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1. 发明申请

WO2005089415A3 STABILIZATION OF SELF-ASSEMBLED MONOLAYERS 审中-公开
标题翻译：自组装单体的稳定性
公开(公告)号：WO2005089415A3
公开(公告)日：2009-04-23
申请号：PCT/US2005008850
申请日：2005-03-17
申请人： UNIV CALIFORNIA , UNIV WAYNE STATE , LIU GANG-YU , AMRO NABIL A , YANG GUOHUA
发明人： LIU GANG-YU , AMRO NABIL A , YANG GUOHUA
IPC分类号： B32B15/04 , B05D1/00 , B05D1/18 , B05D1/36 , B05D3/10 , G01N33/543
CPC分类号： G01N33/54393 , B05D1/185 , B05D3/107 , B82Y30/00 , G01N2610/00 , Y10T428/268 , Y10T428/31536 , Y10T428/31678
摘要： Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.
摘要翻译：自组装单层和其他固体支撑/表面层系统由于其紧密堆积的结构，低缺陷密度和均匀的厚度被广泛用作纳米加工的抗蚀剂。然而，这些抗蚀剂具有由于解吸和/或氧化诱导解吸而在液体中的低稳定性的缺点。提供了稳定的固体支持体/表面层系统以及在固体表面上保持自组装单层的完整性和结构的方法。该方法包括将少量两亲分子如DMF和DMSO加入到水溶液中作为保存介质。这些分子有利地粘附在单层内的缺陷部位，并且抑制已知的降解途径的引发：氧化和解吸。还提供了稳定的系统，包括固体支持体/表面层系统和稳定化溶液，以及用于各种系统的稳定化溶液试剂盒。

2. 发明申请

WO2007098028A3 PHOTOLUMINESCENT POINT LIGHT SOURCE 审中-公开
标题翻译：光致发光点光源
公开(公告)号：WO2007098028A3
公开(公告)日：2008-05-08
申请号：PCT/US2007004089
申请日：2007-02-15
申请人： UNIV CALIFORNIA , LIULEVYCH VALENTYN , LIU GANG-YU
发明人： LIULEVYCH VALENTYN , LIU GANG-YU
IPC分类号： G01Q60/22
CPC分类号： G01Q60/20
摘要： One embodiment of the present invention provides a system that generates a point light source. During operation, the system illuminates a sharp probe using an excitation light, wherein the sharp probe is made of a photoluminescent (PL) material. Illuminating the sharp probe causes a PL emission from the sharp probe. This PL emission generates a point light source at the apex of the sharp probe, wherein the spot size of the point light source is restricted by the radius of curvature of the apex of the sharp probe. Another embodiment of the present invention provides a system that generates a wavelength-tunable point light source. During operation, the system coats a sharp probe with a layer of photoluminescent (PL) material. The system then illuminates the coated sharp probe using an excitation light to cause a PL emission from the coating material. The PL emission generates a point light source at the apex of the coated sharp probe, wherein the wavelength of the PL emission is tunable by varying the composition of the PL material.
摘要翻译：本发明的一个实施例提供一种产生点光源的系统。在操作期间，系统使用激发光照亮尖锐的探针，其中尖锐的探针由光致发光（PL）材料制成。照亮尖锐的探针会导致尖锐的探针产生PL发射。该PL发射在尖锐探针的顶点处产生点光源，其中点光源的斑点尺寸受尖锐探针的顶点的曲率半径的限制。本发明的另一实施例提供一种产生波长可调点光源的系统。在操作过程中，系统用尖锐的探针涂上一层光致发光（PL）材料。然后，该系统使用激发光照射涂覆的尖锐探针以引起来自涂层材料的PL发射。 PL发射在涂覆的尖锐探针的顶点处产生点光源，其中通过改变PL材料的组成可以调节PL发射的波长。

