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    • 61. 发明授权
    • Method of alignment between mask and semiconductor wafer
    • 掩模和半导体晶片之间的对准方法
    • US4815854A
    • 1989-03-28
    • US145355
    • 1988-01-19
    • Yoshiharu TanakaEiichi KounoJoji Iwata
    • Yoshiharu TanakaEiichi KounoJoji Iwata
    • G03F9/00H01L21/68G01B9/02
    • G03F9/7076G03F9/7023H01L21/682
    • A method of alignment between a mask and a semiconductor wafer is disclosed. At least one linear Fresnel zone plate lens is provided on the mask, and first and second reflecting gratings are provided one the semiconductor wafer. The first reflecting grating includes a plurality of concaves or convexs arranged with a constant pitch P.sub.1, and the second reflecting grating includes a plurality of concaves of convexs arranged with a constant pitch P.sub.2 different from the pitch P.sub.1 in the first reflecting grating. A monochromatic radiation is irradiated on the mask and first and second reflected radiations from the first and second reflecting gratings are detected by first and second detectors, respectively. A difference value between the outputs of the first and second detectors is obtained, and the relative position between the mask and the semiconductor wafer is displaced in accordance with the difference value.
    • 公开了一种掩模和半导体晶片之间的对准方法。 在掩模上提供至少一个线性菲涅耳带平板透镜,并且第一和第二反射光栅设置在半导体晶片之间。 第一反射光栅包括以恒定间距P1布置的多个凹凸,并且第二反射光栅包括以与第一反射光栅中的间距P1不同的恒定间距P2布置的多个凸起凹部。 单色辐射照射在掩模上,分别由第一和第二检测器检测来自第一和第二反射光栅的第一和第二反射辐射。 获得第一和第二检测器的输出之间的差值,并且掩模和半导体晶片之间的相对位置根据差值位移。
    • 63. 发明授权
    • Flooring
    • 地板
    • US4591532A
    • 1986-05-27
    • US776147
    • 1985-09-13
    • Yoshiharu Tanaka
    • Yoshiharu Tanaka
    • B60R13/00B32B25/02B32B25/10B60N3/04B60R13/08D06N7/00E04F15/10B32B25/12
    • B32B25/10B60N3/048Y10S428/92Y10S428/921Y10T428/3183
    • A flooring to be used for vehicles, vessels, etc. The flooring comprises a lowermost rubber layer which makes direct contact with a floor board of a vehicle, a surface layer which constitutes a surface layer portion of the flooring and an intermediate layer interposed between the lowermost layer and the surface layer. The lowermost rubber layer contains a hydrate which discharges water of crystallization at the temperature of 150.degree.-300.degree. C. and accordingly prevents rise of surface temperature by discharging water of crystallization in case of fire in a vehicle and the intermediate layer checks heat conduction from the lowermost layer and thus rise of surface temperature of flooring can be controlled for many hours.
    • 用于车辆,船舶等的地板。地板包括与车辆的地板板直接接触的最下面的橡胶层,构成地板的表层部分的表面层和介于其间的中间层 最下层和表面层。 最低的橡胶层含有在150-300℃的温度下排出结晶水的水合物,因此通过在车辆中发生火灾时排出结晶水,防止表面温度升高,并且中间层检查热传导 地板的最低层和表面温度的上升可以控制好几个小时。
    • 65. 发明授权
    • Optical low-pass filter
    • 光学低通滤波器
    • US08437084B2
    • 2013-05-07
    • US11909260
    • 2007-01-17
    • Ichiro TsujimuraMasaaki NoseYoshiharu TanakaNaoki Kubo
    • Ichiro TsujimuraMasaaki NoseYoshiharu TanakaNaoki Kubo
    • G02B1/10
    • G02B1/11G02B27/0006G02B27/46G03B19/12H04N5/23212
    • On the light-entering surface side of a base material 10, a coating layer 11 in which a high-refractive layer and a low-refractive layer are sequentially disposed alternately on one on the other is provided for blocking infrared radiation. One of the high-refractive layers is configured by an ITO film 11a so that the conductivity is increased on the surface of the coating layer. Herein, in view of preventing, to a further extent, the attachment of dirt and dust by providing the conductivity to the surface of the coating layer, it is desirable if the outermost high-refractive layer is made of a transparent conductive material. Moreover, it is desirable if the total layer thickness is 140 nm or smaller for the refractive layers formed outside of the high-refractive layer made of the transparent conductive material.
    • 在基材10的光入射表面侧,设置有高折射层和低折射层相互交替排列的涂层11,用于阻挡红外辐射。 高折射层之一由ITO膜11a构成,使得在涂层的表面上导电性增加。 这里,考虑到通过向涂层的表面提供导电性来进一步防止污物和灰尘的附着,所以最理想的是,最外面的高折射层由透明导电材料制成。 此外,对于由透明导电材料制成的高折射层外侧的折射层,总层厚度为140nm以下是理想的。
    • 67. 发明授权
    • Image pickup apparatus shutter control
    • 摄像设备快门控制
    • US08212918B2
    • 2012-07-03
    • US12510486
    • 2009-07-28
    • Yoshiharu TanakaNobuharu Murashima
    • Yoshiharu TanakaNobuharu Murashima
    • H04N5/235H04N3/14G03B7/12G03B7/00
    • G03B7/093
    • An image pickup apparatus includes a controlling unit moving an electronic front curtain in a simulated manner from an exposure start position towards an exposure end position by successively performing reset operations on a plurality of pixels in an image pickup element in a predetermined direction; a rear curtain that moves from the exposure start position towards the exposure end position by a biasing force of a biasing unit; and a storage unit storing data indicating a change in movement characteristics of the rear curtain with time. On the basis of the data, the controlling unit changes movement characteristics of the electronic front curtain in accordance with the change in the movement characteristics of the rear curtain with the time.
    • 图像拾取装置包括:控制单元,通过对图像拾取元件中的多个像素沿预定方向依次执行复位操作,以模拟方式从曝光开始位置朝向曝光结束位置移动电子前幕; 后帘,其通过偏置单元的偏置力从曝光开始位置朝向曝光结束位置移动; 以及存储单元,其存储表示后帘的运动特性随时间的变化的数据。 基于该数据,控制单元根据随后的后帘的运动特性的变化来改变电子前帘的运动特性。