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51. 发明申请

US20100049353A1 SEMICONDUCTOR MANUFACTURING APPARATUS EQUIPPED WITH WAFER INSPECTION DEVICE AND INSPECTION TECHNIQUES 有权
标题翻译：配备有波浪检测装置和检测技术的半导体制造设备
公开(公告)号：US20100049353A1
公开(公告)日：2010-02-25
申请号：US12198004
申请日：2008-08-25
申请人： Masahiro Takizawa , Teruhide Nishino
发明人： Masahiro Takizawa , Teruhide Nishino
IPC分类号： G06F19/00
CPC分类号： H01L21/67201 , H01L21/67253
摘要： A semiconductor manufacturing apparatus includes a processing unit for processing at least one wafer; a loading/unloading unit for loading/unloading at least wafer; an input/output chamber for taking in a processed wafer from the processing unit and taking out the processed wafer to the loading/unloading unit, and taking in a unprocessed wafer from the loading/unloading unit and taking out the unprocessed wafer to the reaction unit; and a wafer inspection device for inspecting the processed wafer through a light transmittable top portion of the input/output chamber, through which light is transmittable, while the processed wafer is temporarily placed in the input/output chamber.
摘要翻译：半导体制造装置包括用于处理至少一个晶片的处理单元; 至少装载/卸载晶片的装载/卸载单元; 输入/输出室，用于从处理单元接收经处理的晶片并将加工的晶片取出到装载/卸载单元，并从加载/卸载单元接收未加工的晶片，并将未处理的晶片取出到反应单元 ; 以及晶片检查装置，用于通过输入/输出室的可透光顶部检查经处理的晶片，光可透过该晶片检测装置，同时处理的晶片临时放置在输入/输出室中。

52. 发明申请

US20100014945A1 SEMICONDUCTOR PROCESSING APPARATUS HAVING ALL-ROUND TYPE WAFER HANDLING CHAMBER 审中-公开
标题翻译：具有全圆形类型处理器的半导体加工设备
公开(公告)号：US20100014945A1
公开(公告)日：2010-01-21
申请号：US12174491
申请日：2008-07-16
申请人： Masahiro Takizawa , Teruhide Nishino
发明人： Masahiro Takizawa , Teruhide Nishino
IPC分类号： H01L21/677
CPC分类号： H01L21/6719 , H01L21/67167 , H01L21/67201
摘要： A semiconductor manufacturing apparatus includes a wafer handling chamber; at least one wafer input/output chamber attached to the wafer handling chamber; and multiple wafer processing chambers attached to the wafer handling chamber. The wafer handling chamber has a polygonal shape on a processing chamber level on which the wafer processing chambers are installed, and one wafer processing chamber is installed on each and every side of the polygon.
摘要翻译：半导体制造装置包括晶片处理室; 连接到晶片处理室的至少一个晶片输入/输出室; 以及附接到晶片处理室的多个晶片处理室。晶片处理室在其上安装有晶片处理室的处理室水平面上具有多边形形状，并且在多边形的每一面安装一个晶片处理室。

53. 发明授权

US07618226B2 Semiconductor substrate transfer apparatus and semiconductor substrate processing apparatus equipped with the same 有权
标题翻译：半导体基板转印装置和配备有该基板的半导体基板处理装置
公开(公告)号：US07618226B2
公开(公告)日：2009-11-17
申请号：US11445035
申请日：2006-06-01
申请人： Masahiro Takizawa , Masaei Suwada , Takashi Wada
发明人： Masahiro Takizawa , Masaei Suwada , Takashi Wada
IPC分类号： B65B69/00
CPC分类号： H01L21/67265 , H01L21/67276 , H01L21/67781
摘要： A semiconductor substrate transfer apparatus for transferring semiconductor substrates from a first container to a second container, includes: multiple end effectors; at least one robot arm with which the multiple end effectors are independently rotatably joined; and a controller storing software including instructions to judge which end effector or end effectors in the multiple end effectors are to be selected based on a distribution status of substrates stored in the first and second containers and to rotate the selected end effector(s) for unloading a substrate or substrates from the first container and loading the substrate or substrates to the second container.
摘要翻译：一种用于将半导体衬底从第一容器转移到第二容器的半导体衬底传送装置，包括：多个端部执行器; 至少一个机器人手臂，多个端部执行器可独立地可旋转地连接; 以及控制器，其存储软件，其包括用于基于存储在所述第一和第二容器中的基板的分布状态来判断所述多个末端执行器中的哪个末端执行器或末端执行器被选择的指令，并且旋转所选择的末端执行器以用于卸载来自第一容器的衬底或衬底，并将衬底或衬底装载到第二容器。