3. 发明申请

WO2008002605A2 METHOD AND SYSTEM FOR MEASURING SINGLE CELL MECHANICS USING A MODIFIED SCANNING PROBE MICROSCOPE 审中-公开
标题翻译：用改进的扫描探针显微镜测量单细胞力学的方法和系统
公开(公告)号：WO2008002605A2
公开(公告)日：2008-01-03
申请号：PCT/US2007/014901
申请日：2007-06-26
申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA , LIULEVYCH, Valentyn , LIU, Gang-yu
发明人： LIULEVYCH, Valentyn , LIU, Gang-yu
IPC分类号： C12Q1/00
CPC分类号： G01Q60/42
摘要： One embodiment of the present invention provides a system that measures single cell mechanics using a scanning probe microscope. During operation, the system positions a modified probe of the scanning probe microscope above a cell which is located on a surface, wherein the modified probe is configured with a geometry for compressing the cell. The system then compresses the cell against the surface using the modified probe, thereby causing the cell to deform. Next, the system extracts mechanical properties of the cell from cell deformation behavior and cell response to the compression force.
摘要翻译：本发明的一个实施例提供了一种使用扫描探针显微镜来测量单细胞力学的系统。在操作期间，系统将扫描探针显微镜的修改的探针放置在位于表面上的单元上方，其中修改的探针配置有用于压缩单元的几何形状。然后系统使用修改后的探针将细胞压缩到表面，从而导致细胞变形。接下来，系统从细胞变形行为和细胞对压缩力的响应中提取细胞的机械特性。

4. 发明申请

WO2005089415A2 STABILIZATION OF SELF-ASSEMBLED MONOLAYERS 审中-公开
标题翻译：自组装单体的稳定性
公开(公告)号：WO2005089415A2
公开(公告)日：2005-09-29
申请号：PCT/US2005/008850
申请日：2005-03-17
申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA , WAYNE STATE UNIVERSITY , LIU, Gang-Yu , AMRO, Nabil, A. , YANG, Guohua
发明人： LIU, Gang-Yu , AMRO, Nabil, A. , YANG, Guohua
IPC分类号： B05D1/18 , B05D3/10 , B32B15/04 , G01N33/543
CPC分类号： G01N33/54393 , B05D1/185 , B05D3/107 , B82Y30/00 , G01N2610/00 , Y10T428/268 , Y10T428/31536 , Y10T428/31678
摘要： Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.
摘要翻译：自组装单层和其他固体支撑/表面层系统由于其紧密堆积的结构，低缺陷密度和均匀的厚度被广泛用作纳米加工的抗蚀剂。然而，这些抗蚀剂具有由于解吸和/或氧化诱导解吸而在液体中的低稳定性的缺点。提供了稳定的固体支持体/表面层系统以及在固体表面上保持自组装单层的完整性和结构的方法。该方法包括将少量两亲分子如DMF和DMSO加入到水溶液中作为保存介质。这些分子有利地粘附在单层内的缺陷部位，并且抑制已知的降解途径的引发：氧化和解吸。还提供了稳定的系统，包括固体支持体/表面层系统和稳定化溶液，以及用于各种系统的稳定化溶液试剂盒。

