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1. 发明申请

US20090252580A1 WAFER PROCESSING APPARATUS WITH WAFER ALIGNMENT DEVICE 有权
标题翻译：具有水平对准装置的波浪加工设备
公开(公告)号：US20090252580A1
公开(公告)日：2009-10-08
申请号：US12062419
申请日：2008-04-03
申请人： Masahiro Takizawa , Masaei Suwada , Masayuki Akagawa
发明人： Masahiro Takizawa , Masaei Suwada , Masayuki Akagawa
IPC分类号： H01L21/67
CPC分类号： H01L21/68707 , H01L21/681 , Y10S414/135 , Y10S414/136
摘要： A semiconductor-processing apparatus includes: a wafer handling chamber; a wafer processing chamber; a wafer handling device; a first photosensor disposed in the wafer handling chamber in front of the wafer processing chamber at a position where the wafer partially blocks light received by the first photosensor at a ready-to-load position and substantially entirely blocks light received by the first photosensor when the wafer moves from the ready-to-load position toward the wafer processing chamber in the x-axis direction; and a second photosensor disposed in the wafer handling chamber in front of the wafer processing chamber at a position where the wafer does not block light received by the second photosensor at the ready-to-load position and partially blocks light received by the second photosensor when the wafer moves from the ready-to-load position toward the wafer processing chamber in the x-axis direction.
摘要翻译：一种半导体处理装置，包括：晶片处理室; 晶圆处理室; 晶片处理装置; 第一光电传感器，其设置在晶片处理室前面的晶片处理室中，在晶片处理室的位置处，晶片部分地阻挡由第一光电传感器接收的光在准备加载位置，并且当基板完全阻挡由第一光电传感器接收的光时晶片从准备位置朝向晶片处理室在x轴方向移动; 以及第二光电传感器，其在所述晶片处理室的前方设置在所述晶片处理室的位置处，所述晶片处理室在所述晶片不会阻挡由所述第二光电传感器在所述准备加载位置接收的光的位置，并且部分地阻挡由所述第二光电传感器接收的光晶片在准备加载位置朝向晶片处理室沿x轴方向移动。

2. 发明授权

US07963736B2 Wafer processing apparatus with wafer alignment device 有权
标题翻译：具有晶圆对准装置的晶片处理装置
公开(公告)号：US07963736B2
公开(公告)日：2011-06-21
申请号：US12062419
申请日：2008-04-03
申请人： Masahiro Takizawa , Masaei Suwada , Masayuki Akagawa
发明人： Masahiro Takizawa , Masaei Suwada , Masayuki Akagawa
IPC分类号： H01L21/677
CPC分类号： H01L21/68707 , H01L21/681 , Y10S414/135 , Y10S414/136
摘要： A semiconductor-processing apparatus includes: a wafer handling chamber; a wafer processing chamber; a wafer handling device; a first photosensor disposed in the wafer handling chamber in front of the wafer processing chamber at a position where the wafer partially blocks light received by the first photosensor at a ready-to-load position and substantially entirely blocks light received by the first photosensor when the wafer moves from the ready-to-load position toward the wafer processing chamber in the x-axis direction; and a second photosensor disposed in the wafer handling chamber in front of the wafer processing chamber at a position where the wafer does not block light received by the second photosensor at the ready-to-load position and partially blocks light received by the second photosensor when the wafer moves from the ready-to-load position toward the wafer processing chamber in the x-axis direction.
摘要翻译：一种半导体处理装置，包括：晶片处理室; 晶圆处理室; 晶片处理装置; 第一光电传感器，其设置在晶片处理室前面的晶片处理室中，在晶片处理室的位置处，晶片部分地阻挡由第一光电传感器接收的光在准备加载位置，并且当基板完全阻挡由第一光电传感器接收的光时晶片从准备位置朝向晶片处理室在x轴方向移动; 以及第二光电传感器，其在所述晶片处理室的前方设置在所述晶片处理室的位置处，所述晶片处理室在所述晶片不会阻挡由所述第二光电传感器在所述准备加载位置接收的光的位置，并且部分地阻挡由所述第二光电传感器接收的光晶片在准备加载位置朝向晶片处理室沿x轴方向移动。

3. 发明授权

US06288769B1 Optical device method of cleaning the same, projection aligner, and method of producing the same 有权
标题翻译：光学装置清洁方法，投影对准器及其制造方法
公开(公告)号：US06288769B1
公开(公告)日：2001-09-11
申请号：US09458807
申请日：1999-12-10
申请人： Masayuki Akagawa , Osamu Yamashita , Taichi Taniuchi
发明人： Masayuki Akagawa , Osamu Yamashita , Taichi Taniuchi
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G02B27/0006 , G03F7/70058 , G03F7/70241 , G03F7/70825 , G03F7/70883 , G03F7/70891 , G03F7/70925
摘要： An exposure method for irradiating a mask with an illuminating light and transferring a pattern on the mask onto a substrate through a projection optical system includes supplying a gas having a lower capability of absorbing illuminating light to each of plural chambers formed between optical elements disposed in a barrel, floating a contaminating substance on the plural elements in the gas by irradiation, exhausting the gas and contaminating substances from the barrel, supplying the plural chambers with further gas, after exhausting the gas containing the contaminating substance, and transferring the pattern onto the substrate.
摘要翻译：一种用照射光照射掩模并通过投影光学系统将掩模上的图案转印到基板上的曝光方法包括：将设置在其中的光学元件之间形成的多个室之中的每个室提供吸收照明光的能力较低的气体通过照射将污染物质漂浮在气体中的多个元件上，排出气体并从筒体中污染物质，在排出含有污染物质的气体之后，向多个室供给另外的气体，并将图案转印到基板上。

