N21/47 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/027 , H01L21/66 , G01N21/88
CPC分类号： G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8825
摘要： Systems and methods for inspecting a surface of a specimen such as a semiconductor wafer are provided. A system may include an illumination system configured to direct a first beam of light to a surface of the specimen at an oblique angle of incidence and to direct a second beam of light to a surface of the specimen at a substantially normal angle. The system may also include a collection system configured to collect at least a portion of the first and second beams of light returned from the surface of the specimen. In addition, the system may include a detection system. The detection system may be configured to process the collected portions of the first and second beams of light. In this manner, a presence of defects on the specimen may be detected from the collected portions of the first and second beams of light.
摘要翻译：提供了用于检查诸如半导体晶片的样本的表面的系统和方法。系统可以包括照明系统，其被配置为以倾斜的入射角度将第一光束引导到样品的表面，并以基本上一般的角度将第二光束引导到样品的表面。系统还可以包括收集系统，其被配置为收集从样本表面返回的第一和第二光束的至少一部分。另外，该系统可以包括检测系统。检测系统可以被配置为处理第一和第二光束的收集部分。以这种方式，可以从第一和第二光束的收集部分检测出样本上的缺陷。

65. 发明授权

US06208411B1 Massively parallel inspection and imaging system 有权
标题翻译：大规模并行检测和成像系统
公开(公告)号：US06208411B1
公开(公告)日：2001-03-27
申请号：US09161864
申请日：1998-09-28
申请人： Mehdi Vaez-Iravani
发明人： Mehdi Vaez-Iravani
IPC分类号： G01N2188
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/9501 , G01N2021/8905
摘要： A massively parallel inspection and imaging system is provided which employs multiple focused beams to illuminate a specimen. Laser light energy passes through a relatively low resolution diffraction grating or digital optical element, which is either one or two dimensional, and concentrates the transmitted energy into multiple discrete directions or orders. The beams split by the diffraction grating pass through a beam expander or telescope and are recombined onto an optical element and diverted toward the specimen. On reflection toward the specimen, the beams diverge again toward a focusing objective. The resultant light thus comprises multiple focused beams, and a relatively large area of the specimen is illuminated simultaneously by these beams. Upon reflection of the light from the sample, light passes back through the focusing objective in multiple beams, and the beams converge toward the optical element and diverge outward in collimated beams. The collimated beams pass through a focusing lens, which brings all beams onto foci on a detector array. Scanning of patterned wafers by the system may occur using coordinated motion of both the scanning beam and the wafer. To achieve proper orientation and observation, the stage speed in the cross direction is set at the ratio of the distance between the first and last lines divided by the period of the scanner.
摘要翻译：提供了大量平行的检查和成像系统，其采用多个聚焦光束照射样本。激光能量通过相对低分辨率的衍射光栅或数字光学元件，其为一维或二维，并将透射的能量集中到多个离散的方向或次序。由衍射光栅分裂的光束通过光束扩展器或望远镜，并重新组合到光学元件上并朝向样本转移。在对样本的反射时，光束再次朝向聚焦目标发散。所得到的光由此包括多个聚焦光束，并且通过这些光束同时照射样本的相对较大的面积。当来自样品的光反射时，光以多个光束返回穿过聚焦物镜，并且光束朝向光学元件会聚，并在准直光束中向外发散。准直光束通过聚焦透镜，其将所有光束带到检测器阵列上的焦点上。通过系统扫描图案化晶片可以使用扫描光束和晶片两者的协调运动来进行。为了实现适当的取向和观察，将横向的台阶速度设定为第一行和最后一行之间的距离除以扫描仪的周期之间的比率。

66. 发明授权

US5798829A Single laser bright field and dark field system for detecting anomalies of a sample 失效
标题翻译：单个激光亮场和暗场系统，用于检测样品的异常
公开(公告)号：US5798829A
公开(公告)日：1998-08-25
申请号：US611109
申请日：1996-03-05
申请人： Mehdi Vaez-Iravani
发明人： Mehdi Vaez-Iravani
IPC分类号： G01N21/88 , G01N21/95 , G01N21/956 , G01N21/00
CPC分类号： G01N21/9501 , G01N2021/8825
摘要： A single laser is used to provide light for both dark and bright field detection. The laser beam is split into two beams by a Wollaston prism and both beams are directed towards a sample to be inspected to illuminate two areas of the sample. The light reflected by or transmitted through the sample at the two spots is then combined by the same or a different Wollaston prism and the phase shift caused by any anomaly of a sample is detected as a phase shift between the two beams by a bright field detector. Light scattered by the sample at the two spots is detected by a dark field detector. A halfwave plate is used to orient the polarization plane of light from the laser incident on the Wollaston prism so that one of the two beams incident on the sample has a much higher intensity than the other and so that the sensitivity and the detection operation of dark field is not altered by the presence of two illuminated spots on the sample. A transparent dielectric at a suitable angle to the incident beam and the reflected or transmitted beam may be used to enhance bright field detection.
摘要翻译：单个激光器用于为暗场和明场检测提供光。激光束被Wollaston棱镜分成两个光束，并且两个光束被引向待检查的样品以照射样品的两个区域。然后通过相同或不同的Wollaston棱镜将由两个点反射或透过样品的光组合起来，并且由样品的任何异常引起的相移通过亮场检测器被检测为两个光束之间的相移。在两个点处由样品散射的光由暗场检测器检测。使用半波片来定向来自入射在渥拉斯顿棱镜上的激光的光的偏振平面，使得入射到样品上的两束光束中的一个具有比另一个更强的强度，并且使得黑暗的灵敏度和检测操作样品上存在两个发光斑点不会改变光场。可以使用与入射光束和反射或透射光束成适当角度的透明电介质来增强亮场检测。