5. 发明申请

WO2006128189A3 SUCCESSIVE SHRINKING OF ELASTOMERS TO PRODUCE MICRO- AND NANO-STRUCTURES 审中-公开
标题翻译：用于生产微结构和纳米结构的弹性体的连续收缩
公开(公告)号：WO2006128189A3
公开(公告)日：2007-04-12
申请号：PCT/US2006020985
申请日：2006-05-30
申请人： UNIV CALIFORNIA , LIU GANG-YU , HU JUN , TAN LI , LIU MAOZI
发明人： LIU GANG-YU , HU JUN , TAN LI , LIU MAOZI
IPC分类号： B28B7/06 , B28B7/38 , B28B7/40 , B29C33/42 , B29C35/00 , B29C41/00 , B29C43/00 , B29C55/02 , B29C61/02
CPC分类号： B29C59/18 , B29C59/022 , B29C2059/023 , B29C2791/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A stepwise contraction and adsorption nanolithography patterning process can shrink complex microstructures into the nanometer region. The basis of the process is to transfer a pre-engineered microstructure onto a extended elastomer that is then allowed to relax to reduce the microstructure (P1). The new miniaturized structure is then used as a stamp to transfer the structure onto another stretched elastomer. Through iterations of this procedure (P2), patterns of materials with pre-designed geometry are miniaturized to the desired dimensions, including sub- 100 nm. The simplicity and high throughput capability of the stepwise contraction and adsorption nanolithography patterning process make the platform a competitive alternative to other micro- and nanolithography techniques for potential applications in multiplexed sensors, non-binary optical displays, biochips, nanoelectronic devices, and microfluidic devices.
摘要翻译：逐步收缩和吸附纳米光刻图案工艺可以将复杂的微结构收缩到纳米区域。该工艺的基础是将预先设计的微观结构转移到延伸的弹性体上，然后允许其松弛以减少微结构（P1）。然后将新的小型化结构用作印模以将结构转移到另一拉伸弹性体上。通过这个过程（P2）的迭代，具有预先设计的几何形状的材料的图案被小型化到期望的尺寸，包括小于100nm。逐步收缩和吸附纳米光刻图案工艺的简单性和高通量能力使该平台成为其他微复合和纳米光刻技术的有竞争力的替代方案，用于复用传感器，非二元光学显示器，生物芯片，纳米电子器件和微流体器件中的潜在应用。

6. 发明申请

WO2006128189A2 SUCCESSIVE SHRINKING OF ELASTOMERS - A SIMPLE MINIATURIZATION PROTOCOL TO PRODUCE MICRO-AND NANO-STRUCTURES 审中-公开
标题翻译：弹性体的成功收缩 - 一种简单的微型化协议来生产微结构和纳米结构
公开(公告)号：WO2006128189A2
公开(公告)日：2006-11-30
申请号：PCT/US2006/020985
申请日：2006-05-30
申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA , LIU, Gang-yu , HU, Jun , TAN, Li , LIU, Maozi
发明人： LIU, Gang-yu , HU, Jun , TAN, Li , LIU, Maozi
IPC分类号： B29B13/02
CPC分类号： B29C59/18 , B29C59/022 , B29C2059/023 , B29C2791/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A stepwise contraction and adsorption nanolithography (SCAN) patterning process can shrink complex microstructures (produced by current microfabrication technology) into the nanometer region. The basis of SCAN is to transfer a pre-engineered microstructure onto a extended elastomer. This extended elastomer is then allowed to relax, reducing the microstructure accordingly. The new miniaturized structure is then used as a stamp to transfer the structure onto another stretched elastomer. Through iterations of this procedure, patterns of materials with pre-designed geometry are miniaturized to the desired dimensions, including sub- 100 ran. The simplicity and high throughput capability of SCAN make the platform a competitive alternative to other micro- and nanolithography techniques for potential applications in multiplexed sensors, non-binary optical displays, biochips, nanoelectronics devices, and microfluidic devices.
摘要翻译：逐步收缩和吸附纳米光刻（SCAN）图案化工艺可以将复杂的微观结构（由当前微细加工技术生产）收缩到纳米区域。扫描的基础是将预先设计的微结构转移到扩展的弹性体上。然后使该扩展的弹性体松弛，相应地降低微结构。然后将新的小型化结构用作印模以将结构转移到另一拉伸弹性体上。通过该过程的迭代，具有预先设计的几何形状的材料的图案被小型化为期望的尺寸，包括小于100nm。 SCAN的简单性和高吞吐能力使该平台成为其他微量和纳米光刻技术的有竞争力的替代方案，用于复用传感器，非二进制光学显示器，生物芯片，纳米电子器件和微流体器件中的潜在应用。

