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51. 发明授权

US06843258B2 On-site cleaning gas generation for process chamber cleaning 失效
标题翻译：现场清洁气体生成用于处理室清洁
公开(公告)号：US06843258B2
公开(公告)日：2005-01-18
申请号：US09741529
申请日：2000-12-19
申请人： Quanyuan Shang , Sanjay Yadav , William R. Harshbarger , Kam S. Law
发明人： Quanyuan Shang , Sanjay Yadav , William R. Harshbarger , Kam S. Law
IPC分类号： C23C16/44 , B08B9/00
CPC分类号： H01J37/32862 , C23C16/4405 , Y10S134/902 , Y10S438/905
摘要： Provided herein is a method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing. This method comprises the steps of converting a non-cleaning feed gas to a cleaning gas in a remote location and then delivering the cleaning gas to the process chamber for cleaning. Such method may further comprise the step of activating the cleaning gas outside the chamber before the delivery of the gas to the chamber. Also provided is a method of eliminating non-cleaning feed gas from the cleaning gas by cryo condensation.
摘要翻译：本文提供了一种用于清洁用于半导体和/或平板显示器制造的处理室的方法。该方法包括以下步骤：将非清洁进料气体转化为远程位置的清洁气体，然后将清洁气体输送到处理室进行清洁。这种方法还可以包括在将气体输送到室之前激活室外的清洁气体的步骤。还提供了一种通过冷冻冷凝从清洁气体中清除未清洁进料气体的方法。

52. 发明授权

US06676761B2 Method and apparatus for dechucking a substrate 失效
标题翻译：剥离基板的方法和装置
公开(公告)号：US06676761B2
公开(公告)日：2004-01-13
申请号：US10308385
申请日：2002-12-02
申请人： Quanyuan Shang , William R. Harshbarger , Robert L. Greene , Ichiro Shimizu
发明人： Quanyuan Shang , William R. Harshbarger , Robert L. Greene , Ichiro Shimizu
IPC分类号： H01L2100
CPC分类号： H01L21/68742 , C23C16/458
摘要： A substrate support assembly and method for dechucking a substrate is provided. In one embodiment, a support assembly includes a substrate support having a support surface, a first set of lift pins and one or more other lift pins movably disposed through the substrate support. The first set of lift pins and the one or more lift pins project from the support surface when the pins are in an actuated position. When in the actuated position, the first set of lift pins project a longer distance from the support surface than the one or more other lift pins. In another aspect of the invention, a method for dechucking a substrate from a substrate support is provided. In one embodiment, the method includes the steps of projecting a first set of lift pins a first distance above a surface of a substrate support, and projecting a second set of lift pins a second distance above the surface of the substrate support that is less than the first distance.
摘要翻译：提供了一种用于对基板进行脱扣的基板支撑组件和方法。在一个实施例中，支撑组件包括具有支撑表面的基板支撑件，第一组提升销和可移动地设置穿过基板支撑件的一个或多个其他提升销。当销处于致动位置时，第一组提升销和一个或多个提升销从支撑表面突出。当处于致动位置时，第一组提升销与支撑表面比一个或多个其他提升销突出较长的距离。在本发明的另一方面，提供了一种用于从基板支撑件去除基板的方法。在一个实施例中，该方法包括以下步骤：将第一组提升销投影在衬底支撑件的表面之上的第一距离处，并且将第二组提升销投影在衬底支撑件的表面上方的第二距离处，该第二组提升销小于第一个距离。

