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    • 52. 发明授权
    • Method of magnetic tunneling junction pattern layout for magnetic random access memory
    • 磁性随机存取存储器磁隧道结图案布局方法
    • US07508700B2
    • 2009-03-24
    • US11724435
    • 2007-03-15
    • Tom ZhongTerry Kin Ting KoChyu-Jiuh TorngWai-Ming KanAdam Zhong
    • Tom ZhongTerry Kin Ting KoChyu-Jiuh TorngWai-Ming KanAdam Zhong
    • G11C11/00
    • H01L27/222H01L43/12Y10S977/935
    • An MTJ pattern layout for a memory device is disclosed that includes two CMP assist features outside active MTJ device blocks. A first plurality of dummy MTJ devices is located in two dummy bands formed around an active MTJ device block. The inner dummy band is separated from the outer dummy band by the MTJ ILD layer and has a MTJ device density essentially the same as the MTJ device block. The outer dummy band has a MTJ device density at least 10% greater than the inner dummy band. The inner dummy band serves to minimize CMP edge effect in the MTJ device block while the outer dummy band improves planarization. A second plurality of dummy MTJ devices is employed in contact pads outside the outer dummy band and is formed between a WL ILD layer and a BIT ILD layer thereby minimizing delamination of the MTJ ILD layer.
    • 公开了一种用于存储器件的MTJ图案布局,其包括主动MTJ器件块之外的两个CMP辅助特征。 第一组多个虚拟MTJ设备位于形成在活动MTJ设备块周围的两个虚拟带中。 内部虚拟带通过MTJ ILD层与外部虚拟带分离,并且具有与MTJ器件块基本相同的MTJ器件密度。 外虚拟带具有比内虚拟带大至少10%的MTJ装置密度。 内部虚拟带用于最小化MTJ器件块中的CMP边缘效应,而外部虚拟带改善了平坦化。 在外虚拟带外部的接触焊盘中采用第二多个虚拟MTJ器件,并且形成在WL ILD层和BIT ILD层之间,从而最小化MTJ ILD层的分层。
    • 53. 发明授权
    • Method of fabricating contact pad for magnetic random access memory
    • 制造磁性随机存取存储器接触焊盘的方法
    • US07122386B1
    • 2006-10-17
    • US11231674
    • 2005-09-21
    • Chyu-Jiuh TorngTom ZhongWei CaoPo-Kang Wang
    • Chyu-Jiuh TorngTom ZhongWei CaoPo-Kang Wang
    • H01L21/00
    • H01L43/12H01L27/222
    • A method of forming a Cu—Cu junction between a word line pad (WLP) and bit line (BL) contact is described. An opening above a WL contact is formed in a first SiNx layer on a substrate that includes a WLP and word line. After a bottom electrode (BE) layer, MTJ stack, and hard mask are sequentially deposited, an etch forms an MTJ element above the word line. Another etch forms a BE and exposes the first SiNx layer above the WLP and bond pad (BP). An MTJ ILD layer is deposited and planarized followed by deposition of a second SiNx layer and BL ILD layer. Trenches are formed in the BL ILD layer and second SiNx layer above the WLP, hard mask and BP. After vias are formed in the MTJ ILD and first SiNx layers above the WLP and BP, Cu deposition follows to form dual damascene BL contacts.