7. 发明申请

WO2008002605A3 METHOD AND SYSTEM FOR MEASURING SINGLE CELL MECHANICS USING A MODIFIED SCANNING PROBE MICROSCOPE 审中-公开
标题翻译：使用改进的扫描探针显微镜测量单细胞机制的方法和系统
公开(公告)号：WO2008002605A3
公开(公告)日：2008-02-28
申请号：PCT/US2007014901
申请日：2007-06-26
申请人： UNIV CALIFORNIA , LIULEVYCH VALENTYN , LIU GANG-YU
发明人： LIULEVYCH VALENTYN , LIU GANG-YU
IPC分类号： C12Q1/02
CPC分类号： G01Q60/42
摘要： One embodiment of the present invention provides a system that measures single cell mechanics using a scanning probe microscope. During operation, the system positions a modified probe of the scanning probe microscope above a cell which is located on a surface, wherein the modified probe is configured with a geometry for compressing the cell. The system then compresses the cell against the surface using the modified probe, thereby causing the cell to deform. Next, the system extracts mechanical properties of the cell from cell deformation behavior and cell response to the compression force.
摘要翻译：本发明的一个实施例提供了一种使用扫描探针显微镜测量单细胞力学的系统。在操作期间，系统将扫描探针显微镜的修改的探针定位在位于表面上的细胞上方，其中修改的探针被配置有用于压缩细胞的几何形状。然后，系统使用修改的探针将细胞压在表面上，从而导致细胞变形。接下来，系统从细胞变形行为和细胞对压缩力的响应提取细胞的机械性质。

8. 发明申请

WO2007098028A2 PHOTOLUMINESCENT POINT LIGHT SOURCE 审中-公开
标题翻译：光致发光点光源
公开(公告)号：WO2007098028A2
公开(公告)日：2007-08-30
申请号：PCT/US2007/004089
申请日：2007-02-15
申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA , LIULEVYCH, Valentyn , LIU, Gang-Yu
发明人： LIULEVYCH, Valentyn , LIU, Gang-Yu
IPC分类号： G02B21/08
CPC分类号： G01Q60/20
摘要： One embodiment of the present invention provides a system that generates a point light source. During operation, the system illuminates a sharp probe using an excitation light, wherein the sharp probe is made of a photoluminescent (PL) material. Illuminating the sharp probe causes a PL emission from the sharp probe. This PL emission generates a point light source at the apex of the sharp probe, wherein the spot size of the point light source is restricted by the radius of curvature of the apex of the sharp probe. Another embodiment of the present invention provides a system that generates a wavelength-tunable point light source. During operation, the system coats a sharp probe with a layer of photoluminescent (PL) material. The system then illuminates the coated sharp probe using an excitation light to cause a PL emission from the coating material. The PL emission generates a point light source at the apex of the coated sharp probe, wherein the wavelength of the PL emission is tunable by varying the composition of the PL material.
摘要翻译：本发明的一个实施例提供一种产生点光源的系统。在操作期间，系统使用激发光照亮尖锐的探针，其中尖锐的探针由光致发光（PL）材料制成。照亮尖锐的探针会导致尖锐探针产生PL发射。该PL发射在尖锐探针的顶点处产生点光源，其中点光源的斑点尺寸受尖锐探针的顶点的曲率半径的限制。本发明的另一实施例提供一种产生波长可调点光源的系统。在操作过程中，系统用一层光致发光（PL）材料涂覆一个尖锐的探针。然后，该系统使用激发光照射涂覆的尖锐探针以引起来自涂层材料的PL发射。 PL发射在涂覆的尖锐探针的顶点处产生点光源，其中通过改变PL材料的组成可以调节PL发射的波长。

