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51. 发明公开

US20230241160A1 COMPOSITION COMPRISING AN ALGAL PROTEOGLYCAN EXTRACT AND USE THEREOF 审中-公开
公开(公告)号：US20230241160A1
公开(公告)日：2023-08-03
申请号：US18296774
申请日：2023-04-06
申请人： Qing Qi , Jian Ding
发明人： Qing Qi , Jian Ding
IPC分类号： A61K38/16 , A61K36/02 , A61P35/00 , A61K9/00 , A61K31/282 , A61K31/513 , A61K31/675 , A61K31/704 , A61K31/7048 , A61K35/748 , A61K45/06
CPC分类号： A61K38/164 , A61K36/02 , A61P35/00 , A61K9/0019 , A61K9/0053 , A61K31/282 , A61K31/513 , A61K31/675 , A61K31/704 , A61K31/7048 , A61K35/748 , A61K45/06
摘要： The present application provides use of an algal proteoglycan extract and a composition comprising the same in treating or preventing tumor, pain, inflammation or diseases mediated by inflammatory factors.

52. 发明授权

US09475806B2 Complement factor B inhibitors and uses there of 有权
标题翻译：补体因子B抑制剂及其用途
公开(公告)号：US09475806B2
公开(公告)日：2016-10-25
申请号：US14774430
申请日：2014-03-13
申请人： Christopher Michael Adams , Charles Babu , Michael Paul Capparelli , Jian Ding , Takeru Ehara , Keith Jendza , Nan Ji , Rajeshri Ganesh Karki , Toshio Kawanami , Liang Xue , Nello Mainolfi , James J. Powers , Michael H. Serrano-Wu , Chun Zhang
发明人： Christopher Michael Adams , Charles Babu , Michael Paul Capparelli , Jian Ding , Takeru Ehara , Keith Jendza , Nan Ji , Rajeshri Ganesh Karki , Toshio Kawanami , Liang Xue , Nello Mainolfi , James J. Powers , Michael H. Serrano-Wu , Chun Zhang
IPC分类号： C07D401/14 , A61K31/4353 , A61K31/437 , C07D471/04
CPC分类号： C07D471/04
摘要： The present invention provides a compound of formula (I): wherein X is N or CH, Y is NH, O or S, methods for manufacturing these compounds, and their uses as Factor B inhibitors for the treatment of conditions and diseases associated with complement alternative pathway activation such as age-related macular degeneration, diabetic retinopathy and related ophthalmic diseases. The present invention further provides pharmaceutical compositions and combinations of pharmacologically active agents.

53. 发明申请

US20160145244A1 CERTAIN PROTEIN KINASE INHIBITORS 审中-公开
标题翻译：某些蛋白激酶抑制剂
公开(公告)号：US20160145244A1
公开(公告)日：2016-05-26
申请号：US14945426
申请日：2015-11-19
申请人： Weibo Wang , Meiyu Geng , Jian Ding , Xingdong Zhao , Jing Ai , Huajie Zhang , Xia Peng
发明人： Weibo Wang , Meiyu Geng , Jian Ding , Xingdong Zhao , Jing Ai , Huajie Zhang , Xia Peng
IPC分类号： C07D405/14
CPC分类号： C07D405/14
摘要： Provided are certain ALK inhibitors, pharmaceutical compositions thereof, and methods of use therefor.
摘要翻译：提供某些ALK抑制剂，其药物组合物及其用途。

54. 外观设计

USD701614S1 Massager 有权
公开(公告)号：USD701614S1
公开(公告)日：2014-03-25
申请号：US29466913
申请日：2013-09-12
申请人： Jian Ding
设计人： Jian Ding

55. 发明授权

US08455510B2 Rapamycin carbonic ester analogues, pharmaceutical compositions, preparations and uses thereof 失效
标题翻译：雷帕霉素碳酸酯类似物，药物组合物，制剂及其用途
公开(公告)号：US08455510B2
公开(公告)日：2013-06-04
申请号：US13119700
申请日：2009-09-17
申请人： Fajun Nan , Jian Ding , Jianping Zuo , Linqian Yu , Linghua Meng , Yangming Zhang , Na Yang , Min Gu
发明人： Fajun Nan , Jian Ding , Jianping Zuo , Linqian Yu , Linghua Meng , Yangming Zhang , Na Yang , Min Gu
IPC分类号： C07D498/18 , A61K31/436 , A61P35/00
CPC分类号： A61K31/436 , C07D498/18
摘要： Rapalogs of formula I, pharmaceutically acceptable salts, pharmaceutical compositions, and preparation methods and uses thereof. The rapalogs have the structure of formula I and can be used as an anti-tumor medicament. Comparing with rapamycin, the rapalogs of the present invention exhibit enhanced water solubility, and improved pharmacological and pharmacokinetic properties by introducing a hydrophilic and polar group such as a hydroxyl.
摘要翻译：式I的药学上可接受的盐，药物组合物及其制备方法和用途。 rapalogs具有式I的结构，可用作抗肿瘤药物。与雷帕霉素相比，本发明的rapalogs通过引入亲水性和极性基团如羟基表现出增强的水溶性，以及改善的药理学和药代动力学性质。

