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51. 发明授权

US07348567B1 Apparatus for generating a plurality of beamlets 有权
标题翻译：用于产生多个子束的装置
公开(公告)号：US07348567B1
公开(公告)日：2008-03-25
申请号：US11545975
申请日：2006-10-10
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： H01J37/04
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
摘要翻译：本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述透镜阵列位于所述带电粒子源和所述会聚装置之间。以这种方式，可以减小会聚装置的像差。

52. 发明申请

US20070138403A1 Particle optical apparatus 审中-公开
标题翻译：粒子光学仪器
公开(公告)号：US20070138403A1
公开(公告)日：2007-06-21
申请号：US10569963
申请日：2004-08-02
申请人： Dane Cubric , Pieter Kruit
发明人： Dane Cubric , Pieter Kruit
IPC分类号： H01J1/50
CPC分类号： H01J37/05 , H01J37/09 , H01J37/263 , H01J2237/045 , H01J2237/0453 , H01J2237/0455 , H01J2237/0456 , H01J2237/0458
摘要： A particle optical apparatus including an aperture plate for shaping a particle beam before the particle beam enters a monochromator filter assembly. The aperture plate has at least one aperture and is adjustable with respect to the monochromator filter assembly, in normal operating conditions, so that the size of the aperture used to shape the particle beam can be varied, and therefore the beam current entering the filter assembly can be varied.
摘要翻译：一种粒子光学装置，包括用于在粒子束进入单色器过滤器组件之前成形粒子束的孔板。孔板具有至少一个孔，并且在正常操作条件下可相对于单色仪滤光器组件可调节，使得用于成形粒子束的孔的尺寸可以改变，因此射入电流进入过滤组件可以变化。

53. 发明申请

US20070029509A1 Apparatus for generating a plurality of beamlets 有权
标题翻译：用于产生多个子束的装置
公开(公告)号：US20070029509A1
公开(公告)日：2007-02-08
申请号：US11545976
申请日：2006-10-10
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： G21K5/10
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
摘要翻译：本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述透镜阵列位于所述带电粒子源和所述会聚装置之间。以这种方式，可以减小会聚装置的像差。

54. 发明申请

US20070018112A1 Apparatus for generating a plurality of beamlets 有权
公开(公告)号：US20070018112A1
公开(公告)日：2007-01-25
申请号：US11527206
申请日：2006-09-25
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

55. 发明授权

US07091504B2 Electron beam exposure system 有权
公开(公告)号：US07091504B2
公开(公告)日：2006-08-15
申请号：US11128512
申请日：2005-05-12
申请人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent van Veen , Pieter Kruit
发明人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent van Veen , Pieter Kruit
IPC分类号： H01J37/30 , H01J37/304
CPC分类号： H01J3/02 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/0435 , H01J2237/06308 , H01J2237/06375 , H01J2237/3045
摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

56. 发明授权

US06919952B2 Direct write lithography system 失效
标题翻译：直写光刻系统
公开(公告)号：US06919952B2
公开(公告)日：2005-07-19
申请号：US10391956
申请日：2003-03-19
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： G03F7/20 , H01J37/317 , G03B27/54 , G03B27/74
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70375 , H01J37/3174 , H01J37/3177 , H01J2237/31774 , H01J2237/31777 , H01J2237/31779 , Y10S438/942 , Y10S438/949 , Y10T428/24802
摘要： The mask-less lithography system has a converter that includes an array of light controllable electron sources. Each electron source is arranged for converting light into an electron beam and has an activation area. Individually controllable light sources are included where each light source is arranged for activating one electron source. A Controller controls each light source individually and each electron beam is focused on an object plane with a diameter smaller than the diameter of an individually controllable light source.
摘要翻译：无掩模光刻系统具有包括光可控电子源阵列的转换器。每个电子源用于将光转换成电子束并具有激活区域。包括单独控制的光源，其中每个光源被布置用于激活一个电子源。 A控制器分别控制每个光源，并且每个电子束聚焦在直径小于独立可控光源直径的物平面上。

