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51. 发明授权

US5057339A Metallized polyacetylene-type or polyacene-type ultralong conjugated polymers and process for producing the same 失效
标题翻译：金属化的聚乙炔型或多并苯型超长共轭聚合物及其制备方法
公开(公告)号：US5057339A
公开(公告)日：1991-10-15
申请号：US448237
申请日：1989-12-11
申请人： Kazufumi Ogawa
发明人： Kazufumi Ogawa
IPC分类号： B05D1/18 , B05D1/20 , G02F1/361 , H01B1/12
CPC分类号： B82Y30/00 , B05D1/185 , B05D1/202 , B82Y10/00 , B82Y40/00 , G02F1/3615 , H01B1/125 , Y10T428/31536 , Y10T428/31663
摘要： A process for producing a metallized polyacetylene-type ultralong conjugated polymer comprising immersing a substrate having a hydrophilic surface in a first nonaqueous organic solution containing a compound containing an acetylenic group (--C.tbd.C--) and ##STR1## group (hereinafter referred to as silane-type surfactant) to deposit a chemisorbed layer of the silane-type surfactant on the substrate by chemisorption, immersing the substrate on which the chemisorbed layer is deposited in an aqueous solution containing a metal ion to replace a hydrogen atom connected to the acetylenic group by the metal atom, and immersing the substrate on which the chemisorbed layer is deposited in a second organic solution containing a metal salt catalyst to polymerize the molecules at the acetylenic group in the chemisorbed layer. A process according to the present invention makes it possible to obtain a metallized polyacetylene-type ultralong conjugated polymer which has excellent electrical conductivity and nonlinear optical effects and which is stable. Further, the present invention gives a metallized polyacene-type ultralong conjugated polymer.
摘要翻译：一种金属化聚乙炔型超长共轭聚合物的制造方法，其特征在于，将具有亲水性表面的基材浸渍在含有含有炔基的化合物（-C3ONDC-C）和第一组（以下称为硅烷型表面活性剂），通过化学吸附将硅烷型表面活性剂的化学吸附层沉积在基板上，将其上沉积有化学吸附层的基板浸入含有金属离子的水溶液中以代替与炔属基团连接的氢原子通过金属原子，并将其上沉积有化学吸附层的基材浸入含有金属盐催化剂的第二有机溶液中以使化学吸附层中炔属基团上的分子聚合。根据本发明的方法，可以获得具有优异导电性和非线性光学效应并且稳定的金属化聚乙炔型超长共轭聚合物。此外，本发明提供金属化多并苯型超长共轭聚合物。

52. 发明授权

US4945028A Method for formation of patterns using high energy beam 失效
标题翻译：使用高能束形成图案的方法
公开(公告)号：US4945028A
公开(公告)日：1990-07-31
申请号：US341257
申请日：1989-04-20
申请人： Kazufumi Ogawa
发明人： Kazufumi Ogawa
IPC分类号： G03F7/26
CPC分类号： G03F7/265 , B82Y30/00 , B82Y10/00 , B82Y40/00
摘要： Disclosed is a method for formation of a resist pattern used in the photo lithography steps for preparing semi-conductor devices and more particularly, a method for formation of a superfine resist pattern which comprises selectively exposing a resist surface of a photosensitive high molecular film to light to modify the exposed area to a hydrophilic property, chemically adsorbing a Si-containing reagent selectively to the modified area and then subjecting to O.sub.2 RIE using the Si-adsorbed film as a mask. The method is also characterized by enabling to formation of a finer pattern formation using a monomolecular film or monomolecular built-up film formed by the LB method or the chemical adsorption method in place of the resist described above.
摘要翻译：公开了一种形成用于制备半导体器件的光刻步骤中的抗蚀剂图案的方法，更具体地，涉及形成超细抗蚀剂图案的方法，其包括将光敏高分子膜的抗蚀剂表面选择性地暴露于光将曝光区域改性为亲水性，将含Si试剂选择性地吸附到改性区域，然后使用Si吸附膜作为掩模进行O2 RIE处理。该方法的特征还在于使用通过LB法或化学吸附法形成的单分子膜或单分子组合膜代替上述抗蚀剂形成更精细的图案形成。

53. 发明授权

US4902585A Recording medium and method of producing the same 失效
标题翻译：记录介质及其制造方法
公开(公告)号：US4902585A
公开(公告)日：1990-02-20
申请号：US159291
申请日：1988-02-23
申请人： Kazufumi Ogawa , Hideharu Tamura
发明人： Kazufumi Ogawa , Hideharu Tamura
IPC分类号： G11B5/72 , B05D1/18 , G11B5/64 , G11B5/725 , G11B5/73 , G11B5/84
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , G11B5/725 , Y10S428/90
摘要： Disclosed is a recording medium which comprises a base body of the recording medium, a recording layer formed on the base body, and a protective layer formed on the recording layer for protecting the recording layer. The protection layer is made from a silane surface active agent containing fluorine atoms (e.g., CF.sub.3 --(CF.sub.2)m--(CH.sub.2)n--SiCl.sub.3 (m, n: integer) and the agent is polymerized with the recording layer. The recording medium may provide high density recording performance.

