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    • 61. 发明授权
    • Apparatus and method for driving plasma display panels
    • 用于驱动等离子体显示面板的装置和方法
    • US06727659B2
    • 2004-04-27
    • US10431162
    • 2003-05-06
    • Jae-Yeol KimJin-Sung KimJun-Hyung KimKazuhiro ItoMyeong-Seob So
    • Jae-Yeol KimJin-Sung KimJun-Hyung KimKazuhiro ItoMyeong-Seob So
    • G09G310
    • G09G3/2965G09G3/293G09G2310/066
    • An apparatus for driving a plasma display panel that includes first and second signal lines for supplying first and second voltages, respectively, and first and second inductors coupled to one terminal of a panel capacitor. A first current path is formed from the panel capacitor to the second signal line via the second inductor to drop the voltage of the panel capacitor from the first voltage to the second voltage. A second current path is formed to recover the current flowing to the second inductor towards the first signal line, while the voltage of the panel capacitor is sustained at the second voltage. A third current path is formed from the first signal line to the panel capacitor via the first inductor while the current flowing to the second inductor is recovered, to raise the voltage of the panel capacitor from the second voltage to the first voltage. A fourth current is also formed to recover the current flowing to the first inductor towards the first signal line, while the voltage of the panel capacitor is sustained at the first voltage.
    • 一种用于驱动等离子体显示面板的装置,其包括用于分别提供第一和第二电压的第一和第二信号线以及耦合到面板电容器的一个端子的第一和第二电感器。 经由第二电感器从面板电容器到第二信号线形成第一电流路径,以将面板电容器的电压从第一电压降低到第二电压。 形成第二电流路径以恢复流向第二电感器的电流朝向第一信号线,同时面板电容器的电压维持在第二电压。 第三电流路径由第一信号线经由第一电感器形成到面板电容器,同时流过第二电感器的电流被恢复,以将面板电容器的电压从第二电压升高到第一电压。 还形成第四电流以恢复流向第一电感器的电流朝向第一信号线,同时面板电容器的电压维持在第一电压。
    • 63. 发明授权
    • Synchronous SRAM device with late write function
    • 具有迟写功能的同步SRAM器件
    • US06442103B1
    • 2002-08-27
    • US09963962
    • 2001-09-26
    • Jong-Tack KwakJin-Ho KwackSun-Min LeeJin-Sung Kim
    • Jong-Tack KwakJin-Ho KwackSun-Min LeeJin-Sung Kim
    • G11C800
    • G11C7/1087G11C7/1072G11C7/1078G11C7/22G11C2207/2218
    • A synchronous memory device includes a late write mode of operation, and includes a memory cell array storing data information. The synchronous memory device comprises a write-in command detector, a data input control signal generator, first and second latch circuits, and a multiplexer. The write-in command detector generates a first flag signal indicating that write-in command is applied to the memory device, and generates a second flag signal indicating that the write-in command is received during successive clock cycles. The data input control signal generator, in response to the first flag signal, sequentially generates data input control signals synchronized with a clock signal. The first latch circuit sequentially latches write-in data from external sources in response to the data input control signals, and the second latch circuit latches data latched in the first latch circuit in response to at least one of the data input control signals. The multiplexer selects one of the first and second latch circuits in response to the second flag signal. The selected outputs of the latch circuits are stored to a memory cell array through the write-in circuit within sufficient setup time parameters.
    • 同步存储器件包括后期写操作模式,并且包括存储数据信息的存储单元阵列。 同步存储装置包括写入命令检测器,数据输入控制信号发生器,第一和第二锁存电路以及多路复用器。 写入命令检测器产生指示写入命令被施加到存储器件的第一标志信号,并产生指示在连续时钟周期期间接收写入命令的第二标志信号。 数据输入控制信号发生器响应于第一标志信号顺序地产生与时钟信号同步的数据输入控制信号。 第一锁存电路响应于数据输入控制信号顺序地锁存来自外部源的写入数据,并且第二锁存电路响应于数据输入控制信号中的至少一个锁存锁存在第一锁存电路中的数据。 复用器响应于第二标志信号选择第一和第二锁存电路中的一个。 所选择的锁存电路的输出通过写入电路在足够的建立时间参数内存储到存储单元阵列。
    • 64. 发明授权
    • Color adjustment circuit for liquid crystal display
    • 液晶显示器色调电路
    • US06380916B1
    • 2002-04-30
    • US09294849
    • 1999-04-20
    • Jin Sung Kim
    • Jin Sung Kim
    • G09G336
    • G09G3/3607G09G3/3611G09G2320/0606G09G2320/0666
    • A color adjustment circuit in LCDs, comprising: an R data adjusting portion for externally receiving an R data of selected bits, which has a predetermined color level, for adjusting the color level of the received R data to a desirable color level and for generating the color level adjusted-R data; a G data adjusting portion for externally receiving a G data of selected bits, which has a predetermined color level, for adjusting the color level of the received G data to a desirable color level and for generating the color level adjusted-G data; and a B data adjusting portion for externally receiving a B data of selected bits, which has a predetermined color level, for adjusting the color level of the received B data to a desirable color level and for generating the color level adjusted-B data.
