会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 53. 发明授权
    • Remote virtual machine migration port management device and system
    • 远程虚拟机迁移端口管理设备和系统
    • US08972988B2
    • 2015-03-03
    • US13553656
    • 2012-07-19
    • Kozo IkegamiTakashi Yokoyama
    • Kozo IkegamiTakashi Yokoyama
    • G06F9/455G06F15/173G06F7/00
    • G06F9/45545G06F9/45558G06F2009/4557
    • A live migration process between different locations is realized without migrating data stored in a storage area to another location. A network device, which is included in each of locations, for coupling to another one of the locations, the network device stores a program for realizing an access processing module for managing accesses, and coupling management information for managing a coupling relationship between the plurality of virtual machines and the plurality of storage areas, and wherein the access processing module is configured to: receive a notification to start a live migration process, refer to the coupling management information to identify a port for accessing a storage area allocated to a virtual machine; acquire an address of a transfer destination device to which an access request is transferred; generate conversion information; and control the access request based on the conversion information.
    • 实现不同位置之间的实时迁移过程,而不会将存储在存储区域中的数据迁移到另一位置。 网络设备包括在每个位置中,用于耦合到另一个位置,网络设备存储用于实现用于管理访问的访问处理模块的程序,以及耦合用于管理多个站点之间的耦合关系的管理信息 虚拟机和多个存储区域,并且其中所述访问处理模块被配置为:接收启动实时迁移过程的通知,参考所述耦合管理信息以识别用于访问分配给虚拟机的存储区域的端口; 获取传送访问请求的传送目的地设备的地址; 生成转换信息; 并根据转换信息控制访问请求。
    • 57. 发明授权
    • Fuel distribution apparatus for a V-type engine
    • 用于V型发动机的燃油分配装置
    • US08033270B2
    • 2011-10-11
    • US12392402
    • 2009-02-25
    • Naoto YamagishiTakashi Yokoyama
    • Naoto YamagishiTakashi Yokoyama
    • F02M55/02F02M55/00
    • F02B75/22F02M37/007
    • A fuel distribution apparatus for a V-type engine wherein first and second throttle bodies connected to first and second banks disposed in a V shape, respectively, are disposed therebetween and a main fuel distribution pipe for distributing fuel from a common fuel supply system is connected to first and second fuel injection valves provided in the first and second throttle bodies, respectively, is configured such that the fuel distribution pipe is formed from first and second distribution pipes separate from each other and connected to the first and second fuel injection valves and besides fastened to the first and second throttle bodies, respectively, a joint pipe connects the fuel supply to the first or second distribution pipes. Communication conduit connects the first and second distribution pipes.
    • 一种用于V型发动机的燃料分配装置,其中分别设置有连接到V形状的第一和第二排的第一和第二节流体,并且连接用于从公共燃料供应系统分配燃料的主燃料分配管 设置在第一和第二节流体中的第一和第二燃料喷射阀分别被构造成使得燃料分配管由彼此分离并连接到第一和第二燃料喷射阀的第一和第二分配管形成,此外 分别固定在第一和第二节流体上,连接管将燃料供给部与第一或第二分配管连接起来。 通信管道连接第一和第二分配管道。
    • 60. 发明授权
    • Film forming apparatus
    • 成膜装置
    • US07691203B2
    • 2010-04-06
    • US11341093
    • 2006-01-27
    • Toru InagakiTakahiro ShirahataTakashi YokoyamaMichihiro SanoNaochika Horio
    • Toru InagakiTakahiro ShirahataTakashi YokoyamaMichihiro SanoNaochika Horio
    • C23C16/22H01L21/36C23C16/00
    • C23C16/45514C23C16/4411C23C16/4412C23C16/45563C23C16/4584C30B25/14C30B29/16
    • A film forming apparatus is provided that can prevent source gases from reacting together before reaching the substrate being processed in the apparatus, minimize the influence of the radiation heat from the substrate, and make the gas behavior in the reaction chamber better for crystal film formation. The apparatus forms a film on a surface of a heated substrate 5 by causing a first source gas and a second source gas to react together. The apparatus has a processing chamber 1, in which the substrate 5 is placed. The processing chamber 1 is divided into a heating chamber 1a and a reaction chamber 1b by at least the substrate 5 so that the substrate surface can be exposed to the source gases in the reaction chamber 1b. The apparatus further has an exhaust duct 7, through which the exhaust gas can be discharged. The exhaust duct 7 faces the exposed substrate surface and connects with the reaction chamber 1b. The apparatus further has first supply ports 11 and second supply ports 12, through which the first and second source gases respectively can be supplied independently onto the substrate surface. The supply ports 11 and 12 are positioned outside the exhaust duct 7. This enables the source gases to react immediately near the substrate 5 so that high-quality crystal film formation can be performed on the substrate.
    • 提供了一种成膜装置,其可以在到达装置内被处理的基板之前防止源气体一起反应,从而最小化来自基板的辐射热的影响,并使反应室中的气体行为更好地用于晶体膜形成。 该装置通过使第一源气体和第二源气体一起反应而在加热的基板5的表面上形成膜。 该装置具有处理室1,其中放置有基板5。 处理室1至少由基板5分成加热室1a和反应室1b,使得基板表面能够暴露于反应室1b中的源气体。 该装置还具有排气管7,排气可以排出。 排气管7面对暴露的基板表面并与反应室1b连接。 该装置还具有第一供应端口11和第二供应端口12,第一和第二源气体可以分别通过第一供应端口11和第二供应端口12独立地供应到基板表面上。 供给口11和12位于排气管7的外部。这使得源气体能够在基板5附近立即反应,从而可以在基板上进行高质量的晶体成膜。