9. 发明授权

US09768322B2 Metal oxide TFT with improved source/drain contacts and reliability 有权
公开(公告)号：US09768322B2
公开(公告)日：2017-09-19
申请号：US15225592
申请日：2016-08-01
申请人： Gang Yu , Chan-Long Shieh , Tian Xiao , Fatt Foong
发明人： Gang Yu , Chan-Long Shieh , Tian Xiao , Fatt Foong
IPC分类号： H01L29/786 , H01L29/49 , H01L29/66 , H01L23/00 , H01L21/8234 , H01L21/4763 , H01L21/324 , H01L21/321 , H01L21/383 , H01L21/477 , H01L21/428 , H01L29/45 , H01L21/44 , H01L23/31
CPC分类号： H01L29/7869 , H01L21/321 , H01L21/324 , H01L21/383 , H01L21/428 , H01L21/44 , H01L21/47635 , H01L21/477 , H01L21/823418 , H01L23/3171 , H01L23/564 , H01L29/45 , H01L29/4908 , H01L29/66742 , H01L29/66969 , H01L29/78606 , H01L29/78618 , H01L29/78648 , H01L29/78696 , H01L2924/0002 , H01L2924/00
摘要： A method including providing a substrate with a gate, a layer of gate insulator material adjacent the gate, and a layer of metal oxide semiconductor material positioned on the gate insulator opposite the gate, forming a selectively patterned etch stop passivation layer and heating at elevated temperature in an oxygen-containing or nitrogen-containing or inert ambience to selectively increase the carrier concentration in regions of the metal oxide semiconductor not covered by the etch stop layer, on which overlying and spaced apart source/drain metals are formed. Subsequently heating the transistor in an oxygen-containing or nitrogen-containing or inert ambience to further improve the source/drain contacts and adjust the threshold voltage to a desired level. Providing additional passivation layer(s) on top of the transistor with electric insulation and barrier property to moisture and chemicals in the surrounding environment.

10. 发明申请

US20160218128A1 Active Matrix Light Emitting Diode Array and Projector Display Comprising It 有权
标题翻译：有源矩阵发光二极管阵列和投影仪显示器
公开(公告)号：US20160218128A1
公开(公告)日：2016-07-28
申请号：US15087716
申请日：2016-03-31
申请人： Chan- Long Shieh , Gang Yu
发明人： Chan- Long Shieh , Gang Yu
IPC分类号： H01L27/146
CPC分类号： H01L27/14609 , H01L27/1225 , H01L27/1248 , H01L27/1262 , H01L27/14603 , H01L27/1463 , H01L27/14663 , H01L27/14692 , H01L27/156 , H01L33/0075 , H01L33/44 , H01L33/46 , H01L33/62 , H01L33/642 , H01L2933/0025 , H01L2933/0033 , H01L2933/0066 , H01L2933/0075
摘要： A method of fabricating a pixelated imager and structure including a substrate with a bottom contact layer and active element blanket layers deposited on the bottom contact layer. The blanket layers are separated into an array of active elements with trenches isolating adjacent active elements in the array. A dielectric passivation/planarization layer is positioned over the array of active elements. An array of active element readout circuits overlies the passivation/planarization layer above the trenches with one active element readout circuit coupled to each active element of the array of active elements. Each active element and coupled active element readout circuit defines a pixel and the array of active elements and the coupled array of active element readout circuits defines a pixelated imager, and the readout circuit coupled to each active element includes at least one TFT with an active channel comprising a metal-oxide semiconductor material.
摘要翻译：一种制造像素化成像器和结构的方法，其包括具有沉积在底部接触层上的底部接触层和有源元件覆盖层的衬底。橡皮布层被分成具有隔离阵列中的相邻有源元件的沟槽的有源元件阵列。电介质钝化/平坦化层位于有源元件阵列上方。有源元件读出电路的阵列覆盖在沟槽上方的钝化/平坦化层，其中一个有源元件读出电路耦合到有源元件阵列的每个有源元件。每个有源元件和耦合有源元件读出电路限定像素，并且有源元件阵列和有源元件读出电路的耦合阵列限定像素化成像器，并且耦合到每个有源元件的读出电路包括至少一个具有有源沟道的TFT 包括金属氧化物半导体材料。

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