54. 发明申请

US20090252580A1 WAFER PROCESSING APPARATUS WITH WAFER ALIGNMENT DEVICE 有权
标题翻译：具有水平对准装置的波浪加工设备
公开(公告)号：US20090252580A1
公开(公告)日：2009-10-08
申请号：US12062419
申请日：2008-04-03
申请人： Masahiro Takizawa , Masaei Suwada , Masayuki Akagawa
发明人： Masahiro Takizawa , Masaei Suwada , Masayuki Akagawa
IPC分类号： H01L21/67
CPC分类号： H01L21/68707 , H01L21/681 , Y10S414/135 , Y10S414/136
摘要： A semiconductor-processing apparatus includes: a wafer handling chamber; a wafer processing chamber; a wafer handling device; a first photosensor disposed in the wafer handling chamber in front of the wafer processing chamber at a position where the wafer partially blocks light received by the first photosensor at a ready-to-load position and substantially entirely blocks light received by the first photosensor when the wafer moves from the ready-to-load position toward the wafer processing chamber in the x-axis direction; and a second photosensor disposed in the wafer handling chamber in front of the wafer processing chamber at a position where the wafer does not block light received by the second photosensor at the ready-to-load position and partially blocks light received by the second photosensor when the wafer moves from the ready-to-load position toward the wafer processing chamber in the x-axis direction.
摘要翻译：一种半导体处理装置，包括：晶片处理室; 晶圆处理室; 晶片处理装置; 第一光电传感器，其设置在晶片处理室前面的晶片处理室中，在晶片处理室的位置处，晶片部分地阻挡由第一光电传感器接收的光在准备加载位置，并且当基板完全阻挡由第一光电传感器接收的光时晶片从准备位置朝向晶片处理室在x轴方向移动; 以及第二光电传感器，其在所述晶片处理室的前方设置在所述晶片处理室的位置处，所述晶片处理室在所述晶片不会阻挡由所述第二光电传感器在所述准备加载位置接收的光的位置，并且部分地阻挡由所述第二光电传感器接收的光晶片在准备加载位置朝向晶片处理室沿x轴方向移动。

55. 发明授权

US07571732B2 Ignition control of remote plasma unit 有权
标题翻译：远程等离子体单元的点火控制
公开(公告)号：US07571732B2
公开(公告)日：2009-08-11
申请号：US11390832
申请日：2006-03-28
申请人： Masahiro Takizawa , Takashi Wada , Satoru Noguchi
发明人： Masahiro Takizawa , Takashi Wada , Satoru Noguchi
IPC分类号： B08B6/00
CPC分类号： B08B7/0035 , C23C16/4405 , C23C16/52 , H01J37/32357 , H01J37/32862
摘要： A method of maintaining a remote plasma unit for cleaning a semiconductor-processing apparatus includes: (i) detecting if the semiconductor-processing apparatus is in an idle state; (ii) if the idle state is detected, igniting the remote plasma unit for cleaning the semiconductor-processing apparatus after a lapse of a given time period; (iii) detecting if the remote plasma unit is ignited in step (ii); and (iv) if the remote plasma unit is not ignited in step (ii), retrying ignition of the remote plasma unit.
摘要翻译：保持用于清洁半导体处理装置的远程等离子体单元的方法包括：（i）检测半导体处理装置是否处于空闲状态; （ii）如果检测到空闲状态，则在经过给定时间段之后点燃远程等离子体单元以清洁半导体处理装置; （iii）在步骤（ii）中检测远程等离子体单元是否点燃; 和（iv）如果远程等离子体单元在步骤（ii）中未点燃，则重试远程等离子体单元的点火。