54. 发明授权

US4849323A Pattern forming method using contrast enhanced material 失效
标题翻译：使用对比增强材料的图案形成方法
公开(公告)号：US4849323A
公开(公告)日：1989-07-18
申请号：US83199
申请日：1987-08-10
申请人： Masayuki Endo , Masaru Sasago , Kazufumi Ogawa
发明人： Masayuki Endo , Masaru Sasago , Kazufumi Ogawa
IPC分类号： G03F7/095 , G03C1/00 , G03F7/09 , G03F7/11 , H01L21/027
CPC分类号： G03C1/00 , G03F7/091
摘要： Disclosed is a pattern forming method using contrast enhanced material for enhancing the resolution and contrast when forming patterns in fabrication of semiconductors or the like. This pattern forming method comprises a step of applying a contrast enhanced material for pattern forming on a photoresist, a step of exposing and a step of developing.The contrast enhanced material is a water-soluble material using a novel diazo compound so that the coefficient A of the contrast may be 10 or more, and when it is combined with g-line exposure to be used in pattern formation, a pattern of 0.5 .mu.m or less may be formed.The diazo compound may be represented, for example, by ##STR1##
摘要翻译：公开了使用对比度增强材料的图案形成方法，用于在半导体等的制造中形成图案时提高分辨率和对比度。该图案形成方法包括在光致抗蚀剂上施加用于图案形成的对比度增强材料的步骤，曝光步骤和显影步骤。对比度增强材料是使用新型重氮化合物的水溶性材料，使得对比度的系数A可以为10以上，并且当与用于图案形成的g线暴露组合时，图案为0.5 可以形成μm以下。重氮化合物可以例如通过来表示

55. 发明授权

US4841341A Integrator for an exposure apparatus or the like 失效
标题翻译：用于曝光装置等的积分器
公开(公告)号：US4841341A
公开(公告)日：1989-06-20
申请号：US61266
申请日：1987-06-12
申请人： Kazufumi Ogawa , Masaru Sasago , Masayuki Endo , Ken Ishihara
发明人： Kazufumi Ogawa , Masaru Sasago , Masayuki Endo , Ken Ishihara
IPC分类号： G03F7/20
CPC分类号： G03F7/70058
摘要： An exposure apparatus for manufacturing semiconductor devices and in particular an excimer laser exposure apparatus includes, an integrator for uniformly distributing the excimer laser beam used as an exposure light source to render the exposure illuminance uniform at an exposure area. The integrator is characterized by a plurality of concentric-circular or parallel stripe-like recesses on one of two main opposing surfaces so that the light entering one main surface is dispersively radiated fromthe other main surface to render the excimer laser light from the light source uniform so as to reduce uneven exposure illuminance in the exposure area.
摘要翻译：用于制造半导体器件的曝光装置，特别是准分子激光曝光装置包括：用于均匀分布用作曝光光源的准分子激光束的积分器，以使曝光照度在曝光区域均匀。积分器的特征在于两个主要相对表面中的一个上的多个同心圆形或平行的条形凹槽，使得进入一个主表面的光从另一个主表面散射辐射，使来自光源的准分子激光光线均匀以减少曝光区域中不均匀的曝光照度。