    • 一种LCD中的颜色调整电路,包括:R数据调整部分,用于外部接收具有预定色彩级别的所选位的R数据,用于将接收到的R数据的色彩水平调整到期望的色彩水平,并产生 色彩调整R数据; G数据调整部分,用于外部接收具有预定颜色级别的所选位的G数据,用于将接收到的G数据的色彩水平调整到期望的色彩水平,并用于产生色度调整的G数据; 以及B数据调整部分,用于从外部接收具有预定色彩级别的所选位的B数据,用于将接收到的B数据的色彩水平调整到期望的色彩水平,并产生色度调整后的B数据。
    • 65. 发明授权
    • Chemical vapor deposition apparatus for manufacturing semiconductor devices
    • 用于制造半导体器件的化学气相沉积设备
    • US06279503B1
    • 2001-08-28
    • US09183599
    • 1998-10-29
    • Baik-soon ChoiJung-il AnJin-sung KimJung-ki Kim
    • Baik-soon ChoiJung-il AnJin-sung KimJung-ki Kim
    • C23C1600
    • C23C16/4405
    • There is provided a method of optimizing recipe of in-situ cleaning process for process chamber after a specific process on semiconductor wafers by using Residual Gas Analyzer Quadrupole Mass Spectrometer (RGA-QMS). According to the present invention, a Chemical Vapor Deposition (CVD) apparatus for manufacturing semiconductor devices comprises: a process chamber; process gas supply line for supplying process gas into the process chamber; a waste-gas exhaust line for removing the waste-gas from the process chamber after process; a supply line for supplying a CiF3 gas into the process chamber; a sampling manifold for sampling the gas inside process chamber by using pressure difference; and RGA-QMS for analyzing the sampling gas, and the optimization of the end points according to gas flow, pressure, and temperature of the cleaning process for the process chamber is achieved through the analysis by above RGA-QMS.
    • 提供了一种通过使用残留气体分析仪四极质谱仪(RGA-QMS)在半导体晶片上的特定工艺之后优化处理室的原位清洗工艺的方法。 根据本发明,用于制造半导体器件的化学气相沉积(CVD)装置包括:处理室; 工艺气体供应管线,用于将处理气体供应到处理室中; 用于从处理室中除去废气的废气排放管线; 用于将CiF3气体供应到处理室中的供应管线; 采样歧管,用于通过使用压力差来对处理室内的气体进行采样; 和用于分析采样气体的RGA-QMS,并通过上述RGA-QMS的分析实现了根据工艺室清洁过程的气体流量,压力和温度对端点进行优化。
    • 69. 发明授权
    • Method and apparatus for estimating performance of gas tube
    • 用于估计气管性能的方法和装置
    • US5815253A
    • 1998-09-29
    • US760511
    • 1996-12-05
    • Jin-Sung KimTaek-Jin LimGui-Jin Kim
    • Jin-Sung KimTaek-Jin LimGui-Jin Kim
    • G01N23/225F16L55/00F17D5/00G01N21/88G01N21/93G01N21/954G01N23/227G01N37/00G01Q60/24
    • G01N21/88
    • Method and apparatus for estimating the performance of a gas tube. The method comprising the steps of: (a) preparing a sample tube to be analyzed and cutting the sample tube in a desired size and shape; (b) examining distribution of defects and surface condition of the cut sample tube with an optical microscope; (c) analyzing structure and composition of surface defects which can not be measured in the step (b), to determine type and composition of the surface defects and shape of a surface grain; (d) analyzing structure of an inner surface-treated layer of the sample tube along the thickness thereof; and (e) synthetically analyzing data for defect density and surface roughness, which are numerically expressed through the steps (a) to (d), to define a reference data which can be used in a semiconductor manufacturing process.
    • 用于估计气体管的性能的方法和装置。 该方法包括以下步骤:(a)准备要分析的样品管并以期望的尺寸和形状切割样品管; (b)用光学显微镜检查切割的样品管的缺陷和表面状况的分布; (c)分析在步骤(b)中不能测量的表面缺陷的结构和组成,以确定表面缺陷的形式和组成以及表面颗粒的形状; (d)沿其厚度分析样品管的内表面处理层的结构; 和(e)综合分析通过步骤(a)至(d)数值表示的缺陷密度和表面粗糙度的数据,以定义可用于半导体制造工艺的参考数据。