56. 发明申请

US20090177078A1 MAGNETIC RESONANCE IMAGING APPARATUS AND METHOD 有权
标题翻译：磁共振成像装置及方法
公开(公告)号：US20090177078A1
公开(公告)日：2009-07-09
申请号：US12278237
申请日：2007-02-01
申请人： Masahiro Takizawa , Tetsuhiko Takahashi
发明人： Masahiro Takizawa , Tetsuhiko Takahashi
IPC分类号： A61B5/055
CPC分类号： G01R33/56375 , A61B5/055 , A61B5/7207 , A61B5/7257 , G01R33/5615 , G01R33/5616 , G01R33/5617 , G01R33/56383
摘要： In the continuous moving table imaging, high-speed imaging such as the echo planar method is implemented without deteriorating image quality, realizing a high-speed table movement, namely, high-speed imaging.In the magnetic resonance imaging apparatus, an imaging control means for controlling a magnetic field generation means, a transfer means, and a signal processing means executes an imaging sequence for applying multiple readout gradient magnetic fields to measure multiple nuclear magnetic resonance signals, after one-time application of an exciting RF pulse, while moving the transfer means. On this occasion, a positional deviation of the readout gradient magnetic fields given to the multiple nuclear magnetic resonance signals, caused by the movement of the transfer means, is calculated in advance as correction data, so that the measured nuclear magnetic resonance signals are corrected by the correction data.
摘要翻译：在连续移动台成像中，采用回波平面方式的高速成像，而不会降低图像质量，实现高速表移动，即高速成像。在磁共振成像装置中，用于控制磁场产生装置，传送装置和信号处理装置的成像控制装置执行用于施加多个读出梯度磁场以测量多个核磁共振信号的成像序列，在移动传送装置的同时应用激发的RF脉冲。在这种情况下，预先计算由转印装置的移动引起的给予多个核磁共振信号的读出梯度磁场的位置偏差作为校正数据，以便测量的核磁共振信号由校正数据。

57. 发明申请

US20090059307A1 METHOD OF EMBEDDING A PLURALITY OF DIFFERENT TWO-DIMENSIONAL CODES IN AN IMAGE 有权
标题翻译：在图像中嵌入多个不同二维码的方法
公开(公告)号：US20090059307A1
公开(公告)日：2009-03-05
申请号：US12202506
申请日：2008-09-02
申请人： Akari Matsumura , Masahiro Takizawa
发明人： Akari Matsumura , Masahiro Takizawa
IPC分类号： G06K15/00
CPC分类号： H04N1/32288 , G06T1/0071 , G06T2201/0051 , G06T2201/0064 , H04N1/32203 , H04N1/32304 , H04N2201/3269 , H04N2201/3271
摘要： The purpose of the present invention is to prevent a two-dimensional code to be additionally embedded from corrupting a two-dimensional code which has been embedded when a document in which the two-dimensional code has been embedded is copied or when a document in which the two-dimensional code has been embedded is overlaid on form data in which the two-dimensional code has been embedded. In the present invention, when it is detected that a second two-dimensional code is embedded in an input image, the input image is printed without overlay of a first two-dimensional code thereon. Furthermore, when form data for overlaying is stored, when it is detected that a third two-dimensional code is embedded in the form data or when it is detected that a second two-dimensional code is embedded in an input image, the input image is output without overlay of a first two-dimensional code thereon.
摘要翻译：本发明的目的是防止二维码被另外嵌入以破坏当已经嵌入了二维码的文档被复制时嵌入的二维码，或者当其中已经嵌入的二维码被覆盖在其中嵌入了二维码的表单数据上。在本发明中，当检测到第二二维码被嵌入在输入图像中时，输入图像被打印而不叠加第一二维码。此外，当存储用于重叠的表单数据时，当检测到第三个二维码被嵌入在表单数据中时，或者当检测到第二个二维码被嵌入在输入图像中时，输入图像是输出而不覆盖其上的第一二维码。