56. 发明授权

US4388128A Solid-state color-image sensor and process for fabricating the same 失效
标题翻译：固态彩色图像传感器及其制造方法
公开(公告)号：US4388128A
公开(公告)日：1983-06-14
申请号：US242578
申请日：1981-03-11
申请人： Kazufumi Ogawa , Shigeru Kondo , Yoshiko Yasuda , Taketoshi Yonezawa , Isamu Kitahiro
发明人： Kazufumi Ogawa , Shigeru Kondo , Yoshiko Yasuda , Taketoshi Yonezawa , Isamu Kitahiro
IPC分类号： G03F7/00 , H01L31/0216 , B29C27/10 , B32B31/20 , H01L31/18
CPC分类号： G03F7/0007 , H01L31/02162 , Y10T156/1074
摘要： In a step for bonding a color filter to a solid-state color-image sensor chip with an adhesive which is curable not only by light or more particularly ultraviolet-ray irradiation but also by heating, pre-curing or partial curing is effected by irradiating light rays after the color filter and the chip has been pressed against each other and correctly aligned with each other in a bonding device and then the chip with the partially-bonded color filter is removed from the bonding device and complete curing of the adhesive is accomplished by heating. According to one embodiment of the present invention the bonding step is carried out in an atmosphere containing the oxygen so that the adhesive which has been squeezed out from the space between the color filter and the clip may be prevented from being cured and subsequently removed in a simple manner. According to a further embodiment of the present invention, prior to the bonding step, the color filter and chip are covered with protective layers or films so that surface flaws may be avoided. Thus, the color filters can be bonded to the chips with a higher degree of accuracy and a higher degree of adhesive strength and the mass production of solid-state color-image sensors can be much facilitated.
摘要翻译：在将滤色器与固态彩色图像传感器芯片接合的步骤中，不仅可以通过光线或更具体的紫外线照射而固化，而且通过加热固化，固化或部分固化可以通过照射在滤色器之后的光线和芯片已经在接合装置中彼此压靠并且彼此正确地对准，然后将具有部分粘合的滤色器的芯片从接合装置移除并完成粘合剂的完全固化通过加热。根据本发明的一个实施方案，粘合步骤在含有氧的气氛中进行，从而可以防止从滤色器和夹子之间的空间挤出的粘合剂被固化并随后在简单的方式。根据本发明的另一实施例，在接合步骤之前，滤色器和芯片被保护层或膜覆盖，从而可以避免表面缺陷。因此，可以以更高的准确度和更高的粘合强度将滤色器结合到芯片，并且可以大大方便固态彩色图像传感器的批量生产。

57. 发明授权

US4271420A Solid-state image pickup device 失效
标题翻译：固态图像拾取装置
公开(公告)号：US4271420A
公开(公告)日：1981-06-02
申请号：US119187
申请日：1980-02-06
申请人： Takao Chikamura , Kazufumi Ogawa , Yasuaki Terui , Shinji Fujiwara , Masakazu Fukai
发明人： Takao Chikamura , Kazufumi Ogawa , Yasuaki Terui , Shinji Fujiwara , Masakazu Fukai
IPC分类号： H01L27/146 , H04N5/335 , H04N5/341 , H04N5/351 , H04N5/359 , H04N5/369 , H04N5/372 , H04N5/374 , H04N5/378 , H01L27/14 , H01L29/78
CPC分类号： H01L27/14667 , H01L27/14672 , H04N3/1556
摘要： In a solid-state image pickup device of the type in which a photosensitive or photoconductive film is formed over a substrate capable of charge-transfer or X-Y address scanning and an electrode is formed over the photosensitive or photoconductive film, a means for applying to the electrode a voltage having an amplitude proportional to the amount of incident light, whereby blooming may be minimized and an automatic aperture control function may be attained. Because the voltage applied to the electrode over the photosensitive or photoconductive film is set so that the sensitivity of the photoconductive film may be decreased when a light image of high intensity falls on the device, blooming may be avoided.
摘要翻译：在其中在能够进行电荷转移或XY地址扫描的基板上形成感光或光电导膜并且在感光或感光膜上形成电极的固态图像拾取装置中，电极具有与入射光量成比例的振幅的电压，从而可以最小化起霜，并且可以实现自动孔径控制功能。因为施加到感光或感光膜上的电极上的电压被设定为使得当高强度的光图像落在器件上时光电导膜的灵敏度可能降低，因此可以避免起霜。

58. 发明授权

US09180206B2 Pharmaceutical preparation and manufacturing method thereof 有权
标题翻译：药物制备及其制备方法
公开(公告)号：US09180206B2
公开(公告)日：2015-11-10
申请号：US12600002
申请日：2007-05-14
申请人： Kazufumi Ogawa
发明人： Kazufumi Ogawa
IPC分类号： A61K31/43 , A61K47/48 , A61K41/00 , H01F1/00 , B82Y25/00
CPC分类号： A61K47/48861 , A61K31/43 , A61K41/00 , A61K47/6923 , B82Y25/00 , H01F1/0054
摘要： This invention provides a pharmaceutical preparation for DDS containing a pharmaceutical agent fixed by bonding to a monomolecular layer that is covalently bonded to a magnetic particle surface, (a) by reacting an alkoxysilane compound with the magnetic microparticle surface by dispersing a magnetic microparticle in a liquid mixture including an epoxy-containing alkoxysilane compound, a silanol condensation catalyst, and a non-aqueous organic solvent; (b) by washing the microparticle surface with an organic solvent to remove remaining surplus alkoxysilane compound for producing an epoxy-containing monomolecular layer that is covalently bonded to the microparticle surface; and (c) by fixing an imino-containing pharmaceutical agent such as a protein, amino acid, enzyme, antibody, antibiotic, antimicrobial, or contrast medium by reaction with the epoxy group.
摘要翻译：本发明提供了含有通过与共价键合到磁性颗粒表面的单分子层结合而固定的药剂的DDS药物制剂，（a）通过使磁性微粒分散在液体中使烷氧基硅烷化合物与磁性微粒表面反应包含含环氧基的烷氧基硅烷化合物，硅烷醇缩合催化剂和非水有机溶剂的混合物; （b）通过用有机溶剂洗涤微粒表面以去除剩余的剩余的烷氧基硅烷化合物，用于制备共价键合到微粒表面的含环氧基的单分子层; 和（c）通过与环氧基反应来固定含亚氨基的药剂如蛋白质，氨基酸，酶，抗体，抗生素，抗微生物剂或造影剂。

