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51. 发明授权

US07514185B2 Preparation of photomask blank and photomask 有权
标题翻译：光掩模坯料和光掩模的制备
公开(公告)号：US07514185B2
公开(公告)日：2009-04-07
申请号：US11130278
申请日：2005-05-17
申请人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko
发明人： Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/0676
摘要： A photomask blank is prepared by forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40 J/cm2. A photomask is prepared by forming a resist pattern on the photomask blank by photolithography, etching away those portions of the light-absorbing film which are not covered with the resist pattern, and removing the resist.
摘要翻译：通过在透明基板上形成光吸收膜，并以3〜40J / cm 2的能量密度从闪光灯照射光吸收膜来制备光掩模坯料。通过光刻法在光掩模坯料上形成抗蚀剂图案，蚀刻除了未被抗蚀剂图案覆盖的光吸收膜的那些部分，并除去抗蚀剂来制备光掩模。

52. 发明授权

US07264908B2 Photo mask blank and photo mask 有权
标题翻译：照片面具空白和照片面具
公开(公告)号：US07264908B2
公开(公告)日：2007-09-04
申请号：US10834919
申请日：2004-04-30
申请人： Hideo Kaneko , Tetsushi Tsukamoto
发明人： Hideo Kaneko , Tetsushi Tsukamoto
IPC分类号： G03F9/00
CPC分类号： G03F1/46 , G03F1/50 , G03F1/54
摘要： There is disclosed a photo mask blank comprising at least a light-shielding film containing Cr and one or more layers of an anti-reflection film disposed on a substrate, wherein at least one layer of the anti-reflection film contains any one selected from the group consisting of silicon oxide, silicon nitride and silicon oxynitride. And there is also disclosed a photo mask blank comprising at least a light-shielding film containing Cr and two or more layers of an anti-reflection film disposed on a substrate, wherein the anti-reflection film comprises at least a layer of film with high transmittance at exposure wavelength, and a layer of film with lower transmittance at exposure wavelength than that of the layer and higher transmittance at inspection wavelength than at that exposure wavelength. Thus, there can be provided a photo mask blank having an anti-reflection film that can sufficiently reduce reflectance even if the exposure wavelength is short.
摘要翻译：公开了一种光掩模坯料，其至少包含含有Cr的遮光膜和设置在基板上的一层或多层防反射膜，其中至少一层防反射膜包含从由氧化硅，氮化硅和氮氧化硅组成的组。并且还公开了一种光掩模坯料，其至少包含含有Cr的遮光膜和设置在基板上的两层或多层防反射膜，其中抗反射膜至少包括一层具有高曝光波长下的透射率，曝光波长下的透光率低于层的透光率，检测波长的透射率高于曝光波长。因此，可以提供一种具有防反射膜的光掩模坯料，即使曝光波长短，也可以充分降低反射率。

53. 发明授权

US06451489B1 Phase shift photomask 有权
标题翻译：相移光掩模
公开(公告)号：US06451489B1
公开(公告)日：2002-09-17
申请号：US09666907
申请日：2000-09-20
申请人： Hideo Kaneko
发明人： Hideo Kaneko
IPC分类号： G03F900
CPC分类号： G03F1/32 , G03F1/58
摘要： A phase shift photomask is constructed by forming a phase shifter defining a second light transmissive region on a substrate transmissive to exposure light. Exposure light undergoes multiple reflection within the phase shifter. This enables use of a thinner shifter film, minimizes a phase variation relative to a film thickness variation, and alleviates optical restraints on the film.
摘要翻译：通过在透射曝光的基板上形成限定第二透光区域的移相器构成相移光掩模。曝光光在移相器内经历多次反射。这使得能够使用更薄的移位膜，使相对于膜厚度变化的相位变化最小化，并减轻膜上的光学约束。