58. 发明授权

US07486076B2 Magnetic resonance imaging apparatus and method with adjustment in positioning within imaging space to correct deviation from desired position 有权
标题翻译：磁共振成像装置和方法，其调整成像空间内的定位以校正与期望位置的偏差
公开(公告)号：US07486076B2
公开(公告)日：2009-02-03
申请号：US11662108
申请日：2005-09-02
申请人： Hisako Nagao , Takayuki Abe , Tetsuhiko Takahashi , Masahiro Takizawa
发明人： Hisako Nagao , Takayuki Abe , Tetsuhiko Takahashi , Masahiro Takizawa
IPC分类号： G01V3/00
CPC分类号： A61B5/055 , G01R33/56375
摘要： An MRI apparatus and method are provided which are capable of properly setting imaging position of regions of a subject on a table and moving the table to the set positions, for imaging a wide range or the entire body range of the subject.
摘要翻译：提供了一种MRI装置和方法，其能够将桌子上的区域的成像位置适当地设置在桌子上并将桌子移动到设定位置，以对被摄体的宽范围或整个身体范围进行成像。

59. 发明授权

US07340320B2 Method of recipe control operation 有权
标题翻译：配方控制操作方法
公开(公告)号：US07340320B2
公开(公告)日：2008-03-04
申请号：US11105052
申请日：2005-04-13
申请人： Masahiro Takizawa , Takashi Wada , Satoru Noguchi
发明人： Masahiro Takizawa , Takashi Wada , Satoru Noguchi
IPC分类号： G06F19/00
CPC分类号： H01L22/20
摘要： An operation method of a recipe control process in which multiple processing targets are processed continuously in a processing apparatus using recipes that specify a set of control parameters specifying the processing conditions of processing targets. The method comprises the steps of: (I) specifying correction coefficients to correct at least one of the parameters' values for each processing target, separately from the recipes, and (II) performing the recipe control process for multiple processing targets and applying the correction coefficients to each processing target to adjust the parameters' values.
摘要翻译：一种配方控制处理的操作方法，其中在处理装置中使用规定指定处理目标的处理条件的一组控制参数的配方连续处理多个处理目标。该方法包括以下步骤：（I）与配方分开地指定校正系数以校正每个处理目标的参数值中的至少一个值，以及（II）对多个处理目标执行配方控制处理并应用校正系数到每个处理目标来调整参数值。

60. 发明申请

US20060275931A1 Technology of detecting abnormal operation of plasma process 审中-公开
标题翻译：检测等离子体工艺异常运行的技术
公开(公告)号：US20060275931A1
公开(公告)日：2006-12-07
申请号：US11134774
申请日：2005-05-20
申请人： Masahiro Takizawa , Takashi Wada
发明人： Masahiro Takizawa , Takashi Wada
IPC分类号： H01L21/00
CPC分类号： H01J37/32935
摘要： A method of detecting abnormal operation of a plasma process, includes: (i) detecting a potential Vpp1 between an upper electrode and a lower electrode disposed parallel to each other in a reaction camber at a time T1 after the plasma process begins in the reaction chamber; (ii) detecting a Vpp2 between the upper electrode and the lower electrode at a time T2 after T1; (iii) comparing Vpp1 and Vpp2 to obtain an operation value; and (iv) determining abnormal operation if the operation value is within a predetermined range.
摘要翻译：一种检测等离子体工艺的异常操作的方法包括：（i）在等离子体处理开始之后的时间T 1，在反应曲面中检测在彼此平行设置的上电极和下电极之间的电位Vpp 1 反应室; （ii）在T 1之后的时间T 2检测上电极和下电极之间的Vpp 2; （iii）比较Vpp 1和Vpp 2以获得操作值; 以及（iv）如果操作值在预定范围内，则确定异常操作。

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