56. 发明申请

US20110021624A1 Alpha-Amino-N-Substituted Amides, Pharmaceutical Composition Containing Them and Uses Thereof 有权
标题翻译： α-氨基-N-取代酰胺，含有它们的药物组合物及其用途
公开(公告)号：US20110021624A1
公开(公告)日：2011-01-27
申请号：US12747485
申请日：2008-12-11
申请人： Fajun Nan , Jia Li , Jian Ding , Gang Liu , Chuanming Xie , Zehong Miao , Wanyi Tai
发明人： Fajun Nan , Jia Li , Jian Ding , Gang Liu , Chuanming Xie , Zehong Miao , Wanyi Tai
IPC分类号： A61K31/34 , C07C237/00 , A61K31/164 , C07C69/74 , A61K31/215 , C07C69/96 , A61K31/265 , C07D307/20 , C07D307/94 , A61P35/00
CPC分类号： C07C237/22 , C07C247/12 , C07C271/22 , C07C323/60 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/16 , C07C2603/74 , C07D209/14 , C07D209/20 , C07D233/54 , C07D307/24 , C07D307/94
摘要： Disclosed are a series of α-amino-N-substituted amide compounds having a structure of the following formula, the pharmaceutically acceptable salts thereof, and the pharmaceutical composition comprising the same. The α-amino-N-substituted amide compounds or the pharmaceutically acceptable salts thereof according to the present invention have anti-tumor and/or anti-cancer activities in vivo and in vitro, can effectively depress the growth of various tumor cells and/or cancer cells, and thus can be used in preparing drugs for treating tumors and/or cancers.
摘要翻译：公开了一系列具有下式结构的α-氨基-N-取代酰胺化合物及其药学上可接受的盐，以及包含它们的药物组合物。根据本发明的α-氨基-N-取代的酰胺化合物或其药学上可接受的盐在体内和体外具有抗肿瘤和/或抗癌活性，可以有效地抑制各种肿瘤细胞的生长和/或癌细胞，因此可用于制备用于治疗肿瘤和/或癌症的药物。

57. 发明授权

US07626044B2 Triptolide derivatives and their uses 有权
标题翻译：雷公藤内酯衍生物及其用途
公开(公告)号：US07626044B2
公开(公告)日：2009-12-01
申请号：US10540908
申请日：2003-01-28
申请人： Yuanchao Li , Jianping Zuo , Fan Zhang , Ru Zhou , Jian Ding
发明人： Yuanchao Li , Jianping Zuo , Fan Zhang , Ru Zhou , Jian Ding
IPC分类号： C07D307/77 , C07F9/06
CPC分类号： C07D493/22 , A61K31/34
摘要： Triptolide derivatives of Formula (I), their pharmaceutically acceptable salts and optical isomers, Formula (I): wherein, C5 and C6 are connect with each other by a C-C single bond or double bond; when C5 and C6 are connected with C-C single bond, X and Y represent independently hydrogen, oxygen, hydroxyl, halogen, lower alkyl-oxy, lower alkyl-amino, mercapto, lower alkyl-thio, the group of formula —OCOR, —OSO2OR or —OPO(OH)2, each of which is attached to C5 and C6, R represents —(CH2)nCO2Na, —(CO2)nCO2K, or —(CH2)nCH3, wherein n=1-6; Z represents hydrogen, oxygen, hydroxyl, halogen, lower alkyl-oxy, lower alkyl-amino, mercapto, lower alkyl-thio, the group of formula -OCOR, -OSO2OR or —OPO(OH)2, each of which is linked at C14-position, R represents —(CH2)nCO2Na, —(CO2)nCO2K, or —(CH2)nCH2, wherein n=1-6; wherein, the“______” linked with X, Y, and Z represents the stereochemistry orientations “” or “” , but X and Y cannot both be hydrogen atom at the same time, methods for preparing the triptolides and their use as antiphiogistic agent, immunosuppressive agent or therapeutic agent for other related diseases.
摘要翻译：式（I）的雷公藤内酯衍生物，其药学上可接受的盐和旋光异构体，式（I）：其中C5和C6通过C-C单键或双键相互连接; 当C5和C6与CC单键连接时，X和Y独立地表示氢，氧，羟基，卤素，低级烷基氧基，低级烷基 - 氨基，巯基，低级烷基 - 硫基，式-OCOR，-OSO2OR 或-OPO（OH）2，其各自连接到C5和C6，R表示 - （CH2）nCO2Na， - （CO2）nCO2K或 - （CH2）nCH3，其中n = 1-6; Z代表氢，氧，羟基，卤素，低级烷基 - 氧基，低级烷基 - 氨基，巯基，低级烷基 - 硫基，式-OCOR，-OSO2OR或-OPO（OH）2基团， C14-位，R表示 - （CH2）nCO2Na， - （CO2）nCO2K或 - （CH2）nCH2，其中n = 1-6; 其中，与X，Y和Z相连的“______”表示立体化学取向“”或“”，但X和Y不能同时为氢原子，制备雷公藤内酯的方法及其作为抗氧化剂，免疫抑制剂或其他相关疾病的治疗剂的用途。