54. 发明授权

US6117374A Control method for powder feed apparatus 失效
标题翻译：粉末进料装置的控制方法
公开(公告)号：US6117374A
公开(公告)日：2000-09-12
申请号：US42156
申请日：1998-03-13
申请人： Hideo Kaneko , Kazutami Takahashi , Kiyoshi Ogawa
发明人： Hideo Kaneko , Kazutami Takahashi , Kiyoshi Ogawa
IPC分类号： B30B11/00 , B29C31/06 , B29C43/34 , B30B15/30 , B29C39/44
CPC分类号： B30B11/005 , B29C31/066 , B29C43/34 , B30B15/304 , B29C2037/90 , B29C2043/3494 , B29C2043/3618 , B29K2105/251
摘要： A powder feed apparatus and a control method thereof for a powder molding press wherein in feeding powder from a hopper of the powder feed apparatus to a feeder slidably disposed on a die plate of the press proper and charging powder into a die in the die plate the feeder is electronically controlled to a correct position on the die. Powder is fed from a powder feed apparatus into a feeder slidably disposed on a die plate of a press proper and a feeder drive motor is servo-controlled by an output obtained by comparing detection outputs from a position detector for detecting the vertical position of the die plate of the press proper and a position detector for detecting the position of the feeder in its sliding direction. As a result, it is possible to avoid the trouble of changing cams or inserting insert cams every time the shape of the compact being molded changes and it is possible to easily make changes to the movement speed of the feeder in correspondence with changes to the compact.
摘要翻译：一种用于粉末成型压力机的粉末进料装置及其控制方法，其中将粉末进料装置的料斗中的粉末送入可滑动地设置在压榨机的模板上的进料器，并将粉末装入模板中的模具中进料器被电子控制到模具上的正确位置。将粉末从粉末供给装置供给到可滑动地设置在压制机的模板上的进料器中，并且通过比较来自用于检测模具的垂直位置的位置检测器的检测输出获得的输出来进行伺服控制的给料器驱动马达压板本体的板和用于检测进给器在其滑动方向上的位置的位置检测器。结果，可以避免在每次模制件的形状变化时改变凸轮或插入凸轮的麻烦，并且可以容易地根据紧凑件的变化来改变进给器的移动速度。

55. 发明授权

US5591502A Magnetic recording medium 失效
标题翻译：磁记录介质
公开(公告)号：US5591502A
公开(公告)日：1997-01-07
申请号：US348342
申请日：1994-12-02
申请人： Hideo Kaneko , Katsushi Tokunaga , Yoshio Tawara
发明人： Hideo Kaneko , Katsushi Tokunaga , Yoshio Tawara
IPC分类号： G11B5/73 , G11B5/84 , G11B5/66 , B32B3/02 , B32B5/16
CPC分类号： G11B5/7315 , G11B5/8404 , Y10S428/90 , Y10T428/12854 , Y10T428/265
摘要： Proposed is a magnetic recording medium consisting of a non-magnetic substrate and a magnetic recording layer formed thereon by the method of sputtering, in which the non-magnetic substrate is a disk of single crystal silicon having a surface of the crystallographic orientation of (100), the surface roughness Rp being 40 nm or smaller. By virtue of the use of the unique material for the substrate, the magnetic recording layer is outstandingly stable as compared with conventional aluminum or glass substrates and the magnetic layer formed thereon by sputtering has a greatly improved coercive force of 1300 oersted or higher.
摘要翻译：提出了一种由非磁性基板和通过溅射方法在其上形成的磁记录层组成的磁记录介质，其中非磁性基板是晶体取向面为（100）的单晶硅盘），表面粗糙度Rp为40nm以下。由于使用独特材料作为基板，所以与常规的铝或玻璃基板相比，磁记录层非常稳定，并且通过溅射在其上形成的磁性层的矫顽力大大提高了1300奥斯特或更高。