67. 发明授权

US07782452B2 Systems and method for simultaneously inspecting a specimen with two distinct channels 有权
标题翻译：用两个不同通道同时检查样本的系统和方法
公开(公告)号：US07782452B2
公开(公告)日：2010-08-24
申请号：US11848516
申请日：2007-08-31
申请人： Courosh Mehanian , Hans J. Hansen , Yingjian Wang , Yuval Ben-Dov , Zheng-Wu Li , Andrew V. Hill , Mehdi Vaez-Iravani , Kurt Zimmermann
发明人： Courosh Mehanian , Hans J. Hansen , Yingjian Wang , Yuval Ben-Dov , Zheng-Wu Li , Andrew V. Hill , Mehdi Vaez-Iravani , Kurt Zimmermann
IPC分类号： G01N21/00
CPC分类号： G02B21/18 , G01N21/8806 , G01N21/9501 , G01N2021/8825 , G02B21/367
摘要： A system is provided herein for inspecting a specimen. In one embodiment, the system may include a dual-channel microscope, two illuminators, each coupled for illuminating a different channel of the dual-channel microscope and two detectors, each coupled to a different channel of the dual-channel microscope for acquiring images of the specimen. Means are provided for separating the channels of the dual-channel microscope, so that the two detectors can acquire the images of the specimen at substantially the same time. In one embodiment, the channels of the dual-channel microscope may be spectrally separated by configuring the two illuminators, so that they produce light in two substantially non-overlapping spectral ranges. In another embodiment, the channels of the dual-channel microscope may be spatially separated by positioning the two detectors, so that the illumination light do not overlap and the fields of view of the two detectors do not overlap within a field of view of an objective lens included within the system.
摘要翻译：本文提供了用于检查样本的系统。在一个实施例中，系统可以包括双通道显微镜，两个照明器，每个照明器被耦合用于照亮双通道显微镜和两个检测器的不同通道，每个检测器耦合到双通道显微镜的不同通道，用于获取标本。提供了用于分离双通道显微镜的通道的装置，使得两个检测器可以在基本上同时获取样本的图像。在一个实施例中，双通道显微镜的通道可以通过配置两个照明器进行光谱分离，使得它们产生两个基本上非重叠的光谱范围的光。在另一个实施例中，双通道显微镜的通道可以通过定位两个检测器在空间上分离，使得照明光不重叠，并且两个检测器的视场在目标的视场内不重叠镜头包含在系统内。

68. 发明授权

US07471382B2 Surface inspection system with improved capabilities 有权
标题翻译：表面检测系统具有改进的能力
公开(公告)号：US07471382B2
公开(公告)日：2008-12-30
申请号：US11243349
申请日：2005-10-03
申请人： Lawrence Robert Miller , Mehdi Vaez-Iravani
发明人： Lawrence Robert Miller , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.
摘要翻译：还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。

69. 发明授权

US07218392B2 Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination 有权
标题翻译：使用多角度和多波长照明的晶圆检查系统的系统和方法
公开(公告)号：US07218392B2
公开(公告)日：2007-05-15
申请号：US11227555
申请日：2005-09-14
申请人： Steve Biellak , Stanley E. Stokowski , Mehdi Vaez-Iravani
发明人： Steve Biellak , Stanley E. Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/9501 , G01N2021/8825 , H01L22/12
摘要： A method for detecting an anomaly on a top surface of a substrate comprises directing a first radiation beam having a first wavelength at the top surface of the substrate at a first angle measured from normal, and directing a second radiation beam having a second wavelength at the top surface of the substrate at a second angle measured from normal, wherein the second wavelength is not equal to the first wavelength. The method then comprises detecting scattered radiation from the first radiation beam and the second radiation beam to detect the presence of particles or COPs, and to differentiate between the two. Differences in the scattered radiation detected from the first radiation beam and from the second radiation beam provide the data needed to differentiate between particles and COPs.
摘要翻译：用于检测衬底的顶表面上的异常的方法包括以从正常测量的第一角度引导具有第一波长的第一辐射束在衬底的顶表面处，并且将具有第二波长的第二辐射束引导到从正常测量的第二角度的衬底的顶表面，其中第二波长不等于第一波长。该方法然后包括检测来自第一辐射束和第二辐射束的散射辐射，以检测颗粒或COP的存在，并区分两者。从第一辐射束和第二辐射束检测的散射辐射的差异提供了区分颗粒和COP之间所需的数据。

70. 发明授权

US07068363B2 Systems for inspection of patterned or unpatterned wafers and other specimen 有权
标题翻译：用于检查图案或未图案化晶片和其他样品的系统
公开(公告)号：US07068363B2
公开(公告)日：2006-06-27
申请号：US10456203
申请日：2003-06-06
申请人： Christopher F. Bevis , Mike Kirk , Mehdi Vaez-Iravani
发明人： Christopher F. Bevis , Mike Kirk , Mehdi Vaez-Iravani
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/474 , G01N21/94 , G01N21/9501
摘要： Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
摘要翻译：提供了用于图案化和未图案化晶片检查的系统。一个系统包括被配置为照亮样本的照明系统。该系统还包括收集器，用于收集从样品散射的光。此外，该系统包括分段检测器，其被配置为分别检测光的不同部分，使得保持关于光的不同部分的方位角和极坐标信息。检测器还可以被配置为产生表示光的不同部分的信号。该系统还可以包括处理器，其配置成从信号中检测样本上的缺陷。在另一个实施例中，系统可以包括被配置为旋转和平移样本的台。在一个这样的实施例中，系统还可以包括被配置为在样本的旋转和平移期间以宽扫描路径扫描样本的照明系统。

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