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    • 51. 发明授权
    • Vertical cavity surface emitting laser having continuous grading
    • 具有连续分级的垂直腔表面发射激光
    • US5530715A
    • 1996-06-25
    • US346559
    • 1994-11-29
    • Chan-Long ShiehMichael S. LebbyHsing-Chung LeePiotr Grodzinski
    • Chan-Long ShiehMichael S. LebbyHsing-Chung LeePiotr Grodzinski
    • H01S5/00H01S5/183H01S3/08
    • H01S5/183B82Y20/00H01S5/3054H01S5/3215H01S5/34313
    • A first stack of distributed Bragg mirrors having alternating layers of aluminum gallium arsenide differing in concentrations of an aluminum are disposed on a surface of a substrate with a first plurality of continuous gradient layers positioned between the alternating layers of differing aluminum concentrations to dynamically move the aluminum concentration from one of the alternating layer to another alternating layers. A first cladding region is disposed on the first stack of distributed Bragg mirrors. An active region is disposed on the first cladding region with a second cladding region being dispose on the active region. A second stack of distributed Bragg mirrors having alternating layers of aluminum gallium arsenide differing concentrations of aluminum are disposed on the second cladding region with a second plurality of continuous gradient layers being positioned between the alternating layers of differing aluminum concentrations to dynamically change the aluminum concentration from one of the altering layers to another alternating layers.
    • 具有不同于铝浓度的铝砷化镓的交替层的分布布拉格反射镜的第一堆叠被布置在基板的表面上,其中第一多个连续梯度层位于不同铝浓度的交替层之间以动态地移动铝 从交替层之一到另一个交替层的浓度。 第一包层区域布置在分布布拉格反射镜的第一堆叠上。 有源区设置在第一包层区上,第二包层区设置在有源区上。 具有不同浓度的铝的交替铝砷化镓层的第二层布拉格反射镜布置在第二覆层区域上,第二多个连续梯度层位于不同铝浓度的交替层之间以动态地将铝浓度从 另一个交替层的改变层之一。
    • 54. 发明授权
    • Laser annealing of metal oxide semiconductor on temperature sensitive substrate formations
    • 金属氧化物半导体在温度敏感衬底地层上的激光退火
    • US08377743B2
    • 2013-02-19
    • US12874145
    • 2010-09-01
    • Chan-Long ShiehHsing-Chung Lee
    • Chan-Long ShiehHsing-Chung Lee
    • H01L21/00
    • H01L21/268H01L29/66969H01L29/78603H01L29/78693
    • A method of annealing a metal oxide on a temperature sensitive substrate formation includes the steps of providing a temperature sensitive substrate formation and forming a spacer layer on a surface of the substrate formation. A metal oxide semiconductor device is formed on the spacer layer, the device includes at least a layer of amorphous metal oxide semiconductor material, an interface of the amorphous metal oxide layer with a dielectric layer, and a gate metal layer adjacent the layer of amorphous metal oxide semiconductor material and the interface. The method then includes the step of at least partially annealing the layer of metal oxide semiconductor material by heating the adjacent gate metal layer with pulses of infra red radiation to improve the mobility and operating stability of the amorphous metal oxide semiconductor material while retaining at least the amorphous metal oxide semiconductor material adjacent the gate metal layer amorphous.
    • 在温度敏感的基板形成上退火金属氧化物的方法包括以下步骤:在基板结构的表面上形成温度敏感的基板并形成间隔层。 金属氧化物半导体器件形成在间隔层上,该器件至少包括一层非晶金属氧化物半导体材料,非晶金属氧化物层与电介质层的界面,以及与非晶金属层相邻的栅极金属层 氧化物半导体材料和界面。 该方法然后包括通过用红外辐射脉冲加热相邻栅极金属层来至少部分地退火金属氧化物半导体材料层的步骤,以提高非晶金属氧化物半导体材料的迁移率和操作稳定性,同时至少保留 非晶态金属氧化物半导体材料与栅极金属层相邻无定形。
    • 56. 发明申请
    • TWO-TERMINAL SWITCHING DEVICES AND THEIR METHODS OF FABRICATION
    • 两端开关器件及其制造方法
    • US20110147761A1
    • 2011-06-23
    • US13015013
    • 2011-01-27
    • Gang YuChan-Long ShiehHsing-Chung Lee
    • Gang YuChan-Long ShiehHsing-Chung Lee
    • H01L29/12H01L21/28H01L21/20
    • H01L29/861G02F1/1365G02F1/167H01L29/22H01L29/417H01L29/786H01L45/00H01L51/0035H01L51/0579H01L51/0587
    • Two-terminal switching devices characterized by high on/off current ratios and by high breakdown voltage are provided. These devices can be employed as switches in the driving circuits of active matrix displays, e.g., in electrophoretic, rotating element and liquid crystal displays. The switching devices include two electrodes, and a layer of a broad band semiconducting material residing between the electrodes. According to one example, the cathode comprises a metal having a low work function, the anode comprises an organic material having a p+ or p++ type of conductivity, and the broad band semiconductor comprises a metal oxide. The work function difference between the cathode and the anode material is preferably at least about 0.6 eV. The on/off current ratios of at least 10,000 over a voltage range of about 15 V can be achieved. The devices can be formed, if desired, on flexible polymeric substrates having low melting points.