56. 发明授权

US5514468A Magneto-optical recording medium 失效
标题翻译：磁光记录介质
公开(公告)号：US5514468A
公开(公告)日：1996-05-07
申请号：US145173
申请日：1993-11-03
申请人： Hideo Kaneko , Katsushi Tokunaga , Yoshio Tawara , Yoshiaki Shimizu , Tadao Nomura
发明人： Hideo Kaneko , Katsushi Tokunaga , Yoshio Tawara , Yoshiaki Shimizu , Tadao Nomura
IPC分类号： G11B11/105 , B32B3/02 , B32B5/16 , G11B5/66
CPC分类号： G11B11/10584 , G11B11/10593 , Y10S428/90 , Y10T428/26 , Y10T428/265
摘要： A magneto-optical recording medium having a layered structure consisting of a first dielectric layer, magnetic recording layer, second dielectric layer and reflecting layer successively formed on a transparent substrate plate can be imparted with improved performance relative to the recording sensitivity and the C/N ratio when the recording layer and the second dielectric layer each have such a thickness that the angle .delta. given by the equation .delta.=tan.sup.-1 (.epsilon./.theta.k), in which .epsilon. is the Kerr ellipticity of the regenerative light and .theta.k is the Kerr rotation angle, does not exceed 10.degree., the thickness of the recording layer being in the range from 8 nm to 13.5 nm and the thickness of the second dielectric layer satisfying the relationship given by the inequality0.06.ltoreq.nd/.lambda..ltoreq.0.14,in which d is the thickness of the second dielectric layer, .lambda. is the wavelength of the regenerative light for reading-out of the recorded signals and n is the refractive index of the material forming the second dielectric layer to the regenerative light of wavelength .lambda..
摘要翻译：具有由第一电介质层，磁记录层，第二电介质层和连续形成在透明基板上的反射层组成的层状结构的磁光记录介质可以相对于记录灵敏度和C / N 当记录层和第二介电层各自具有这样的厚度，即由等式delta = tan-1（epsilon /θk）给出的角度δ，其中ε是再生光的Kerr椭圆率和θk是克尔旋转角不超过10°，记录层的厚度在8nm至13.5nm的范围内，第二介电层的厚度满足不等式0.06

57. 发明授权

US4146391A High-permeability magnetic material 失效
标题翻译：高磁导率磁性材料
公开(公告)号：US4146391A
公开(公告)日：1979-03-27
申请号：US839885
申请日：1977-10-06
申请人： Kiyoshi Inoue , Hideo Kaneko
发明人： Kiyoshi Inoue , Hideo Kaneko
IPC分类号： C22C38/00 , C22C38/02 , C22C38/06 , H01F1/147
CPC分类号： C22C38/06 , C22C38/02 , H01F1/14791
摘要： A rollable or plastically deformable Sendust-type magnetic alloy containing by weight 3 to 8% aluminum, 4 to 8% silicon, 0.1 to 2% niobium or tantalum or mixture thereof, 0.5 to 7% a mixture of vanadium and copper and the balance iron. The alloy is especially suitable for use with high-frequency inputs.
摘要翻译：包含重量为3至8％的铝，4至8％的硅，0.1至2％的铌或钽或其混合物的可卷曲或塑性可变形的Sendust型磁性合金，0.5至7％的钒和铜的混合物以及余量为。该合金特别适用于高频输入。

58. 发明申请

US20120064438A1 PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSURE METHOD, AND DESIGN METHOD OF TRANSITION METAL/SILICON BASE MATERIAL FILM 有权
标题翻译：光电薄膜和制作方法，光电子图案，光图案曝光方法，以及过渡金属/硅基材料薄膜的设计方法
公开(公告)号：US20120064438A1
公开(公告)日：2012-03-15
申请号：US13228501
申请日：2011-09-09
申请人： Hiroki YOSHIKAWA , Yukio Inazuki , Ryuji Koitabashi , Hideo Kaneko , Takashi Haraguchi , Yosuke Kojima , Tomohito Hirose
发明人： Hiroki YOSHIKAWA , Yukio Inazuki , Ryuji Koitabashi , Hideo Kaneko , Takashi Haraguchi , Yosuke Kojima , Tomohito Hirose
IPC分类号： G03F7/20 , H01L21/31 , G03F1/00
CPC分类号： G03F1/72 , G03F1/32 , G03F1/48 , G03F1/50
摘要： A photomask blank has a film of a transition metal/silicon base material comprising a transition metal, silicon, oxygen and nitrogen, having an oxygen content of at least 3 atom %, and satisfying the formula: 4×CSi/100−6×CM/100>1 wherein CSi is a silicon content in atom % and CM is a transition metal content in atom %.
摘要翻译：光掩模坯料具有包含氧含量为至少3原子％的过渡金属，硅，氧和氮的过渡金属/硅基材的膜，并且满足下式：4×CSi / 100-6×CM 其中CSi是原子％的硅含量，CM是原子％的过渡金属含量。

