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    • 2. 发明申请
    • Optical Low-Pass Filter
    • 光学低通滤波器
    • US20110116162A1
    • 2011-05-19
    • US11909260
    • 2007-01-17
    • Ichiro TsujimuraMasaaki NoseYoshiharu TanakaNaoki Kubo
    • Ichiro TsujimuraMasaaki NoseYoshiharu TanakaNaoki Kubo
    • G02B5/28
    • G02B1/11G02B27/0006G02B27/46G03B19/12H04N5/23212
    • On the light-entering surface side of a base material 10, a coating layer 11 in which a high-refractive layer and a low-refractive layer are sequentially disposed alternately on one on the other is provided for blocking infrared radiation. One of the high-refractive layers is configured by an ITO film 11a so that the conductivity is increased on the surface of the coating layer. Herein, in view of preventing, to a further extent, the attachment of dirt and dust by providing the conductivity to the surface of the coating layer, it is desirable if the outermost high-refractive layer is made of a transparent conductive material. Moreover, it is desirable if the total layer thickness is 140 nm or smaller for the refractive layers formed outside of the high-refractive layer made of the transparent conductive material.
    • 在基材10的光入射表面侧,设置有高折射层和低折射层相互交替排列的涂层11,用于阻挡红外辐射。 高折射层之一由ITO膜11a构成,使得在涂层的表面上导电性增加。 这里,考虑到通过向涂层的表面提供导电性来进一步防止污物和灰尘的附着,所以最理想的是,最外面的高折射层由透明导电材料制成。 此外,对于由透明导电材料制成的高折射层外侧的折射层,总层厚度为140nm以下是理想的。
    • 5. 发明授权
    • Optical component
    • 光学元件
    • US06493144B2
    • 2002-12-10
    • US09729790
    • 2000-12-06
    • Katsuto TanakaMasaaki Nose
    • Katsuto TanakaMasaaki Nose
    • G02B110
    • G02B1/115
    • An optical component is produced by forming an anti-reflection film on a surface of a molding of a norbornene resin having a polar group. The anti-reflection film is composed of an equivalent film of which the overall refractive index as calculated according to a prescribed formula is 1.52 to 1.8 and that has an intermediate layer measuring 10 to 50 nm in mechanical film thickness and containing Al2O3, a first high-refractive-index layer, and a first low-refractive-index layer containing SiO2 as a main ingredient, a second high-refractive-index layer measuring 0.4&lgr; to 0.6&lgr; (where &lgr; is 480 to 550 nm) in optical film thickness and containing TiO2 as a main ingredient, and a second low-refractive-index layer measuring 0.2&lgr; to 0.3&lgr; in optical film thickness and containing SiO2 as a main ingredient. This ensures that the anti-reflection film adheres to the surface of the molding so strongly as not to exfoliate therefrom.
    • 通过在具有极性基团的降冰片烯树脂的成型体的表面上形成防反射膜来制造光学部件。 防反射膜由等效膜构成,其中根据规定的公式计算的总折射率为1.52至1.8,并且具有机械膜厚度为10至50nm的中间层,并且包含Al 2 O 3,第一高 折射率层和包含SiO 2作为主要成分的第一低折射率层,在光学膜厚度中测量为0.4lambd至0.6lambd(其中lambd为480至550nm)的第二高折射率层,以及 含有TiO 2作为主要成分,第二低折射率层,其光学膜厚度为0.2lambd至0.3lamb,并含有SiO2作为主要成分。 这就确保了防反射膜如此强烈地附着在模制品的表面上而不会脱模。
    • 8. 发明授权
    • Optical low-pass filter
    • 光学低通滤波器
    • US08437084B2
    • 2013-05-07
    • US11909260
    • 2007-01-17
    • Ichiro TsujimuraMasaaki NoseYoshiharu TanakaNaoki Kubo
    • Ichiro TsujimuraMasaaki NoseYoshiharu TanakaNaoki Kubo
    • G02B1/10
    • G02B1/11G02B27/0006G02B27/46G03B19/12H04N5/23212
    • On the light-entering surface side of a base material 10, a coating layer 11 in which a high-refractive layer and a low-refractive layer are sequentially disposed alternately on one on the other is provided for blocking infrared radiation. One of the high-refractive layers is configured by an ITO film 11a so that the conductivity is increased on the surface of the coating layer. Herein, in view of preventing, to a further extent, the attachment of dirt and dust by providing the conductivity to the surface of the coating layer, it is desirable if the outermost high-refractive layer is made of a transparent conductive material. Moreover, it is desirable if the total layer thickness is 140 nm or smaller for the refractive layers formed outside of the high-refractive layer made of the transparent conductive material.
    • 在基材10的光入射表面侧,设置有高折射层和低折射层相互交替排列的涂层11,用于阻挡红外辐射。 高折射层之一由ITO膜11a构成,使得在涂层的表面上导电性增加。 这里,考虑到通过向涂层的表面提供导电性来进一步防止污物和灰尘的附着,所以最理想的是,最外面的高折射层由透明导电材料制成。 此外,对于由透明导电材料制成的高折射层外侧的折射层,总层厚度为140nm以下是理想的。