53. 发明授权

US06500265B1 Apparatus for electrostatically maintaining subtrate flatness 失效
标题翻译：用于静电保持底片平整度的装置
公开(公告)号：US06500265B1
公开(公告)日：2002-12-31
申请号：US09714023
申请日：2000-11-15
申请人： Quanyuan Shang , Robert McCormick Robertson , Kam S. Law , James T. Gardner
发明人： Quanyuan Shang , Robert McCormick Robertson , Kam S. Law , James T. Gardner
IPC分类号： C23C1600
CPC分类号： C23C16/4583 , C23C14/50 , C23C16/458 , C23C16/4586 , H01L21/67069 , H01L21/6831 , H02N13/00 , Y10T279/23
摘要： An apparatus for holding a substrate on a support layer in a processing chamber. The apparatus is directed to a susceptor system for a processing chamber in which a substrate is electrostatically held essentially flat. The apparatus includes a substrate support and a support layer composed of a dielectric material disposed on the substrate support. At least one lift pin is used for supporting the substrate relative to the support layer. A device is provided for moving each lift pin relative to the support layer. A device is also provided for producing a plasma within the processing chamber.
摘要翻译：一种用于将基板保持在处理室中的支撑层上的装置。该装置被引导到用于处理室的基座系统，其中基底被静电地保持基本上平坦。该装置包括基板支撑件和由设置在基板支撑件上的电介质材料构成的支撑层。至少一个提升销用于相对于支撑层支撑基板。提供了用于相对于支撑层移动每个提升销的装置。还提供了用于在处理室内产生等离子体的装置。

54. 发明授权

US06468601B1 Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology 有权
标题翻译：使用远程等离子体源清洗技术的氮化硅沉积中白色粉末还原的装置和方法
公开(公告)号：US06468601B1
公开(公告)日：2002-10-22
申请号：US09523538
申请日：2000-03-10
申请人： Quanyuan Shang , Robert McCormick Robertson , Kam S. Law , Dan Maydan
发明人： Quanyuan Shang , Robert McCormick Robertson , Kam S. Law , Dan Maydan
IPC分类号： B05D306
CPC分类号： C23C16/4405
摘要： An apparatus and method for reducing the production of white powder in a process chamber used for depositing silicon nitride. Steps of the method include heating at least a portion of a wall of the process chamber; providing a liner covering a substantial portion of a wall of the process chamber; providing a remote chamber connected to the interior of the process chamber; causing a plasma of cleaning gas in the remote chamber; and flowing a portion of the plasma of cleaning gas into the process chamber. The apparatus includes a deposition chamber having walls; means for heating the walls, the means thermally coupled to the walls; a liner covering a substantial portion of the walls; a remote chamber disposed outside of the chamber; an activation source adapted to deliver energy into the remote chamber; a first conduit for flowing a precursor gas from a remote gas supply into the remote chamber where it is activated by the activation source to form a reactive species; and a second conduit for flowing the reactive species from the remote chamber into the deposition chamber.
摘要翻译：用于在用于沉积氮化硅的处理室中减少白色粉末的生产的装置和方法。该方法的步骤包括加热处理室壁的至少一部分; 提供覆盖所述处理室的壁的主要部分的衬垫; 提供连接到处理室内部的远程室; 导致远程室中的清洁气体的等离子体; 并将清洁气体的等离子体的一部分流入处理室。该装置包括具有壁的沉积室; 用于加热壁的装置，热耦合到壁的装置; 覆盖壁的大部分的衬垫; 设置在室外的远程室; 活化源，其适于将能量输送到所述远程室中; 用于将前体气体从远程气体供给流入远程室的第一导管，其中激活源被激活以形成反应性物质; 以及用于使反应物质从远程室流入沉积室的第二导管。