58. 发明授权

US07365014B2 Reticle fabrication using a removable hard mask 有权
标题翻译：使用可移除的硬掩模的标线制造
公开(公告)号：US07365014B2
公开(公告)日：2008-04-29
申请号：US10768919
申请日：2004-01-30
申请人： Christopher Dennis Bencher , Melvin Warren Montgomery , Alexander Buxbaum , Yung-Hee Yvette Lee , Jian Ding , Gilad Almogy , Wendy H. Yeh
发明人： Christopher Dennis Bencher , Melvin Warren Montgomery , Alexander Buxbaum , Yung-Hee Yvette Lee , Jian Ding , Gilad Almogy , Wendy H. Yeh
IPC分类号： H01L21/66 , H01L21/311 , H01L21/302 , H01L21/44 , H01L21/461
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull back which occurs during pattern transfer to the hard mask is minimalized. In addition, a hard mask material having anti-reflective properties which are matched to the reflective characteristics of the radiation-blocking layer enables a reduction in critical dimension size and an improvement in the pattern feature integrity in the hard mask itself. An anti-reflective hard mask layer left on the radiation-blocking layer provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：我们已经减少了标线制造的临界尺寸偏差。图案转印到掩模版基板的辐射阻挡层基本上取决于使用从光致抗蚀剂转移图案的硬掩模。在图案转印到硬掩模期间发生的光致抗蚀剂拉回最小化。此外，具有与防辐射层的反射特性相匹配的抗反射性能的硬掩模材料能够降低临界尺寸尺寸，并改善硬掩模本身的图案特征完整性。当在半导体器件制造工艺中使用掩模版时，留在辐射阻挡层上的抗反射硬掩模层提供功能。

59. 发明申请

US20080096138A1 Method of reducing critical dimension bias during fabrication of a semiconductor device 有权
标题翻译：在半导体器件制造期间减小临界尺寸偏压的方法
公开(公告)号：US20080096138A1
公开(公告)日：2008-04-24
申请号：US11983450
申请日：2007-11-09
申请人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
发明人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
IPC分类号： G03F7/00
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：当在半导体器件制造工艺中使用掩模版时，在掩模版的制造期间留在辐射阻挡层上的抗反射硬掩模层提供了功能。

60. 发明申请

US20070184354A1 Process for etching photomasks 有权
标题翻译：蚀刻光掩模的工艺
公开(公告)号：US20070184354A1
公开(公告)日：2007-08-09
申请号：US10925887
申请日：2004-08-25
申请人： Madhavi Chandrachood , Nicole Sandlin , Yung-Hee Lee , Jian Ding
发明人： Madhavi Chandrachood , Nicole Sandlin , Yung-Hee Lee , Jian Ding
IPC分类号： C03C25/68 , B44C1/22 , H01L21/461 , C03C15/00 , C23F1/00 , H01L21/302 , C25F3/00 , G03F1/00
CPC分类号： C03C17/06 , C03C2217/26 , C03C2218/33 , C03C2218/34 , C23F4/00 , G03F1/54 , G03F1/80 , H01J37/321 , H01J2237/3341
摘要： Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
摘要翻译：提供了用于蚀刻设置在诸如光刻掩模之类的基板上的金属层的方法和设备。一方面，提供了一种处理基板的方法，包括：将具有设置在处理室中的光学透明材料上的金属层的基板定位，引入包含含氧气体，含氯气体和将含氯气体的无卤素气体和任选的惰性气体加入到处理室中，在处理室中产生处理气体的等离子体，并蚀刻设置在基板上的金属层的暴露部分。

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