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1. 发明授权

US5815253A Method and apparatus for estimating performance of gas tube 失效
标题翻译：用于估计气管性能的方法和装置
公开(公告)号：US5815253A
公开(公告)日：1998-09-29
申请号：US760511
申请日：1996-12-05
申请人： Jin-Sung Kim , Taek-Jin Lim , Gui-Jin Kim
发明人： Jin-Sung Kim , Taek-Jin Lim , Gui-Jin Kim
IPC分类号： G01N23/225 , F16L55/00 , F17D5/00 , G01N21/88 , G01N21/93 , G01N21/954 , G01N23/227 , G01N37/00 , G01Q60/24
CPC分类号： G01N21/88
摘要： Method and apparatus for estimating the performance of a gas tube. The method comprising the steps of: (a) preparing a sample tube to be analyzed and cutting the sample tube in a desired size and shape; (b) examining distribution of defects and surface condition of the cut sample tube with an optical microscope; (c) analyzing structure and composition of surface defects which can not be measured in the step (b), to determine type and composition of the surface defects and shape of a surface grain; (d) analyzing structure of an inner surface-treated layer of the sample tube along the thickness thereof; and (e) synthetically analyzing data for defect density and surface roughness, which are numerically expressed through the steps (a) to (d), to define a reference data which can be used in a semiconductor manufacturing process.
摘要翻译：用于估计气体管的性能的方法和装置。该方法包括以下步骤：（a）准备要分析的样品管并以期望的尺寸和形状切割样品管; （b）用光学显微镜检查切割的样品管的缺陷和表面状况的分布; （c）分析在步骤（b）中不能测量的表面缺陷的结构和组成，以确定表面缺陷的形式和组成以及表面颗粒的形状; （d）沿其厚度分析样品管的内表面处理层的结构; 和（e）综合分析通过步骤（a）至（d）数值表示的缺陷密度和表面粗糙度的数据，以定义可用于半导体制造工艺的参考数据。

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