59. 发明授权

US08592676B2 Solar cell and method for manufacturing the same 有权
标题翻译：太阳能电池及其制造方法
公开(公告)号：US08592676B2
公开(公告)日：2013-11-26
申请号：US12664242
申请日：2007-06-22
申请人： Kazufumi Ogawa
发明人： Kazufumi Ogawa
IPC分类号： H01L31/00 , H01L21/00
CPC分类号： C01B33/02 , H01L21/02532 , H01L21/02601 , H01L21/02628 , H01L31/0256 , H01L51/4213
摘要： A solar cell in which an n-type fine silicon particle film is formed in a lamination layer on the surface of a transparent substrate via a transparent electrode, and the n-type fine silicon particle film is covalently bound to the transparent electrode via the first organic coating formed on the surface of the transparent electrode and the second organic coating formed on the surface of the n-type fine silicon particle film and the n-type fine silicon particle film is covalently bound to the p-type fine silicon particle film via the second organic coating formed on the surface of the n-type fine silicon particle film and the third organic coating formed on the surface of the p-type fine silicon particle film.
摘要翻译：一种太阳能电池，其中通过透明电极在透明基板的表面上的层压层中形成n型细硅颗粒膜，并且所述n型细硅颗粒膜经由第一透明电极共价结合到透明电极形成在透明电极表面上的有机涂层和形成在n型细硅颗粒膜和n型细硅颗粒膜表面上的第二有机涂层与p型细硅颗粒膜共价键合在n型细硅颗粒膜的表面上形成的第二有机涂层和在p型细硅颗粒膜的表面上形成的第三有机涂层。

60. 发明申请

US20100062240A1 ANTIREFLECTION FILM AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：抗反射膜及其制造方法
公开(公告)号：US20100062240A1
公开(公告)日：2010-03-11
申请号：US12597743
申请日：2008-04-16
申请人： Kazufumi Ogawa
发明人： Kazufumi Ogawa
IPC分类号： B32B5/16 , B32B38/00
CPC分类号： G02B1/111 , G02B1/118 , Y10T428/25 , Y10T428/261
摘要： An antireflection film that requires neither a special vacuum chamber nor other expensive instruments and can be formed on a substrate having any size and a method for manufacturing such an antireflection film are provided.The antireflection film 1 is configured as follows: to the surface of a substrate 14 coated with a film composed of a first film compound having a first functional group, a transparent fine particle layer formed as an array of reactive silica fine particles 42, each coated with a film composed of a first coupling agent having a first coupling reactive group that forms a bond through a coupling reaction with the first functional group, is bound and fixed through a bond formed by a coupling reaction between the first functional group and the first coupling reactive group. Furthermore, alternating layers that consist of transparent fine particles 24 each coated with a film composed of a film compound reactive with the first coupling reactive group and the reactive transparent fine particles 42 may be bound and fixed thereonto.
摘要翻译：提供了既不需要特殊的真空室也不需要其他昂贵的仪器并且可以形成在具有任何尺寸的基板上的防反射膜和用于制造这种抗反射膜的方法。防反射膜1如下构成：涂布有由具有第一官能团的第一膜化合物构成的膜的基板14的表面，形成为反应性二氧化硅细粒42的阵列的透明微粒层，由具有通过与第一官能团的偶联反应形成键的第一偶联反应性基团的第一偶联剂构成的膜通过第一官能团和第一偶联剂之间的偶联反应形成的键而结合并固定反应组。此外，可以将各自涂覆有由与第一偶联反应性基团反应的膜化合物构成的膜的膜的透明微粒24和反应性透明微粒42组成的交替层结合并固定在其上。

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