55. 发明授权

US5788778A Deposition chamber cleaning technique using a high power remote excitation source 失效
标题翻译：沉积室清洗技术采用高功率远程激励源
公开(公告)号：US5788778A
公开(公告)日：1998-08-04
申请号：US707491
申请日：1996-09-16
申请人： Quanyuan Shang , Kam S. Law , Dan Maydan
发明人： Quanyuan Shang , Kam S. Law , Dan Maydan
IPC分类号： B08B7/00 , C23C16/44 , H01L21/205 , H01L21/3065 , B08B7/04 , B08B5/00 , C03C15/00 , C03C23/06
CPC分类号： C23C16/4405 , B08B7/0035 , Y10S156/916
摘要： A method for cleaning a deposition chamber that is used in fabricating electronic devices including the steps of delivering a precursor gas into a remote chamber that is outside of the deposition chamber, activating the precursor gas in the remote chamber via a high power source to form a reactive species, flowing the reactive species from the remote chamber into the deposition chamber, and using the reactive species that is flowed into the deposition chamber from the remote chamber to clean the inside of the deposition chamber.
摘要翻译：一种用于清洁用于制造电子器件的沉积室的方法，包括以下步骤：将前体气体输送到位于沉积室外的远程室中，经由高功率源激活远程室中的前体气体，以形成将反应性物质从远程室流入沉积室，以及使用从远程室流入沉积室的反应物质以清洁沉积室的内部。

56. 发明申请

US20110045206A1 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY PLASMA SPRAYING 有权
标题翻译：电池活性锂离子电池原位沉积
公开(公告)号：US20110045206A1
公开(公告)日：2011-02-24
申请号：US12862244
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
IPC分类号： C23C16/513 , H05H1/24 , C23C16/06
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译：提供一种用于形成薄膜电池的电化学层的方法和装置。包含分散在携带介质中的前体颗粒的前体混合物通过施加电场在活化室中活化，以电离至少一部分前体混合物。然后将活化的前体混合物与可燃气体混合物混合，以向前体颗粒添加热能，将其转化成沉积在基材上的纳米晶体。当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。

57. 发明申请

US20070148336A1 PHOTOVOLTAIC CONTACT AND WIRING FORMATION 审中-公开
标题翻译：光伏接触和接线形成
公开(公告)号：US20070148336A1
公开(公告)日：2007-06-28
申请号：US11556776
申请日：2006-11-06
申请人： Robert Bachrach , Quanyuan Shang , Yan Ye
发明人： Robert Bachrach , Quanyuan Shang , Yan Ye
IPC分类号： B05D5/12 , H05K3/00 , C23C16/00
CPC分类号： C23C14/35 , C23C14/564 , H01L31/022425 , H01L31/18 , H05K3/048 , Y02E10/50
摘要： A method and apparatus for fabricating a solar cell and forming metal contact is disclosed. Solar cell contact and wiring is formed by depositing a thin film stack of a first metal material and a second metal material as an initiation layer or seed layer for depositing a bulk metal layer in conjunction with additional sheet processing, photolithography, etching, cleaning, and annealing processes. In one embodiment, the thin film stack for forming metal silicide with reduced contact resistance over the sheet is deposited by sputtering or physical vapor deposition. In another embodiment, the bulk metal layer for forming metal lines and wiring is deposited by sputtering or physical vapor deposition. In an alternative embodiment, electroplating or electroless deposition is used to deposit the bulk metal layer.
摘要翻译：公开了一种用于制造太阳能电池和形成金属接触的方法和装置。通过沉积第一金属材料和第二金属材料的薄膜堆叠来形成太阳能电池接触和布线，所述第一金属材料和第二金属材料作为起始层或籽晶层，用于结合额外的片材处理，光刻，蚀刻，清洁和退火工艺。在一个实施例中，通过溅射或物理气相沉积沉积用于形成具有降低的片上接触电阻的金属硅化物的薄膜叠层。在另一个实施例中，通过溅射或物理气相沉积沉积用于形成金属线和布线的体金属层。在替代实施例中，使用电镀或无电沉积来沉积体金属层。