57. 发明授权

US5838004A Particle-optical apparatus comprising a fixed diaphragm for the monochromator filter 失效
标题翻译：粒子光学装置包括用于单色器滤光器的固定光圈
公开(公告)号：US5838004A
公开(公告)日：1998-11-17
申请号：US849205
申请日：1997-06-02
申请人： Peter Christiaan Tiemeijer , J. Chmelik , Pieter Kruit
发明人： Peter Christiaan Tiemeijer , J. Chmelik , Pieter Kruit
IPC分类号： H01J37/05 , H01J37/09 , H01J37/04
CPC分类号： H01J37/05 , H01J2237/057
摘要： An electron microscope comprises an energy-selective filter (10) which is arranged ahead of the high-voltage field in the electron gun (2). Because the filter carries high-voltage potential and is arranged within the gun space (14) which is filled with SF.sub.6 gas, problems arise regarding electrical and mechanical passages to the filter. Notably the centering of the filter is problematic. In order to enable suitable aperture adjustment of the filter nevertheless (for current limitation and for avoiding optical aberrations introduced into the beam by the filter), there is provided an entrance diaphragm (30) which is rigidly connected to the filter parts, notably to a pole face or to a field-defining closing piece (48a) of the filter.
摘要翻译： PCT No.PCT / IB96 / 01029 Sec。 371日期：1997年6月2日 102（e）日期1996年6月2日PCT提交1996年10月1日PCT公布。公开号WO97 / 13268 日期1997年04月10日电子显微镜包括设置在电子枪（2）中的高压场前方的能量选择滤光器（10）。因为过滤器承载高压电位并且被布置在填充有SF 6气体的枪空间（14）内，所以关于过滤器的电和机械通道出现问题。值得注意的是过滤器的中心是有问题的。为了使滤波器适当的孔径调节（为了限制电流并避免由滤波器引入到光束中的光学像差），提供了一个入口隔膜（30），其刚性地连接到过滤器部件，特别是一个极面或过滤器的场界定闭合件（48a）。

58. 发明授权

US09105439B2 Projection lens arrangement 有权
标题翻译：投影镜头布置
公开(公告)号：US09105439B2
公开(公告)日：2015-08-11
申请号：US13304427
申请日：2011-11-25
申请人： Marco Jan Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Van Veen , Pieter Kruit , Stijn Willem Steenbrink
发明人： Marco Jan Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Van Veen , Pieter Kruit , Stijn Willem Steenbrink
IPC分类号： H01J37/317 , H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/30
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/1205 , H01J2237/121 , H01J2237/151
摘要： The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.
摘要翻译：本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

59. 发明授权

US08188450B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08188450B2
公开(公告)日：2012-05-29
申请号：US13050875
申请日：2011-03-17
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J3/14 , A61N5/00
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

60. 发明申请

US20120043457A1 OPTICAL SWITCHING IN A LITHOGRAPHY SYSTEM 审中-公开
标题翻译：光刻系统中的光学切换
公开(公告)号：US20120043457A1
公开(公告)日：2012-02-23
申请号：US13284634
申请日：2011-10-28
申请人： Jan-Jaco Marco Wieland , Johannes Christian van ' t Spijker , Remco Jager , Pieter Kruit
发明人： Jan-Jaco Marco Wieland , Johannes Christian van ' t Spijker , Remco Jager , Pieter Kruit
IPC分类号： H01J3/14 , H01J3/26 , G01J1/04
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译：一种用于将图案转印到目标表面上的无掩模光刻系统。用于产生多个子束的至少一个光束发生器。多个调制器调制小波束的幅度，并且控制单元控制调制器。控制单元生成并将模式数据传送到调制器，以控制每个单独子束的幅度。控制单元包括用于存储图案数据的至少一个数据存储器，用于从数据存储器读出数据的至少一个读出单元，至少一个数据转换器，用于将从数据存储器读出的数据转换为至少一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。

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