    • 提供了具有高导通/截止电流比和高击穿电压特性的两端开关器件。 这些器件可以用作有源矩阵显示器的驱动电路中的开关,例如在电泳,旋转元件和液晶显示器中。 开关器件包括两个电极和位于电极之间的宽带半导体材料层。 根据一个示例,阴极包括具有低功函数的金属,阳极包括具有p +或p ++类型的导电性的有机材料,并且宽带半导体包括金属氧化物。 阴极和阳极材料之间的功函数差异优选为至少约0.6eV。 可以实现在约15V的电压范围内的至少10,000的开/关电流比。 如果需要,可以在具有低熔点的柔性聚合物基材上形成装置。
    • 57. 发明授权
    • Two-terminal switching devices and their methods of fabrication
    • 两端开关器件及其制造方法
    • US07898042B2
    • 2011-03-01
    • US11801735
    • 2007-05-09
    • Gang YuChan-Long ShiehHsing-Chung Lee
    • Gang YuChan-Long ShiehHsing-Chung Lee
    • H01L21/00H01L47/00H01L29/04
    • H01L29/861G02F1/1365G02F1/167H01L29/22H01L29/417H01L29/786H01L45/00H01L51/0035H01L51/0579H01L51/0587
    • Two-terminal switching devices characterized by high on/off current ratios and by high breakdown voltage are provided. These devices can be employed as switches in the driving circuits of active matrix displays, e.g., in electrophoretic, rotataing element and liquid crystal displays. The switching devices include two electrodes, and a layer of a broad band semiconducting material residing between the electrodes. According to one example, the cathode comprises a metal having a low work function, the anode comprises an organic material having a p+ or p++ type of conductivity, and the broad band semiconductor comprises a metal oxide. The work function difference between the cathode and the anode material is preferably at least about 0.6 eV. The on/off current ratios of at least 10,000 over a voltage range of about 15 V can be achieved. The devices can be formed, if desired, on flexible polymeric substrates having low melting points.
    • 提供了具有高导通/截止电流比和高击穿电压特性的两端开关器件。 这些装置可以用作有源矩阵显示器的驱动电路中的开关,例如在电泳,旋转元件和液晶显示器中。 开关器件包括两个电极和位于电极之间的宽带半导体材料层。 根据一个示例,阴极包括具有低功函数的金属,阳极包括具有p +或p ++类型的导电性的有机材料,并且宽带半导体包括金属氧化物。 阴极和阳极材料之间的功函数差异优选为至少约0.6eV。 可以实现在约15V的电压范围内的至少10,000的开/关电流比。 如果需要,可以在具有低熔点的柔性聚合物基材上形成装置。
    • 59. 发明授权
    • Self-aligned transparent metal oxide TFT on flexible substrate
    • 柔性基板上的自对准透明金属氧化物TFT
    • US07605026B1
    • 2009-10-20
    • US11949477
    • 2007-12-03
    • Chan-Long ShiehHsing-Chung Lee
    • Chan-Long ShiehHsing-Chung Lee
    • H01L29/49
    • H01L29/7869H01L29/78603
    • A method of fabricating self-aligned metal oxide TFTs on transparent flexible substrates is disclosed and includes the steps of providing a transparent flexible substrate with at least an opaque first metal TFT electrode in a supporting relationship on the front surface of the substrate and a layer of transparent material, including at least one of a metal oxide semiconductor and/or a gate dielectric, on the front surface of the substrate and the first metal TFT electrode. A layer of photoresist is positioned in overlying relationship to the layer of transparent material. Dual photo masks are positioned over the front and rear surfaces of the substrate, respectively, and the layer of photoresist is exposed. The layer of photoresist is developed and used to form a layer of second metal.
    • 公开了一种在透明柔性基板上制造自对准金属氧化物TFT的方法,包括以下步骤:提供透明柔性基板,所述透明柔性基板至少具有支撑关系的不透明第一金属TFT电极在基板的前表面上, 在基板的前表面和第一金属TFT电极上包括金属氧化物半导体和/或栅极电介质中的至少一种的透明材料。 一层光致抗蚀剂以与透明材料层重叠的关系定位。 双光掩模分别位于基板的前表面和后表面上,并且光致抗蚀剂层被暴露。 显影光致抗蚀剂层并用于形成第二金属层。