58. 发明申请

US20070076040A1 Methods and apparatus for inkjet nozzle calibration 审中-公开
标题翻译：喷墨喷嘴校准方法和装置
公开(公告)号：US20070076040A1
公开(公告)日：2007-04-05
申请号：US11489258
申请日：2006-07-19
申请人： Quanyuan Shang , Fan-Cheung Sze
发明人： Quanyuan Shang , Fan-Cheung Sze
IPC分类号： B41J29/393
CPC分类号： B41J2/0456 , B41J2/0458 , B41J2/04588 , B41J3/28 , B41J3/4073 , B41J11/0035 , B41J25/308 , G02F1/1303 , G02F1/133516
摘要： Methods and apparatus are provided for calibrating inkjet print nozzles that include dispensing a plurality of ink drops onto a surface with one or more inkjet print nozzles at a firing pulse voltage, measuring a parameter of the ink drops, and calibrating the firing pulse voltage of at least one of the one or more inkjet print nozzles based on the measured parameter of the ink drops.
摘要翻译：提供了用于校准喷墨打印喷嘴的方法和装置，其包括使用一个或多个喷墨打印喷嘴在喷射脉冲电压下将多个墨滴分配到表面上，测量墨滴的参数，以及校准喷墨脉冲电压基于所测量的墨滴的参数，一个或多个喷墨打印喷嘴中的至少一个。

59. 发明申请

US20070070107A1 Methods and systems for inkjet drop positioning 失效
标题翻译：喷墨定位方法和系统
公开(公告)号：US20070070107A1
公开(公告)日：2007-03-29
申请号：US11238636
申请日：2005-09-29
申请人： Bassam Shamoun , Janusz Jozwiak , Eugene Mirro , Quanyuan Shang , Shinichi Kurita , John White
发明人： Bassam Shamoun , Janusz Jozwiak , Eugene Mirro , Quanyuan Shang , Shinichi Kurita , John White
IPC分类号： B41J29/38
CPC分类号： B41J29/393
摘要： Methods and apparatus for inkjet inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.
摘要翻译：提供喷墨喷墨滴定位的方法和装置。第一种方法包括确定墨滴在基底上的预期沉积位置，使用喷墨印刷系统将墨滴沉积在基底上，检测沉积的墨滴在基底上的沉积位置，将沉积位置与预期的位置进行比较确定存放位置与预期位置之间的差异，以及通过调整喷墨打印系统的参数来补偿存放位置与预期位置之间的差异。提供了许多其他方面。

60. 发明申请

US20070070099A1 METHODS AND APPARATUS FOR INKJET PRINTING ON NON-PLANAR SUBSTRATES 审中-公开
标题翻译：用于印刷非平板基板的方法和装置
公开(公告)号：US20070070099A1
公开(公告)日：2007-03-29
申请号：US11536533
申请日：2006-09-28
申请人： Emanuel Beer , Chang Lin , Shinichi Kurita , Quanyuan Shang , Benjamin Johnston
发明人： Emanuel Beer , Chang Lin , Shinichi Kurita , Quanyuan Shang , Benjamin Johnston
IPC分类号： B41J25/308
CPC分类号： B41J2/0456 , B41J2/0458 , B41J2/04588 , B41J3/28 , B41J3/4073 , B41J11/0035 , B41J25/308 , G02F1/1303 , G02F1/133516
摘要： A sensor apparatus for an inkjet printing device is provided. The sensor apparatus may include 1) at least one print head adapted to deposit ink on a top surface of a substrate, wherein the substrate is in motion relative to the print head, 2) at least one sensor adapted to detect the distance of the at least one sensor from the top surface of the substrate, and 3) a controller adapted to determine the substrate to nozzle distance based on the distance of the sensor to the top surface of the substrate, and adjust the trajectory of the ink being deposited on the substrate based on the substrate to nozzle distance. Numerous other aspects are provided.
摘要翻译：提供了一种用于喷墨打印装置的传感器装置。所述传感器装置可以包括：1）适于将墨水沉积在基底的顶表面上的至少一个打印头，其中所述基底相对于所述打印头运动; 2）至少一个传感器，适于检测所述at 至少一个传感器，以及3）控制器，其适于基于所述传感器与所述基板顶表面的距离来确定所述基板与喷嘴的距离，并且调整沉积在所述基板上的所述油墨的轨迹基板基于基板与喷嘴的距离。提供了许多其他方面。

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