4. 发明授权

US06762412B1 Optical apparatus, exposure apparatus using the same, and gas introduction method 失效
标题翻译：光学装置，使用其的曝光装置和气体引入方法
公开(公告)号：US06762412B1
公开(公告)日：2004-07-13
申请号：US09564632
申请日：2000-05-03
申请人： Masayuki Akagawa , Taichi Taniuchi
发明人： Masayuki Akagawa , Taichi Taniuchi
IPC分类号： H01K126
CPC分类号： G03F7/70833 , G03F7/70933
摘要： The optical apparatus of the present invention comprises; an optical member such as a lens; a casing containing the optical member; a gas supply device that supplies gas at a predetermined flow rate to inside the casing; and a gas introduction mechanism that reduces the flow rate of the gas supplied to inside the casing to below the predetermined flow rate. The casing has an inlet through which gas is supplied from the gas supply device to the inside. The gas introduction mechanism comprises an impingement member which is disposed between the inlet and a surface of the optical member, and the gas introduced from the inlet impinges against the impingement member. As a result, contamination of the optical member due to gas introduced to inside the casing can be reduced.
摘要翻译：本发明的光学装置包括：诸如透镜的光学构件; 容纳光学构件的壳体; 气体供给装置，其以规定的流量向外部供给气体; 以及将供给到壳体内部的气体的流量降低到规定流量以下的气体导入机构。壳体具有从气体供应装置向内部供应气体的入口。气体引入机构包括设置在光学构件的入口和表面之间的冲击构件，并且从入口引入的气体撞击冲击构件。结果，可以减少由引入到壳体内部的气体引起的光学部件的污染。

5. 发明授权

US4856904A Wafer inspecting apparatus 失效
标题翻译：晶圆检查仪
公开(公告)号：US4856904A
公开(公告)日：1989-08-15
申请号：US157128
申请日：1988-02-10
申请人： Masayuki Akagawa
发明人： Masayuki Akagawa
IPC分类号： H01L21/68
CPC分类号： H01L21/681 , Y10S414/137 , Y10S414/138
摘要： Semiconductor wafer inspecting apparatus comprises plural supports each adapted to support a wafer to be inspected and a feeder for feeding a wafer to each of the plural supports. The apparatus can effect accurate and rapid positioning of the wafer.
摘要翻译：半导体晶片检查装置包括多个支撑件，每个支撑件适于支撑待检查的晶片和用于将晶片馈送到多个支撑件中的每一个的馈线。该装置可以实现晶片的准确和快速的定位。

6. 发明授权

US06671033B2 Optical device, method of cleaning the same, projection aligner, and method of producing the same 失效
公开(公告)号：US06671033B2
公开(公告)日：2003-12-30
申请号：US10119141
申请日：2002-04-10
申请人： Masayuki Akagawa , Osamu Yamashita , Taichi Taniuchi
发明人： Masayuki Akagawa , Osamu Yamashita , Taichi Taniuchi
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G02B27/0006 , G03F7/70058 , G03F7/70241 , G03F7/70825 , G03F7/70883 , G03F7/70891 , G03F7/70925
摘要： A reticle (R) is irradiated with an ArF excimer laser beam to transfer a pattern on the reticle (R) onto a wafer (W) through a projection optical system (PL). Each of a plurality of illuminating lens units (2) arranged in the illuminating optical passage has a barrel containing a plurality of lenses, and caps are so provided as to be spaced from the lenses at both ends. Lens chambers among the lenses are filled with an inert gas, and the spaces between the caps and the lenses are also filled with an inert gas. When the illuminating lens unit (2) are housed in and illuminating optical path housing, the caps are removed while purging the spaces. Therefore, the lenses at both ends are prevented from being contaminated and the transmittance of the optical lens device for exposure with light having a wavelength of shorter than 300 nm is prevented from lowering.

7. 发明授权

US5888327A Pellicle pasting system and method 失效
标题翻译：胶片粘贴系统和方法
公开(公告)号：US5888327A
公开(公告)日：1999-03-30
申请号：US857560
申请日：1997-05-16
申请人： Masayuki Akagawa , Yoshihiro Kimura
发明人： Masayuki Akagawa , Yoshihiro Kimura
IPC分类号： G03F1/62 , G03F1/82 , G03F1/84 , H01L21/00 , H01L21/027 , H01L21/677 , B32B31/00
CPC分类号： H01L21/68707 , B32B38/162 , H01L21/6715 , H01L21/67271 , H01L21/67276 , Y10T156/1744
摘要： A pellicle pasting system and method pastes a pellicle on a mask. The system includes a washing apparatus to wash the mask; a first mask transport apparatus to transport the mask washed by the washing apparatus; a first inspection apparatus to inspect whether foreign objects are attached to the mask received from the first mask transport apparatus; a second mask transport apparatus to transport the mask when the first inspection apparatus determines that the foreign objects are substantially absent from the mask; and a pellicle pasting apparatus to paste the pellicle on the mask received from the second mask transport apparatus.
摘要翻译：防护薄膜组合系统和方法将防护薄膜组件贴在面具上。该系统包括用于洗涤面罩的洗涤装置; 用于运送由洗涤装置洗涤的面罩的第一掩模传送装置; 第一检查装置，用于检查异物是否附着到从第一掩模传送装置接收的掩模上; 当所述第一检查装置确定所述外部物体基本上不存在于所述掩模中时，传送所述掩模的第二掩模传送装置; 以及防护薄膜组件粘贴装置，用于将防护薄膜组件粘贴在从第二掩模传送装置接收的掩模上。

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