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    • 65. 发明授权
    • Manufacturing and cleansing of thin film transistor panels
    • 制造和清洗薄膜晶体管面板
    • US08389454B2
    • 2013-03-05
    • US12645471
    • 2009-12-22
    • Hong-Sick Park
    • Hong-Sick Park
    • C11D7/50
    • C11D11/0047C11D7/263C11D7/3281
    • A manufacturing a thin film transistor array panel includes depositing a first thin film including aluminum on a substrate, patterning the first thin film by photolithography and etching, cleansing the substrate including the first thin film, and depositing a second thin film on the cleansed substrate. The cleansing is performed using a cleansing material including ultrapure water, cyclic amine, pyrogallol, benzotriazole, and methyl glycol. The cleansing material includes ultrapure water at about 85 wt % to about 99 wt %, cyclic amine at about 0.01 wt % to about 1.0 wt %, pyrogallol at about 0.01 wt % to 1.0 wt %, benzotriazole at about 0.01 wt % to 1.0 wt %, and methyl glycol at about 0.01 wt % to 1.0 wt %.
    • 制造薄膜晶体管阵列面板包括在基板上沉积包括铝的第一薄膜,通过光刻和蚀刻对第一薄膜进行图案化,清洗包括第一薄膜的基板,以及在清洁的基板上沉积第二薄膜。 使用包括超纯水,环胺,连苯三酚,苯并三唑和甲基二醇的清洁材料进行清洁。 清洁材料包括约85重量%至约99重量%的超纯水,约0.01重量%至约1.0重量%的环胺,约0.01重量%至1.0重量%的连苯三酚,约0.01重量%至1.0重量%的苯并三唑 %和约0.01重量%至1.0重量%的甲基二醇。