59. 发明申请

US20100248091A1 METHOD FOR INSPECTING PHOTOMASK BLANK OR INTERMEDIATE THEREOF, METHOD FOR DETERMINING DOSAGE OF HIGH-ENERGY RADIATION, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK 有权
标题翻译：用于检查光电隔离膜或其中间体的方法，用于确定高能量辐射剂量的方法，以及制造光电离空白的方法
公开(公告)号：US20100248091A1
公开(公告)日：2010-09-30
申请号：US12750121
申请日：2010-03-30
申请人： Yukio INAZUKI , Hideo Kaneko , Hiroki Yoshikawa
发明人： Yukio INAZUKI , Hideo Kaneko , Hiroki Yoshikawa
IPC分类号： G03F1/00 , G01B11/24
CPC分类号： G03F1/84 , G03F7/70783
摘要： A photomask blank which is manufactured by depositing a phase shift film on a substrate and irradiating the phase shift film with high-energy radiation to effect substrate shape adjusting treatment is inspected by measuring a surface topography of the photomask blank after the substrate shape adjusting treatment, removing the phase shift film from the photomask blank, measuring a surface topography of the treated substrate after removal of the phase shift film, and comparing the surface topographies, thereby evaluating a warpage change before and after removal of the phase shift film, due to a stress of the phase shift film having undergone substrate shape adjusting treatment.
摘要翻译：通过在基板形状调整处理之后测量光掩模坯料的表面形貌来检查通过在基板上沉积相变膜并用高能辐射照射相移膜来进行基板形状调整处理而制造的光掩模坯料，从光掩模坯料中去除相移膜，在移除相移膜之后测量处理过的基板的表面形貌，并比较表面形貌，由此评估在移相膜之前和之后的翘曲变化，由于经过衬底形状调整处理的相移膜的应力。

60. 发明授权

US06620593B1 Method for safety evaluation of chemical compound using recombinant yeast expressing human cytochrome P450 失效
标题翻译：使用表达人细胞色素P450的重组酵母对化合物进行安全性评估的方法
公开(公告)号：US06620593B1
公开(公告)日：2003-09-16
申请号：US08277031
申请日：1994-07-19
申请人： Koji Hayashi , Toshiyuki Sakaki , Yoshiyasu Yabusaki , Koichiro Komai , Hideo Kaneko , Iwao Nakatsuka
发明人： Koji Hayashi , Toshiyuki Sakaki , Yoshiyasu Yabusaki , Koichiro Komai , Hideo Kaneko , Iwao Nakatsuka
IPC分类号： C12Q126
CPC分类号： C12Y106/02004 , C12N9/0038 , C12N9/0077 , C12Q1/025
摘要： There is disclosed a method for evaluation of the safety of a chemical compound, which includes the steps of: (a) reacting a chemical compound with recombinant yeast cells expressing, or in other words producing, human cytochrome P450 molecular species P450 1A2, P450 2C9, P450 2E1 and P450 3A4 together with a yeast NADPH-P450 reductase, which may be in the form of a fused enzyme with each of said human cytochrome P450 molecular species, or with the cell free extracts of the yeast cells; and (b) analyzing the resulting metabolite to determine the safety of the compound. According to this method, it can be determined whether a test compound will be converted into a carcinogenic or mutagenic form through the metabolism in the human liver, and whether the test compound or its metabolite has mutagenicity.
摘要翻译：公开了一种用于评估化合物安全性的方法，其包括以下步骤：（a）使化学化合物与表达或换句话说，生成人细胞色素P450分子种类P450 1A2，P450 2C9的重组酵母细胞，P450 2E1和P450 3A4以及酵母NADPH-P450还原酶，其可以是与每种所述人细胞色素P450分子种类的融合酶的形式，或与酵母细胞的无细胞提取物; 和（b）分析得到的代谢物以确定化合物的安全性。根据该方法，可以确定试验化合物是否将通过人肝脏中的代谢转化为致癌或诱变形式，以及试验化合物或其代谢物是否具有致突变性。

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