    • 描述了在字线焊盘(WLP)和位线(BL)触点之间形成Cu-Cu结的方法。 在包括WLP和字线的衬底上的第一SiN x层中形成WL触点上方的开口。 在底电极(BE)层,MTJ叠层和硬掩模之后,顺序沉积,蚀刻在字线之上形成MTJ元件。 另一蚀刻形成BE,并使WLP和接合焊盘(BP)上方的第一SiN x层暴露。 沉积MTJ ILD层并平坦化,随后沉积第二SiN x层和BL ILD层。 沟槽形成在WLP,硬掩模和BP之上的BL ILD层和第二SiN x x层中。 在WLP和BP上方的MTJ ILD和第一SiN x x层中形成通孔之后,随后进行Cu沉积以形成双镶嵌BL触点。
    • 54. 发明授权
    • GMR biosensor with enhanced sensitivity
    • GMR生物传感器具有增强的灵敏度
    • US08133439B2
    • 2012-03-13
    • US11497162
    • 2006-08-01
    • Po-Kang WangXizeng ShiChyu-Jiuh Torng
    • Po-Kang WangXizeng ShiChyu-Jiuh Torng
    • G01N15/06
    • G01R33/0052B82Y25/00G01N15/0656G01N27/745G01N2015/0065G01R33/05G01R33/093G01R33/098Y10T29/49124Y10T29/49986
    • A sensor array comprising a series connection of parallel GMR sensor stripes provides a sensitive mechanism for detecting the presence of magnetized particles bonded to biological molecules that are affixed to a substrate. The adverse effect of hysteresis on the maintenance of a stable bias point for the magnetic moment of the sensor free layer is eliminated by a combination of biasing the sensor along its longitudinal direction rather than the usual transverse direction and by using the overcoat stress and magnetostriction of magnetic layers to create a compensatory transverse magnetic anisotropy. By making the spaces between the stripes narrower than the dimension of the magnetized particle and by making the width of the stripes equal to the dimension of the particle, the sensitivity of the sensor array is enhanced.
    • 包括并联GMR传感器条的串联连接的传感器阵列提供了用于检测粘附到固定到基底上的生物分子的磁化颗粒的存在的敏感机制。 通过将传感器沿着其纵向方向而不是通常的横向偏置并通过使用传感器的外涂层应力和磁致伸缩的组合来消除滞后对维持传感器自由层的磁矩的稳定偏置点的不利影响 磁性层产生补偿横向磁各向异性。 通过使条纹之间的空间比磁化粒子的尺寸窄,并且通过使条纹的宽度等于粒子的尺寸,传感器阵列的灵敏度增强。
    • 56. 发明申请
    • Novel hard bias design for extra high density recording
    • 用于超高密度记录的新型硬偏置设计
    • US20100172053A1
    • 2010-07-08
    • US12660908
    • 2010-03-05
    • Kunliang ZhangYun-Fei LiChyu-Jiuh TorngChen-Jung Chien
    • Kunliang ZhangYun-Fei LiChyu-Jiuh TorngChen-Jung Chien
    • G11B5/187B05D1/36
    • B82Y25/00B82Y10/00G11B5/3912G11B5/3932G11B2005/3996
    • A hard bias structure for biasing a free layer in a MR element within a read head is comprised of a composite hard bias layer having a Co78.6Cr5.2Pt16.2/Co65Cr15Pt20 configuration. The upper Co65Cr15Pt20 layer has a larger Hc value and a thickness about 2 to 10 times greater than that of the Co78.6Cr5.2Pt16.2 layer. The hard bias structure may also include a BCC underlayer such as FeCoMo which enhances the magnetic moment of the hard bias structure. Optionally, the thickness of the Co78.6Cr5.2Pt16.2 layer is zero and the Co65Cr15Pt20 layer is formed on the BCC underlayer. The present invention also encompasses a laminated hard bias structure. The Mrt value for the hard bias structure may be optimized by adjusting the thicknesses of the BCC underlayer and CoCrPt layers. As a result, a larger process window is realized and lower asymmetry output during a read operation is achieved.
    • 用于偏置读取头内的MR元件中的自由层的硬偏置结构由具有Co78.6Cr5.2Pt16.2 / Co65Cr15Pt20配置的复合硬偏置层组成。 Co65Cr15Pt20上层具有较大的Hc值,厚度约为Co78.6Cr5.2Pt16.2层的2〜10倍。 硬偏压结构还可以包括诸如FeCoMo的BCC底层,其增强了硬偏压结构的磁矩。 可选地,Co78.6Cr5.2Pt16.2层的厚度为零,Co65Cr15Pt20层形成在BCC底层上。 本发明还包括层压硬偏置结构。 可以通过调整BCC底层和CoCrPt层的厚度来优化硬偏置结构的Mrt值。 结果,实现了更大的处理窗口,并且在读取操作期间实现了较低的不对称输出。